A novel 3-TFT voltage driving method of compensating VTH shift for a-Si:H TFT and OLED degradation for AMOLED

This work demonstrates the feasibility of a novel pixel circuit by using three a-Si:H TFTs. The proposed circuit can stabilize the OLED current and provide an additional driving current to ameliorate the brightness degradation of the AMOLED. Measurement results indicate that the current degradation of the proposed circuit, caused by V_TH variations, is less than 5% over more than 50,000 s at 60 °C, whereas that of a conventional 2T1C pixel circuit is larger than 34%. Furthermore, to ameliorate the decrease in luminance owing to the OLED degradation, the OLED current can be increased by 10% by analyzing the current degradation and modulating the detected voltage appropriately.     

Mirrored OLED pixel circuit for threshold voltage and mobility compensation with IGZO TFTs

In this paper, pixel circuit using mirroring structure with Indium–Gallium–Zinc oxide (IGZO) thin film transistors (TFTs) for active matrix organic light emitting diode (AMOLED) display is proposed. This pixel circuit consists of only four TFTs, and one capacitor. Due to the mirroring structure, characteristic of the driving TFT can be precisely sensed by the sensing TFT, which is deployed in a discharging path for gate electrode of the driving TFT. This discharging process is strongly dependent on threshold voltage (V_T) and effective mobility of the sensing TFT. Circuit operating details are discussed, and compensation effects for threshold voltage shift and mobility variations are verified through numerical derivation and SPICE simulations. Furthermore, compared with conventional schematics, the proposed pixel circuit might have much simplified external driving circuits, and it is a promising alternative solution of high performance AMOLED display.     

A new voltage-modulated AMOLED pixel design compensating for threshold voltage variation in poly-Si TFTs

A new voltage-modulated active-matrix organic light-emitting diode (AMOLED) pixel design, which successfully compensates for the threshold voltage variations in poly-Si thin-film transitors (TFTs), is proposed, and verified by SPICE simulation and experiments. In order to compensate for variations in OLED current, the proposed pixel design employs a new voltage modulation scheme using diode connections.     

A new a-Si:H thin-film transistor pixel circuit for active-matrix organic light-emitting diodes

We propose a new pixel circuit using hydrogenated amorphous silicon (a-Si:H) thin-film transistors (TFTs), composed of three switching and one driving TFT, for active-matrix organic light-emitting diodes (AMOLEDs) with a voltage source method. The circuit simulation results based on the measured threshold voltage shift of a-Si:H TFTs by gate-bias stress indicate that this circuit compensates for the threshold voltage shifts over 10000 h of operation.     

Polysilicon TFT technology for active matrix OLED displays

The integration of active matrix polysilicon TFT technology with organic light emitting diode (OLED) displays has been investigated with the goal of producing displays of uniform brightness. This work identifies and addresses several process integration issues unique to this type of display which are important in achieving bright and uniform displays. Rapid thermal processing has been incorporated to achieve uniform polysilicon microstructure, along with silicides to reduce parasitic source and drain series resistance. Using these processes, TFT drain current nonuniformity has been reduced below 5% for 90% of the devices. This work also introduces transition metals to produce low resistance contacts to ITO and to eliminate hillock formation in the aluminum metallization. These processes, along with spin on glasses for planarization, have been used to produce functional active matrix arrays for OLED displays. The final array pixel performance is also presented     

Simulation of pixel voltage error for a-Si TFT LCD regarding thechange in LC pixel capacitance

LC pixel capacitance C_lc, which changes with the director of liquid crystal molecules as a function of external applied voltage, has a most important impact on the pixel voltage error Δ V_p and therefore on the electro-optics (E-O) characteristics of the LC pixel for an a-Si TFT LCD. In this paper, the pixel voltage error has been simulated for 10.4" VGA (640×480) and SVGA (800×600) a-Si TFT LCD, and in this simulation, we especially took into account the change in LC dielectric constant. We found that Δ V_p changes with the data voltage V_p. In addition, E-O characteristics of LC pixel for an a-Si TFT LCD has been investigated. The result shows that the effect of Δ V_p on E-O characteristics is significant when V_p ranges from the threshold voltage to the saturation voltage     

