Organic thin film transistors with double insulator layers

We have investigated a double-layer structured gate dielectric for the organic thin films transistor (OTFT) with the purpose of improving the performance of the SiO₂ gate insulator. A 50 nm PMMA layer was coated on top of the SiO₂ gate insulator as organic insulator layer. The results demonstrated that using inorganic/organic compound insulator as the gate dielectric layers is an effective method to fabricate OTFTs with improved electric characteristics and decreased leakage current. Electrical parameters such as carrier mobility and on/off ratio by field effect measurement have been calculated. OTFT based on highly doped Si substrate with a field-effect mobility of 0.004 cm²/V s and on/off ratio of 10⁴ have been obtained.     

Hybridization of a low-temperature processable polyimide gate insulator for high performance pentacene thin-film transistors

We have synthesized a novel fully soluble and low-temperature processable polyimide gate insulator (KSPI) through the one-step condensation polymerization of the monomers 5-(2,5-dioxytetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride and 4,4-diaminodiphenylmethane. Fully imidized KSPI was found to be completely soluble in organic solvents such as N-methyl-2-pyrrolidone (NMP), dimethylacetamide (DMAc), γ-butyrolactone, dimethylsulfoxide (DMSO), and 2-butoxyethanol. Thin films of KSPI can be fabricated at only 150 °C and a pentacene OTFT with KSPI as a gate dielectric was found to exhibit a field effect mobility of 0.22 cm²/V s. To obtain a high performance organic thin-film transistor (OTFT), the KSPI surface was modified in our new technique by hybridization with a non-polar side chain containing a polyimide insulator (PI). The carrier mobility of a pentacene OTFT with a hybridized polyimide gate insulator (BPI-3) was found to be 0.92 cm²/V s. Our new low-temperature processable polyimides show promise as gate dielectrics for OTFTs.     

Solution processable bilayered gate dielectric towards flexible organic thin film transistors

In this study, we have successfully explored the potential of a new bilayer gate dielectric material, composed of Polystyrene (PS), Pluronic P123 Block Copolymer Surfactant (P123) composite thin film and Polyacrylonitrile (PAN) through fabrication of metal insulator metal (MIM) capacitor devices and organic thin film transistors (OTFTs). The conditions for fabrication of PAN and PS-P123 as a bilayer dielectric material are optimized before employing it further as a gate dielectric in OTFTs. Simple solution processable techniques are applied to deposit PAN and PS-P123 as a bilayer dielectric layer on Polyimide (PI) substrates. Contact angle study is further performed to explore the surface property of this bilayer polymer gate dielectric material. This new bilayer dielectric having a k value of 3.7 intermediate to that of PS-P123 composite thin film dielectric (k ∼ 2.8) and PAN dielectric (k ∼ 5.5) has successfully acted as a buffer layer by preventing the direct contact between the organic semiconducting layer and high k PAN dielectric. The OTFT devices based on α,ω-dihexylquaterthiophene (DH4T) incorporated with this bilayer dielectric, has demonstrated a hole mobility of 1.37 × 10⁻² and on/off current ratio of 10³ which is one of the good values as reported before. Several bending conditions are applied, to explore the charge carrier hopping mechanism involved in deterioration of electrical properties of these OTFTs. Additionally, the electrical performance of OTFTs, which are exposed to open atmosphere for five days, can be interestingly recovered by means of re-baking them respectively at 90 °C.     

Flexible,plastic transistor-based chemical sensors

Flexible, plastic chemical sensors were fabricated using a thin polymer gate dielectric layer and polymer electrodes patterned via selective wetting directly on the surface of the organic semiconductor film. Low-voltage transistors based on DDFTTF with PEDOT:PSS electrodes had a mobility as high as 0.05 cm²/Vs with an on–off ratio of 1.2 × 10⁴ on ITO/PET substrates. These devices demonstrated stable operation in water with sensor characteristics similar to those reported on rigid silicon substrates, with sub-ppm detection for cysteine and 2,4,6-trinitrobenzene (TNB).     

