铝阳极氧化基板制备过程对埋置型Ta-N薄膜电阻的影响

在铝阳极氧化多层基板内用RF反应溅射制备了埋置型Ta-N薄膜电阻,研究了铝阳极氧化过程对Ta-N薄膜电阻和显微结构的影响.实验结果表明:Ta-N薄膜受上层多孔氧化铝膜影响在表层形成了由Ta2O5和Ta-O-N组成的氧化物凸起绝缘层,氧化物凸起层厚度与氧化电压有关.底层Ta-N薄膜电阻率和电阻温度系数基本保持不变,表层氧化凸起使电阻稳定性增加.     

铝膜穿透性阳极氧化技术

铝膜穿透性阳极氧化是实现阳极氧化铝薄膜多层布线基板制作的关键技术。研究了电流密度、电解质溶液温度和铝膜厚度对氧化时间的影响。绝缘电阻测定及扫描电子显微镜分析的结果证实了采用穿透性阳极氧化技术制作导带 ,导带间不存在残余铝薄膜。     

基于铜铝氧化物的透红外导电薄膜

研究了一种新型透红外的导电薄膜铜铝氧化物(CuAlxOy),选用高纯度铜、铝靶材,利用磁控溅射台在蓝宝石衬底上生长CuAlxOy薄膜。研究了氧气流量、薄膜厚度、预溅射铜层时间(铜层厚度)等重要条件对薄膜性能的影响。实验发现,通过微调溅射参数、合理控制预溅射铜层过程可以获得低电阻率和高透过率的铜铝氧化物薄膜。得到最好的CuAlxOy薄膜(厚度为1765)在波长2.6μm处红外透过率达到了最大值62.5%,红外波段(波数8000～2000 cm-1)的平均透过率达到53%,方块电阻为358.9/sq,电阻率为6.33×10-3.cm。     

形状记忆合金表面纳米管阵列的制备与表征

采用阳极氧化方法在镍钛形状记忆合金表面成功制备出氧化物纳米管阵列。实验结果表明,阳极氧化电压和温度是影响纳米管生长的重要因素。当阳极氧化电压较低时,温度效应不大,合金表面仅形成数十纳米厚的氧化物薄膜。当阳极氧化电压升至20V,在20℃阳极氧化可形成双氧化物层(表面为不均匀多孔纳米结构,下部为具有两种不同直径的纳米管阵列);增大阳极氧化温度至30℃,表面多孔纳米结构溶解,露出底部的纳米管阵列;当阳极氧化温度增大至50℃时,纳米管开始出现破裂。纳米管为Ni-Ti-O氧化物,纳米管的镍含量与镍钛基体相比有所降低。     

基于铜氧化物的电阻存储器工艺优化

针对铜氧化物电阻存储器,通过优化硅化、氧化以及上电极制备等工艺得到具有良好性能的存储单元。通过选取合适的机台,形成了厚度符合需求的均匀铜氧化层。在氧化之前进行硅化处理,很好地解决了氧化层空洞的问题,提高了存储器可靠性。在铜氧化过程中调节氧气比例,增加氧化后高温退火工艺,提高铜氧化物薄膜中氧空位的比例,从而提高了电阻转换特性。发现钛与氮化钛复合上电极中钛的比例对存储特性影响很大,当钛与氮化钛的比例较小时高低阻态最稳定,电阻转换特性更好。     

一种电容式Al2O3湿度传感器

在单晶Si片上热生长一层SiO2薄膜，采用真空淀积的方法制备一层Al薄膜，然后利用铝阳极氧化的方法获得一层多孔Al2O3薄膜。设计制作了电容式Al2O3湿度传感器，测试结果表明，该器件具有较好的感湿特性和较宽的感湿范围。     

湿法氧化工艺对VCSEL器件性能的影响

在精确控制气体流量、温度等条件下对样品进行了湿法氧化实验.在SEM下观察了高铝氧化层的微观结构.讨论了高铝氧化限制层中氧化产物体积收缩产生的多孔结构对氧化反应的作用,以及收缩应力对有源区的影响.分析了氧化后器件串联电阻变大的原因.综合考虑这些因素,结合器件结构优化氧化层的设计,制备出了阈值电流低的、性能优良的VCSEL器件.     

