共查询到17条相似文献,搜索用时 62 毫秒
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电子枪蒸发制备了氧化铪薄膜,对氧离子束辅助和未辅助两种情况下的样品进行了折射率、吸收、激光损伤阈值等属性的测试,结果表明,氧离子束辅助沉积的样品与未辅助沉积的样品相比具有高的折射率和高的吸收,以及稍低的激光损伤阈值。经过分析发现,薄膜的激光损伤阈值是影响薄膜抗激光特性的不利因素和有利因素竞争的结果,离子束辅助沉积技术在引入结构致密等有利因素的同时,也引入了吸收增加等不利因素。 相似文献
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采用合适的离子束辅助沉积(IBAD)参数在K9基底上镀制了高激光损伤阈值的中心波长1053 nm的增透膜,分别从光谱性能、吸收性能、抗激光损伤阈值(LIDT)以及退火后的影响等方面与未进行离子束辅助沉积的薄膜进行对比分析。实验结果发现,采用离子辅助制备的薄膜放置80 d后具有更好的光谱稳定性,与未进行离子束辅助镀制的薄膜相比,平均吸收下降了57%,吸收值偏高的奇异点明显减少;损伤阈值提高了60%,用Leica偏振光学显微镜观察50%损伤几率的能量下破斑形貌,发现经过离子束辅助制备的样品破斑形状整齐且缺陷点少;未进行离子束辅助制备的样品退火后吸收降低,阈值提高,但奇异点没有减少,辅助样品变化不大。由此可知,离子辅助有助于制备高性能基频增透膜。 相似文献
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离子束辅助技术在高功率激光薄膜中的应用 总被引:2,自引:0,他引:2
从离子束清洗、离子束辅助沉积以及离子束后处理三个方面,介绍了离子束辅助技术在高功率激光薄膜中的应用背景、应用优势以及存在的问题。 相似文献
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激光清洗阈值和损伤阈值的研究 总被引:5,自引:0,他引:5
讨论了采用波长为308nm,脉冲宽度为28ns的准分子激光清洗基片的实验研究,分析了激光清洗过程中清洗阈值和损伤阈值存在的原因,并对它们进行了定量性推导。 相似文献
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为了满足薄膜激光损伤阈值客观、准确、高精度测量的要求, 提出了损伤阈值标定技术。通过互换两个能量探测器位置的试验标定方法, 消除分光镜的分光误差和能量探测器的测量误差, 获得准确的辐照能量。再通过调整两个CCD位置获得相同光斑尺寸的测量方法标定被测样品表面与光斑面积测量面的等效, 并剔除激光光斑中非平顶部分, 获得准确的辐照光斑面积。最后采用最小二乘法对计算得到的能量密度及其对应的损伤几率进行拟合, 获得损伤阈值。通过对TiO2/SiO2高反射膜1064nm激光辐照测量实验, 得到23.0164J/cm2的薄膜激光损伤阈值。结果表明, 采用标定技术使薄膜激光损伤阈值的测量精度提高了9.26%, 满足高精度的测量要求。此研究有助于薄膜激光损伤阈值的准确标定。 相似文献
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Kevin G. Ressler Neville Sonnenberg Michael J. Cima 《Journal of Electronic Materials》1996,25(1):35-42
Yttria-stabilized zirconia (YSZ) films were deposited using ion assisted, electron beam deposition (IBAD) on Pyrex, quartz,
Hastelloy, and polycrystalline zirconia substrates. Film orientation was studied as a function of IBAD fabrication conditions.
Film texture from several populations of biaxially aligned grains has been observed. The ion beam is shown to induce biaxial
alignment of all grain orientations. Specifically, grains with (200), (311), and (111) normal to the substrate surface are
biaxially aligned. The ion beam induces biaxial alignment at all angles of incidence, not just those corresponding to YSZ
channeling directions. The development of (200) biaxial alignment on Pyrex is examined as a function of thickness. Biaxially
aligned IBAD YSZ films were deposited on amorphous and polycrystalline substrates without active heating. Biaxial alignment
development with IBAD is shown to be consistent with a previously proposed growth and extinction model. 相似文献
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A. T. Ping C. Youtsey I. Adesida M. Asif Khan J. N. Kuznia 《Journal of Electronic Materials》1995,24(4):229-234
Chemically assisted ion beam etching of gallium nitride (GaN) grown by metalorganic chemical vapor deposition has been characterized
using an Ar ion beam and Cl2gas. The etch rate of GaN was found to increase linearly with Ar ion beam current density, increase linearly then saturate
with Ar ion beam energy, vary slightly with Cl2 flow rate, and lastly, increase moderately with substrate temperature. Etch rates as high as 330 nm/min were obtained at
high beam energies and 210 nm/min at a more nominal level of 500 eV. The anisotropy of etched profiles improved in the presence
of Cl2 in comparison to those etched by Ar ion milling only. Elevated substrate temperatures further enhanced the anisotropy to
obtain near-vertical profiles for fairly deep-etched structures. Auger electron spectroscopy was used to investigate etch-induced
surface changes. Oxygen contamination was observed on the as-etched surface but a dilute HC1 treatment restored the stoichiometry
of the material to its unetched state. 相似文献
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Using a new kind of EH1000 ion source, hafnium dioxide (HfO2) films are deposited with different depo sition techniques and different conditions. The absorbance and the laser damage threshold of these films have been measured and studied. By comparing these characteristics, one can conclude that under right conditions, such as high partial pressure of oxygen and right kind of ion source, the ion-assisted reaction deposition can prepare HfO2 films with higher laser induced damage threshold. 相似文献
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本文以TiO_2薄膜为例,研究并分析了不同能量的离子束辅助淀积的薄膜的光学性能、激光破坏阈值及微结构。 相似文献
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Aluminum nitride thin films have been prepared at room temperature by reactive ion beam sputtering for potential use as a
passivant and diffusion/anneal cap in compound semiconductor technology. The electrical and optical pro-perties of these films
have been studied along with the in-fluence of thermal annealing on the material characteristics. The quality of the films
has also been found to improve in the presence of atomic hydrogen during the deposition. 相似文献
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Application of silicon-nitride (Si-N) as a passivant in com-pound semiconductor technology requires a low-temperature deposition
process to prevent dissociation of the volatile constituents of the semiconductor. With this in mind, an exploratory study
of Si-N films prepared at room temperature using low-energy, reactive ion-beam sputtering has been carried out. The electrical
and optical characteristics of the films have been studied, and an annealing step is found necessary to reduce the conductivity
of the nitride and im-prove the interfacial properties.
On leave of absence from the Department of Physics, Kurukshetra University, Kurukshetra-132119, India. 相似文献