Effects of HCl and Cl2 additions on silicon oxidation kinetics

The growth kinetics of SiO₂ films (100-18000Å) on [100], 2Ωcm silicon have been investigated between 900-1100?C with additions of 0-9 vol.% HC1 or 0-2 vol.% Cl₂ to the dry oxygen ambient. The thickness-time data could best be fitted numerically to a mixed linear-parabolic equation that included a correction for fast initial growth. Equivalent amounts of chlorine (e.g., 2 vol.% HC1 or 1 vol.% Cl₂) produced completely different effects on the rate of SiO₂ growth. The quantitative effects of halogen additions were studied in greatest detail at 900?C. At that temperature, the parabolic rate constant increased linearly with the HC1 concentration. At the same time, the linear rate constant remained constant. Both rate constants did change when Cl₂ was used as an additive. The effect of HC1 additions on the parabolic rate constant reaches a maximum around 1000?C. Possible mechanisms for the halogen effects are discussed,← and it is seen that the gas phase reaction 4 HC1 + 0₂ → 2 H₂O + 2 Cl₂ is not reflected in the growth kinetics.     

Secondary ion mass spectrometry characterization of D2O and H2 18O steam oxidation of silicon

Silicon wafers were steam oxidized at temperatures of 550–1000°C and pressures of 0.05–8 atm with H₂ ¹⁶O, H₂ ¹⁸O, and D₂ ¹⁶O. Deuterium (D) and¹⁸O profiles in 100–200 nm thick oxide films were measured with Cs⁺ beam secondary ion mass spectroscopy (SIMS). The use of D and¹⁸O isotopes enabled analysis of these elements without interference from the sputtering ambient. Peaks in the D profiles near the interface are due predominantly to abrupt changes in the ion yield and charging conditions as the interface is approached. Although the D concentration is nearly constant at ∼ 1 × 10²⁰ cm⁻³ for 700–1000°C oxidations, it rises to a non-equilibrium value of 6 × 10²⁰ cm⁻³ at 600°C. Analysis of steam indiffusions below 800°C indicates that the OD concentration is proportional to the (steam pressure)^1/2, in agreement with earlier results on as-oxidized wet thermal oxides. The results of sequential isotope oxidations indicate that there is rapid exchange ofboth the hydrogen and oxygen species during transport of “water” to the SiO₂. Si interface. We examine these results in terms of the concentrations of the interacting species in the oxide films, and our results are compared to similar reported studies.     

烧结助剂LBZ对CaO-La_2O_3-TiO_2微波介质陶瓷掺杂改性研究

采用La2O3-B2O3-ZnO(LBZ)玻璃掺杂钙钛矿系CaO-La2O3-TiO2(CLT)微波介电陶瓷。运用XRD、SEM和微波介电性能测试等手段,研究了LBZ掺杂对样品烧结性能及微波介电性能的影响。结果表明,在CLT陶瓷中添加LBZ,有效促进CLT陶瓷烧结,使得CLT的烧结温度由1 350℃降低到950℃以下,同时保持较好的介电性能。当LBZ的质量分数为3%时,样品在950℃保温4h后烧结致密,并获得最佳微波性能,即介电常数εr=103.12,品质因数与频率的乘积Q×f=8 826GHz(f=3.03GHz),频率温度系数τf=87.52×10-6/℃。     

Frequency and voltage dependence of admittance characteristics of Al/Al2O3/PVA:n-ZnSe Schottky barrier diodes

This paper reports the frequency dependence of admittance measurements i.e C–V and G/ω–V characteristics of Al/Al₂O₃/PVA:n-ZnSe MIS diode. The interface states (N_ss) and series resistance (R_s) of the MIS diode strongly influence the C–V–f and G/ω–V–f characteristics. The conductance method is used to calculate the series resistance (R_s), the density of states (N_ss), insulator layer capacitance and thickness. The frequency dependent dieclectric parameters such as dielectric constant (εʹ), dielectric loss (ε″), loss tangent (tan δ) and a.c. electrical conductivity (σ_ac) has been calculated and which are also responsible for observed frequency dispersion in C–V and G/ω curves.     

用紫外光和双氧水降低工业废水色度的研究

本文研究185nmUV加H₂O₂去除工业废水中的色度.实验结果表明:185nmUV能使水发生均裂反应,产生·OH、·H和e_aq(水合电子)等活性中间体,对废水的色度有一定的去除作用;对185nmUV加H₂O₂对废水的色度有很好的去除效果,而且H₂O₂在紫外线的作用下也可以生成·OH,与单独使用185nmUV相比,降解速率可以提高10~20倍.因此脱色效果好,脱色速度快,适合多种色料,处理后结果色度均能达到国家一级以上的排放标准.本文研究的185nmUV+H₂O₂方法,工艺简单、操作方便、脱色快捷效果好,可广泛应用于各种场合的各种色度的脱除.     

