A 576 K 3.5-ns access BiCMOS ECL static RAM with array built-inself-test

An experimental 576 K BiCMOS emitter-coupled-logic (ECL)-compatible SRAM that achieves 3.5-ns access and cycle is discussed. The SRAM is fully self-testable using less than 1 K on-chip logic gates to assist characterization, wafer testing, and package testing. The I/O is also transistor-transistor-logic (TTL) programmable with the first-metal mask     

A 1.5-ns 256-kb BiCMOS SRAM with 60-ps 11-K logic gates

A 1.5-ns address access time, 256-kb BiCMOS SRAM has been developed. To attain this ultra-high-speed access time, an emitter-coupled logic (ECL) word driver is used to access 6-T CMOS memory cells, eliminating the ECL-MOS level-shifter time delay. The RAM uses a low-power active pull down ECL decoder. The chip contains 11-K, 60-ps ECL circuit gates. It provides variable RAM configurations and general logic functions. RAM power consumption is 18 W; chip power consumption is 35 W. The chip is fabricated by using a 0.5-μm BiCMOS process. The memory cell size is 58 μm² and the chip size is 11×11 mm     

A 5-ns 1-Mb ECL BiCMOS SRAM

A 1-Mword×1-b ECL (emitter coupled logic) 10 K I/O (input/output) compatible SRAM (static random-access memory) with 5-ns typical address access time has been developed using double-level poly-Si, double-level metal, 0.8-μm BiCMOS technology. To achieve 5-ns address access time, high-speed X-address decoding circuits with wired-OR predecoders and ECL-to-CMOS voltage-level converters with partial address decoding function and sensing circuits with small differential signal voltage swing were developed. The die and memory cell sizes are 16.8 mm×6.7 mm and 8.5 μm×5.3 μm, respectively. The active power is 1 W at 100-MHz operation     

A 3.8-ns 16 K BiCMOS SRAM

A 2 K×8-b, ECL 100 K compatible BiCMOS SRAM with 3.8-ns (-4.5 V, 60°) address access time is described. The precisely controlled bit-line voltage swing (60 mV), a current sensing method, and optimized ECL decoding circuits permit a reliable and fast readout operation. The SRAM features an on-chip write pulse generator, latches for input and output bits, and a full six-transistor CMOS cell array. Power dissipation is approximately 2 W, and the chip size is 3.9×5.9 mm². The SRAM was based on 1.2-μm BiCMOS, using double-metal, triple-polysilicon, and self-aligned bipolar transistors     

A 1.5-ns access time, 78-μm2 memory-cell size, 64-kbECL-CMOS SRAM

A 1.5-ns access time, 78-μm² memory-cell size, 64-kb ECL-CMOS SRAM has been developed. This high-performance device is achieved by using a novel ECL-CMOS SRAM circuit technique: a combination of CMOS cell arrays and ECL word drivers and write circuits. These ECL word drivers and write circuits drive the CMOS cell arrays directly without any intermediate MOS level converter. In addition to the ultrahigh-speed access time and relatively small memory-cell size, a very short write-pulse width of 0.8 ns and sufficient soft-error immunity are obtained. This ECL-CMOS SRAM circuit technique is especially useful for realizing ultrahigh-speed high-density SRAMs, which have been used as cache and control storages of mainframe computers     

A 2-ns cycle, 3.8-ns access 512-kb CMOS ECL SRAM with a fullypipelined architecture

The authors describe a 512 K CMOS static RAM (SRAM) with emitter-coupled-logic (ECL) interfaces which has a 2-ns cycle time and a 3.8-ns access time, both of which are valid for random READ/WRITE operations. The CMOS technology and the physical organization of the chip are briefly discussed, and the pipelined architecture of the chip is described. Detailed measurements of internal chip waveforms demonstrating 2-ns cycle time operation are presented. The impact of wire RC delays on performance is discussed. Circuit examples that demonstrate the implementation of the pipelined architecture are included. Measurements of operating margins, access time, and cycle time are outlined     

