Ion implantation in 4H-SiC

Silicon carbide offers unique applications as a wide bandgap semiconductor. This paper reviews various aspects of ion implantation in 4H-SiC studied with a view to optimise ion implantation in silicon carbide. Al, P and Si ions with keV energies were used. Channelling effects were studied in both a-axis and c-axis crystals as a function of tilts along major orthogonal planes and off the major orthogonal planes. Major axes such as [0 0 0 1] and the and minor axis like the showed long channelling tails and optimum tilts for minimising channelling are recommended. TEM analyses of the samples showed the formation of (0 0 0 1) prismatic loops and the loops as well,in both a and c-cut crystals. We also note the presence of voids only in P implanted samples implanted with amorphising doses. The competing process between damage accumulation and dynamic annealing was studied by determining the critical temperature for the transition between crystalline and amorphous SiC and an activation energy of 1.3 eV is extracted.     

Study of annealing induced redistribution of implanted Au in Si: Fluence dependence

One hour 500 °C air annealing induced movement of implanted Au in Si have been studied for 32 keV Au implantation in Si, in the fluence range of . Samples were characterized using Rutherford backscattering spectrometry and cross-sectional transmission electron microscopy. The results indicate that, depending on the initial state of Au in the matrix, there is a clear difference in the diffusion behaviour of Au in Si. When Au is precipitated as gold-silicide nanoclusters inside the Si matrix, annealing is found to cause diffusion of Au into the bulk Si. Compared to this, for a random atomic distribution of Au in an amorphous Si matrix, annealing is found to result in out-diffusion of Au towards the surface.     

Absorption and photoluminescence study of Al2O3 single crystal irradiated with fast neutrons

Colour centers formation in Al₂O₃ by reactor neutrons were investigated by optical measurements (absorption and photoluminescence). The irradiation’s were performed at 40 °C, up to fast neutron (E_n > 1.2 MeV) fluence of 1.4 × 10¹⁸ n cm⁻². After irradiation the coloration of the sample increases with the neutron fluence and absorption band at about 203, 255, 300, 357 and 450 nm appear in the UV-visible spectrum. The evolution of each absorption bands as a function of fluence and annealing temperature is presented and discussed. The results indicate that at higher fluence and above 350 °C the F⁺ center starts to aggregate to F center clusters (F₂, F₂⁺ and ). These aggregates disappear completely above 650 °C whereas the F and F⁺ centers persist even after annealing at 900 °C. It is clear also from the results that the absorption band at 300 nm is due to the contribution of both F₂ center and interstitial ions.     

Microstructure and dry-sliding wear properties of DC plasma nitrided 17-4 PH stainless steel

An attempt that the precipitation hardening steel 17-4PH was conducted by DC plasma nitriding (DCPN) is made to develop a kind of candidate material for nuclear reactor. Nitriding process performed at temperature ? 400 °C takes effect on creation of the layers composed of S-phase (expanded austenite) and (expanded martensite). Up to the temperature of 420 °C, the S-phase peaks disappear due to the transformation occurrence (S-phase → + CrN). For the samples nitrided at temperature ? 450 °C, no evidence of is found owing to a precipitation () taking place. For the 480 °C/4 h treated sample, it is the surface microhardness that plays the lead role in the wear rate reduction but the surface roughness; while for the 400 °C/4 h treated sample, it is both of the surface roughness and the S-phase formation. Dry sliding wear of the untreated 17-4PH is mainly characterized by strong adhesion, abrasion and oxidation mechanism. Samples nitrided at 400 °C which is dominated by slight abrasion and plastic deformation exhibit the best dry sliding wear resistance compared to the samples nitrided at other temperatures.     

Anisotropy of disorder accumulation and recovery in 6H-SiC irradiated with Au ions at 140 K

Single crystal 〈0 0 0 1〉-oriented 6H-SiC was irradiated with Au²⁺ ions to fluences of 0.032, 0.058 and 0.105 ions/nm² at 140 K and was subsequently annealed at various temperatures up to 500 K. The relative disorder on both the Si and C sublattices has been determined simultaneously using in situ D⁺ ion channeling along the 〈0 0 0 1〉 and 〈〉 axes. A higher level of disorder on both the Si and C sublattices is observed along the 〈〉. There is a preferential C disordering and more C interstitials are aligned with 〈0 0 0 1〉. Room-temperature recovery along 〈〉 occurs, which is associated with the 〈0 0 0 1〉-aligned interstitials that annihilate due to close-pair recombination. Disorder recovery between 400 and 500 K is primarily attributed to annihilation of interstitials that are misaligned with 〈0 0 0 1〉 and to epitaxial crystallization. Effects of stacking order in SiC on disorder accumulation are insignificant; however, noticeable differences of low-temperature recovery in Au²⁺-irradiated 6H-SiC and 4H-SiC are observed.     

