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1.
A study of the effects of changes in composition, film thickness, substrate deposition temperature and annealing on the optical properties of MoO3-In2O3 is presented. The results are found to be compatible with the reduction in the value of optical energy gap of these materials as the molar fraction of In2O3 in the MoO3 thin film increases. This decrease of optical gap may be attributed to the incorporation of In(III) ions in an MoO3 lattice. The decrease in optical band gap with increasing thickness may be interpreted in terms of the incorporation of oxygen vacancies which are also believed to be the source of conduction electrons in the MoO3-In2O3 complex. The decrease of band gap with increasing substrate temperature may be attributed to the enhanced ordering of the samples and the decrease of band gap with annealing may be attributed to a reduction in the concentration of lattice imperfections.  相似文献   

2.
Vacuum deposited MoO3-V2O5 films of different molar concentrations have been used for DC electrical conductivity studies at different temperatures. The optical absorption spectra of MoO3-V2O5 films of different molar concentrations have been measured. From these measurements it is found that optical band gap and activation energy vary with molar concentration of MoO3-V2O5 films.  相似文献   

3.
The infrared absorption spectra of vacuum-evaporated MoO3-In2O3 thin films are reported for a series of films of varying compositions within the spectral range 4000 to 400 cm–1 and interpreted in relation to the spectrum of the pure MoO3 films. The affects of changes in composition, film thickness, substrate deposition temperature and annealing on the absorption bands are observed. In some cases a shift in band frequency is also observed. The gradual increase in ordering and decrease in valency state with increase of annealing temperature is observed in the infrared curves. Some new peaks appear which reveal the presence of a lower valency state in MoO3. The shift in band frequency may be attributed to the incorporation of Mo(VI) ions in the indium interstitial positions.  相似文献   

4.
Bi2Te3-In2Se3 films were prepared by co-sputtering followed by annealing, and their structural and thermoelectric properties were investigated. The immiscible nature of the two alloys results in precipitation of the second phase, thus leading to structures with self-assembled dots that are a few nanometers in scale. HAADF-STEM and HRTEM were used to confirm that In2Se3 nanodots that were a few nanometers in size did indeed form in the Bi2Te3 thin film. It was found that the incorporation of these nanodots can reduce the thermal conductivity of the thin film.  相似文献   

5.
The system Fe2O3-In2O3 was studied using X-ray diffraction,57Fe Mössbauer spectroscopy and infrared spectroscopy. The samples were prepared by chemical coprecipitation and thermal treatment of the hydroxide coprecipitates. For samples heated at 600 °C, a phase, α- (Fe1?x In x )2O3, isostructural with α-Fe2O3, exists for 0?x?0.8, and a phase C-(Fe1?x In x )2O3, isostructural with cubic In2O3, exists for 0.3?x?/1. In the two-phase region these two phases are poorly crystallized. An amorphous phase is also observed for 0.3?x?0.7. For samples heated at 900 °C the two-phase region is wider and exists for 0.1?x?0.8 with the two phases well crystallized. In these samples an amorphous phase is not observed.57Fe Mössbauer spectroscopy of samples prepared at 600 °C indicated a general tendency of the broadening of spectral lines and the decrease of numerical values of the hyperfine magnetic field (HMF) with increasing molar fraction In2O3 in the system Fe2O3-In2O3. The samples prepared at 900 °C, in the two-phase region, are characterized by a constant HMF value of 510 kOe at room temperature. Infrared spectroscopy was also used to follow the changes in the infrared spectra of the system Fe2O3-In2O3 with gradual increase of molar fraction of In2O3. A correlation between X-ray diffraction, Mössbauer spectroscopic and infrared spectroscopic results was obtained.  相似文献   

6.
A discussion of the optical properties of two systems of dielectric films i.e. In2O3 and of mixed oxides In2O3−MoO3 system is presented. Film thickness, substrate temperature, annealing and composition (in molar%) have a profound effect on the structure and optical properties of these films. The decrease in optical band gap with the increase in film thickness of In2O3 is interpreted in terms of incorporation of oxygen vacancies in the In2O3 lattice. The decrease in optical band gap with the increase in substrate temperature and annealing of In2O3 thin films is ascribed to the release of trapped electrons by thermal energy or by the outward diffusion of the oxygen-ion vacancies, which are quite mobile even at low temperature. For the mixed oxides In2O3−MoO3 system the results are found to be compatible with the reduction in the value of optical band gap of these materials as the molar fraction of MoO3 increases in the In2O3 thin films and is attributed to the incorporation of Mo(VI) ions in an In2O3lattice that causes the indium orbital to become a little less tightly bound. The decrease in optical band gap of mixed oxides In2O3−MoO3 system, with increasing film thickness is interpreted in terms of incorporation of oxygen vacancies in both In2O3 and MoO3 lattice which are also believed to be the source of conduction electrons in In2O3–MoO3 complex. The decrease in optical band gap with increasing substrate temperature and annealing of mixed oxides In2O3−MoO3 system is due to the increasing concentration of oxygen vacancies, formation of indium and molybdenum species of lower oxidation state and indium interstitials. The blue colouration of mixed oxides In2O3–MoO3 samples is due to the inter-electron transfer from oxygen 2p to molybdenum 4d level due to which Mo species of lower oxidation states are formed.  相似文献   