Direct photo-patternable,low-temperature processable polyimide gate insulator for pentacene thin-film transistors

We have developed photo-sensitive, low-temperature processable, soluble polyimide (PSPI) gate insulator with excellent resistance to the photo-patterning process. The PSPI was synthesized through one-step condensation polymerization of monomers 5-(2,5-dioxytetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride (DOCDA) and 3,5-diaminobenzyl cinnamate (DABC). PSPI thin film, fabricated at 160 °C, has a dielectric constant of 3.3 at 10 kHz, and leakage current density of <1.7 × 10^?10 A/cm², while biased from 0 to 100 V. PSPI could be easily patterned by selective UV-light exposure and dipping into γ-butyrolactone. To investigate the potential of the polyimide as the photo-patternable gate insulator, we fabricated pentacene OTFTs and confirmed the PSPI’s resistance to the photo-patterning process. The photo-patternable polyimide shows promise as gate dielectrics for OTFTs.     

Photo-patternable polyimide gate insulator with fluorine groups for improving performance of 2,7-didecyl[1]benzothieno[3,2-b][1]benzothiopene (C10-BTBT) thin-film transistors

Surface properties of gate insulators strongly affect the device performance of organic thin-film transistors (OTFTs). To improve the performance of OTFTs, we have developed photo-sensitive polyimide gate insulator with fluorine groups. The polyimide gate insulator film could be easily patterned by selective UV exposure without any photoinitiator. The polyimide gate insulator film, fabricated at 130 °C, has a dielectric constant of 2.8 at 10 kHz, and leakage current density of <1.6 × 10^?10 A/cm² while biased from 0 to 90 V. To investigate the potential of the polyimide with fluorine groups as a gate insulator, we fabricated C₁₀-BTBT TFTs. The field-effect mobility and the on/off current ratio of the TFTs were measured to be 0.76 ± 0.09 cm²/V s and >10⁶, respectively.     

Pentacene organic thin-film transistors with solution-based gelatin dielectric

Gelatin is a natural protein in the field of food, pharmaceutical and tissue engineering, which works very well as the gate dielectric for pentacene organic thin-film transistors (OTFTs). An aqueous solution process has been applied to form a gelatin thin film on poly(ethylene terephthalate) (PET) or glass by spin-coating and subsequent casting. The device performance of pentacene OTFTs depend on the bloom number (molecular weight) of gelatin. The pentacene OTFT with 300 bloom gelatin as the gate dielectric in air ambient exhibits the best performance with an average field-effect mobility (μ_FE) value of ca. 16 cm² V^?1 s^?1 in the saturation regime and a low threshold voltage of ?1 V. The high performance of the pentacene OTFT in air ambient is attributed to the water resided in gelatin. The crystal quality of pentacene is not the key factor for the high performance.     

Self-aligned flexible organic thin-film transistors with gates patterned by nano-imprint lithography

Many applications that rely on organic electronic circuits still suffer from the limited switching speed of their basic elements – the organic thin film transistor (OTFT). For a given set of materials the OTFT speed scales inversely with the square of the channel length, the parasitic gate overlap capacitance, and the contact resistance. For maximising speed we pattern transistor channels with lengths from 10 μm down to the sub-micrometre regime by industrially scalable UV-nanoimprint lithography. The reduction of the overlap capacitance is achieved by minimising the source–drain to gate overlap lengths to values as low as 0.2 μm by self-aligned electrode definition using substrate reverse side exposure. Pentacene based organic thin film transistors with an exceptionally low line edge roughness <20 nm of the channels, a mobility of 0.1 cm²/Vs, and an on–off ratio of 10⁴, are fabricated on 4″ × 4″ flexible substrates in a carrier-free process scheme. The stability and spatial distribution of the transistor channel lengths are assessed in detail with standard deviations of L ranging from 185 to 28 nm. Such high-performing self-aligned organic thin film transistors enabled a ring-oscillator circuit with an average stage delay below 4 μs at an operation voltage of 7.5 V.     

