共查询到13条相似文献,搜索用时 31 毫秒
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通过热风回流焊制备了Cu/Sn3.0Ag0.5Cu/Cu对接互连焊点,测试了未通电及6.5 A直流电下通电36 h和48 h后焊点的剪切强度.结果表明,电迁移显著地降低了焊点的剪切强度,电迁移36 h使剪切抗力降低约30%,电迁移48 h降低约50%.SEM观察断口和界面形貌表明,界面金属间化合物增厚使断裂由韧性向脆性... 相似文献
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在28℃.3.25A直流电下,对Cu/Sn3.0Ag0.5Cu/Cu对接无铅焊点进行原位电迁移实验,观察了通电120,168,384和504 h后焊点横截面的微观组织形貌.结果表明,电迁移初期,Cu<,6>Sn<,5>化合物遍布整个焊点截面,随时间延长,不断从阴极向阳极迁移聚集;当通电504 h后,焊点内已看不到金属间... 相似文献
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为了研究电迁移过程中焊点与焊盘界面金属问化合物(IMC)的变化,在28℃下,对无铅Sn3.0Ag0.5Cu焊点进行了6.5A直流电下的电迁移实验.结果发现,通电144h后,阳极侧IMC层变厚,平均达到10.12 μm;阴极侧IMC层大部分区域变薄至0.86μm,局部出现Cu焊盘的溶解消失,但在界面边缘处出现Cu3Sn5... 相似文献
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利用扫描电子显微镜(SEM)和透射电子显微镜(TEM)研究了Sn3.8Ag0.7Cu(Sn37Pb)/Cu焊点在时效过程中的界面金属间化合物(IMC)形貌和成份。结果表明:150℃高温时效50、100、200、500h后,Sn3.8Ag0.7Cu(Sn37Pb)/Cu焊点界面IMC尺寸和厚度增加明显,IMC颗粒间的沟槽越来越小。50h时效后界面出现双层IMC结构,靠近焊料的上层为Cu6Sn5,邻近基板的下层为Cu3Sn。之后利用透射电镜观察了Sn37Pb/Ni和Sn3.8Ag0.7Cu/Ni样品焊点界面,结果显示,焊点界面清晰,IMC晶粒明显。 相似文献
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基于ANSYS有限元软件,综合考虑电子风力、温度梯度、应力梯度和原子密度梯度四种电迁移驱动机制,采用原子密度积分法(ADI)对倒装芯片球栅阵列封装(FCBGA)的Sn0.7Cu无铅焊点进行电迁移失效模拟。针对焊点直径、焊点高度、焊点下金属层(UBM)厚度三个关键参数进行电迁移失效的正交试验优化,探究焊点尺寸对电迁移失效的影响。研究表明:焊点直径和高度的增加会缩短焊点的电迁移失效寿命(TTF),而UBM层厚度对焊点失效寿命的影响相对较小;焊点局部拉应力对焊点的失效寿命影响较大,通常会加剧焊点的空洞失效。 相似文献
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A novel bumping process using solder bump maker is developed for the maskless low‐volume solder on pad (SoP) technology of fine‐pitch flip chip bonding. The process includes two main steps: one is the aggregation of powdered solder on the metal pads on a substrate via an increase in temperature, and the other is the reflow of the deposited powder to form a low‐volume SoP. Since the surface tension that exists when the solder is below its melting point is the major driving force of the solder deposit, only a small quantity of powdered solder adjacent to the pads can join the aggregation process to obtain a uniform, low‐volume SoP array on the substrate, regardless of the pad configurations. Through this process, an SoP array on an organic substrate with a pitch of 130 μm is successfully formed. 相似文献
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《Microelectronics Reliability》2014,54(11):2513-2522
Appropriate constitutive, damage accumulation and fracture models are critical to accurate life predictions. In this study, we utilize the maximum entropy fracture model (MEFM) to predict and validate cyclic hysteresis in Sn3.8Ag0.7Cu and Sn3.0Ag0.5 solder alloys through a damage enhanced Anand viscoplasticity model. MEFM is a single-parameter, information theory inspired model that aims to provide the best estimate for accumulated damage at a material point in ductile solids in the absence of detailed microstructural information. Using the developed model, we predict the load drop during cyclic fatigue testing of the two chosen alloys. A custom-built microscale mechanical tester was utilized to carryout isothermal cyclic fatigue tests on specially designed assemblies. The resultant relationship between load drop and accumulated inelastic dissipation was used to extract the geometry and temperature-independent damage accumulation parameter of the maximum entropy fracture model for each alloy. The damage accumulation relationship is input into the Anand viscoplastic constitutive model, allowing prediction of the stress–strain hysteresis and cyclic load drop. The damage accumulation model is validated by comparing predicted and measured load drops after 55 and 85 cycles respectively for Sn3.8Ag0.7Cu and Sn3.0Ag0.5 solder alloys. The predictions agreed to within 10% and 20% of the experimental observations respectively for the two alloys. The damage enhanced Anand model developed in this study will enable the tracking of crack fronts during finite element simulations of fatigue crack initiation and propagation in complex solder joint geometries. 相似文献
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A cost‐effective and simple solder on pad (SoP) process is proposed for a fine‐pitch microbump interconnection. A novel solder bump maker (SBM) material is applied to form a 60‐μm pitch SoP. SBM, which is composed of ternary Sn3.0Ag0.5Cu (SAC305) solder powder and a polymer resin, is a paste material used to perform a fine‐pitch SoP through a screen printing method. By optimizing the volumetric ratio of the resin, deoxidizing agent, and SAC305 solder powder, the oxide layers on the solder powder and Cu pads are successfully removed during the bumping process without additional treatment or equipment. Test vehicles with a daisy chain pattern are fabricated to develop the fine‐pitch SoP process and evaluate the fine‐pitch interconnection. The fabricated Si chip has 6,724 bumps with a 45‐μm diameter and 60‐μm pitch. The chip is flip chip bonded with a Si substrate using an underfill material with fluxing features. Using the fluxing underfill material is advantageous since it eliminates the flux cleaning process and capillary flow process of the underfill. The optimized bonding process is validated through an electrical characterization of the daisy chain pattern. This work is the first report on a successful operation of a fine‐pitch SoP and microbump interconnection using a screen printing process. 相似文献