7.
An original study has been made of the influence of additions of alkaline-earth metal oxides (CaO, SrO, BaO) at the expense of ZnO on the dielectric properties of certain ZnO-Al2O3-SiO2 glass-ceramics. Tests were carried out at 20° C at frequencies of 105 to 1010 Hz and at temperatures up to 400° C at a frequency of 9.37 × 109 Hz. X-ray diffraction analysis showed that the major crystalline phase in all cases was Zn2SiO4 and this was little changed in proportions or lattice parameters by the additions. Some changes in secondary crystal phases were noted but no positive identification of crystals containing Ca2+, Sr2+ or Ba2+ was made. It is concluded that the alkaline-earth metal ions are essentially contained in the residual glassy phase and that the major contribution to the dielectric losses is by the residual glassy phase. Increase in the BaO content causes a loss peak to move to lower frequencies (in the range > 1010 to 108 Hz) and this is believed to be partly due to the BaO additions rendering the network of the residual glassy phase more open, and partly due to the heavy mass of the Ba2+ ions. A similar effect was not observed for additions of CaO and SrO. Furthermore, it appears that the alkaline-earth metal oxide additions are restricting deformation of the network of the residual glassy phase.  相似文献   

8.
The optical absorption of amorphous thin films of V2O5, SiO and of SiO/V2O5 is studied in the photon energy range 0.42 to 6.53 eV. The optical absorption edge of evaporated V2O5 films can be described by direct forbidden transitions while that of SiO films follows the non-direct transitions in k-space. The data of the SiO/V2O5 oxide mixtures are fitted to new values of the exponent in the well-known absorption equation and the corresponding optical band gaps are determined. Experimental data on the wavelength dependence of the refractive index of SiO films are presented. The dispersion of the refractive index follows a single oscillator model. The infrared spectra show that some bonding occurs between the two oxides so that the mixed dielectric system SiO/V2O5 cannot be considered as a simple physical mixture.  相似文献   

9.
Amorphous indium oxide (In2O3) and 10-wt% SnO2 doped In2O3 (ITO) thin films were prepared by pulsed-laser deposition. These films were crystallized upon heating in vacuum at an effective heating rate of 0.00847 °C/s, while the evolution of the structure was observed by in situ X-ray diffraction measurements. Fast crystallization of the films is observed in the temperature ranges 165–210 °C and 185–230 °C for the In2O3 and ITO films, respectively. The crystallization kinetics is described by a reaction equation, with activation energies of 2.31 ± 0.06 eV and 2.41 eV and order of reactions of 0.75 ± 0.07 and 0.75 for the In2O3 and ITO films, respectively. The structures of the films observed here during heating are compared with those obtained upon film growth at different temperatures. The resistivity of the films depends on the evolution of the structure, the oxygen content and the activation of tin dopants in the films. A low resistivity of 5.5 × 10−4 Ω cm was obtained for the In2O3 and ITO films at room temperature, after annealing to 250 °C the resistivity of the ITO film reduces to 1.2 × 10−4 Ω cm.  相似文献   

10.
Journal of Materials Science: Materials in Electronics - MoO3 thin films were synthesized by thermal evaporation method with thicknesses of 300, 400, and 500 nm on FTO substrate. The...  相似文献   

11.
Fe2O3 thin film was prepared using aqueous solution of FeCl3 by spray pyrolysis. The substrate temperature was 450°C. The lattice parametersa andc for different concentrations were calculated from X-ray diffraction study. Hexagonal structure of the Fe2O3 thin film was confirmed. Band gap values of Fe2O3 prepared from different concentrations were determined from optical transmission data.  相似文献   

12.
We describe the technique ofin situ preparation of thin (d=0, 1-1μm) YBCO films by the RF magnetron sputtering of the ceramic target in the argon-oxygen atmosphere on the heated substrates, and report the preliminary results of investigation of the multilayer structure based on such films.  相似文献   

