分子束外延生长InAsSb材料的组分控制（英文）

采用分子束外延方法在GaAs和GaSb衬底上生长了一系列InAsSb薄膜,研究了Sb组分与Sb4束流间关系.实验发现,在分子束外延生长中,相比As原子,Sb原子更易并入晶格中.利用该特性可较好实现InAsSb材料的组分控制.     

原子氢辅助分子束外延生长以GaAs材料性能的改善

利用深能级瞬态谱（ＤＬＴＳ）研究了常规分子束外延和原子氢辅助分不外延生长的掺杂Ｓｉ和Ｂｅ的ＧａＡｓ同质结构样品中缺陷的电这特性。发现原以辅助分子束外延生长的样品中缺陷的浓度与常规分子束外延生长的样品相比有明显的降低,这可解释为生长过程中原子对缺陷的原位中和与钝化作用。     

长波InAsSb材料的结构特性研究

用熔体外延(ME)法在InAs衬底上生长了InAsSb外延层,用扫描电子显微镜(SEM)观察了样品的横截面,并测量出外延层的厚度达到100μm,用X-射线衍射(XRD)谱研究了InAsSb外延层的结构性质。测量结果表明,InAs/InAs0.023Sb0.977单晶具有相当完美的晶体取向结构及良好的结晶质量,这可能得益于100μm的外延层厚度基本消除了外延层与衬底之间晶格失配的影响。电子探针微分析(EPMA)测量的元素分布图像显示,Sb(锑)元素在外延层中的分布相当均匀。     

原子层分子束外延技术

本文概述了Ⅲ-Ⅴ族化合物分子束外延的新进展——原子层分子束外延（ALMBE）。介绍了它的基本原理、生长方法和应用。     

利用分子束外延生长高质量应变平衡InAs/InAsSbⅡ类超晶格（英文）

利用分子束外延技术在Ga Sb衬底上生长了高质量的InAs/InAsSb(无Ga)Ⅱ类超晶格。超晶格的结构由100个周期组成,每个周期分别是3.8 nm厚的In As层和1.4 nm厚的InAs_(0.66)Sb_(0.34)层。在实验过程中出现了一种特殊的尖峰状缺陷。利用高分辨率x射线衍射(HRXRD)、原子力显微镜(AFM)和傅里叶变换红外光谱(FTIR)对外延的超晶格进行了表征和分析。结果表明,优化后的样品几乎为零晶格失配,超晶格0级峰半峰宽为39.3 arcsec,表面均方根粗糙度在10μm×10μm范围内达到1.72?。红外吸收光谱显示50%的截止波长为4.28μm,PL谱显示InAs/InAs_(0.66)Sb_(0.34)超晶格4.58μm处有清晰锐利的发光峰。这些结果表明,外延生长的InAs/InAsSb超晶格稳定性和重复性良好,值得进一步的研究。     

长波红外焦平面材料技术的进展与新途径

评述长波红外焦平面阵列技术的进展,介绍一种适合于发展长波红外焦平面阵列的新材料—InAsSb 应变层超晶格及其生长技术、发展背景、目前现状,生长这种材料用的分子束外延和有机金属化学汽相淀积工艺及其这种材料的发展前景。     

原子氢辅助分子束外延生长台阶状表面形貌的研究

研究了分子束外延中引入原子氢后,原子氢对外延层表面形貌特征形成的诱导作用.原子力显微镜(AFM)测试表明,在(311)A GaAs表面,原子氢导致了台阶状形貌的形成,在这种台阶状表面进一步生长了InAs量子点,测试结果表明其位置分布的有序化受到台阶高度和台阶周期的制约.这为实现量子点结构的有序化控制生长提供了一定的实验参考.     

Ⅱ—Ⅵ族宽带隙半导体的分子束外延

我们用分子束外延法已生长出了ZnSe、ZnTe单晶薄层。外延层的生长速率基本上由分子束流量和衬底温度决定。本文讨论了这种二元化合物的生长速率,包括衬底温度、结晶性及分子束强度,并和实验结果作了比较分析。所获得的生长速率与衬底温度和入射束比的关系能用原子表面覆盖度的动力学方程得到解释。     

全固源分子束外延生长InP和InGaAsP

在国产分子束外延设备的基础上,利用新型三温区阀控裂解源炉,对InP及InGaAsP材料的全固源分子束外延(SSMBE)生长进行了研究.生长了高质量的InP外延层,表面缺陷密度为65cm-2,非故意掺杂电子浓度约为1×1016cm-3.InP外延层的表面形貌、生长速率及p型掺杂特性与生长温度密切相关.研究了InGaAsP外延材料的组分特性,发现在一定温度范围内生长温度对Ⅲ族原子的吸附系数有较大影响.最后得到了晶格匹配的In0.56Ga0.4As0.04P06材料,低温光致发光谱峰位于1507 nm,FWHM为9.8 meV.     

