Photocatalytic Decomposition of Formic Acid Under Visible Light Irradiation Over V-ion-implanted TiO2 Thin Film Photocatalysts Prepared on Quartz Substrate by Ionized Cluster Beam (ICB) Deposition Method

Unique visible-light-responsive TiO₂ photocatalysts (λ>450 nm) were successfully developed by implantation of V ions into the TiO₂ thin films prepared on a quartz substrate by an ionized cluster beam (ICB) deposition method. After V ions implantation into TiO₂ thin film, the photocatalytic activity of the thin films for the decomposition of formic acid into CO₂ and H₂O was found to proceed efficiently under visible light irradiation longer than 450 nm. The TiO₂ thin film photocatalysts were characterized by XRD, UV-vis, XPS, FE-SEM and AFM.     

Photocatalytic Water Splitting on Visible Light-responsive TiO2 Thin Films Prepared by a RF Magnetron Sputtering Deposition Method

The development of visible light-responsive TiO₂ (Vis-TiO₂) thin films has been achieved by applying a radio-frequency magnetron sputtering deposition (RF-MS) method. Pt-loaded Vis-TiO₂ thin films act as photocatalysts to decompose water involving sacrificial reagent such as methanol or silver nitrate even under visible light (λ ≧ 420 nm) irradiation. It was also found that Pt-loaded Vis-TiO₂ thin films decompose pure water into H₂ and O₂ stoichiometrically under light irradiation of wavelengths longer than 390 nm. Vis-TiO₂ thin films exhibit columnar structures perpendicular to the substrate and a declined composition of the O/Ti ratio from the surface (O/Ti = 2.00) to bottom (O/Ti = 1.93). This unique structure (anisotropic structure) of Vis-TiO₂ can be considered an important factor in the modification of the electronic properties of Vis-TiO₂ thin films, enabling the absorption of visible light. Furthermore, the effect of the Pt loadings on the photocatalytic activity of the TiO₂ thin films was investigated and the optimum Pt loading was determined to be 21 μ g/cm² as Pt metal     

气体流量对热解法制备TiO2薄膜性能的影响

通过改变镀膜材料气体流量,研究热解法在线制备TiO2薄膜性能的影响.采用SEM、EDS分析了膜层表面微观形貌、断面厚度和碱腐蚀前后膜层的化学组成,采用分光光度计分析了镀膜玻璃的光学性能和颜色指标,并配制5 mol/L的NaOH溶液对薄膜的耐碱性能进行测试.结果表明:随着气体流量增大,TiO2晶体的颗粒度逐渐增大,晶体密...     

溶胶-凝胶法制备固载型光催化剂TiO2膜的试验研究

研究了溶胶-凝胶法制备负载于玻璃上的光催化剂TiO2膜的制备条件：包括溶胶的体系组成、溶胶溶液的pH值及TiO2膜的焙烧温度。用X射线衍射和扫描电镜对制备的TiO2膜的物相和形貌进行了表征。     

碳钢基体镍-磷合金镀层表面沉积TiO2薄膜

采用电沉积法在碳钢镀镍一磷合金镀层表面制备了TiO2薄膜,研究了溶液pH值、沉积时间和电流密度对薄膜增重的影响,分析测定了薄膜的成分及表面形貌。所得最佳工艺条件：pH值为4;时间为40min;电流密度为40-50mA／cm^2。在最佳工艺条件下成功制备了与基体结合良好、致密、均匀的TiO2薄膜。浸泡试验表明TiO2薄膜提高了镍一磷合金镀层在质量分数为10％硫酸和10％氯化钠溶液中的耐蚀性。     

液相沉积法制备TiO2薄膜及杀菌性能

采用液相沉积法（LPD）在玻璃的表面制得透明的TiO2薄膜,以XRD和SEM等方法对薄膜的物相、结构、形貌和光催化性能进行表征。通过热处理后TiO2薄膜对金黄色葡萄球菌（S．Aureus）和大肠杆菌（E．Coli）杀菌试验研究发现,在自然光照射下经热处理的TiO2薄膜具有良好的杀菌活性,400℃热处理的薄膜杀菌性能最优,在24h内可达到99％。同时对TiO2薄膜的杀菌机理进行了初号分析。     

