Investigation of the electrical parameters of Ag/p-TlGaSeS/C Schottky contacts

p-type TlGaSeS single crystal was used to fabricate a Schottky device. Silver and carbon metals were used as the Ohmic and Schottky contacts, respectively. The device which displayed wide RF band at 13.200 and narrow band at 62.517 kHz with Q value of 1.4 and of 6.3 × 10⁴, respectively, is characterized by means of current (I)–voltage (V), capacitance (C)–voltage characteristics as well as capacitance–frequency (f) characteristics. The device series resistance, ideality factor and barrier height are determined from the I–V curve as 35.8 MΩ, 1.2 and 0.74 eV, respectively. The apparent acceptor density and the build in voltage of the device increased with increasing ac signal frequency. The high Q value, observed at 62.517 kHz, indicated a much lower rate of energy loss relative to the stored energy of the device. The energy loss (Q⁻¹) is much less than 0.001% of the stored value. The device was tested and found to remain at the same mode of resonance for several hours. It never switched or ceased unless it was tuned off.     

Preparation and electrical characterization of Cd0.8Zn0.2Te/Si thin films

Thin films of Cd_0.8Zn_0.2Te/Si structures were prepared by vacuum evaporation technique. The electrical properties such as activation energy, barrier height, and transport mechanism along with the capacitance-voltage characteristics are analyzed. The zero field activation energy calculated from the saturation current density with the inverse absolute temperature is found to be 0.37 eV and the barrier height is 0.54 eV. As the applied bias voltage increases the activation energy decreases from 0.3 to 0.22 eV for the bias range of 0-2 V. From the observed current voltage characteristics it is found that the surface state density is high for the films deposited at room temperature. From the high-frequency (1 MHz) C-V measurement the built in voltage is found to be 0.15 V. The plot of 1/C² vs the applied bias voltage behaviour is linear, indicating the presence of abrupt junction. The acceptor concentration as obtained from the 1/C² vs bias voltage is 1.4×10¹⁶ cm⁻³.     

Charge trapping characteristics of Al2O3/Al-rich Al2O3/SiO2 stacked films fabricated by radio-frequency magnetron co-sputtering

A thin-film structure comprising Al₂O₃/Al-rich Al₂O₃/SiO₂ was fabricated on Si substrate. We used radio-frequency magnetron co-sputtering with Al metal plates set on an Al₂O₃ target to fabricate the Al-rich Al₂O₃ thin film, which is used as a charge storage layer for nonvolatile Al₂O₃ memory. We investigated the charge trapping characteristics of the film. When the applied voltage between the gate and the substrate is increased, the hysteresis window of capacitance-voltage (C-V) characteristics becomes larger, which is caused by the charge trapping in the film. For a fabricated Al-O capacitor structure, we clarified experimentally that the maximum capacitance in the C-V hysteresis agrees well with the series capacitance of insulators and that the minimum capacitance agrees well with the series capacitance of the semiconductor depletion layer and stacked insulator. When the Al content in the Al-rich Al₂O₃ is increased, a large charge trap density is obtained. When the Al content in the Al-O is changed from 40 to 58%, the charge trap density increases from 0 to 18 × 10¹⁸ cm^− 3, which is 2.6 times larger than that of the trap memory using SiN as the charge storage layer. The device structure would be promising for low-cost nonvolatile memory.     

Studying trivalent/bivalent metal ion doped TiO2 as p-TiO2 in bipolar heterojunction devices

Trivalent/bivalent metal ions doped TiO₂ thin films (M_xTi_1−xO₂, M = Cr³⁺, Fe³⁺, Ni²⁺, Co²⁺, Mn²⁺ and x = 0.01, 0.05, 0.1, 0.15, 0.2) were deposited on Indium–tin oxide (ITO) coated glass substrates by spin coating technique. X-ray photoelectron spectroscopy (XPS) showed Ti⁴⁺ oxidation state of the Ti2p band in the doped p-TiO₂. The homogenous M_xTi_1−xO₂ was used to support n-ZnO thin films with thickness ∼40–80 nm and vertically aligned n-ZnO nanorods (NR) with length ∼300 nm and 1.5 μm. Current (I)–voltage (V) characteristics for the Ag/n-ZnO/M_xTi_1−xO₂/ITO/glass assembly showed rectifying behavior with small turn-on voltages (V₀) < 1 V. The ideality factor (η) and the resistances in both forward and reverse bias were calculated. The temperature dependence performance of these bipolar devices was performed and variation of the parameters with temperature was studied.     