A 6-ns ECL 100 K I/O and 8-ns 3.3-V TTL I/O 4-Mb BiCMOS SRAM

The authors report a 4 M word×1 b/1 M word×4 b BiCMOS SRAM that can be metal mask programmed as either a 6-ns access time for an ECL 100 K I/O interface to an 8-ns access time for a 3.3-V TTL I/O interface. Die size is 18.87 mm×8.77 mm. Memory cell size is 5.8 μm×3.2 μm. In order to achieve such high-speed address access times the following technologies were developed: (1) a BiCMOS level converter that directly connects the ECL signal level to the CMOS level; (2) a high-speed BiCMOS circuit with low threshold voltage nMOSFETs; (3) a design method for determining the optimum number of decoder gate stages and the optimum size of gate transistors; (4) high-speed bipolar sensing circuits used at 3.3-V supply voltage; and (5) 0.55-μm BiCMOS process technology with a triple-well structure     

Fast-access BiCMOS SRAM architecture with a VSSgenerator

A high-speed BiCMOS ECL (emitter coupled logic) interface SRAM (static RAM) architecture is described. To obtain high-speed operation for scaled-down devices, such as MOSFETs with a feature size of 0.8 μm or less and with a small MOS level, a new SRAM architecture featuring all-bipolar peripheral circuits and CMOS memory cells with V_SS generator has been developed. Two key circuits, a V_SS generator and a current switch level converter, are described in detail. These circuits reduce the external supply voltage to the internal MOS level, thus permitting high-speed SRAM operation. To demonstrate the effectiveness of the concept, a 256 kb SRAM with an address access time of 5 ns is described     

Power reduction techniques for a 1-Mb ECL-CMOS SRAM with an accesstime of 550 ps and an operating frequency of 900 MHz

This paper describes power reduction circuit techniques in an ultra-high-speed emitter-coupled logic (ECL)-CMOS SRAM. Introduction of a 0.25-μm MOS transistor allows a Y decoder and a bit-line driver to be composed of CMOS circuits, resulting in a power reduction of 34%. Moreover, a variable-impedance load has been proposed to reduce cycle time. A 1-Mb ECL-CMOS SRAM was developed by using these circuit techniques and 0.2-μm BiCMOS technology. The fabricated SRAM has an ultrafast access time of 550 ps and a high operating frequency of 900 MHz with a power dissipation of 43 W     

A 1-V, 10-MHz, 3.5-mW, 1-Mb MTCMOS SRAM: with charge-recyclinginput/output buffers

This paper presents a high-speed and low-power SRAM for portable equipment, which is operated by a single battery cell of around 1 V. Its memory cells are made up of high-threshold-voltage (high-V_th) MOSFETs in order to suppress the power dissipation due to large subthreshold leakage currents. For designing peripheral circuitry, we use SRAM's special feature that input signals of each logic gate during the standby time can be predicted. Low-V_th MOSFETs are assigned for the critical paths of memory-cell access. The leakage current in each logic gate is reduced by high-V_th MOSFETs, which are cut off during standby. The high-V_th, MOSFET in one logic gate can be shared with another logic gate in order to enlarge effective channel width. To shorten the readout time, a step-down boosted-wordline scheme suitable for current-sense readout and a new half-swing bidirectional double-rail bus are used. The data-writing time is halved by means of a pulse-reset wordline architecture. To reduce the power dissipation, a 32-divided memory array structure is employed with a new redundant address-decoding scheme. Also, data transition detectors and a charge-recycling technique are employed for reducing the power dissipation of data-I/O buffers. A 64-K-words×16-bits SRAM test chip, which was fabricated with a 0.5-μm multithreshold voltage CMOS (MTCMOS) process, has demonstrated a 75-ns address access time at a 1-V power supply. The power dissipation during standby is 1.2 μW, and that at a 10-MHz read operation with the modified checkerboard test pattern is 3.9 mW for 30-pF loads     