13.
ThexB2O3 · (20-x) P2O5 · 80SiO2 (in mol%) glass films withx=0, 10 and 20 have been prepared from metal alkoxides by carrying out the coating in a dry atmosphere. These coating films have shown a larger value of load at scratch and a smaller shrinkage during heat-treatment by replacing P2O5 in the films with B2O3. It has been found that B2O3 more effectively reduces the glass transition temperature of SiO2 glass than P2O5. The concentrations of sodium ions, which migrated from soda-lime-silica glass substrates during the film formation, were higher in phosphosilicate and borophosphosilicate films than in borosilicate and pure silica films. This finding should be ascribed to the gettering effects of phosphorus for sodium ions.  相似文献   

14.
塑料基MoO3电致变色薄膜性能   总被引:1,自引:0,他引:1  
采用溶胶-凝胶工艺,在镀有ITO透明电极的聚对苯二甲酸乙二酯(PET)基体上制备了MoO3电致变色薄膜.用FT-IR和TG-DTA分析了薄膜的成分和热稳定性,用分光光度计、电化学工作站研究了其在1 mol/L的LiClO4碳酸丙烯酯(PC)液体电解质中的电致变色性能.结果表明:薄膜主要成分是含有水合过氧化氢的无定形MoO3;着、退色前后可见光透过率变化△T为40%,在550 nm时的致色效率为44.8 cm^2/C,经1000次循环,电色性能变化很小;着色速度和对比度随着色电压的增加而增加,Li^0的扩散和Li+的迁移分别控制着着色速度和退色速度.  相似文献   

15.
Zirconia-based ZrO2-In2O3 nanocrystals are prepared by hydrothermal treatment of coprecipitated zirconium oxyhydroxide and indium hydroxide. Indium oxide is shown to dissolve predominantly in cubic zirconia nanocrystals. Its solubility in nanocrystalline zirconia notably exceeds the equilibrium In2O3 solubility in ZrO2 single crystals.  相似文献   

16.
利用溶胶-凝胶法合成了Er2O3-Yb2O3-SiO2纳米二氧化硅(SiO2)粉。Er3 和Yb3 直接加入有机酸催化的TEOS反应溶液中,凝胶后经过700~900℃,得到Er3 -Yb3 共掺纳米SiO2粉。样品经过红外光谱、XRD、TEM等分析,结果表明,纳米粉的粒径受有机酸比例和处理温度的影响。在室温PL谱上,样品可观察到较强的1530nm荧光,同时镱的引入对掺铒SiO2纳米粉在1.54μm的荧光发射有增强作用。  相似文献   

17.
18.
The kinetics of solid-state reactions of powdered reactants were investigated by X-ray and by differential thermogravimetry in a magnetic field. Measurements revealed mutual diffusion of the Fe3+ and In3+ ions in the Fe2O3-In2O3 system heat treated for 3 h at 700 to 1400° C. Diffusion of indium into the Fe2O3 lattice caused a shift of the Curie temperature of the antiferromagnetic iron oxide towards lower temperatures. Only Caln2O4 was found between CaCO3 and In2O3 up to 1400° C. Also, in the Fe2O3-CaCO3-In2O3in system, the reaction started with the mutual diffusion of iron and indium and the forming of CaFe2O4. End-products were the magnetic -Ca4Fe14O25 and CaFe4O7, and the non-magnetic CaFe5O7, depending on the In3+ concentration. Indium stabilized the magnetic calcium-iron oxide structures, shifting their Curie temperatures towards lower values.  相似文献   

19.
We report on measurements of the in-plane resistivityρ and Hall coefficientR H (B∥c) of various oxygen-deficient epitaxial films of YBa2Cu3O7?x in the normal state. The superconducting transition temperaturesT c of the samples vary from 14 to 90 K. Both the resistivity and the Hall coefficient exhibit a strong dependence on the oxygen content and the temperature. Asx increases,T c decreases continuously, whileρ andR H gradually increase in magnitude. Furthermore, also the characteristic linear dependences ofραT andR Hα T ?1 of the highly doped compounds changes to a nonlinear behavior for the samples withT c lower than 60 K. The unusual doping and temperature dependence ofR H will be compared to the predictions of our calculations, based on a two-dimensional tight-binding model using the relaxation-time approximation. The model considers also the next-nearest-neighbor hopping, which strongly influences the predicted Hall coefficient. Additionally, the cotangent of the Hall angle cot(Θ H ) is discussed in the framework of the two-dimensional Luttinger liquid theory.  相似文献   

20.
Journal of Materials Science: Materials in Electronics - In the present study, the electron beam evaporation technique was employed to deposit gadolinium oxide thin films (Gd2O3-TF) on the silicon...  相似文献   

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