Effects of different electroplated gate electrodes on electrical performances of flexible organic thin film transistor and flexibility improvement

Various electroplated metal gate electrodes (Ni, Cu, and Au) on flexible polyimide (PI) substrates were applied to the fabrication of inverted staggered pentacene organic thin film transistors (OTFTs). The metal gate electrodes additively electroplated onto the patterned negative photoresist mask on the Cu(seed)/Cr(adhesion) layers sputter-deposited on the O₂-plasma-treated PI substrates were effective in obtaining good adhesion between the metal gate electrode and organic substrate. It was found that the reduction in the surface roughnesses of the electroplated metal gate and of the subsequently deposited PVP (poly-4-vinyl phenol) gate dielectric layers was a critical factor in improving the device performance. The Ni-gated OTFT exhibited the best electrical characteristics, with a field-effect mobility of ≅0.2 cm²/V-s and a current on/off ratio of ≅10³, due to the better chemical stability of the Ni electrode and the smoother surface of the PVP layer on the Ni electrode, as compared to the OTFTs with PVP/Cu or PVP/Au gates. The results of the flexibility test showed that the field-effect mobility and current on/off ratio were not changed significantly when the OTFTs were subjected to 10,000 cyclic bendings with a bending radius of 6 mm in tension mode (outward bending).     

Light-emitting field-effect transistors with π-conjugated liquid crystalline polymer driven by AC-gate voltages

Light-emitting field-effect transistors with a liquid crystalline polymer of poly[(9,9-dioctylfluorenyl-2,7-diyl)-co-bithiophene] (F8T2) were investigated under alternating current (AC) gate operations. Bottom-contact/top-gate devices were fabricated with indium-tin-oxide (ITO) source/drain electrodes, a poly(methyl methacrylate) dielectric and a gold gate electrode. The crystalline F8T2 film exhibited ambipolar characteristics with electron and hole mobilities of 1.8 × 10^?3 and 2.5 × 10^?3 cm²/V s, respectively, although the threshold voltage was considerably higher for electron injection. By applying square-wave voltages to the gate, light emission was obtained at the both edges of the source and drain electrodes by alternating injection of opposite carriers even when the source and drain were grounded. The light intensity was enhanced in the channel region by biasing the source negative while biasing the drain positive where the holes injected from the drain were transported to recombine with the electrons injected at the source edge.     

High performance tetrathienoacene-DDP based polymer thin-film transistors using a photo-patternable epoxy gate insulating layer

High performance organic thin-film transistors (OTFTs) are fabricated on an epoxy based photo-patternable organic gate insulating layer (p-OGI) using a top contact thin-film transistor configuration. This negative tone p-OGI material is composed of an epoxy type polymer resin, a polymeric epoxy cross-linker, and a sulfonium photoacid generator (PAG). Features from p-OGI can be precisely patterned down to ∼3 μm via i-line photolithography. In order to evaluate the potential of this epoxy type resin as a gate insulator, we evaluated the dielectric properties of the p-OGI and its gate insulating performance upon fabricating solution processed OTFTs using an organic semiconductor (OSC), namely tetrathienoacene-DPP copolymer (PTDPPTFT4). Results show that the PTDPPTFT4 based OTFTs with this p-OGI exhibit field-effect mobilities up to 1 cm² V⁻¹ s⁻¹, indicating the potential of high performance solution processed OTFT based on an epoxy based p-OGI/OSC system.     

Flexible nonvolatile organic ferroelectric memory transistors fabricated on polydimethylsiloxane elastomer

The flexible organic ferroelectric nonvolatile memory thin film transistors (OFMTs) were fabricated on polydimethylsiloxane (PDMS) elastomer substrates, in which an organic ferroelectric poly(vinylidene-trifluoroethylene) and an organic semiconducting poly(9,9-dioctylfluorene-co-bithiophene) layers were used as gate insulator and active channel, respectively. The carrier mobility, on/off ratio, and subthreshold swing of the OFMTs fabricated on PDMS showed 5 × 10⁻² cm² V⁻¹ s⁻¹, 7.5 × 10³, and 2.5 V/decade, respectively. These obtained values did not markedly change when the substrate was bent with a radius of curvature of 0.6 cm. The memory on/off ratio was initially obtained to be 1.5 × 10³ and maintained to be 20 even after a lapse of 2000 s. The fabricated OFMTs exhibited sufficiently encouraging device characteristics even on the PDMS elastomer to realize mechanically stretchable nonvolatile memory devices.     

