Defects creation in sapphire by swift heavy ions: A fluence depending process

Single crystals of sapphire (α-Al₂O₃) were irradiated at GANIL with 0.7 MeV/amu xenon ions corresponding to an electronic stopping power of 21 keV/nm. Several fluences were applied between 5 × 10¹¹ and 2 × 10¹⁴ ions/cm². Irradiated samples were characterized using optical absorption spectroscopy. This technique exhibited the characteristic bands associated with F and F⁺ centers defects. The F centers density was found to increase with the fluence following two different kinetics: a rapid increase for fluences less than 10¹³ ions/cm² and then, a slow increase for higher fluences. For fluences less than 10¹³ ions/cm², results are in good agreement with those obtained by Canut et al. [B. Canut, A. Benyagoub, G. Marest, A. Meftah, N. Moncoffre, S.M.M. Ramos, F. Studer, P. Thévenard, M. Toulemonde, Phys. Rev. B 51 (1995) 12194]. In the fluences range: 10¹³-10¹⁴ ions/cm², the F centers defects creation process is found to be different from the one evidenced for fluences less than 10¹³ ions/cm².     

Photoluminescence study of swift heavy ion (SHI) induced defect centers in sapphire

Single crystals of sapphire (Al₂O₃: Fe, Ti, Cr) were irradiated at room temperature with different fluence of 100 MeV Ni ions. Photoluminescence (PL) spectra of pristine and irradiated sapphires were recorded at room temperature under 2.8 eV blue excitation. A broad emission band consists of two bands centered at 516 nm corresponding to F₂ defect center and 546 nm corresponding to defect center was observed. The intensity of these defect centers was found to vary with the fluence. defect center develops at low fluence reaching maximum at 5 × 10¹⁶ ions/m² and finally decreasing at higher fluence. The behavior is interpreted in terms of creation of defect centers, their clustering and annihilation.     

Optical absorption and thermoluminescence studies in 100 MeV swift heavy ion irradiated CaF2 crystals

Pure and Ytterbium (Yb) doped Calcium fluoride (CaF₂) single crystals were irradiated with 100 MeV Ni⁷⁺ ions for fluences in the range 5 × 10¹¹-2.5 × 10¹³ ions cm⁻². The irradiated crystals were characterized by Optical absorption (OA) and Thermoluminescence (TL) techniques. The OA spectra of ion irradiated pure CaF₂ crystals showed a broad absorption with peak at ∼556 nm and a weak one at ∼220 nm, whereas the Yb doped crystals showed two strong absorption bands at ∼300 and 550 nm. From the study of OA spectra, the defect centers responsible for the absorption were identified. TL measurements of Ni⁷⁺ ion irradiated pure CaF₂ samples indicated a strong TL glow with peak at ∼510 K. However, the Yb doped crystals showed two TL glows at ∼406 and 496 K. The OA and TL intensity were found to increase with increase of ion fluence upto 1 × 10¹³ ions cm⁻² and thereafter it decreased with further increase of fluence. The results obtained are discussed in detail.     

Color center formation in silica glass induced by high energy Fe and Xe ions

Silica glass samples were implanted with 1.157 GeV ⁵⁶Fe and 1.755 GeV ¹³⁶Xe ions to fluences range from 1 × 10¹¹ to 3.8 × 10¹² ions/cm². Virgin and irradiated samples were investigated by ultraviolet (UV) absorption from 3 to 6.4 eV and photoluminescence (PL) spectroscopy. The UV absorption investigation reveals the presence of various color centers (E′ center, non-bridging oxygen hole center (NBOHC) and ODC(II)) appearing in the irradiated samples. It is found that the concentration of all color centers increase with the increase of fluence and tend to saturation at high fluence. Furthermore the concentration of E′ center and that of NBOHC is approximately equal and both scale better with the energy deposition through processes of electronic stopping, indicating that E′ center and NBOHC are mainly produced simultaneously from the scission of strained Si-O-Si bond by electronic excitation effects in heavy ion irradiated silica glass. The PL measurement shows three emissions peaked at about 4.28 eV (α band), 3.2 eV (β band) and 2.67 eV (γ band) when excited at 5 eV. The intensities of α and γ bands increase with the increase of fluence and tend to saturation at high fluence. The intensity of β band is at its maximum in virgin silica glass and it is reduced on increasing the ions fluence. It is further confirmed that nuclear energy loss processes determine the production of α and γ bands and electronic energy loss processes determine the bleaching of β band in heavy ion irradiated silica glass.     