A circuit technology for sub-10-ns ECL 4-Mb BiCMOS DRAM's

The feasibility of realizing an emitter-coupled-logic (ECL) interface 4-Mb dynamic RAM (DRAM) with an access time under 10 ns using 0.3-μm technology is explored, and a deep submicrometer BiCMOS VLSI using this technology is proposed. Five aspects of such a DRAM are covered. They are the internal power supply voltage scheme using on-chip voltage limiters, an ECL DRAM address buffer with a reset function and level converter, a current source for address buffers compensated for device parameter fluctuation, an overdrive rewrite amplifier for realizing a fast cycle time, and double-stage current sensing for the main amplifier and output buffer. Using these circuit techniques, an access time of 7.8 ns is expected with a supply current of 198 mA at a 16-ns cycle time     

On-chip test circuitry for a 2-ns cycle, 512-kb CMOS ECL SRAM

On-chip test circuitry that provides 8-b-deep emitter-coupled logic (ECL) level patterns to 12 input pads of a 512-kb CMOS ECL static RAM (SRAM) at cycle times as fast as 1.4 ns has been built in a 0.8- mu m CMOS technology with L/sub eff/=0.5 mu m. A unique approach for synchronizing the input signals to the chip-select signal in order to provide an optimum setup time and data-valid windows as the operating frequency changes is described. Measured results and extensive simulation demonstrate the stability of the on-chip test circuitry for cycle times of 1.4-50 ns. The on-chip test circuitry makes it possible to test the SRAM chip at its pipelined cycle time. In addition, the speed of the on-chip test circuitry will track future technology improvements, making it possible to generate test patterns as SRAM performance continues to improve.<>     

A 0.65-ns, 72-kb ECL-CMOS RAM macro for a 1-Mb SRAM

An ultrahigh-speed 72-kb ECL-CMOS RAM macro for a 1-Mb SRAM with 0.65-ns address-access time, 0.80-ns write-pulse width, and 30.24-μm ² memory cells has been developed using 0.3-μm BiCMOS technology. Two key techniques for achieving ultrahigh speed are an ECL decoder/driver circuit with a BiCMOS inverter and a write-pulse generator with a replica memory cell. These circuit techniques can reduce access time and write-pulse width of the 72-kb RAM macro to 71% and 58% of those of RAM macros with conventional circuits. In order to reduce crosstalk noise for CMOS memory-cell arrays driven at extremely high speeds, a twisted bit-line structure with a normally on MOS equalizer is proposed. These techniques are especially useful for realizing ultrahigh-speed, high-density SRAM's, which have been used as cache and control storages in mainframe computers     

An advanced high-performance trench-isolated self-aligned bipolar technology

This paper describes the extension of "double-poly" self-aligned bipolar technology to include a silicon-filled trench with self-aligned cap oxide isolation, a p{^+} polysilicon defined epi-base lateral p-n-p, a p{^+} polysilicon defined self-aligned guard-ring Schottky-barrier diode, and p{^+} polysilicon resistors. Experimental circuits designed with 1.2-µm design rules have shown switching delays of as small as 73 ps for ECL circuits with FI = FO = 1. ISL circuits built with the same process on the same chip as the ECL circuits exhibit a sub-400-ps switching delay. The performance of the technology has also been demonstrated by a 5-kbit ECL SRAM with a 760-µm²Schottky-clamped multi-emitter cell and 1.0-ns access time.     

A 5-ns GaAs 16-kb SRAM

A GaAs 4 K×4-b static-Ram (SRAM) with high speed and high reliability has been developed for practical systems. By adopting a novel basic circuit technique to the peripheral circuits, the RAM operates over a wide temperature range. By using a novel memory cell, the soft-error rate is reduced to less than that of commercial silicon emitter-coupled-logic (ECL) RAMs. Furthermore, by adopting a triple-level interconnection process, the chip area is reduced to 58% of that using a double-level one. The RAM operates at a single supply voltage of 1.8 V. At an ambient temperature of between 25 and 100°C, the RAM is guaranteed a 5.0-ns access time, 2.0-W power dissipation, and ±0.1-V supply voltage tolerance     