Copper phthalocyanine thin-film field-effect transistor with SiO2/Ta2O5/SiO2 multilayer insulator

Top-contact Copper phthalocyanine (CuPc) thin-film field-effect transistor (TFT) with SiO₂/Ta₂O₅/SiO₂ (STS) multilayer as the dielectric was fabricated and investigated. With the multi-layer dielectric, drive voltage was remarkably reduced. A relatively large on-current of 1.1 × 10⁻⁷ A at a V_GS of −15 V was obtained due to the strong coupling capability provided by the STS multilayer gate insulator. The device shows a moderate performance: saturation mobility of μ_sat = 6.12 × 10⁻⁴ cm²/V s, on-current to off-current ratio of I_on/I_off = 1.1 × 10³, threshold voltage of V_TH = −3.2 V and sub-threshold swing SS = 1.6 V/dec. Atomic force microscope images show that the STS multilayer has a relative smooth surface. Experiment results indicate that STS multilayer is a promising insulator for the low drive voltage CuPc-based TFTs.     

Carrier transport mechanisms and photovoltaic characteristics of p-H2Pc/n-Si heterojunctions

Heterojunction cells of p-H₂Pc/n-Si were fabricated by vacuum deposition of p-H₂Pc thin films onto n-Si single crystals. Measurements of the current-voltage (I-V) and the capacitance—voltage (C-V) characteristics have been evaluated to identify the mechanisms of barrier formation and, consequently, current flow. The forward current involves tunneling and could be explained by a multi-step tunneling recombination model due to a high density of interface defects. The C-V characteristics indicate an abrupt heterojunction model. The devices exhibit strong photovoltaic characteristics with an open-circuit voltage of 0.34 V, a short-circuit current density of 17.5 mA/cm² and a power conversion efficiency of 1.5%. These parameters have been estimated at room temperature and under constant illumination of 150 mW/cm².     

High-performance ZnO thin film transistors with sputtering SiO2/Ta2O5/SiO2 multilayer gate dielectric

A high-performance ZnO thin film transistor （ZnO-TFT） with SiO₂/Ta₂O₅/SiO₂ (STS) multilayer gate insulator is fabricated by sputtering at room temperature. Compared to ZnO-TFTs with sputtering SiO₂ gate insulator, its electrical characteristics are significantly improved, such as the field effect mobility enhanced from 11.2 to 52.4 cm²/V s, threshold voltage decreased from 4.2 to 2 V, and sub-threshold swing improved from 0.61 to 0.28 V/dec. The improvements are attributed to the high gate capacitance (from 50 to 150 nF/cm²) as well as nice surface morphology by using dielectric with high～k Ta₂O₅ sandwiched by SiO₂ layers. The capacitance-voltage characteristic of a metal-insulator-semiconductor capacitor with the structure of Indium Tin Oxide/STS/ZnO/Al was investigated and the trap charges at the interface or bulk is evaluated to be 2.24 × 10¹² cm⁻². From the slope of C⁻² versus gate voltage, the doping density N_D of ZnO is estimated to be 1.49 × 10¹⁶ cm⁻³.     

TiN/VN composites with core/shell structure for supercapacitors

TiN/VN core-shell composites are prepared by a two-step strategy involving coating of commercial TiN nanoparticles with V₂O₅·nH₂O sols followed by ammonia reduction. The highest specific capacitance of 170 F g⁻¹ is obtained when scanned at 2 mV s⁻¹ and a promising rate capacity performance is maintained at higher voltage sweep rates. These results indicate that these composites with good electronic conductivity can deliver a favorable capacity performance.     

Study on ZnGa2O4:Cr a.c. powder electroluminescent device

An a.c. powder electroluminescent (EL) device using ZnGa₂O₄:Cr³⁺ phosphor was fabricated by the screen printing method. Optical and electrical properties of the device were investigated. The fabricated device shows a red emission at 695 nm driven by the a.c. voltage. The emission is attributed to the energy transfer from hot electrons to Cr³⁺ centers via self-activated Ga-O groups. Luminance (L) versus voltage (V) matches the well-known equation of L = L₀exp(− bV ^− 1 / 2) and luminance increases proportionally with frequency due to the increase of excitation probability of host lattice or Cr³⁺ centers. The diagram of the charge density (Q) versus applied voltage (V) is based on a conventional Sawyer-Tower circuit. At 280 V and 1000 Hz, the luminance and the luminous efficiency of the fabricated powder EL device are about 1.0 cd/m² and 13 lm/W, respectively. And under the high field, the device fabricated with the oxide-based phosphor of ZnGa₂O₄:Cr³⁺ shows excellent stability in comparison with the conventional sulfide powder EL device.     