Anisotropic deformation of polystyrene particles by MeV Au ion irradiation

MeV Au irradiation leads to a shape change of polystyrene (PS) and SiO₂ particles from spherical to ellipsoidal, with an aspect ratio that can be precisely controlled by the ion fluence. Sub-micrometer PS and SiO₂ particles were deposited on copper substrates and irradiated with Au ions at 230 K, using an ion energy and fluence ranging from 2 to 10 MeV and 1 × 10¹⁴ ions/cm² to 1 × 10¹⁵ ions/cm². The mechanisms of anisotropic deformation of PS and SiO₂ particles are different because of their distinct physical and chemical properties. At the start of irradiation, the volume of PS particles decrease, then the aspect ratio increases with fluence, whereas for SiO₂ particles the volume remains constant.     

Effect of Ag and Li ion irradiation on superconducting Tl2Ca2Ba2Cu3O10 single crystals

The effect of irradiation by 50 MeV Li³⁺ and 200 MeV Ag¹⁵⁺ ions on single crystals of Tl₂Ca₂Ba₂Cu₃O₁₀ (Tl2223) superconductor has been investigated at different fluences. Isothermal magnetization hysteresis loops have been recorded at different temperatures using a SQUID magnetometer and the effect of irradiation on the critical current density, irreversible field, second magnetization peak and pinning force has been studied. Irradiation by 200 MeV Ag¹⁵⁺ ions resulted in increased hysteresis and irreversibility field while no change in second magnetization peak position and critical temperature was observed. A broadening in the hysteresis loop before the second magnetization peak was also observed for the crystals irradiated by Li³⁺ ions. Annealing of irradiated crystals at 500 °C resulted in reduction of point defects created by Li³⁺ ions.     

Effect of 50 MeV Li ion irradiation on electrical, optical and mechanical properties of 4,4′-dimethylbenzophenone

4,4′-Dimethylbenzophenone (DMBP) single crystals were irradiated at room temperature and at liquid nitrogen temperature with 50 MeV Li³⁺ ions at fluences 1 × 10¹² and 1 × 10¹³ ions/cm². The dielectric constant and dielectric loss as a function of frequency of the applied ac field in the range from 20 Hz to 1 MHz and at temperatures ranging from 313 to 353 K were analyzed. The dielectric constant decreases with increase in frequency for all the temperatures. The dielectric constant and dielectric loss increase with fluence. Optical absorption was measured at different conditions. UV-Vis studies reveal the decrease in bandgap. The unirradiated as well as irradiated crystals were characterized by photoluminescence. Ion-induced changes were also studied with respect to their mechanical response using the Vicker’s microhardness technique and parameters including fracture toughness, brittleness index and yield strength are calculated.     

Effect of SHI on dielectric and magnetic properties of metal oxide/PMMA nanocomposites

Magnetic nanoparticles embedded in polymer matrices have excellent potential for electromagnetic device applications like electromagnetic interference suppression, etc. The NiO nanoparticles were synthesized by simple method. These nanoparticles were dispersed in PMMA matrix and films were prepared by casting method with varying concentrations of nickel oxide nanoparticles. These films were irradiated with 50 MeV Li⁺³ ions at a fluence of 5 × 10¹² ions/cm². AC electrical properties of pristine and irradiated samples were studied in wide frequency range. Dependence of dielectric properties on frequency, ion beam fluence and filler concentration was studied. The results reveal the enhancement in dielectric properties after doping nanoparticles and also upon irradiation, which is also corroborated with field-cooled-zero-field-cooled (FC-ZFC) susceptibility measurement in which magnetization is increased upon irradiation. The Fourier transform infrared (FTIR) spectroscopy analysis revealed the change in the intensity of functional groups after irradiation. Average surface roughness observed to change with filler concentration and also with the irradiation fluence as obtained from AFM analysis.     

