Studies on micro-structural and electrical properties of spray-deposited fluorine-doped tin oxide thin films from low-cost precursor

Thin films of fluorine-doped tin oxide (SnO₂:F) on glass were prepared by spray pyrolysis technique using stannous chloride (SnCl₂) and ammonium fluoride (NH₄F) as precursors. The as-prepared films were characterized for their structural and electrical properties and are discussed in detail in this article. The surface morphology studies revealed that the films are grainy and the roughness of undoped films has been reduced on fluorine doping. X-ray diffraction (XRD) studies revealed that the films are polycrystalline. It further revealed that the undoped films grow along the preferred orientation of (211), whereas all the doped films grow along (200). The minimum sheet resistance 1.75 Ω/□ achieved in the present study for the films doped with 15 wt.% F is the lowest among the reported values for these materials prepared using SnCl₂ precursor. The electrical transport phenomenon has been analyzed in order to find out the possible scattering mechanism that limiting the mobility of charge carriers.     

Characterisation of YBa2Cu3O6+x films grown by the trifluoro-acetate metal organic decomposition route by infrared spectroscopy

Infrared reflectivity measurements have been performed at T = 300 K on c-axis oriented YBa₂Cu₃O_6+x films obtained by deposit of trifluoroacetate precursors on (100)-LaAlO₃ single crystalline substrates. A detailed simulation of the infrared spectra acquired on the thin films based on the use of an appropriate complex dielectric function model is proposed here. It allows us to determine with a single experiment the thickness and the residual porosity of the layers. To reinforce the statement of the infrared simulations, the results have been compared with the film porosity obtained by scanning electron microscopy imaging. Moreover the local grain orientation has been checked by polarized Raman microspectroscopy. Finally, the three complementary experimental ways give consistent results that justify the present approach.     

Correlated structural and electrical properties of thin manganese oxide films

In the present work, different crystalline Mn-oxide thin films (MnO, α-Mn₂O₃, and γ-Mn₂O₃) were prepared on glass and Si(P) substrates by evaporation of MnO₂ powder followed by annealing in air and in vacuum at different temperatures. The oxide films were characterised by methods of energy-dispersion X-ray fluorescence method (EDXRF), X-ray diffraction (XRD), and ultraviolet-visible (UV-VIS) optical spectroscopy. The samples for electrical study were constructed in the form of metal-oxide-Si (MOS) structures and characterised by measurements of their capacitance and ac-conductance as a function of gate-voltage. The frequency dependence of ac-electrical properties of Mn-oxide films and their variation with the annealing temperatures or crystal-structural content were studied. The measured values of the relative permittivity for Mn oxides of different crystal structures were tabulated. It was found that the obtained MnO oxide because of the annealing in vacuum at about 500 °C has the highest relative permittivity, about 10, which suggests it to be a candidate for high-k insulator on Si applications. It was found that the data of the ac-measurements follow the correlated barrier-hopping (CBH) model and the model's parameters were determined.     

Structural and optical properties of polycrystalline CdSexTe1−x (0 ≤ x ≤ 0.4) thin films

CdSe_xTe_1−x (0 ≤ x ≤ 0.4) ternary thin films have been deposited on quartz substrates at room temperature by a single source thermal evaporation. X-ray diffraction patterns and transmission electron microscope micrographs of these films showed that the films were of polycrystalline texture over the whole range studied and exhibit predominant cubic (zinc blende) structure with strong preferential orientation of the crystallites along (1 1 1) direction. Linear variation of the lattice constant with mole fraction x is observed obeying Vegard's law. The dependence of the optical constants, the refractive index n and extinction coefficient k, of the films on the mole fraction x was studied in the spectral range of 400-2500 nm. The normal dispersion of the refractive index of the films could be described using the Wemple-DiDomenco single-oscillator model. CdSe_xTe_1−x thin films of different composition have two direct and indirect transitions corresponding to energy gaps and . The variation in either or with x indicates that this system belongs to the amalgamation type. The variation follows a subquadratic dependence and the bowing parameters were found to be 0.36 and 0.48 eV for the direct, and indirect energy gaps, respectively. Direct linear variation of the ratio N/m^* with x is observed.     

Spectroellipsometric assessment of HfO2 thin films

Present paper looks into the possibilities and limitations of near ultraviolet-visible range spectroscopic ellipsometry in investigating HfO₂ thin films (thickness < 7 nm). The “high k” dielectric films were produced by Atomic Layer Deposition—ALD, sputtering, and Metalo-Organic Chemical Vapour Deposition—MOCVD, on silicon and on silicon/silicon dioxide structures. Using a simple optical model (Cauchy dispersion, with an Urbach absorption tail), suitable for the optical range investigated, we extract the thickness of the layers and their optical constants. Results related to the optical properties show the important impact made by the initial surface and the growth/deposition procedure. It is also shown that for the case of ALD HfO₂ films grown on RTO oxides a significant increase in the absorption coefficient is recorded in the 4.7-5.15 eV range; this can be linked with the formation of defects related to oxygen vacancies. Subsequent anneal cycles performed in oxygen reveal that changes do occur both at the transition layer level, and in the structure of the HfO₂ film, for which an increase in the absorption is recorded.     