高Al组分In1-xAlx Sb/InSb的MBE生长研究

高Al(10%~15%)组分的In1-xAlx Sb层可作为势垒层以抑制隧穿暗电流、提高器件工作温度而显得很重要。采用分子束外延的方法对InSb(100)衬底高Al组分的In1-xAlx Sb/InSb外延生长进行了实验探索,确定出了Al组分(约12.5%)并讨论了Al组分梯度递变的In1-xAlx Sb缓冲层和生长温度对外延薄膜质量的影响。     

Investigation on the InAS1-xSbx epilayers growth on GaAs (001) substrate by molecular beam epitaxy

Undoped and Be-doped InAs1-xSbx (0 ≤ x ≤ 0.71) epitaxial layers were successfully grown on lattice mismatched semi-insulating GaAs (001) substrate with 2° offcut towards 〈 110〉.The effect of the InAs buffer layer on the quality of the grown layers was investigated.Moreover,the influence of Sb/In flux ratio on the Sb fraction was examined.Furthermore,we have studied the defects distribution along the depth of the InAsSb epilayers.In addition,the p-type doping of the grown layers was explored.The InAsSb layers were assessed by X-ray diffraction,Nomarski microscopy,high resolution optical microscopy and Hall effect measurement.The InAs buffer layer was found to be beneficial for the growth of high quality InAsSb layers.The X-ray analysis revealed a full width at half maximum (FWHM) of 571 arcsec for InAs0.87Sb0.13.It is worth noting here that the Hall concentration (mobility) as low (high) as 5 × 1016 cm-3 (25000 cm2V-1s-1) at room temperature,has been acquired.     

GaSb衬底上InAsxSb1-x合金的低压MOCVD生长和表征

采用自制的低压金属有机化学气相淀积设备,用三甲基镓、三甲基铟作为Ⅲ族源,三甲基锑和砷烷作为Ⅴ族源在(100)面GaSb和GaAs单晶衬底上分别外延生长了InAsSb材料.用X射线双晶衍射、原子力显微镜、扫描电镜和电子探针能谱仪等对材料特性进行了表征,研究了生长温度、Ⅴ/Ⅲ比、过渡层等生长参数对外延层质量的影响.获得了与GaSb衬底晶格失配度为0.4%的表面光亮且晶体质量较好的InAs0.85Sb0.15外延层.     

Photoelectric and luminescence properties of GaSb-Based nanoheterostructures with a deep Al(As)Sb/InAsSb/Al(As)Sb quantum well grown by metalorganic vapor-phase epitaxy

The luminescence and photoelectric properties of heterostructures with a deep Al(As)Sb/InAsSb/Al(As)Sb quantum well grown on n-GaSb substrates by metalorganic vapor-phase epitaxy are investigated. Intense superlinear luminescence and increased optical power as a function of the pump current in the photon energy range of 0.6–0.8 eV are observed at temperatures of T = 77 and 300 K. The photoelectric, current-voltage, and capacitance characteristics of these heterostructures are studied in detail. The photosensitivity is examined with photodetectors operating in the photovoltaic mode in the spectral range of 0.9–2.0 μm. The sensitivity maximum at room temperature is observed at a wavelength of 1.55 μm. The quantum efficiency, detectivity, and response time of the photodetectors were estimated. The quantum efficiency and detectivity at the peak of the photosensitivity spectrum are as high as η = 0.6–0.7 and D _λmax ^* = (5–7) × 10¹⁰ cm Hz^1/2 W^?1, respectively. The photodiode response time determined as the rise time of the photoresponse pulse from 0.1 to the level 0.9 is 100–200 ps. The photodiode transmission bandwidth is 2–3 GHz. Photodetectors with a deep Al(As)Sb/InAsSb/Al(As)Sb quantum well grown on n-GaSb substrates are promising foruse in heterodyne detection systems and in information technologies.     

In situ study of the formation kinetics of InSb quantum dots grown in an InAs(Sb) matrix

Formation of InSb quantum dots grown in an InAs matrix by molecular-beam epitaxy that does not involve forced deposition of InSb is studied. Detection of intensity oscillations in the reflection of high-energy electron diffraction patterns was used to study in situ the kinetics of the formation of InSb quantum dots and an InAsSb wetting layer. The effects of the substrate temperature, the shutter operation sequence, and the introduction of growth interruptions on the properties of the array of InSb quantum dots are examined. Introduction of a growth interruption immediately after completing the exposure of the InAs surface to the antimony flux leads to a reduction in the nominal thickness of InSb and to an enhancement in the uniformity of the quantum-dot array. It is shown that, in the case of deposition of submonolayer-thickness InSb/InAs quantum dots, the segregation layer of InAsSb plays the role of the wetting layer. The Sb segregation length and segregation ratio, as well as their temperature dependences, are determined.     