电泳沉积法制备多层膜染料敏化太阳能电池

将纳米TiO2颗粒以电泳沉积法披覆于导电玻璃上,同时整合光电极、反电极、电解质及染料制备出染料敏化太阳能电池.首先将TiO2纳米颗粒与异丙醇所混合的电泳悬浮液通过电泳技术沉积出适当厚度的多层膜结构;精确控制制程中的电流、电压与沉积时间而获得单层厚度为3.3μm的TiO2薄膜.此多层膜通过低温烧结增加其致密性及染料披覆效果.最后将此多层薄膜作为工作电极,封装成染料敏化太阳能电池,经由I-V曲线检测结果显示,所制染料敏化太阳能电池的光电转换效率为5.29%,且这种染料敏化太阳能电池的制造成本十分低廉.     

TiO2薄膜和多孔薄膜的溶胶-凝胶法制备与表征

本文以钛酸丁酯[Ti（OC4H9）4]、去离子水、盐酸和聚乙二醇（PEG）1000为原料,采用溶胶-凝胶法和旋转涂膜工艺,在玻璃基底上制备纳米TiO2薄膜和TiO2多孔薄膜.利用原子力显微镜（AFM）、X射线衍射仪（XRD）和紫外-可见光谱仪（UV-Vis）对薄膜进行分析表征.结果表明,实验制备的TiO2粉体为锐钛矿晶型,纳米TiO2薄膜的平均粗糙度为17.2nm,TiO2多孔薄膜平均粗糙度为1.55 nm.TiO2多孔薄膜有较高的透射性和光催化活性,可直接用于光催化降解有机物等领域.     

溶胶-凝胶法制备亲水性TiO2/SiO2 薄膜的相转变行为研究

采用溶胶-凝胶法在玻璃表面制备了厚度约240nm的亲水性TiO2/SiO2薄膜,用差热分析(DTA)、红外光谱(FT-IR)和X射线衍射分析(XRD)研究了薄膜的热演化过程及晶相转变行为,结果表明:在500℃热处理1h的TiO2膜呈锐钛矿相,TiO2/SiO2复合膜则为非晶态,SiO2的加入使析出锐钛矿晶体所需的温度升高,且提高了TiO2由锐钛矿向金红石结构转变的温度;此外,随薄膜中SiO2含量增多,薄膜的亲水性增强.     

常压化学气相沉积法氮氧化硅薄膜性能的研究

我们用常压化学气相沉积法(APCVD),以SiH4和NH3为先驱体,在较低的温度(＜700℃)下制备氮氧化硅(Si-O-N)薄膜,并对其性能进行了研究.研究结果表明氮氧化硅薄膜能使改性后平板玻璃硬度提高40%,并具有良好的抗高温氧化性,这种薄膜在材料表面改性领域有着广阔的应用前景.     

电子束蒸发制备HfO2薄膜的性能研究

用电子束蒸发方法沉积HfO2薄膜,用X射线衍射和透射光谱测定HfO2薄膜的结构特征和光学性能,并测定薄膜的弱吸收和损伤阈值.结果表明:HfO2薄膜在沉积温度为350℃时,达到了较好的结晶程度.在可见光和近红外光区具有很高的透过率;HfO2薄膜的损伤阈值比较高,达到10.5 J/cm2.     

TaCx Thin Films Prepared by Atomic Layer Deposition as Diffusion Barriers for Cu Metallization

TaC_x films were deposited by atomic layer deposition (ALD) using tris (neopentyl) tantalum dichloride, (Ta[CH₂C(CH₃)₃]₃Cl₂) and H₂ plasma as the precursor and reactant, respectively, at substrate temperatures ranging from 200°C to 400°C. The ALD–TaC_x films with the formation of nanocrystalline structures and a rock‐salt phase were confirmed by X‐ray and electron diffraction. The ALD temperature window was found to be 225°C–300°C with a growth rate of ~0.11 nm per cycle. The resistivity of the ALD–TaC_x films was dependent on the microstructural features, such as the grain size and crystallinity, as well as their composition (C/Ta ratio), and the presence of impurities in the films, which could be controlled by varying the deposition parameters, such as the deposition temperature and reactant pulse conditions. With increasing deposition temperature and reactant pulse time, Ta‐rich films with a low Cl impurity concentration and larger grain size were obtained. The film with a resistivity less than 400 μΩ cm was obtained at 300°C, which was within the ALD temperature window, by optimizing the H₂ plasma pulse time. The step coverage of the film deposited at 300°C was approximately 100% over the trench structure (top opening width of 25 nm) with an aspect ratio of ~4.5. The performance of the ALD–TaC_x films deposited under the optimized conditions was evaluated as a diffusion barrier for the Cu interconnects. The structure of Cu (100 nm)/ALD–TaC_x (5 nm)/ Si was stable without the formation of copper silicide after annealing at 600°C for 30 min.     