H_2O,Ne分子填充对纳米碳管振荡器性能的影响

采用分子动力学方法,分别对管芯没有填充和填充了H2O或Ne分子的纳米碳管振荡器的振荡进行了模拟。根据计算结果,讨论了H2O或Ne分子填充对碳管振荡器振幅衰减、振荡频率等振荡性能的影响。研究表明,H2O或Ne分子的填充加速了振荡器振幅的衰减,其中,Ne填充振荡器的衰减最为严重,无填充碳管振荡器的振荡性能最好,Ne填充碳管振荡器的性能最差。     

H2稀释比对RF-PECVD制备a-Si:H/nc-Si:H薄膜的光电特性的影响

研究了H2稀释比对a-Si：H/nc-Si：H薄膜光电特性及微结构的影响。采用RF-PECVD法,以高纯SiH4及H2/SiH4混合气体为反应气源交替反应制备样品,并通过紫外-可见光分光光度计、椭偏仪及Keithley 4200、XRD对样品进行分析测试。实验表明：在纳米级厚度的a-Si：H薄膜基础上,随着第二反应气H2/SiH4混合气中H2比率(99%、97%、95%、92%、80%)的升高,沉积速率持续下降,薄膜消光系数、禁带宽度以及电导率呈现先增大后减小的趋势。针对实验现象,结合薄膜生长机理对实验结果原因进行了分析。     

BaCu(B_2O_5)掺杂2.5ZnO-2.5Nb_2O_5-5TiO_2陶瓷的低温烧结及其与Ag的相容性(英文)

研究了不同BaCu(B2O5)(BCB)掺杂量对2.5ZnO-2.5Nb2O5-5TiO2(ZNT)陶瓷烧结行为、介电性能及与Ag相容性的影响规律。添加BCB可有效地将ZNT陶瓷的烧结温度从1 100℃降低至900℃。BCB添加量为3.0wt%,900℃烧结3h所制得的ZNT陶瓷的微波性能良好:εr=48,Qf=15 258GHz,τf=41×10-6/℃。且在BCB掺杂ZNT陶瓷与Ag共烧样品中未检测到新生相和Ag的扩散,表明3.0wt%BCB掺杂的ZNT陶瓷与Ag的相容性良好,是一种很有潜力的LTCC材料。     

Synthesis of MoSe2/CoSe2 Nanosheets for NIR-Enhanced Chemodynamic Therapy via Synergistic In-Situ H2O2 Production and Activation

Currently, the limited intratumoral H₂O₂ level restricts the development of chemodynamic therapy (CDT). Herein, MoSe₂/CoSe₂@PEG nanosheets are prepared to reveal NIR-photocatalytic H₂O₂ generation to insure the intracellular H₂O₂ supplement. The formation mechanism is investigated, showing the dissolved O₂ and photo-excited electrons to determine H₂O₂ production via sequential single-electron transfer process. The experimental data and density functional theory calculation further display their typical-II heterostructure, which possesses the effective charge separation and nearly four times H₂O₂ generation than MoSe₂@PEG. In addition, the nanocomposites also reveal the peroxidase/catalase activity, making the in-situ H₂O₂ activation and ·OH generation. And, the O₂ production derived from catalase-mimic activity not only relieves hypoxia but also offers the source for H₂O₂ production. Because of the decreased resistance for charge transfer, MoSe₂/CoSe₂@PEGs also reveal more than three times enzyme-activity for MoSe₂@PEG. With the narrow band gap and high NIR-harvest, MoSe₂/CoSe₂@PEG exhibits the great photothermal converting ability (62.5%). MoSe₂/CoSe₂@PEG reveals the novel biodegradation, and most of them can be eliminated via urine and feces within 2 weeks. Here, the computed tomography/magnetic resonance imaging/photothermal imaging and the synergistic photothermal therapy/CDT treatments further make sure potential application on anticancer.     

新型无铅压电陶瓷NBT-NBSN的研究

采用传统陶瓷制备方法,制备出一种钙钛矿结构无铅新压电陶瓷材料(1-x)(Na1/2Bi1/2)TiO3-x(Na1/2Bi1/2)(Sb1/2Nb1/2)O3(x=0~1.4%,摩尔分数)。研究了(Na1/2Bi1/2)TiO3(NBT)陶瓷B位复合离子(Sb1/2Nb1/2)4 取代对介电和压电性能的影响。X-射线衍射分析表明,所研究的组成均能形成纯钙钛矿(ABO3)型固溶体。陶瓷材料的介电常数-温度曲线显示陶瓷在升温过程中存在两个介电常数温度峰,不同频率下陶瓷材料的介电常数-温度曲线显示该体系材料具有明显的弛豫铁电体特征。检测了不同组成陶瓷的压电性能,发现材料的压电常数d33、厚度机电耦合系数kt和介电常数rε随着x值的增加先增加后降低,在x=0.8%时,陶瓷的d33=97 pC/N,kt=0.50,为所研究组成中的最大值,介电损耗tanδ则随x值的增加而增加。     