Temperature dependence of damage formation in Ag ion irradiated 4H-SiC

Rutherford backscattering spectrometry (RBS) in channelling mode was used to study the defect formation in silver (Ag) ion irradiated silicon carbide (SiC). The 4H-SiC samples were irradiated with 360 keV Ag ions at different temperatures (15, 295, 375, 475, 625 and 875 K) over a wide range of fluences (1×10¹¹ to , depending on the irradiation temperature). The results can be divided into two groups: (i) for irradiation temperatures between 15 and 475 K amorphisation of the implanted layers is reached for ion fluences between 7×10¹³ and . The over-all cross-section of defect production at very low ion fluences which comprises the formation of point defects and of amorphous clusters, is almost identical for all data sets measured in this temperature range. Differences in the damage evolution which occur at higher ion fluences, suggest that the relative contribution of amorphous clusters within single ion impacts in crystalline material decreases with rising temperature. (ii) For irradiations performed at 625 and 875 K no amorphisation is found for ion fluences as high as . With increasing ion fluence the defect concentration exhibits a distinctive plateau due to the balance between formation and recombination of point defects before increasing up to a saturation level well below amorphisation. For this final stage our results indicate a mixture of point defect clusters and extended defects most probably dislocations. A comparison with data from the literature suggests that the damage evolution for implantation at 625 and 875 K is strongly influenced by the mobility of vacancies starting at around 600 K.     

First-principles study on electronic structures and absorption spectra for BaWO4 crystal containing barium vacancy

The electronic structures, dielectric function and absorption spectra for the perfect BaWO₄ (BWO) crystal and the BWO crystal containing barium vacancy () have been studied using density functional theory code CASTEP with the lattice structure optimized. The results indicate that the optical properties of the BWO crystal exhibit anisotropy and its optical symmetry coincide with lattice structure geometry of the BWO crystal. For the BWO crystal containing , there exhibit four absorption bands peaking at 0.71 eV (1751 nm), 1.85 eV (672 nm), 3.43 eV (362 nm) and 3.85 eV (322 nm), respectively. The origins of the 370 nm absorption band should be related to the .     

Ion beam induced defects in solids studied by optical techniques

Optical methods can provide important insights into the mechanisms and consequences of ion beam interactions with solids. This is illustrated by four distinctly different systems.X- and Y-cut LiNbO₃ crystals implanted with 8 MeV Au³⁺ ions with a fluence of 1 × 10¹⁷ ions/cm² result in gold nanoparticle formation during high temperature annealing. Optical extinction curves simulated by the Mie theory provide the average nanoparticle sizes. TEM studies are in reasonable agreement and confirm a near-spherical nanoparticle shape but with surface facets. Large temperature differences in the nanoparticle creation in the X- and Y-cut crystals are explained by recrystallisation of the initially amorphised regions so as to recreate the prior crystal structure and to result in anisotropic diffusion of the implanted gold.Defect formation in alkali halides using ion beam irradiation has provided new information. Radiation-hard CsI crystals bombarded with 1 MeV protons at 300 K successfully produce F-type centres and V-centres having the structure as identified by optical absorption and Raman studies. The results are discussed in relation to the formation of interstitial iodine aggregates of various types in alkali iodides. Depth profiling of and aggregates created in RbI bombarded with 13.6 MeV/A argon ions at 300 K is discussed.The recrystallisation of an amorphous silicon layer created in crystalline silicon bombarded with 100 keV carbon ions with a fluence of 5 × 10¹⁷ ions/cm² during subsequent high temperature annealing is studied by Raman and Brillouin light scattering.Irradiation of tin-doped indium oxide (ITO) films with 1 MeV protons with fluences from 1 × 10¹⁵ to 250 × 10¹⁵ ions/cm⁻² induces visible darkening over a broad spectral region that shows three stages of development. This is attributed to the formation of defect clusters by a model of defect growth and also high fluence optical absorption studies. X-ray diffraction studies show evidence of a strained lattice after the proton bombardment and recovery after long period storage. The effects are attributed to the annealing of the defects produced.     