Effect of swift heavy ion irradiation in W/Co multilayer structures

Present study reports effect of swift heavy ion irradiation on structural and magnetic properties of sputtered W/Co multilayer structures (MLS) having bilayer compositions of [W(10 Å)/Co(20 Å)]_5BL and [W(20 Å)/Co(20 Å)]_5BL. These MLS are irradiated by 120 MeV Au⁹⁺ ions up to fluence of 1 × 10¹³ ions/cm². X-ray reflectivity (XRR), wide-angle X-ray diffraction (WAXD), cross-sectional transmission electron microscopy (X-TEM) and magneto optical Kerr effect (MOKE) techniques are used for structural and magnetic characterization of pristine and irradiated MLS. Analysis of XRR data using Parratt’s formalism shows a significant increase in W/Co interface roughness. WAXD and X-TEM studies reveals that intra-layer microstructure of Co-layers in MLS becomes nano-crystalline on irradiation. MOKE study shows slight increase in coercivity at higher fluence, which may be due to increase in surface and interface roughness after recrystallization of Co-layers.     

Swift heavy ion induced structural modifications in zircon and scheelite phases of ThGeO4

Structural modifications in the zircon and scheelite phases of ThGeO₄ induced by swift heavy ions (93 MeV Ni⁷⁺) at different fluences as well as pressure quenching effects are reported. X-ray diffraction and Raman measurements at room temperature on the irradiated zircon phase of ThGeO₄ indicate the occurrence of stresses that lead to a reduction of the cell volume up to 2% followed by its transformation to a mixture of nano-crystalline and amorphous scheelite phases. Irradiation of the zircon phase at liquid nitrogen temperature induces amorphization at a lower fluence (7.5 × 10¹⁶ ions/m²), as compared to that at room temperature (6 × 10¹⁷ ions/m²). Scheelite type ThGeO₄ irradiated at room temperature undergoes complete amorphization at a lower fluence of 7.5 × 10¹⁶ ions/m² without any volume reduction. The track radii deduced from X-ray diffraction measurements on room temperature irradiated zircon, scheelite and low temperature irradiated zircon phases of ThGeO₄ are, 3.9, 3.5 and 4.5 nm, respectively. X-ray structural investigations on the zircon phase of ThGeO₄ recovered after pressurization to about 3.5 and 9 GPa at ambient temperature show the coexistence of zircon and disordered scheelite phases with a larger fraction of scheelite phase occurring at 9 GPa. On the other hand, the scheelite phase quenched from 9 GPa shows crystalline scheelite phase pattern.     

AFM and photoluminescence studies of swift heavy ion induced nanostructured aluminum oxide thin films

E-beam evaporated aluminum oxide films were irradiated with 120 MeV swift Au⁹⁺ ions in order to induced nanostructure formation. Atomic force microscope (AFM) results showed the formation of nanostructures for films irradiated with a fluence of 1 × 10¹³ ions cm⁻². The particle size estimated by section analysis of the irradiated film was in the range 25-30 nm. Glancing angle X-ray diffraction (GAXRD) revealed the amorphous nature of the films. Two strong Photoluminescence (PL) emission bands with peaks at ∼430 nm and ∼645 nm besides a shoulder at ∼540 nm were observed in all irradiated samples. The PL intensity is found to increase with increase of ion fluence.     

Effect of swift heavy ion irradiation on structure, optical, and gas sensing properties of SnO2 thin films

Swift heavy ion irradiation has been successfully used to modify the structural, optical, and gas sensing properties of SnO₂ thin films. The SnO₂ thin films prepared by sol-gel process were irradiated with 75 MeV Ni⁺ beam at fluences ranging from 1 × 10¹¹ ion/cm² to 3 × 10¹³ ion/cm². Structural characterization with glancing angle X-ray diffraction shows an enhancement of crystallinity and systematic change of stress in the SnO₂ lattice up to a threshold value of 1 × 10¹³ ions/cm², but decrease in crystallinity at highest fluence of 3 × 10¹³ ions/cm². Microstructure investigation of the irradiated films by transmission electron microscopy supports the XRD observations. Optical properties studied by absorption and PL spectroscopies reveal a red shift of the band gap from 3.75 eV to 3.1 eV, and a broad yellow luminescence, respectively, with increase in ion fluence. Gas response of the irradiated SnO₂ films shows increase of resistance on exposure to ammonia (NH₃), indicating p-type conductivity resulting from ion irradiation.     