Light-emitting characteristics of organic light-emitting diodes with the MoOx-doped NPB and C60/LiF layer

The hole ohmic properties of the MoO_x-doped NPB layer have been investigated by analyzing the current density-voltage properties of hole-only devices and by assigning the energy levels of ultraviolet photoemission spectra. The result showed that the performance of organic light-emitting diodes (OLEDs) is markedly improved by optimizing both the thickness and the doping concentration of a hole-injecting layer (HIL) of N, N′-diphenyl-N, N′-bis(1-naphthyl)-1,1′-biphenyl-4,4′-diamine (NPB) doped with molybdenum oxide (MoO_x) which was inserted between indium tin oxide (ITO) and NPB. For the doping concentration of above 25%, the device composed of a glass/ITO/MoO_x-doped NPB (100 nm)/Al structure showed the excellent hole ohmic property. The investigation of the valence band structure revealed that the p-type doping effects in the HTL layer and the hole concentration increased at the anode interfaces cause the hole-injecting barrier lowering. With both MoO_x-doped NPB as a hole ohmic contact and C₆₀/LiF as an electron ohmic contact, the device, which is composed of glass/ITO/MoO_x-doped NPB (25%, 5 nm)/NPB (63 nm)/Alq₃ (37 nm)/C₆₀ (5 nm)/LiF (1 nm)/Al (100 nm), showed the luminance of about 58,300 cd/m² at the low bias voltage of 7.2 V.     

Low temperature deposition of ITO on organic films by using negative ion assisted dual magnetron sputtering system

In a magnetron sputter type negative metal ion deposition, the influence of positive bias voltage (V_b) on the surface morphology, electrical resistivity, optical transmittance, and microhardness of ITO prepared on organic polycarbonate films has been investigated. In this study, the V_b increased from 0 to 250 V to attract secondary negative In and Sn metal ions, which were produced from ITO target by surface negative ionization with intense Cs ion bombardments. During deposition although reactive oxygen gas was not introduced into the chamber, by adjusting V_b at 100 V, ITO films on polycarbonate substrate with resistivity as low as 6.1×10⁻⁴ Ω cm and transmittance over 90% at 550 nm have been obtained without intentional substrate heating.AFM measurement also shows that surface roughness varied significantly with V_b. However, too intense ion bombardment originated by high V_b (>100 V) condition increased surface roughness and as a result deteriorated the electrical and optical property of ITO films.     

Relaxor ferroelectric like giant permittivity in PrCrO3 semiconductor ceramics

The electrical behavior of PrCrO₃ ceramics prepared by citric acid route and sintered at 1200 °C has been characterized by a combination of permittivity measurements, and impedance spectroscopy (IS). The effective permittivity obtained in frequency range 100 Hz to 1 MHz and temperature range 80–300 K, exhibits giant permittivity value of 3 × 10⁴ near room temperature. The response is similar to that observed for relaxor ferroelectrics. IS data analysis revealed the ceramics to be electrically heterogeneous semiconductor with room temperature resistivity <10² Ω m consisting of semiconducting grains with permittivity ?′ ∼ 100 and more resistive grain boundaries with effective permittivity ?′ ∼ 10⁴. We conclude, therefore that grain boundary effect is the primary source for the high effective permittivity in PrCrO₃ ceramics.     

Effect of an organic compound (Methyl Red) interfacial layer on the calculation of characteristic parameters of an Al/Methyl Red/p-Si sandwich Schottky barrier diode

An Al/Methyl Red/p-Si sandwich Schottky barrier diode (SBD) has been fabricated by adding a solution of the organic compound Methyl Red in chloroform onto a p-Si substrate, and then evaporating the solvent. Current-voltage (I-V) measurements of the Al/Methyl Red/p-Si sandwich SBD have been carried out at room temperature and in the dark. The Al/Methyl Red/p-Si sandwich SBD demonstrated rectifying behavior. Barrier height (BH) and ideality factor values of 0.855 eV and 1.19, respectively, for this device have been determined from the forward-bias I-V characteristics. The Al/Methyl Red/p-Si sandwich SBD showed non-ideal I-V behavior with the value of ideality factor greater than unity. The energy distribution of the interface state density determined from I-V characteristics increases exponentially with bias from 3.68 × 10¹² cm^− 2 eV^− 1 at (0.81 − E_v) eV to 9.99 × 10¹³ cm^− 2 eV^− 1 at (0.69 − E_v) eV.     