前驱体对溶胶—凝胶法制备TiO_2薄膜微结构与形貌的影响

文章采用溶胶—凝胶法分别以四氯化钛和钛酸四丁酯作为前驱体,在热处理温度为400~500℃条件下,制得晶相结构为锐钛矿Ti O2薄膜,但以四氯化钛为前驱体的Ti O2薄膜易开裂;以钛酸四丁酯为前驱体的Ti O2薄膜更加致密均匀,薄膜品质更优;所制得的Ti O2薄膜表现出半导体性质,方块电阻在几十兆欧每平方范围内;Ti O2薄膜随着热处理温度升高,导电性增强。     

High Tunability of Nonepitaxially Grown Ba0.6Sr0.4TiO3 Thin Films Prepared by Plasma‐Assisted Pulsed Laser Deposition

Nonepitaxially grown Ba_0.6Sr_0.4TiO₃ (NE‐BSTO) thin film with tunability of 65.4% and low leakage current was obtained on Ir electrode by oxygen plasma‐assisted pulsed laser deposition (PLD), and epitaxially grown Ba_0.6Sr_0.4TiO₃ (E‐BSTO) thin film with tunability of 32.5% was obtained by PLD without plasma assistance. Results indicate that the NE‐BSTO film possessed higher oxygen content, lower tetragonal distortion, and low stress, all of which contributed to its excellent dielectric properties. This work demonstrates that NE‐BSTO thin films are well suited for room temperature tunable microwave device applications.     

自组装膜引导合成二氧化钛薄膜

采用巯丙基三甲氧基硅烷的分子自组装膜层对基材表面进行修饰,利用低温下氟钛酸铵的配位交换反应,制备出与基底结合紧密的二氧化钛晶态薄膜.磺酸基修饰的基材能够对TiO2膜的沉积产生明显的诱导作用,当(NH4)2TiF6与HBO3的摩尔比为0.05:0.10时,薄膜晶型主要为金红石型;比例增大为0.05:0.15时,薄膜晶型主要为锐钛矿型.沉积的TiO2晶态薄膜具有良好的透光性.     

离子束诱发沉积Pt纳米结构的研究

文章采用聚焦离子束诱发沉积的方法在Si表露制备了周期性的Pt纳米结构,利用扫描电子显微镜研究了离子束流和沉积时间对纳米结构的影响。本研究对于实现纳米结构的可控沉积具有学术参考价值。     

掺杂Mo6+对纳米TiO2薄膜亲水性的影响

用溶胶 凝胶法制备了一系列掺杂钼量不同的TiO2纳米薄膜.用XRD,SEM和CAS(ContactAngleSystem)对TiO2薄膜的结构和性能进行了表征.结果表明,Mo6 掺杂浓度对薄膜的热致亲水性和光致亲水性均有影响,当掺Mo6 质量分数为0.75%,热处理温度为400℃时,掺钼TiO2薄膜在黑暗中放置72h后仍能表现超亲水性.     

Strontium-Doped Lanthanum Manganite Films Prepared by Magnetic Deposition

Deposition of La_0.85Sr_0.15MnO₃ (LSM) films from suspensions using a magnetic field was found to be a cheap and quick technique. Ninety weight percent of the particles present in the suspensions were deposited within the first minute of the deposition, and the thickness of the film varied linearly with the concentration of the suspension. Deposition phenomena were explained by modeling the magnetic flux in the deposition cell. Particles aligned with the flux lines, forming chains of LSM particles that, upon sintering, resulted in the formation of porous films with long chains of LSM grains.