8-ns CMOS 64 K×4 and 256 K×1 SRAMs

SRAMs (static random-access memory) with a 64 K×4 and 256 K×1 structure and with 8-ns access time have been developed on a 1.0-μm CMOS process. Circuits are designed with source-coupling techniques to achieve high speed with small signal swings, using only CMOS devices. A metal option permits selection of the 64 K×4 or 256 K×1 configuration. The same core architecture has also been used to generate ×8 and ×9 designs. An output-enable (OE) version achieves 3-ns response time. As system speeds have recently increased toward 100-MHz operation, the need for address transition detection (ATD) has diminished as a means for improving the SRAM speed/power ratio. This trend in SRAM design stems mainly from the fact that AC current becomes the most significant fraction of the total current. Accordingly, the design described here employs a purely static path through the entire SRAM, with no requirement of ATD at any point. The resulting DC current is countered with a combined strategy of array subdivision, small-signal techniques, and active preamplification at key points in the data path     

A 16-Mb CMOS SRAM with a 2.3-μm2 single-bit-linememory cell

A novel architecture that enables fast write/read in poly-PMOS load or high-resistance polyload single-bit-line cells is developed. The architecture for write uses alternate twin word activation (ATWA) with bit-line pulsing. A dummy cell is used to obtain a reference voltage for reading. An excellent balance between a normal cell signal line and a dummy cell signal line is attained using balanced common data-line architecture. A newly developed self-bias-control (SBC) sense amplifier provides excellent stability and fast sensing performance for input voltages close to V_CC at a low power supply of 2.5 V. The single-bit-line architecture is incorporated in a 16-Mb SRAM, which was fabricated using 0.25-μm CMOS technology. The proposed single-bit-line architecture reduces the cell area to 2.3-μm² , which is two-thirds of a conventional two-bit-line cell with the same processes. The 16-Mb SRAM, a test chip for a 64-Mb SRAM, shows a 15-ns address access time and a 20-ns cycle time     

A GaAs 16 K SRAM with a single 1-V supply

A GaAs 4 K/spl times/4-b static random access memory (SRAM) with 11-ns access time and 1-W power dissipation is described. The device is fabricated using 1.0-/spl mu/m WSi/SUB x/ selfaligned gate metal semiconductor FET (MESFET) and double-level interconnection technology. Optimization of fan-out and adoption of an address precoder circuit enable both fast access time and low power dissipation. The SRAM operates with a single 1.0-V supply.     

A 2-ns 16K bipolar ECL RAM with reduced word-line voltage swing

A reduced word-line voltage swing (RWS) circuit configuration that results in a high-speed bipolar ECL (emitter coupled logic) RAM is proposed. The write operation can be performed with the configuration in the condition of reduced word-line voltage swing, which causes write operation error in conventional circuit configurations. The proposed configuration cuts off the hold current of the selected memory cell, and then the low-voltage node is charged up through the load p-n-p transistor. A 16-kb ECL RAM with a p-n-p loaded memory cell was fabricated by advanced silicide-base transistor (ASBT) process technology. A 2-ns access time was obtained with 1.8-W power consumption in which the word-line voltage swing was reduced by 0.7 V from a conventional case. Simulation results show that the access time is improved by 25% compared with a conventional case. Simulation results also show that writing time becomes comparable with the conventional time of 1.7 ns when the load p-n-p transistor has a saturation current of 5.0× 10¹⁷ A and a current gain of 1.0. The saturation current is 5 times larger and the current gain is 5 times smaller than those of the standard lateral p-n-p transistor     

Design techniques for high-throughput BiCMOS self-timed SRAMs

Design techniques for a high-throughput BiCMOS self-timed SRAM are described. A new BiCMOS read circuit using a pipelined read architecture and a BiCMOS complementary clocked driver (BCCD) are proposed to reduce the operating cycle time. A 8192×9-b dual-port self-timed SRAM designed using the proposed techniques achieved a clock cycle time of 3.0 ns, that is, a 333-MHz operating frequency, by SPICE simulation on model parameters for 0.8-μm BiCMOS technology. A high-speed built-in self-test (BIST) circuit was studied and designed for the 3.0-ns cycle SRAM. It is confirmed that the BIST circuit allows the 3.0-ns cycle SRAM to test at its maximum operating frequency