InAsSb/InTISb superlattice: A proposed heterostructure for long wavelength infrared detectors

A novel superlattice (SL) heterostructure, comprising of InTlSb well and InAsSb barrier lattice matched to InSb, is proposed for long wavelength 8−12 urn detectors. Improvements in the InTlSb epilayers’ structural quality are expected, as it will be sandwiched between higher quality zinc-blende InAsSb epilayers. Preliminary energy band calculations of 30? InAs_0.07Sb_0.93/100? In_0.93Tl_0.07Sb SL show the band alignment favorable to type I with three heavy-hole subband confinement in the valence band and a partial electron subband confinement in the conduction band due to the small conduction band offset. Including the effect of strain indicates significant changes in the band offsets, with optical bandgap essentially unaltered. The optical band gap of this SL was computed to be 0.127 eV (9.7 μm) at OK, indicating its potential for long wavelength applications.     

Electroluminescence of InAs/InAs(Sb)/InAsSbP LED heterostructures in the temperature range 4.2–300 K

The electroluminescence of InAs/InAsSbP and InAsSb/InAsSbP LED heterostructures grown on InAs substrates is studied in the temperature range T = 4.2–300 K. At low temperatures (T = 4.2–100 K), stimulated emission is observed for the InAs/InAsSbP and InAsSb/InAsSbP heterostructures with an optical cavity formed normal to the growth plane at wavelengths of, respectively, 3.03 and 3.55 μm. The emission becomes spontaneous at T > 70 K due to the resonant “switch-on” of the CHHS Auger recombination process in which the energy of a recombining electron–hole pair is transferred to a hole, with hole transition to the spin–orbit-split band. It remains spontaneous up to room temperature because of the influence exerted by other Auger processes. The results obtained show that InAs/InAs(Sb)/InAsSbP structures are promising for the fabrication of vertically emitting mid-IR lasers.     

非制冷型中长波铟砷锑探测器

工作在中、长波红外波段(波长5~12μm)的红外探测器在红外制导、红外成像、环境监测及资源探测等方面有着重要而广阔的应用前景。目前中国军用和民用对这一波段的非制冷型、快速响应的光子型红外探测器有迫切需求。文中用熔体外延(ME)法在InAs(砷化铟)衬底上生长的InAs0.05Sb0.95(铟砷锑)厚膜单晶,制作了高灵敏度、非制冷型、中长波光导型探测器,探测器上安装了Ge(锗)浸没透镜。傅里叶变换红外(FTIR)吸收光谱显示InAsSb材料的本征吸收边出现在波长8μm以后。InAs0.05Sb0.95探测器的光谱响应波长范围为2~9μm。室温下,在波长6.5μm处的峰值探测率Dλp*达到5.4×109 cm·Hz1/2·W-1,在波长8.0μm和9.0μm处的探测率D*分别为9.3×108和1.3×108 cm·Hz1/2·W-1,显示了InAsSb探测器的优越性能及对红外探测和成像的应用前景。     

Room-temperature InAsSb photovoltaic detectors for mid-infrared applications

Novel noncryogenic InAsSb photovoltaic detectors grown by molecular beam epitaxy are proposed and demonstrated. The quaternary alloy In/sub 0.88/Al/sub 0.12/As/sub 0.80/Sb/sub 0.20/ is introduced as a wide bandgap barrier layer lattice matched to the GaSb substrate. The valence band edge of In/sub 0.88/Al/sub 0.12/As/sub 0.80/Sb/sub 0.20/ nearly matches with InAs/sub 0.91/Sb/sub 0.09/, leading to more efficient transport of photogenerated holes. The resulting mid-infrared photovoltaic detector exhibits a 50% cutoff wavelength of 4.31 /spl mu/m and a peak responsivity of 0.84 A/W at room temperature. High Johnson-noise-limited detectivity (D/sup */) of 2.6/spl times/10/sup 9/ cm/spl middot/Hz/sup 1/2//W at 4.0 /spl mu/m, and 4.2/spl times/10/sup 10/ cm/spl middot/Hz/sup 1/2//W at 3.7 /spl mu/m are achieved at 300 K and 230 K, respectively.     

温度和材料参数对InAsxSb1-x俄歇复合寿命影响的数值分析

工作在中长波的红外探测器可被广泛应用在空间成像、军事和通信等领域,锑基InAsSb材料由于其特殊的性质是制作长波非致冷光子探测器的理想材料。俄歇复合寿命是影响探测器性能的重要因素之一,文章采用Matlab软件模拟研究了n型和p型InAsxSb1-x材料的俄歇复合寿命随温度、As组分及载流子浓度的变化。对确定的As组分,可通过优化工作温度及载流子浓度获得较长的俄歇复合寿命。当载流子浓度为3.2×1015 cm-3、温度为200K时,n型InAs0.35Sb0.65的俄歇复合寿命最大为2.91×10-9 s。