A new pixel circuit for active matrix organic light emitting diodes

We propose a new thin-film-transistor (TFT) pixel circuit for active-matrix organic light-emitting diode (AMOLED) composed of four TFTs and two capacitors. The simulation results, based on the device performances measured for an OLED and a poly-Si TFT, indicate that the proposed circuit has high immunity to the variation of poly-Si TFT characteristics     

基于低温多晶硅薄膜晶体管的AMOLED交流像素电路

This work presents a new voltage programmed pixel circuit for an active-matrix organic light-emitting diode(AMOLED) display.The proposed pixel circuit consists of six low temperature polycrystalline silicon thinfilm transistors(LTPS TFTs),one storage capacitor,and one OLED,and is verified by simulation work using HSPICE software.Besides effectively compensating for the threshold voltage variation of the driving TFT and OLED,the proposed pixel circuit offers an AC driving mode for the OLED,which can suppress the degradation of the OLED.Moreover,a high contrast ratio can be achieved by the proposed pixel circuit since the OLED does not emit any light except for the emission period.     

一种LTPS-TFT AMOLED像素电路的理论研究

本文对一种LTPS-TFT AMOLED电压型阈值电压(V_(th))补偿像素电路进行了理论研究,分析了影响V_(th)补偿效果的主要因素。电路的补偿效果主要由驱动TFTV_(th)的获取精度和随后的保持精度决定。在V_(th)获取过程中,相关误差主要由驱动TFT转移特性电流对存储电容充电的充电率不足产生;在显示信号与V_(th)叠加过程中,与V_(th)保持节点连接的电容增量等因素会造成V_(th)保持精度的损失。根据分析的结果,本文解释了高分辨率像素电路补偿效果下降的原因。     

Threshold voltage shift compensated active pixel sensor array for digital X-ray imaging in a-Si technology

A new active pixel sensor for X-ray digital imaging using amorphous silicon thin-film transistors (a-Si TFTs) is proposed. Simulation results show that this new APS structure is fully capable of compensating for variations in threshold voltage (V/sub T/) of a-Si TFTs under prolonged gate voltage stress.     

A novel current-scaling a-Si:H TFTs pixel electrode circuit for AM-OLEDs

Hydrogenated amorphous silicon thin-film transistor (a-Si:H TFT) pixel electrode circuit with a function of current scaling is proposed for active-matrix organic light-emitting displays (AM-OLEDs). In contrast to the conventional current mirror pixel electrode circuit, in this circuit a high data-to-organic light-emitting device (OLED) current ratio can be achieved, without increasing the a-Si:H TFT size, by using a cascade structure of storage capacitors. Moreover, the proposed circuit can compensate for the variations of TFT threshold voltage. Simulation results, based on a-Si:H TFT and OLED experimental data, showed that a data-to-OLED current ratio larger than 10 and a fast pixel programming time can be accomplished with the proposed circuit.     

Improved a-Si:H TFT pixel electrode circuits for active-matrixorganic light emitting displays

Two improved four thin-film-transistors (TFTs) pixel electrode circuits based on hydrogenated amorphous silicon (a-Si:H) technology have been designed. Both circuits can provide a constant output current level and can be automatically adjusted for TFT threshold voltage variations. The circuit simulation results indicate that an excellent linearity between the output current and input current can be established. An output current level higher than ~5 μA can be achieved with these circuits. This current level can provide a pixel electrode brightness higher than 1000 cd/m² with the organic light-emitting device (OLED) having an external quantum efficiency of 1%. These pixel electrode circuits can potentially be used for the active-matrix organic light-emitting displays (AM-OLEDs)     

A novel a-Si:H AMOLED pixel circuit based on short-term stress stability of a-Si:H TFTs

This letter presents a novel pixel circuit for hydrogenated amorphous silicon (a-Si:H) active matrix organic light-emitting diode displays employing the short-term stress stability characteristics of a-Si:H thin film transistors (TFTs). The pixel circuit uses a programming TFT that is under stress during the programming cycle and unstressed during the drive cycle. The threshold voltage shift (V/sub T/-shift) of the TFT under these conditions is negligible. The programming TFT in turn regulates the current of the drive TFT, and the pixel current therefore becomes independent of the threshold voltage of the drive TFT.     

