Structural characteristics of rutile films prepared by direct deposition and neon ion beam assisted deposition

In this article, titanium dioxide films prepared by neon ion beam assisted deposition (IBAD) in an oxygen environment were investigated. The deposition rate was varied from 0.2 to 0.4 nm/s while the current density and ion energy were kept at 20 μA/cm² and 40 keV. The structural characteristics of all films were studied by X-ray diffraction and Raman spectroscopy. Results show that all the films exhibit a rutile phase. The location of (2 0 0) diffraction peaks deviated from the standard value. Simultaneously, the relative intensity of (2 0 0)/(1 1 0) peaks decreases with increasing evaporation rate. All results are discussed in terms of surface free energy and ion channeling effects.     

离子束辅助沉积立方氮化硼的试验研究

运用离子束辅助沉积(IBAD)法在硅片上制备了立方氮化硼(c—BN)薄膜，研究了辅助能量、辅助束流及辅助束中氮气含量等参数对膜中c—BN含量的影响。用红外光谱(FTIR)及X射线光电子能谱(XPS)分析技术对得到的c—BN膜进行了分析。结果表明：合适的离子辅助能量能够获得c—BN含量高的薄膜；膜中c—BN的含量随辅助气体中N2含量的提高而增加；辅助束流对薄膜的形成影响不明显。     

低能Ar离子束辅助沉积Cu、Ag、Pt薄膜

采用低能Ar离子束辅助沉积方法,在Mo/Si(100)衬底上分别沉积Cu、Ag、Pt薄膜.实验发现,若辅助轰击的Ar离子束沿衬底法线方向入射,当离子/原子到达比为0.2时,沉积的Cu膜呈(111)晶向,而Ag、Pt膜均呈(111)和(100)混合晶向.当辅助轰击的Ar离子束偏离衬底法线方向45°入射时,沉积的Cu、Ag、Pt膜均呈(111)择优取向.采用Monte Carlo方法模拟能量为500 eV的Ar离子入射单晶Ag所引起的原子级联碰撞过程,分别算得Ar离子入射单晶Ag(100)面、(111)面时,Ar离子的溅射率与入射角和方位角的关系.对离子注入的沟道效应和薄膜表面的自由能对薄膜择优取向的影响作了初步的探讨和分析.     

利用离子束技术及PECVD制备碳化硅

阐述利用离子注入、离子束增强沉积、反应离子束溅射及反应离子束辅助沉积等方法制备碳化硅薄膜的实验结果，并报道利用等离子体增强化学气相沉积技术制备可光致发光的非晶态α－ＳｉＣ：Ｈ薄膜的工作。     

离子束辅助沉积制备TiN/Si3N4纳米超硬膜的工艺研究

采用离子束辅助沉积法(Ion beam assisted deposition,IBAD)在单晶硅片上进行沉积制备了TiN/Si3N4纳米复合超硬薄膜;研究了辅助束流、轰击能量和Ti:Si靶面积比等工艺参数对TiN/Si3N4超硬纳米复合薄膜性能的影响.此外采用纳米硬度计、光电子能谱(X-ray photoelectron spectrum,XPS)和x射线衍射分析(X-raydiffraction,XRD)方法研究了纳米复合薄膜的性能、成分与组织结构;采用原子力显微镜(Atomic forcemicroscopy,AFM)分析了薄膜的表面形貌,并初步探讨了TiN/Si3N4纳米复合超硬薄膜的生长机理.     

9Cr18钢上离子束辅助沉积TiCxNy膜的研究

用离子束辅助沉积技术９Ｃｒ１８钢基体上形成了ＴｉＣｘＮｙ膜,ＴＥＭ观察膜呈多晶结构,具有（１１１）,（２００）和（２２０）择优取向。ＡＥＳ和ＸＰＳ分析进一步证实,ＴｉＣｘＮｙ膜呈含氧配置。膜的硬度与Ｎ含量有关,Ｎ的含量过高时硬度下降。在本实验条件下以离子注量为３×１０＾１７／ｃｍ６２时硬度最高,干摩擦表明膜的抗氧化性能优良,它的存在能有效抑制基体在摩擦过程中氧化皮的形成,显改善基体的磨损特性,并     

Microanalyses of the hydroxyl—poly—calcium sodium phosphate coatings produced by ion beam assisted deposition

Thin calcium phosphate catings on titanium alloy substrates were prepared by Ar^ ion beam assisted deposition(IBAD) from hydroxyl-poly-calcium sodium phosphate(HPPA) target.The coatings were analyzed by XRD,FTIR,XPS,These analyses revealed that the as-deposited films were amorphous or no apparent crystallinity.No distinct absorption band of the hydroxyl group was observed in FTIR spectra of the coatings but new absorption bands were presented for CO3^-2,The calcium to phosphorous ratio of these catings in different IBAD conditions varied from 0.46 to 3.36.     