Fe/Al_2O_3/石蜡复合材料的制备及微波吸收性能研究

为了改善Fe粉的微波吸收性能,采用sol-gel法与H_2还原法制备了w(Al_2O_3)为0.5%~5.0%的Fe/Al_2O_3复合粉。利用SEM和激光粒度分析仪分析了所制粉末的形貌与粒度分布;并将所制复合粉末与石蜡按质量比80:20制成Fe/Al_2O_3/石蜡复合材料,研究w(Al_2O_3)对复合材料微波吸收性能的影响。结果表明:Fe/Al_2O_3复合粉的外形呈片状与针状,其粒度分布很宽。当w(Al_2O_3)由0增加到5.0%时,复合材料的复介电常数实部ε′从11增加至21;复磁导率虚部μ″呈多模共振的曲线形式;w(Al_2O_3)为2.0%,厚为2mm的Fe/Al_2O_3/石蜡复合材料的–5dB反射损失R频宽为4.6GHz。     

Pb(Sc1/2Ta1/2)O3铁电薄膜的制备及性能研究

用Pb(CH3COO)2·3H2O、Sc(CH3COO)3·xH2O和C10H25O 5Ta为原材料,乙二醇甲醚为溶剂,用改进的溶胶-凝胶(Sol-Gel)法在Pt/Ti/SO2/Si基片上成功地制备出ABO3钙钛矿型结构Pb(Sc1/2Ta1/2)O3(PST)铁电薄膜.该薄膜是研制铁电微型致冷器和非致冷热释电红外焦平面阵列的优选材料.对制备出的PST薄膜进行了介电、铁电和热释电性能测试.测试得到在1 kHz下PST薄膜的介电常数为570,介电损耗为0.02.铁电性能良好,剩余板化强度为3.8～6.0 μC·cm-2,矫顽场为40～45 kV·cm-1.热释电系数为4.0×10-4～20×10-4Cm-2K-1.     

添加BaCu(B2O5)和ZnO的CaO-Li2O-Sm2O3-TiO2陶瓷低温烧结研究

采用固相反应法制备了添加复合助烧剂BaCu(B<,2>O<,5>)-ZnO的16CaO-9Li<,2>O-12Sm<,2>O<,3>-63TiO<,2>(CLST)陶瓷研究了所制CLST陶瓷的烧结特性、微观结构及介电性能.结果表明:低熔点的BaCu(B<,2>O<,5>)-ZnO复合助烧剂的加入,使CLST陶瓷的烧结温...     

CaB2O4/CBS复相陶瓷的制备及性能

研究了偏硼酸钙(CaB2O4)与钙硼硅(CBS)玻璃按不同比例制备的CaB2O4/CBS复相陶瓷的相组成、显微结构、介电性能和热膨胀系数等。在200～500℃时,复相陶瓷的热膨胀系数为10×10–6 K–1。当添加w(CBS)为20%,CaB2O4/CBS复相陶瓷经过930℃保温2 h后,试样主要由CaB2O4晶相和少量的β-CaSiO3晶相所构成。微观结构致密,气孔率低,晶粒尺寸为5μm左右。在10 MHz下,εr为7.18,tanδ为1.2×10–4。     

原位XPS分析Al2O3作为势垒层的Er2O3/Si结构

在超高真空条件下,通过脉冲激光沉积(PLD)技术制作了Er2O3/Al2O3/Si多层薄膜结构,原位条件下利用X射线光电子能谱(XPS)研究了Al2O3作为势垒层的Er2O3与Si界面的电子结构.XPS结果表明,Al2O3中Al的2p芯能级峰在低、高温退火前后没有变化;Er的4d芯能级峰来自于硅酸铒中的铒,并非全是本征氧化铒薄膜中的铒;衬底硅的芯能级峰在沉积Al2O 3时没有变化,说明Al2O3薄膜从沉积到退火不参与任何反应,与Si界面很稳定;在沉积Er2O3薄膜和退火过程中,有硅化物生成,表明Er2O3与Si的界面不太稳定,但随着Al2O3薄膜厚度的增加,其硅化物中硅的峰强减弱,含量减少,说明势垒层很好地起到了阻挡扩散的作用.     