聚3,4-乙撑二氧噻吩(PEDOT)-氧化石墨烯复合电极在有机发光二极管中的应用

通过将氧化石墨烯(Graphene Oxide,GO)与十二烷基苯磺酸钠(Sodium Dodecyl Benzene Sulfonate,SDBS)作为填料混入聚3,4-乙撑二氧噻吩∶聚苯乙烯磺酸(PEDOT∶PSS)溶液中制备了高透光率和低方块电阻的透明导电薄膜.当氧化石墨烯与PEDOT∶PSS质量比为0.02％时,薄膜获得了最佳的导电率,电阻为85 Ω/口,在550 nm的光波长下透光率为87％.采用不同掺杂比例的薄膜作为电极制备了有机发光二极管(OLED)器件,相比于常用的ITO电极,复合薄膜作为阳极更有利于空穴的注入和传输,所制备的器件能够得到更优的性能.这些结果表明PEDOT∶PSS和氧化石墨烯复合电极有望取代柔性OLED器件中的ITO阳极.     

阳极氧化工艺及成膜机理

铝基板经阳极氧化后形成一层耐磨、耐腐蚀、电绝缘的氧化膜。铝合金成分、微观组织结构、氧化前处理等因素都会对阳极氧化产生影响。本文基于阳极氧化工艺流程,结合工艺参数,探讨了氧化膜的形成和生长过程,进而分析了影响氧化膜性能的深层原因,对生产有一定的参考意义。     

利用金属膜的针尖诱导氧化过程和点击原子力显微镜工作模式实现纳米尺度模板复制

我们讨论用扫描探针显微技术研究超薄无序钛薄膜局域氧化过程,并利用此氧化过程实现薄膜表面钠米尺度网板修饰。实验说明针尖诱导氧化过程可被认为是电化学阳极氧化过程,钛薄膜的电阻,环境相对湿度,施加的电压幅度和氧化持续时间对纳米修饰的速度和分辨率都有影响。使用专门设计的软件,我们实现了基于针尖诱导氧化过程在超薄钛膜上按模板进行的纳米修饰图案。     

传统PAA成孔理论的局限性和新生长模型

综述了多孔阳极氧化铝(PAA)的成孔理论,分析了传统"酸性场致溶解"理论多方面的局限性,其无法解释PAA的六棱柱元胞结构。笔者根据PAA的氧气气泡生长模型,对PAA规则的六棱柱结构进行了合理的解释:电解液中阴离子使氧化膜变成了壁垒层和污染层两层,雪崩电子电流导致了在壁垒层/污染层界面上O2的析出,PAA的圆柱形孔道和六棱柱元胞是Al2O3抱紧氧气气泡生长的结果。     

Formation of Thick Porous Anodic Alumina Films and Nanowire Arrays on Silicon Wafers and Glass

A method for the fabrication of thick films of porous anodic alumina on rigid substrates is described. The anodic alumina film was generated by the anodization of an aluminum film evaporated on the substrate. The morphology of the barrier layer between the porous film and the substrate was different from that of anodic films grown on aluminum substrates. The removal of the barrier layer and the electrochemical growth of nanowires within the ordered pores were accomplished without the need to remove the anodic film from the substrate. We fabricated porous anodic alumina samples over large areas (up to 70 cm²), and deposited in them nanowire arrays of various materials. Long nanowires were obtained with lengths of at least 9 μm and aspect ratios as high as 300. Due to their mechanical robustness and the built‐in contact between the conducting substrate and the nanowires, the structures were useful for electrical transport measurements on the arrays. The method was also demonstrated on patterned and non‐planar substrates, further expanding the range of applications of these porous alumina and nanowire assemblies.     

超薄阳极氧化铝模版的制备

采用二次阳极氧化铝的方法制备出厚度仅为509 nm超薄多孔阳极氧化铝模版,氧化铝模版上孔洞大小均匀.呈完美的六角分布,孔径为35 nm左右,孔间距约为100 nm.成功地将多孔阳极氧化铝模版转移到硅衬底上,并在磷酸溶液中通孔,使薄膜上小孔双向贯通.可以十分方便的利用该模版合成纳米点、纳米柱等纳米结构.     