氩离子辅助沉积的羟基聚磷酸钙钠膜的结构与溶解特性

用60keV的Ar离子束辅助将羟基聚磷酸钙钠材料沉积于Ti合金表面,通过X射线衍射谱(XRD)、付里叶变换红外谱(FTIR)和X射线光电子能谱(XPS)对沉积膜进行表征,发现膜呈非晶或无明显的结晶度,膜层元素与基体材料Ti相互扩散明显,沉积中出现C和O污染,膜中引入了CO_3~(2-)根基团。膜的Ca-P比随辅助离子剂量的增高而降低,而在盐溶液中的耐溶解性则随辅助剂量的增加而增强。实验中还发现,这种Ar离子辅助沉积的膜,在Hanks溶液中的电化学特性退火前后表现出明显的差异:退火前,膜一直呈现较高的钝性。当电极电位从0升至1500mV时,反映溶解特性的极化电流仅从1μA增至2μA,而在氩气氛中退火后,当电极电位≤200mV时,极化电流极低(<0.5μA),耐溶性明显优于前者;当电位在400—800mV之间时与退火前相差不大。但当电极电位>800mV时,其电化学特性很快变坏,极化电流迅速增大,溶解率猛增。     

Deposition of polycrystalline Si thin films on glass substrates by direct negative Si ion beam deposition

Polycrystalline Si (Poly-Si) thin films were deposited on a glass substrate by direct negative Si (Si⁻) ion beam deposition. The glass substrate temperature was kept constant at 500 °C for all depositions. Prior to deposition, the ion energy spread and ion-to-atom arrival ratio were evaluated as a function of the ion beam energy.The Si⁻ ion energy spread was less than 10% regardless of the ion energy, while the ion-to-atom arrival ratio increased proportionally from 1.3 to 1.6 according to the ion beam energy.Atomic force microscopy images showed that a relatively rough surface was obtained at 50 eV of Si⁻ ion energy and it is also concluded that the Si⁻ ion beam irradiation at 50 eV is effective to deposit Si thin film with small grains as shown in Fig. 3.     

离子束增强沉积碳膜及其在抑制电子发射中的应用

栅电子发射是影响行波管工作性能和制约其使用寿命的主要因素。国内研制的导弹雷达制导用行波管因存在严重的栅电子发射现象,寿命只有70h,不能付诸军事应用。采用离子束增强沉积的方法在栅网表面沉积一层碳膜后,可有效地抑制栅电子发射,使行波管寿命超过了1000h,在军事和航天领域获得了成功应用。报导了低能离子束增强沉积类金刚石薄膜和高能离子束增强沉积类石墨碳膜的制备技术、结构性能及其在抑制栅电子发射中的应用和机理研究的结果。     

Metastable phases in Co–Ag system formed by ion beam assisted deposition at the glancing ion incidence

Co metastable structures are formed in Co–Ag alloy films with the aid of glancing incident ions during deposition. The structures of Co are characterized by X-ray absorption near-edge structure (XANES) spectroscopy at the Co K-edge. The results indicate that two kinds of Co phases coexist in every film. One is -Co or β-Co and the other is named fcc-II with a = 4.06 Å. It is thought that the stress between Co and Ag clusters induces the formation of β-Co and the fcc-II phase. The role of glancing incident ions is to trigger a collision cascade on the surface and to facilitate both thermodynamics and kinetics aspects of cluster mixing.     

离子束增强沉积法制备Mo2N和Mo2-xTixN薄膜及其结构与性能研究

分别采用氮离子束增强沉积和Ｎ－Ｔｉ离子束同步增强沉积工艺制备了Ｍｏ２Ｎ和Ｍｏ２－ｘＴｉｘＮ薄膜,用ＸＲＤ,ＴＥＭ、划痕和阳极极化方法研究了两者的结构与性能。