Gated-four-probe a-Si:H TFT structure: a new technique to measurethe intrinsic performance of a-Si:H TFT

In this letter, a new technique based on gated-four-probe hydrogenated amorphous silicon (a-Si:H) thin-film transistor (TFT) structure is proposed. This new technique allows the determination of the intrinsic performance of a-Si:H TFT without any influence from source/drain series resistances. In this method, two probes within a conventional a-Si:H TFT are used to measure the voltage difference within a channel. By correlating this voltage difference with the drain-source current induced by applied gate bias, the a-Si:H TFT intrinsic performance, such as mobility, threshold voltage, and field-effect conductance activation energy, can be accurately determined without any influence from source/drain series resistances     

Improvement of pixel electrode circuit for active-matrix OLED by application of reversed-biased voltage

In this paper, an improved ac pixel electrode circuit for active-matrix organic light-emitting display (AMOLED) has been proposed by adding a thin-film transistor. This circuit can provide an ac driving mode for AMOLED and makes the OLED in a reversed-biased voltage during the reverse cycle. And a circuit design for understanding ac driving mode was presented. The circuit simulation results indicate that this circuit is feasible. The circuit structure is practical for the AMOLED pixel driver; it can improve the performance of OLED.     

一种新的应用到硅基有机发光二极管微显示像素电路仿真的OLED SPICE模型

本文介绍了一种新的OLED器件等效电路模型。由于单二极管模型能和多二极管模型一样较好的模拟OLED特性,因此新模型是基于单二极管模型建立的。并且为了保证拟合数据和测试数据有很好的一致性,在新模型中将常量电阻替换成指数电阻。通过与测试数据和其他两种OLED SPICE模型的模拟数据对比,新的模型更符合OLED的电流电压特性。新的模型能直接整合到SPICE电路仿真器中去,并且在OLED整个电压工作范围内拥有较好的仿真精度。     

一种基于低温多晶硅薄膜晶体管的交流AMOLED像素补偿电路

This paper presents a new poly-Si pixel circuit employing AC driving mode for active matrix organic light-emitting diode （AMOLED） displays. The proposed pixel circuit, which consists of one driving thin-film tran- sistor （TFT）, three switching TFTs, and one storage capacitor, can effectively compensate for the threshold voltage variation in poly-Si and the OLED degradation. As there is no light emission, except for during the emitting period, and a small number of devices used in the proposed pixel circuit, a high contrast ratio and a high pixel aperture ratio can be easily achieved. Simulation results by SMART-SPICE software show that the non-uniformity of the OLED current for the proposed pixel circuit is significantly decreased （〈 10%） with an average value of 2.63%, while that of the conventional 2T1C is 103%. Thus the brightness uniformity of AMOLED displays can be improved by using the proposed pixel circuit.     

Schottky-contact gated-four-probe a-Si:H TFT structure: a newstructure to investigate the electrical instability of a-Si:H TFT

In this letter, we describe a new device structure, the Schottky-contact (SC) gated-four-probe (GFP) hydrogenated amorphous silicon (a-Si:H) thin-film transistor (TFT) structure, that can be used to study the electrical instability of a-Si:H TFTs induced by bias-temperature-stress (BTS). In this SC-GFP TFT structure, the evolution of both electron and hole conduction characteristics can he studied before and after BTS without the influence of source-drain contacts. We observed that low-bias negative stress induces a reduction in the deep-gap state density, while high-bias negative stress mainly causes trapping of holes in the gate-insulator. On the other hand, positive BTS induces mainly the trapping of electrons in the gate-insulator, which causes positive shifts of both electron and hole conduction characteristics     

a—Si：H TFT自对准工艺的研究

实验研究了自对准结构的ａ－Ｓｉ：Ｈ ＴＦＴ的制备工艺，对其中关键的底部曝光和顶胶工艺进行了详细的研究和分析，对制备工艺和结构参数进行了合理的优化，成功地制备出自对准结构的ａ－Ｓｉ：Ｈ ＴＦＴ。对影响自对准结构ａ－Ｓｉ：Ｈ ＴＦＴ特性的主要因素进行了详细的分析，提出了一种新颖的双有源层结构的ａ－Ｓｉ：Ｈ ＴＦＴ，可以有效地改善ａ－Ｓｉ：Ｈ ＴＦＴ的开态特性，其通断电流比ＩＯＮ／ＩＯＦＦ〉１０＾５。