Electronic stopping dependence of ion beam induced modifications in GaN

We report here Swift heavy ion induced effects in GaN samples grown by metal organic chemical vapor deposition (MOCVD) technique. These samples were irradiated with 80 MeV Ni and 100 MeV Ag ions at a fixed fluence of 1 × 10¹³ ions/cm². Ion species and energies are chosen such that the difference in their electronic energy loss (S_e) would be 8 keV/nm. Effects of Ag on structural and optical properties over Ni ions have been discussed extensively. We employed different characterization techniques like High Resolution X-ray Diffraction (HRXRD) and Raman Spectroscopy for defect density calculations and for vibrational modes, respectively. Defect densities are calculated and compared using Williamson-Hall method from HRXRD. Change of strain and vibrational modes with S_e has been discussed.     

Absorption and photoluminescence study of Al2O3 single crystal irradiated with fast neutrons

Colour centers formation in Al₂O₃ by reactor neutrons were investigated by optical measurements (absorption and photoluminescence). The irradiation’s were performed at 40 °C, up to fast neutron (E_n > 1.2 MeV) fluence of 1.4 × 10¹⁸ n cm⁻². After irradiation the coloration of the sample increases with the neutron fluence and absorption band at about 203, 255, 300, 357 and 450 nm appear in the UV-visible spectrum. The evolution of each absorption bands as a function of fluence and annealing temperature is presented and discussed. The results indicate that at higher fluence and above 350 °C the F⁺ center starts to aggregate to F center clusters (F₂, F₂⁺ and ). These aggregates disappear completely above 650 °C whereas the F and F⁺ centers persist even after annealing at 900 °C. It is clear also from the results that the absorption band at 300 nm is due to the contribution of both F₂ center and interstitial ions.     

Ion-irradiation-induced athermal annealing of helium bubbles in SiC

We have compared the microstructural evolution of helium bubbles under ion irradiation and high temperature annealing. 4H-SiC was irradiated first by 140 keV He ions to a fluence of 1.0 × 10¹⁷ cm⁻² and then annealed at 1200 K for 30 min. Then, the samples were either irradiated by 2 MeV He ions to a fluence of 3.0 × 10¹⁶ cm⁻² at room temperature or annealed additionally at 1200 K for 30 min. Before and after 2 MeV He ion irradiation, significant microstructural changes were observed, similar to effects of high temperature annealing. Thus, the study provides evidence of ion-irradiation-induced athermal annealing on defect Ostwald ripening process and bubble evolution. Possible mechanisms are discussed.     

Structural characterization of swift heavy ion irradiated polycarbonate

Makrofol-N polycarbonate thin films were irradiated with copper (50 MeV) and nickel (86 MeV) ions. The modified films were analyzed by UV-VIS, FTIR and XRD techniques. The experimental data was used to evaluate the formation of chromophore groups (conjugated system of bonds), degradation cross-section of the special functional groups, the alkyne formation and the amorphization cross-section. The investigation of UV-VIS spectra shows that the formation of chromophore groups is reduced at larger wavelength, however its value increases with the increase of ion fluence. Degradation cross-section for the different chemical groups present in the polycarbonate chains was evaluated from the FTIR data. It was found that there was an increase of degradation cross-section of chemical groups with the increase of electronic energy loss in polycarbonate. The alkyne and alkene groups were found to be induced due to swift heavy ion irradiation in polycarbonate. The radii of the alkyne production of about 2.74 and 2.90 nm were deduced for nickel (86 MeV) and copper (50 MeV) ions respectively. XRD analysis shows the decrease of the main XRD peak intensity. Progressive amorphization process of Makrofol-N with increasing fluence was traced by XRD measurements.     