碱性抛光液中H_2O_2对铜布线CMP的影响

化学机械平坦化(CMP)过程中,抛光液的化学作用对平坦化效果起着不可替代的作用。介绍了碱性抛光液中氧化剂(H2O2)对铜布线CMP的作用:H2O2对铜的强氧化性可以将铜氧化为离子状态,然后在螯合剂的螯合作用下快速去除铜膜;H2O2对铜的钝化作用可以保护凹处铜膜不被快速去除,从而有效降低高低差。此外,还研究了碱性抛光液中不同H2O2浓度对铜的静态腐蚀速率、动态去除速率及铜布线平坦化结果的影响。研究表明:抛光液对铜的静态腐蚀速率随H2O2浓度的增大逐渐降低然后趋于饱和;铜的动态去除速率随H2O2浓度的增大而逐渐降低;抛光液的平坦化能力随H2O2浓度的增大逐渐增强再趋于稳定。     

Effect of post-growth annealing on the structural,optical and electrical properties of V2O5 nanorods and its fabrication,characterization of V2O5/p-Si junction diode

We report the synthesis of V₂O₅ nanorods by utilizing simple wet chemical strategy with ammonia meta vanadate (NH₄VO₃) and polyethylene glycol (PEG) exploited as precursor and surfactant agent, respectively. The effect of post-annealing on structural, optical and electrical properties of V₂O₅ nanorods was characterized by XRD, HRSEM-EDX, TEM, FT-IR, UV (DRS), PL, TG–DTA and DC conductivity studies. The X-ray diffraction analysis revealed that the prepared sample annealed at 150 °C for 5 h which exhibited anorthic phase of V₅O₉ and annealed at 300–600 °C showed the anorthic phase change to orthorhombic phase of V₂O₅ due to the post-annealing effect. The surface morphology results indicated that increasing temperature caused a change from microrods to a nanorods shape in the morphology of V₂O₅. FT-IR spectrum confirmed that the presence of V₂O₅ functional groups and the formation of V–O bond. The optical band gap was found in the range 2.5–2.48 eV and observed to decreases with various annealed temperature. The DC electrical conductivity was studied as a function of temperature which indicated the semiconducting nature. Further, the potential of V₂O₅ nanostructures were grown on the p-Si substrate using the nebulizer spray technique. The junction properties of the V₂O₅/p-Si diode were evaluated by measuring current (I)–voltage (V) and AC characteristics.     

Synthesis of Leaf‐Vein‐Like g‐C3N4 with Tunable Band Structures and Charge Transfer Properties for Selective Photocatalytic H2O2 Evolution

Photocatalytic H₂O₂ evolution through two‐electron oxygen reduction has attracted wide attention as an environmentally friendly strategy compared with the traditional anthraquinone or electrocatalytic method. Herein, a biomimetic leaf‐vein‐like g‐C₃N₄ as an efficient photocatalyst for H₂O₂ evolution is reported, which owns tenable band structure, optimized charge transfer, and selective two‐electron O₂ reduction. The mechanism for the regulation of band structure and charge transfer is well studied by combining experiments and theoretical calculations. The H₂O₂ yield of CN4 (287 µmol h^?1) is about 3.3 times higher than that of pristine CN (87 µmol h^?1), and the apparent quantum yield for H₂O₂ evolution over CN4 reaches 27.8% at 420 nm, which is much higher than that for many other current photocatalysts. This work not only provides a novel strategy for the design of photocatalyst with excellent H₂O₂ evolution efficiency, but also promotes deep understanding for the role of defect and doping sites on photocatalytic activity.     

B2O3对BMT微波陶瓷结构及介电性能的影响

研究了w(B2O3)=0.5%～3.0%(质量分数)对Ba(Mg1/3Ta2/3)O3(BMT)微波介质陶瓷结构和微波特性的影响。实验结果表明,B2O3掺杂可促进烧结,当w(B2O3)=1%时,BMT陶瓷致密化烧结温度降至1 200℃左右,其表观密度ρ=7.306g/cm3,相对密度达到95.7%,同时,陶瓷体系获得了良好的介电常数εr=22.08,品质因数Q.f=88 000GHz(10GHz),频率温度系数τf=3.3×10-6/℃。     

Na和Ti掺杂对Bi_2(Zn_(1/3)Nb_(2/3))_2O_7陶瓷性能的影响

采用传统固相反应法制备了Na-Ti掺杂Bi2(Zn1/3Nb2/3)2O7陶瓷。研究了Na+替代Bi3+,Ti4+替代Nb5+对Bi2(Zn1/3Nb2/3)2O7陶瓷烧结特性、显微结构和介电性能的影响。结果表明,掺入Na+和Ti4+后,Bi2(Zn1/3Nb2/3)2O7陶瓷的烧结温度从1000℃降到了860℃左右;在–30℃～+130℃的温度范围内,Na-Ti掺杂Bi2(Zn1/3Nb2/3)2O7陶瓷表现出明显的、激活能约为0.3eV的介电弛豫现象。这主要是由缺陷偶极子和晶格畸变在陶瓷中的出现引起的。