Organic field-effect transistors based on low-temperature processable transparent polymer dielectrics with low leakage current

A solution-based transparent polymer was investigated as the gate dielectric for organic field-effect transistors (OFETs). Organic thin films (400 nm) are readily fabricated by spin-coating a polyhydrazide solution under ambient conditions on the ITO substrates, followed by annealing at a low temperature (120 °C). The smooth transparent dielectrics exhibited excellent insulating properties with very low leakage current densities of ～10^?8 A/cm². High performance OFETs with evaporated pentacene as organic semiconductor function at a low operate voltage (?15 V). The mobility could reach as high as 0.7 cm²/Vs and on/off current ratio up to 10⁴. Solution-processed TIPS-pentacene OFETs also work well with this polymer dielectric.     

Fabrication of the flexible pentacene thin-film transistors on 304 and 430 stainless steel (SS) substrate

Flexible organic thin-film transistors (OTFT) were fabricated on 304 and 430 stainless steel (SS) substrate with aluminum oxide as a gate insulator and pentacene as an organic semiconductor. Chemical mechanical polishing (CMP) process was used to study the effect of the SS roughens on the dielectric properties of the gate insulator and OTFT characteristics. The surface roughness was decreased from 33.8 nm for 304 SS and 19.5 nm for 430 SS down to ～2.5 nm. The leakage current of the metal–insulator–metal (MIM) structure (Au/Al₂O₃/SS) was reduced with polishing. Mobility and on/off ratio of pentacene TFT with bare SS showed a wide range of values between 0.005 and 0.36 cm²/Vs and between 10³ and 10⁵ depending on the location in the substrate. Pentacene TFTs on polished SS showed an improved performance with a mobility of 0.24–0.42 cm²/Vs regardless of the location in the substrate and on/off ratio of ～10⁵. With self assembled monolayer formation of octadecyltrichlorosilane (OTS) on insulator surface, mobility and on/off ratio of pentacene TFT on polished SS was improved up to 0.85cm²/Vs and ～10⁶. I–V characteristics of pentacene TFT with OTS treated Al₂O₃/304 SS was also obtained in the bent state with a bending diameter (D) of 24, 45 or 70 mm and it was confirmed that the device performed well both in the linear regime and the saturation regime.     

Soluble pentacene thin-film transistor using a high solvent and heat resistive polymeric dielectric with low-temperature processability and its long-term stability

Solution processable organic thin-film transistors (OTFTs) were fabricated using 6,13-bis(triisopropyl-silylethynyl) pentacene (TIPS-pentacene) and low-temperature processable polyimide gate dielectric. The TIPS-pentacene OTFT with the dielectric was found to have a field-effect mobility of 0.15 cm²/Vs, which is comparable to that of OTFT with an inorganic dielectric. The OTFTs with the polyimide dielectric did not show any significant performance degradation as time passed. A field-effect mobility of the OTFTs in 60 days was found to be almost identical to that of pristine OTFT. The combination of TIPS-pentacene and our polyimide gate dielectric can be one of the potential candidates for the fabrication of stable OTFTs for large-area flexible electronics.     

Transparent conductors with an ultrathin nickel layer for high-performance photoelectric device applications

A thin nickel (Ni) layer of thickness 5 nm was inserted in between the indium tin oxide (ITO) layers of thickness 50 nm each so as to increase the conductivity of ITO without affecting much of its transmittance nature. ITO layers with and without Ni film were prepared by reactive DC sputtering on both Si and glass substrates. The influence of Ni layer on the optical and electrical properties of prepared devices was investigated. Due to the insertion of thin Ni layer, the resistivity of ITO/Ni/ITO sample (3.2×10⁻⁴ Ω cm) was reduced 10 times lesser than that of ordinary ITO layer (38.6×10⁻⁴ Ω cm); consequently it increased the mobility of ITO/Ni/ITO device. The external and internal quantum efficiencies (EQE and IQE) of ITO/Ni/ITO device exhibited better performance when compared to ITO layer that has no Ni film. At wavelengths of 350 and 600 nm, the photoresponses of ITO/Ni/ITO device were predominant than that of reference ITO device. This highly conductive and photoresponsive Ni inserting ITO layers would be a promising device for various photoelectric applications.     

Effect of active layer thickness on environmental stability of printed thin-film transistor

We have studied the effect of active layer thickness on the performance and environmental stability of the 6,13-bis(triisopropylsilylethynyl) pentacene (TIPS pentacene) thin-film transistor. The organic thin-film transistors (OTFTs) were fabricated by inkjet printing using a solution based TIPS pentacene. To get thick organic semiconductor, the surface of gate insulator was treated with n-octyltrichlorosilane (OTS-C₈) before jetting. The on-currents of the OTFT with ～1 μm active layer decreases a little in air, but the OTFT with 0.05 μm TIPS pentacene shows a significant degradation in drain currents.     