First principle studies on the electronic structures and absorption spectra in KMgF3 crystal with fluorine vacancy

The experiments indicate that the perfect KMgF₃ crystal has no absorption in the visible range, however the electron irradiation induces a complex absorption spectrum. The absorption spectra can be decomposed by five Gaussian bands peaking at 2.5 eV (488 nm), 3.4 eV (359 nm), 4.2 eV (295 nm), 4.6 eV (270 nm) and 5.2 eV (239 nm), respectively. The purpose of this paper is to seek the origins of the absorption bands. The electronic structures and absorption spectra either for the perfect KMgF₃ or for KMgF₃: with electrical neutrality have been studied by using density functional theory code CASTEP with the lattice structure optimized. The calculation results predicate that KMgF₃: also exhibits five absorption bands caused by the existence of the fluorine ion vacancy and the five absorption bands well coincide with the experimental results. It is believable that the five absorption bands are related to in KMgF₃ crystal produced by the electron irradiation.     

The morphology and structure of one-dimensional carbon-carbon composite under high-fluence ion irradiation

The temperature dependences of the ion-induced electron emission yield γ(T), the crystal structure, and the morphology of a surface layer of the one-dimensional carbon fiber composite KUP-VM (1D) under high-fluence (10¹⁸-10¹⁹ ion/cm²) irradiation with 30 keV ions at normal incidence both perpendicular and parallel to the fiber directions have been studied. The target temperature has been varied during continuous irradiation from T = −180 to 400 °C. The surface analysis has been performed by the RHEED, SEM and RBS techniques. The surface microgeometry was studied using laser goniophotometry (LGP). It has been found that ion irradiation results in a loss of anisotropy of the surface layer structure because of amorphization at room temperature or recrystallization at a temperature higher than the ion-induced annealing temperature. The fiber morphology anisotropy remains under ion irradiation.     

Gamma radiolysis of NaCl brine: Effect of dissolved radiolysis gases on the radiolytic yield of long-lived products

Five moles per litre NaCl solution is γ-irradiated in autoclaves at 35 °C and 90 °C. H₂, O₂ and are formed as long-lived products and reach equilibrium concentrations at a gas partial pressure of some 10 bar. Since formation of a gas phase is completely suppressed, H₂ and O₂ are kept dissolved. The equilibrium concentration level depends on dose rate and pH. Experiments at 90 °C and with added H₂ show no gas production at all. From the kinetic simulation of the experiments we deduce that the reaction of OH and radicals with H₂ limits or inhibits sustaining solution decomposition. If species are present which compete with the radicals for H₂, (such as Br⁻) the decomposition is promoted. In such a case the gas partial pressure exceeds 100 bar.     

Crystallographic measurement of the β to α phase transformation and δ-hydride precipitation in a laser-welded Zircaloy-2 tube by electron backscattering diffraction

Crystallographic measurement of the β to α phase transformation and δ-hydride precipitation in a laser-welded Zircaloy-2 ferrule tube were carried out using an electron backscattering diffraction pattern (EBSP). A basket-weave structure with sub-micron lath width caused by quenching from the β to α phase was observed in the heat-affected and fusion zones, and mainly showed a grain boundary misorientation angle of 60° with an <1 1  0> rotation axis. This result is consistent with the Burgers orientation relationship of {1 1 0}_β//(0 0 0 1)_α and <1 1 1>_β//<1 1  0>_α for the β to α phase transformation. The texture of the quenched α′ phase was strongly inherited from the original α phase, having a radial (0 0 0 1) basal pole and axial {1 1  0} textures, even in the fusion zone. The primary hydride habit plane in the welded Zircaloy-2 was (0 0 0 1)_α//{1 1 1}_δ, matching previously obtained results for recrystallized cladding tubes. In addition to the primary habit plane, secondary habit planes were observed for the other low-index planes {1 0  0} and {1 0  1} in the fusion zone. The heterogeneous accumulation of hydrides in the transition zone between heat-affected and unaffected zones was mainly due to the residual stress distribution in the narrow region.     

Fabrication and nuclear analysis of isotopic N and N ion-implanted silicon standards

The fabrication of reliable isotopic nitrogen standards is achieved in Si through ¹⁴N and ¹⁵N ion implantation. 60 keV and ions were implanted at 400 °C up to ∼60% peak atomic concentration, yielding nitrogen-saturated silicon layers as measured using resonant nuclear reaction analysis. No isotopic effect has been observed. The nitrogen standards are validated by measurements of stability under ion irradiation. No significant desorption of nitrogen is observed either under a ⁴He⁺ ion fluence of 3.36 × 10¹⁶ cm⁻² or under a ¹H⁺ ion fluence of 8.60 × 10¹⁷ cm⁻², giving strong evidence that isotopic nitrogen standards can be achieved.     