Optical properties of amorphous-like indium zinc oxide and indium gallium zinc oxide thin films

The paper presents the optical properties of amorphous-like indium zinc oxide and indium gallium zinc oxide thin films with various In/(In + Zn) ratios obtained by Pulsed Laser Deposition. Thickness results obtained from simulations of X-ray Reflectivity and Spectroscopic Ellipsometry data were very similar. The dependence of density on stoichiometry resembles the corresponding dependence of the refractive index in the transparency range. A free carrier absorption was noted in the visible spectral range, leading to a weak absorbing thin transparent conductive oxide. On the other hand, the refractive index is smaller than those of based oxides (ZnO and In₂O₃), and counterbalance therefore the weak light absorption.     

Growth and characterization of electrosynthesised zinc oxide thin films

Zinc oxide (ZnO) films have been electrodeposited from an aqueous solution containing 0.1 M zinc nitrate as the electrolyte with pH around 5±0.1. The deposition was carried out by galvanostatic reduction with an applied cathodic current density in the range between 5 and 20 mA cm⁻². The influence of bath composition on the preparation of ZnO films is studied. The effects of zinc nitrate concentration and cathodic current density on the deposition rate of ZnO films were also studied. An optimum current density of 10 mA cm⁻² is identified for the growth of ZnO film with improved crystallinity and optical transmittance. The crystalline structure of the deposits studied by X-ray diffraction reveals the possibility of growing hexagonal ZnO films under suitable electrochemical conditions. The surface morphological studies by scanning electron micrographs revealed the presence of nodular appearance for films deposited at 800 °C bath temperatures.     

Refractive indices of textured indium tin oxide and zinc oxide thin films

The refractive indices of textured indium tin oxide (ITO) and zinc oxide (ZnO) thin films were measured and compared. The ITO thin film grown on glass and ZnO buffered glass substrates by sputtering showed distinct differences; the refractive index of ITO on glass was about 0.05 higher than that of ITO on ZnO buffered glass in the whole visible spectrum. The ZnO thin film grown on glass and ITO buffered glass substrates by filtered vacuum arc also showed distinct differences; the refractive index of ZnO on glass was higher than that of ZnO on ITO buffered glass in the red and green region, but lower in the blue region. The largest refractive index difference of ZnO on glass and ITO buffered glass was about 0.1 in the visible spectrum. The refractive index variation was correlated with the crystal quality, surface morphology and conductivity of the thin films.     

Annealing effect on structural and electrical properties of thermally evaporated Cd1−xMnxS nanocrystalline films

Thin films of Cd_1−xMn_xS (0 ≤ x ≤ 0.5) were deposited on glass substrates by thermal evaporation. All the films were deposited at 300 K and annealed at 573 K. The as-deposited and the annealed films were characterized for composition, structure and microstructure by using energy-dispersive analysis for X-rays, X-ray diffraction, scanning electron microscopy and atomic force microscopy. Electrical conductivity was studied in the temperature range 190-450 K. All the films exhibited wurtzite structure of the host material with the grain size varying in the range between 36 and 82 nm. Resistivity of all the films is strongly dependent on Mn content and annealing temperature and lies in the range 13-160 Ω cm.     

Comparative study of gasochromic and electrochromic effect in thermally evaporated tungsten oxide thin films

Substoichiometric tungsten oxide films (WO_3 − y, 0.49 ≥ y ≥ 0.15) were prepared by non-reactive thermal evaporation of WO₃ powder in vacuum. The thin film composition, structure and optical properties were investigated with the purpose to establish their dependence on the deposition conditions and to prove a possible correlation between electrochromic and gasochromic colouration. An analogy in the dependencies of the maximum achievable optical density on the thin film oxygen content for gasochromically and electrochromically coloured films was observed.In-situ performed XPS measurements suggested that the main mechanism of gasochromic colouration is charge transfer between W⁶⁺ and W⁵⁺ states, i.e., similar to the electrochromic effect.     