Transport and generation-recombination mechanisms of nonequilibrium charge carriers in ZnO/In2O3/InSe:Cd heterojunctions

Current-voltage characteristics, spectral characteristics of short-circuit photocurrent and charge generation-recombination kinetics in InSe layer from the contact region of ZnO:Al/In₂O₃/InSe:Cd heterojunctions are investigated. The structures show photosensitivity in the photon energy range 0.96-3.30 eV. The photosensitivity in the low energy range is determined by absorption threshold of InSe:Cd, while in higher energy range, the optical transparency region of ZnO film prevails. For doping levels of 0.5-1.0 at.%, the ratio of the ambipolar diffusion coefficient and the recombination rate at the InSe surface is decreasing from 1.8 to 0.9 μm.     

Capacitance-voltage and leakage-current characteristics of sol-gel-derived crystalline and amorphous SrTa2O6 thin films

SrTa₂O₆ (STA) is a promising high-dielectric-constant (ε) material. In this study, STA thin films were fabricated using the sol-gel method. The capacitance-voltage and leakage-current characteristics of crystalline and amorphous STA thin-film capacitors were investigated. STA thin films crystallized at an annealing temperature of 800 °C. Crystalline STA thin films exhibited a high ε of about 110, whereas amorphous STA thin films showed a much lower ε of about 26-41. However, amorphous STA thin films had a much more constant capacitance as a function of voltage. Of the amorphous thin films, the one annealed at 700 °C had the highest ε of about 41, the lowest leakage current of 10^− 8 A/cm², and a very constant capacitance as a function of voltage with a quadratic voltage-capacitance coefficient (α) of 27 ppm/V². The crystalline STA thin film had a negative α that was independent of frequency, which suggests that dipolar relaxation occurs and is responsible for the large change in the capacitance. The amorphous thin films had a positive α that decreased with increasing frequency, which implies that electrode polarization occurs.     

Synthesis and electroluminescent properties of blue-emitting t-butylated bis(diarylaminoaryl)anthracenes for OLEDs

A new series of blue fluorescent emitters based on t-butylated bis(diarylaminoaryl) anthracenes were synthesized and their electroluminescent properties investigated. Into these blue materials, t-butyl groups were introduced to both prevent molecular aggregation between the blue emitters through steric hindrance and reduce self-quenching. As such, this would contribute to overall improvement in OLED efficiency. To explore the electroluminescent properties of these materials, multilayered OLEDs were fabricated into a device structure of: ITO/NPB(50 nm)/blue emitters doped in ADN(30 nm)/Alq₃(20 nm)/Liq(2 nm)/Al(100 nm). All devices showed efficient blue emissions. In particular, one device exhibited highly efficient sky blue emissions with a maximum luminance of 11,060 cd/m² at 12.0 V and respective luminous and power efficiencies of 6.59 cd/A and 2.58 lm/W at 20 mA/cm². The peak wavelength of the electroluminescence was 468 nm with CIEx,y coordinates of (0.159, 0.198) at 12.0 V. In addition, a deep blue device with CIEx,y coordinates of (0.159, 0.151) at 12.0 V showed a luminous efficiency of 4.2 cd/A and power efficiency of 1.66 lm/W at 20 mA/cm².     

Deposition and characterization of MgO/Si gate stacks grown by molecular beam epitaxy

In this article, the deposition and characterization of amorphous MgO films grown on Si (001) using molecular beam epitaxy is reported. In order to ensure amorphous films, low substrate temperatures (200 °C) and high oxygen pressures were used (up to 5 × 10^− 3 Pa). Both atomic and molecular oxygen species were used at different pressures. Films ranging in thickness from 3 nm till 30 nm were grown and characterized using structural and electrical methods.The dielectric constant deduced from this thickness series corresponds to 8.74 close to the bulk value of 9.8. The best equivalent oxide thickness value observed for this series - grown under high oxygen pressure - corresponds to 1.2 nm for a current density measured at V_FB − 1 V of 0.1 A/cm². The films grown with atomic oxygen display a lower capacitance and lower leakage compared to the films grown using molecular oxygen. This is due to the appearance of a thin SiO₂ interface layer which is also responsible for the high defect density observed in the capacitance-voltage measurements. Upon annealing both types of films in forming gas for 15 min at 450 °C, the capacitance decreases further while the leakage increases. This change is assigned to the appearance of the lower bandgap (6.6 eV), lower dielectric constant (6.6) phase of silicate, MgSiO₃. Furthermore a V_FB shift of − 0.6 V is observed and is related to the appearance of oxygen vacancies as Mg diffuses into the SiO₂ interface layer.     