Evidence of nanostructure formation in Ge oxide by crystallization induced by swift heavy ion irradiation

Ge oxide films were irradiated with 150 MeV Ag ions at fluences varying between 10¹² and 10¹⁴ ions/cm². The irradiation-induced changes were monitored by FT-IR spectroscopy, atomic force microscopy, X-ray diffraction and photoluminescence spectroscopy. The FT-IR spectra indicate stoichiometric changes and an increase in Ge content on irradiation. X-ray diffraction shows a crystallization of the irradiated films and presence of both Ge and GeO₂ phases. The Ge nanocrystal size, as calculated from Scherrer’s formula, was around 30 nm. The morphological changes, observed in atomic force microscopy, also indicate formation of nanostructures upon ion irradiation and a uniform growth is observed for a fluence of 1 × 10¹⁴ ions/cm².     

Effect of 200 MeV Ag ion irradiation on structural and electrical transport properties of Fe3O4 thin films

Thin films of Fe₃O₄ have been deposited on single crystal MgO(1 0 0) and Si(1 0 0) substrates using pulsed laser deposition. Films grown on MgO substrate are epitaxial with c-axis orientation whereas, films on Si substrate are highly 〈1 1 1〉 oriented. Film thicknesses are 150 nm. These films have been irradiated with 200 MeV Ag ions. We study the effect of the irradiation on structural and electrical transport properties of these films. The fluence value of irradiation has been varied in the range of 5 × 10¹⁰ ions/cm² to 1 × 10¹² ions/cm². We compare the irradiation induced modifications on various physical properties between the c-axis oriented epitaxial film and non epitaxial but 〈1 1 1〉 oriented film. The pristine film on Si substrate shows Verwey transition (T_V) close to 125 K, which is higher than generally observed in single crystals (121 K). After the irradiation with the 5 × 10¹⁰ ions/cm² fluence value, T_V shifts to 122 K, closer to the single crystal value. However, with the higher fluence (1 × 10¹² ions/cm²) irradiation, T_V again shifts to 125 K.     

Magnetic behaviour of nanosized zinc ferrite under heavy ion irradiation

Present investigation reports the effect of 100 MeV oxygen beam on the magnetic properties of zinc ferrite nanoparticles. The nanoparticles for this study were synthesized by using the nitrates of zinc and iron in the matrix of citric acid and by sintering the precursor at 500 and 1000 °C. Both these samples were irradiated by 100 MeV oxygen beam with two different fluence 1 × 10¹³ and 5 × 10¹³ ions/cm². Besides the presence of cubic spinel phase, ZnO phase appears after the irradiation in both the samples. A decrease in average particle size was observed in the irradiated samples as estimated by X-ray diffraction pattern. The magnetization versus applied field curves show the decrease in magnetization with the fluence of the beam, which is attributed to the ZnO phase. The thermal magnetization curve for the sample ZF500 shows almost constant value of blocking temperature after irradiation whereas for ZF1000 it increases from 18 K to 32 K at a fluence of 5 × 10¹³ ions/cm².     

Structural studies of Ge nanocrystals embedded in SiO2 matrix

Germanium nanoparticles embedded in SiO₂ matrix were prepared by atom beam sputtering on a p-type Si substrate. The as-deposited films were annealed at temperatures of 973 and 1073 K under Ar + H₂ atmosphere. The as-deposited and annealed films were characterized by Raman, X-ray diffraction and Fourier transform infrared spectroscopy (FTIR). Rutherford backscattering spectrometry was used to quantify the concentration of Ge in the SiO₂ matrix of the composite thin films. The formation of Ge nanoparticles were observed from the enhanced intensity of the Ge mode in the Raman spectra as a function of annealing, the appearance of Ge(3 1 1) peaks in the X-ray diffraction data and the Ge vibrational mode in the FTIR spectra. We have irradiated the films using 100 MeV Au⁸⁺ ions with a fluence of 1 × 10¹³ ions/cm² and subsequently studied them by Raman and FTIR. The results are compared with the ones obtained by annealing.