纳米T-ZnOW的制备及其生长机理研究

以锌粒为原料，分子筛为催化剂，利用真空控氧高温气相氧化法，制备了纳米四针状氧化锌晶须（T—ZnOw）。利用XRD和SEM、TEM对产物进行物相分析和形貌观察。结果表明：产物为纯六方晶系纤锌矿结构氧化锌；体系压力和反应温度是影响晶须形貌的两个重要因素。当温度恒定为1038℃，而压力低于11083Pa时，均可获得根部直径为20—80nm、针长500nm-2μm、形貌规整的纳米T—ZnOw。TEM研究表明，纳米T—ZnOw的针部为单晶，而核心为多重孪晶结构，其生长遵循气固生长机理。     

On the structural and electrical characteristics of zinc oxide thin films

ZnO thin films with thickness d = 100 nm were deposited by radio frequency magnetron sputtering onto glass substrate from different targets. The structural analyses of the films indicate they are polycrystalline and have a wurtzite (hexagonal) structure. Crystallites are preferentially oriented with (002) plane parallel to the substrate surface and the samples have low values for surface roughness, between 1.7 nm and 2.7 nm. The mechanism of electrical conduction in the studied films is strongly influenced by this polycrystalline structure and we used Van der Pauw method to analyze these properties. Electrical studies indicate that the ZnO thin films are n-type. For the cooling process, thermal activation energy of electrical conduction of the samples can vary from 1.22 eV to 1.07 eV (for the ZnO layer obtained from for metallic Zn target) and from 0.90 eV to 0.63 eV (for the ZnO layer obtained from ZnO target), respectively. The influence of deposition arrangement and oxidation conditions on the structural and electrical properties of the ZnO films was investigated in detail.     

Optical constants and band edge of amorphous zinc oxide thin films

The optical characteristics of amorphous zinc oxide (a-ZnO) thin films grown by radio frequency reactive magnetron sputtering on various substrates at temperature < 325 K have been investigated in the spectral range 340-1600 nm. The amorphous nature of the a-ZnO films was verified by X-ray diffraction and the optical constants were obtained by analysis of the measured ellipsometric spectra using the Cauchy-Urbach model. Refractive indices and extinction coefficients of the films were determined to be in the range 1.67-1.93 and 3.9 × 10^− 8-0.32, respectively. The band edge of the films on Si (100) and quartz has been determined by spectroscopic ellipsometry (3.39 ± 0.05 eV) and spectrophotometric (3.35 ± 0.05 eV) methods, respectively. From the angle dependence of the p-polarized reflectivity we deduce a Brewster angle of 60.5°. Measurement of the polarized optical properties shows a high transmissivity (81%-99%) and low absorptivity (< 5%) in the visible and near infrared regions at different angles of incidence. Also, we found that there was a higher absorptivity for wavelength < 370 nm. This wavelength, ∼ 370 nm, therefore indicated that the band edge for a-ZnO thin films is about 3.35 eV.     

The effect of parallel electric fields on the orientation of polycrystalline zinc oxide thin films produced by reactive evaporation and oxidation of zinc

The effect of an electric field (detached electrodes) on the crystal orientation of zinc oxide thin film was investigated. Two methods, direct and indirect, were utilized to produce zinc oxide thin films. In the direct method (reactive evaporation) oxygen was introduced into the zinc vapour stream and ZnO films were deposited on cold substrates in a vacuum system. Parallel electric fields were applied during the reaction process. It was observed that the electric field had no effect on the preferred c-axis orientation of the ZnO crystals. There was no significant difference in the crystal size or surface texture of ZnO samples subjected to electric fields with respect to the sample that experienced no electric field. In the indirect method (oxidation) electric fields were applied during the evaporation of zinc then the samples were oxidized in air in a furnace at 600 C. Here the application of electric field improved the c-axis orientations. The crystal size remained unchanged, but the surface morphology was affected by the application of the electric field. Whenever the c-axis orientation improved, crystals on the surface became rounded and a more ordered microstructure was observed.     

RF diode reactive sputtering of n- and p-type zinc oxide thin films

We present the relationship between parameters of reactive RF diode sputtering from a zinc oxide (ZnO) target and the crystalline, electrical and optical properties of n-/p-type ZnO thin films. The properties of the ZnO thin films depended on RF power, substrate temperature and, particularly, on working gas mixtures of Ar/O₂ and of Ar/N₂. Sputtering in Ar+O₂ working gas (up to 75% of O₂) improved the structure of an n-type ZnO thin film, from fibrous ZnO grains to columnar crystallites, both preferentially oriented along the c-axis normally to the substrate (〈0 0 2〉 direction). These films had good piezoelectric properties but also high resistivity (ρ≈10³ Ω cm). ZnO:N p-type films exhibited nanograin structure with preferential 〈0 0 2〉 orientation at 25% N₂ and 〈1 0 0〉 orientation for higher N₂ content. The presence of nitrogen N_O at O-sites forming N_O-O acceptor complexes in ZnO was proven by SIMS and Raman spectroscopy. A minimum value of resistivity of 790 Ω cm, a p-type carrier concentration of 3.6×10¹⁴ cm⁻³ and a Hall mobility of 22 cm² V⁻¹ s⁻¹ were obtained at 75% N₂.     