CdTe钝化的HgCdTe非平衡载流子表面复合速度的实验研究

利用Ａｒ＾＋束央求宙积技术在ＧｇＣｄＴｅ表面实现了低温ＣｄＴｅ介质薄膜的低温生长。在用－ＨｇＣｄＴｅ晶片表面分别用ＣｄＴｅ介质膜、ＨｇＣｄＴｅ自身阳极氧化膜进行表面钝化。利用光电导衰退测量技术测量了两种不同表面钝化的薄ＨｇＣｄＴｅ晶片的非平衡载流子（少数载流子）寿命,并通过光电导衰减信号波形的拟合,得到两种不同表面钝化的ＨｇＣｄＴｅ表面复合速度。实验结果表明,获得的ＣｄＴｅ／ＨｇＣｄＴｅ界面质量已     

入射角对含钴氧化铝膜红外偏振光谱特性研究

为了研究入射角度对含钴阳极氧化铝膜近红外偏振光谱特性的影响,采用阳极氧化的方法制备了阳极氧化铝膜,向其孔中镀入了钴,然后利用UV-3101PC型分光光度计对其进行了透射光谱测试,并在入射角分别为30和45时测试了其偏振光谱。结果表明,这种含钴阳极氧化铝膜在近红外波段具有良好的透射率和消光比,且消光比随着入射角的增大而显著提高。     

In-situ evaluation of the anodic oxide growth on Hg1−xCdxTe (MCT) using ellipsometry and second harmonic generation

In-situ measurements of ellipsometry and second harmonic generation (SHG) were carried out to monitor the electrochemical growth of native anodic oxide films on Hg_1?xCd_xTe (MCT). Growth of the anodic oxide was performed using two different methods viz., by linear sweep voltammetry and by applying a constant current density. The influence of scan rate and the magnitude of the applied current density on the properties of the growing films were examined. From the ellipsometry data, we have shown that the measured refractive index value of 2.19 for the oxide film remains unchanged for moderate and high oxide growth rates. Only at very slow growth rates were significant increases in the refractive index observed (n=2.4), indicating an increase in the compactness of the layer. For film thicknesses in excess of ～1200 Å, a non-zero value for the extinction coefficient was found, indicating the incorporation of HgTe particles within the anodic oxide film. SHG rotational anisotropy measurements, performed on the MCT with and without an anodic oxide film showed only the four-fold symmetry associated with the MCT and so confirmed that the oxide was centrosymmetric. However, an increase in the SH intensity was observed in the presence of the oxide and this has been attributed to multiple reflections in the thin oxide film and also to the increase in the χ⁽²⁾ non-linear susceptibility tensor as a result of charge accumulation at the MCT/anodic oxide interface.     

Nanostructured layers of anodic aluminum oxide on insulating substrates

A method for creation of porous alumina layers on insulating substrates is proposed. The anodic oxidation of thin aluminum films is performed in two stages: formation of a thin dense oxide layer and its local breakdown followed by the final oxidation of the film with a propagation of the oxidation front from a breakdown region to periphery. Aluminum oxide layers exhibit quasi-ordered structure with the pore diameter ranging from 10 to 100 nm and depending on conditions of electrochemical oxidation. The method provides the aluminum film oxidation right to the insulating substrate (i.e., the absence of residual metal phase inclusions on the interface) and can be used for the creation of matrix and composite structures for semiconductor microelectronics.     

自组织多孔阳极氧化铝膜的研究进展

主要介绍了几种不同多孔氧化铝膜的制作,氧化铝膜的光致发光性质及来源,最后介绍了多孔氧化铝膜在钠米材料中的应用,并对阳极氧化铝膜发展前景进行了展望。     

n-HgCdTe光导器件的两种表面钝化研究

利用 Ar 束溅射沉积技术实现了 Cd Te薄膜的低温生长 ,利用电化学方法进行了 Hg Cd Te表面自身阳极氧化膜的生长 ,利用生长的 Cd Te介质膜和 Hg Cd Te表面自身阳极氧化膜对 n- Hg Cd Te光导器件进行了表面钝化 .对两种器件的电阻、各项性能指标进行了测量分析 ,实验表明得到的 Cd Te/ Hg Cd Te界面质量已达到器件实用化水平 .     

Long-range-ordered Ag nanodot arrays grown on GaAs substrate using nanoporous alumina mask

With more and more attention given to the plasmonic nanostructures enhancing light trapping of solar cells, the fabrication of metal nanostructures becomes more and more important. In this work, we fabricated porous anodic alumina on SiO₂/GaAs substrate and obtained periodic Ag nanodots with hemispherical shape by electron beam evaporation. During the experiments, it was found that the properties of barrier layers of porous anodic alumina fabricated on SiO₂/GaAs and SiO₂/Si substrates after pore-widening are different. The through-hole porous anodic alumina film on SiO₂/GaAs substrate cannot be obtained after a long pore-widening process. The additional Ar ion bombardment against the samples was needed in our experiments to get the through-hole porous anodic alumina films on SiO₂/GaAs substrate.