Measurement of radiation-enhanced diffusion of La in single crystal thin film CeO2

The diffusion of La, a trivalent cation dopant, actinide surrogate, and high-yield fission product, in CeO₂, a UO₂ nuclear fuel surrogate, during 1.8 MeV Kr⁺ ion bombardment over a temperature range from 673 K to 1206 K has been measured with secondary ion mass spectroscopy. The diffusivity under these irradiation conditions has been analyzed with a model based on a combination of sink-limited and recombination-limited kinetics. This analysis yielded a cation vacancy migration energy of  ∼ 0.4 eV below ∼800 K, were recombination-limited kinetics dominated the behavior. The thermal diffusivity of La in the same system was measured over a range of 873-1073 K and was characterized by an activation enthalpy of . The measurement of both the migration enthalpy and total activation enthalpy separately allows the vacancy formation enthalpy on the cation sublattice to be determined;  ∼ 1 eV. The mixing parameter under energetic heavy-ion bombardment at room temperature was measured as well and found to be ∼4 × 10⁻⁵ nm⁵/eV.     

Density effects on the guided transmission of 3 keV Ne ions through PET nanocapillaries

Experiments for guided transmission of 3 keV Ne⁷⁺ ions through nanocapillaries in insulating PET polymers are reported. The ion guiding was studied for a two types of PET samples which consist of 200 nm capillaries with densities of and . The width of the emission profile and the fraction of transmitted ions were measured as a function of the capillary tilt angle. For the high capillary density the profile width of the transmitted ions is independent of the tilt angle in agreement previous studies. However, for the low-density sample the profile width was found to increase by a factor of 2 as the tilt angle increases from 0° to 8°. The results for the fraction of transmitted ions are used to evaluate the guiding angle, which specifies the guiding power of the material. The guiding powers were found to be equal for the two samples. The present results are discussed in terms of scaling laws, which have recently been established.     

Photoluminescence study of swift heavy ion (SHI) induced defect centers in sapphire

Single crystals of sapphire (Al₂O₃: Fe, Ti, Cr) were irradiated at room temperature with different fluence of 100 MeV Ni ions. Photoluminescence (PL) spectra of pristine and irradiated sapphires were recorded at room temperature under 2.8 eV blue excitation. A broad emission band consists of two bands centered at 516 nm corresponding to F₂ defect center and 546 nm corresponding to defect center was observed. The intensity of these defect centers was found to vary with the fluence. defect center develops at low fluence reaching maximum at 5 × 10¹⁶ ions/m² and finally decreasing at higher fluence. The behavior is interpreted in terms of creation of defect centers, their clustering and annihilation.     

Radiation induced defects in BaBPO5:Ce and their role in thermally stimulated luminescence reactions: EPR and TSL investigations

Defect centers induced by gamma irradiation in Ce doped BaBPO₅ were investigated using EPR spectroscopy. From EPR studies, three phosphorous centered radicals were characterized on the basis of observed ³¹P hyperfine splitting and g values as , and radicals. In addition to this, two types of boron oxygen hole centers (BOHC) and O⁻ were also formed at room temperature. An intense broad signal in sample annealed in argon (g_⊥ = 1.9258 and g_‖ = 1.8839) was assigned to Ce³⁺ ions associated with the electron trapped at anion vacancy or nearby lattice defect. TSL studies showed two glow peaks, a relatively weaker one at 425 K and an intense one at 575 K. Spectral studies of the TSL glow peaks have shown that Ce³⁺ ion acts as emission center. From the temperature dependence of the EPR spectra of gamma irradiated samples, the glow peaks at 425 K and 575 K were attributed to thermal destruction of /O⁻ and BOHC, respectively, by trapping of electrons from elsewhere. The energy released in electron hole recombination process is used for the excitation of Ce³⁺ ions resulting in these glow peaks at 425 K and 575 K. The spectral studies of the TSL glow peaks have shown emission at 330 nm indicating Ce³⁺ acts as the luminescent centre. The trap depth and the frequency factor for the 425 K and 575 K peaks were determined using different heating rates method.