Effect of the work function of gate electrode on hysteresis characteristics of organic thin-film transistors with Ta2O5/polymer as gate insulator

Organic thin-film transistors (OTFTs) using high dielectric constant material tantalum pentoxide (Ta₂O₅) and benzocyclobutenone (BCBO) derivatives as double-layer insulator were fabricated. Three metals with different work function, including Al (4.3 eV), Cr (4.5 eV) and Au (5.1 eV), were employed as gate electrodes to study the correlation between work function of gate metals and hysteresis characteristics of OTFTs. The devices with low work function metal Al or Cr as gate electrode exhibited high hysteresis (about 2.5 V threshold voltage shift). However, low hysteresis (about 0.7 V threshold voltage shift) OTFTs were attained based on high work function metal Au as gate electrode. The hysteresis characteristics were studied by the repetitive gate voltage sweep of OTFTs, and capacitance–voltage (C–V) and trap loss-voltage (G_p/ω?V) measurements of metal–insulator–semiconductor (MIS) devices. It is proved that the hysteresis characteristics of OTFTs are relative to the electron injection from gate metal to Ta₂O₅ insulator. The electron barrier height between gate metal and Ta₂O₅ is enhanced by using Au as gate electrode, and then the electron injection from gate metal to Ta₂O₅ is reduced. Finally, low hysteresis OTFTs were fabricated using Au as gate electrode.     

Thermally curable polymers consisting of alcohol-functionalized cyclotetrasiloxane and melamine derivatives for use as insulators in OTFTs

New thermally curable organic/inorganic hybrid polymers were designed and synthesized as insulators for organic thin film transistors (OTFTs). Cyclotetrasiloxane (CTS) was reacted with allyl alcohols through a hydrosilylation reaction in the presence of a catalytic amount of Pt(0) to give the alcohol-functionalized cyclotetrasiloxane (CTS-OH). The synthesized CTS-OH was then thermally cured with hexamethoxymethylmelamine (HMMM) at 80 °C in the presence of a catalytic amount of p-toluenesulfonic acid to form a hard and smooth thin film composed of a highly cross-linked network polymers (CTS-MMs). Devices with indium-tin-oxide/CTS-MM/Au configuration were fabricated to investigate electrical properties of the polymers such as capacitance, dielectric constant, and leakage current. The CTS-MM showed lower leakage current level than the well-known curable insulator consisting of poly(vinylphenol) (PVP) and a melamine derivative. Pentacene-based OTFTs were fabricated using the synthesized insulators as the gate dielectric layers, and their performances were compared to those of the device fabricated using PVP. The OTFTs fabricated using CTS-MM showed higher field-effect mobility than that of the PVP. The hole mobility of the pentacene based-OTFTs fabricated using CTS-MM as gate dielectric was 0.36 cm²/V s and the on/off current ratio was >10⁷.     

IGZO thin film transistors with Al2O3 gate insulators fabricated at different temperatures

Thin film transistors (TFTs) with bottom gate and staggered electrodes using atomic layer deposited Al₂O₃ as gate insulator and radio frequency sputtered In–Ga–Zn Oxide (IGZO) as channel layer are fabricated in this work. The performances of IGZO TFTs with different deposition temperature of Al₂O₃ are investigated and compared. The experiment results show that the Al₂O₃ deposition temperature play an important role in the field effect mobility, I_on/I_off ratio, sub-threshold swing and bias stability of the devices. The TFT with a 250 °C Al₂O₃ gate insulator shows the best performance; specifically, field effect mobility of 6.3 cm²/Vs, threshold voltage of 5.1 V, I_on/I_off ratio of 4×10⁷, and sub-threshold swing of 0.56 V/dec. The 250 °C Al₂O₃ insulator based device also shows a substantially smaller threshold voltage shift of 1.5 V after a 10 V gate voltage is stressed for 1 h, while the value for the 200, 300 and 350 °C Al₂O₃ insulator based devices are 2.3, 2.6, and 1.64 V, respectively.