Optical properties of zinc oxide thin films doped with aluminum and lithium

Aluminum doped Zinc Oxide (AZO) and Lithium doped Zinc Oxide (LZO) thin films are obtained by Pulsed Laser Deposition (PLD) method. These films are characterized by using Spectroscopic Ellipsometry (SE), X-ray Diffraction (XRD) and Photoluminescence (PL). By modeling the ellipsometry spectra we get the dielectric functions, the optical band gap E_g, and the electrical properties. Our results show the influence of the processing parameters on the optical and structural properties of doped ZnO thin films. The post-annealing treatment applied to AZO thin films, changes strongly the optical properties, by lowering the resistivity and red-shifting the band gap.     

Growth and characterization of transparent conducting nanostructured zinc indium oxide thin films

Transparent conductive oxide (TCO) films have been widely used in various applications, such as for transparent electrodes in flat-panel displays, and in solar cells, optoelectronic devices, touch panels and IR reflectors. Among these, tin doped zinc oxide (ZTO) and indium doped zinc oxide (ZIO) have attracted considerable attention. Particularly, IZO thin film is the best candidate for high-quality transparent conducting electrodes in OLEDs and flexible displays. In this work zinc indium oxide (ZIO) thin films were deposited on glass substrate with varying concentration (ZnO:In₂O₃ — 100:0, 90:10, 70:30 and 50:50 wt.%) at room temperature by flash evaporation technique. These deposited ZIO films were annealed in vacuum to study the thermal stability and to see the effects on the physical properties. The XRF spectra revealed the presence of zinc and indium with varying concentration in ZIO thin films, while the surface composition and oxidation state were analyzed by X-ray photoelectron spectroscopy. The core level spectra were deconvoluted to see the effect of chemical changes, while the valance band spectra manifest the electronic transitions. The surface morphology studies of the films using atomic force microscopy (AFM) revealed the formation of nanostructured ZIO thin films. The optical band gap was also found to be decreased for both types of films with increasing concentration of In₂O₃.     

Comparative study of zinc oxide and aluminum doped zinc oxide transparent thin films grown by direct current magnetron sputtering

Pure and aluminum (Al) doped zinc oxide (ZnO and ZAO) thin films have been grown using direct current (dc) magnetron sputtering from pure metallic Zn and ceramic ZnO targets, as well as from Al-doped metallic ZnAl2at.% and ceramic ZnAl2at.%O targets at room temperature (RT). The effects of target composition on the film's surface topology, crystallinity, and optical transmission have been investigated for various oxygen partial pressures in the sputtering atmosphere. It has been shown that Al-doped ZnO films sputtered from either metallic or ceramic targets exhibit different surface morphology than the undoped ZnO films, while their preferential crystalline growth orientation revealed by X-ray diffraction remains always the (002). More significantly, Al-doping leads to a larger increase of the optical transmission and energy gap (E_g) of the metallic than of the ceramic target prepared films.     

The properties of aluminum-doped zinc oxide thin films prepared by rf-magnetron sputtering from nanopowder targets

Aluminum-doped zinc oxide (ZnO:Al) films were deposited onto glass substrates by rf-magnetron sputtering at ambient temperature using, for the first time, doped nanocrystalline powder synthesized by the sol–gel method. The effects of aluminum on structural, electrical, morphological and optical properties were investigated. The films showed a hexagonal wurtzite structure and high preferential orientation in the (002) crystallographic direction. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were used to study the films morphology. The obtained samples have a typical columnar structure and a very smooth surface. The optical transmittance spectra showed transmittance higher than 90% within the visible wavelength region. A minimum resistivity of 5.436 · 10^− 5 Ω cm at room temperature was obtained for the 3.0 at.% Al-doped film.     

Growth of cubic and hexagonal CdTe thin films by pulsed laser deposition

The paper reports the growth of cadmium telluride (CdTe) thin films by pulsed laser deposition (PLD) using excimer laser (KrF, λ=248 nm, 10 Hz) on corning 7059 glass and SnO₂-coated glass (SnO₂/glass) substrates at different substrate temperatures (T_s) and at different laser energy pulses. Single crystal target CdTe was used for deposition of thin films. With 30 min deposition time, 1.8- to ∼3-μm-thick films were obtained up to 200 °C substrate temperature. However, the film re-evaporates from the substrate surface at temperatures >275 °C. Atomic force microscopy (AFM) shows an average grain size ∼0.3 μm. X-ray diffraction analysis confirms the formation of CdTe cubic phase at all pulse energies except at 200 mJ. At 200 mJ laser energy, the films show hexagonal phase. Optical properties of CdTe were also investigated and the band gap of CdTe films were found as 1.54 eV for hexagonal phase and ∼1.6 eV for cubic phase.