Structure and electrical transport properties of pure and Li2O-doped CuO/MgO solid solution

The different electrical properties, σ, ?′, tan δ and E_σ of pure and Li₂O-doped CuO/MgO solid solution were investigated. The mole fraction of CuO (MF) was varied between 0.048 and 0.2. Pure and doped samples were subjected to heat treatments at 673 and 1073 K. The results revealed that the amount of CuO dissolved in MgO lattice increases progressively by increasing the MF as evidenced from the progressive decrease in the intensity of all diffraction lines of undissolved CuO phase. The dissolution process of copper ions in MgO lattice was accompanied by progressive increase in its lattice parameter. This process being conducted at 1073 K was accompanied by a significant progressive increase in the values of σ, ?′ and tan δ with subsequent decrease in the value of E_σ. The increase in the MF value of CuO from 0.048 to 0.2 led to a significant increase in the value of σ_DC, measured at room temperature, from 6.33 × 10⁻¹² to 9.9 × 10⁻¹⁰ Ω⁻¹ cm⁻¹ and E_σ decreases from 0.76 to 0.58 eV.Li₂O doping of the investigated system followed by calcination at 1073 K resulted in a measurable increase in values of σ, ?′ and tan δ with subsequent decrease in E_σ. These results were discussed in the light of the possible effective increase in the charge carriers concentration (Cu²⁺ions dissolved in MgO lattice) and also to an effective increase in mobility of these charge carriers by Li₂O doping.     

Synthesis and high-pressure sintering of (W0.5Al0.5)C

A new solid solution of Al in WC, which can be expressed by the chemical formula (W_0.5Al_0.5)C, has been synthesized directly by reaction milling (RM) of a W_0.5Al_0.5 alloy and the proper amount of carbon. The total reaction time is about 50 h. The ESEM photograph shows that the prepared (W_0.5Al_0.5)C powders are spherical, and the average particle size is about 40 nm. (W_0.5Al_0.5)C has been identified to crystallize in the hexagonal space group P-6m2 (No.187) and belongs to the WC structure type. The lattice parameter of (W_0.5Al_0.5)C is calculated to be a = 2.908(1) Å, c = 2.836(1) Å. This nanocrystalline powder can be well sintered at the high temperature (1600 °C) under the high pressure (4.5 GPa), and the relative density reaches 99.1%. The hardness of the sintered (W_0.5Al_0.5)C is tested to be 1500 ± 50 kg mm⁻², while the density is about 9.417 ± 0.003 g cm⁻³, which is far lower than that of WC.     

Electron paramagnetic resonance (EPR) of antiferromagnetic nanoparticles of La1−xSrxCrO3 (0.000 ≤ x ≤ 0.020) synthesized by combustion reaction

Nanocrystalline particles of La_1−xSr_xCrO₃ (0.000 ≤ x ≤ 0.020) compounds were synthesized in order to investigate the antiferromagnetic (AFM) to paramagnetic (PM) phase transition temperature, g-factor, line width and intensity by electron paramagnetic resonance (EPR). All samples were synthesized by combustion reaction method using strontium nitrate, lanthanum nitrate, chromium nitrate and urea as fuel without subsequent heat treatment. X-ray diffraction patterns of all systems showed broad peaks consistent with orthorhombic structure of LaCrO₃. The absence of extra reflections in the diffraction patterns of as-prepared materials ensures the phase purity. The average crystallite sizes determined from the prominent (1 1 2) peak of the diffraction using Scherrer's equation was independent of the addition of Sr²⁺ ions; being ca. 31–29 nm for x = 0.000 and 0.020, respectively. The EPR line width and intensity were found to be dependent on Sr²⁺ addition and temperature. However, the AFM–PM transition temperature was found to be independent of strontium concentration, being ca. 296 K. In the PM phase, g-factor was nearly temperature independent with increasing of x. The EPR results indicated that the addition of Sr²⁺ ions may induce creation of Cr³⁺–Cr⁴⁺ clusters.