退火温度对电子束蒸发的ZnS薄膜性能的影响

为了获得光电性能好的ZnS窗口层薄膜,采用电子束蒸发法在玻璃基片上沉积ZnS薄膜,研究退火温度(200~500℃)对ZnS薄膜的结构和光电性能的影响。结果表明:所制备的薄膜均为闪锌矿结构的β-ZnS多晶薄膜,导电类型为n型。随着退火温度的增高,薄膜结晶度和光电性能都变好。但是,当退火温度过高(500℃)时,薄膜的半导体特性反而变差。退火温度为400℃时,ZnS薄膜的性能最佳,此时薄膜的透过率较高;电阻率较低,为246.2?.cm。     

退火温度对电子束蒸发沉积硅薄膜结构和光学性能的影响（英文）

系统研究了退火温度对硅薄膜结构和光学性能的影响。通过电子束蒸发工艺制备硅薄膜,然后在氮气保护下对薄膜样品在200～500°C范围内进行退火处理。使用XRD、拉曼光谱、电子自旋共振和透射光谱测量等方法对薄膜样品进行了表征。结果显示,随着退火温度的升高,非晶硅薄膜结构有序度在短程和中程范围内得到改善,同时缺陷密度显著降低-。当样品在400°C退火后,消光系数k由6.14×10~(-3)下降到最小值1.02×10~3(1000 nm),这是由于此时硅薄膜缺陷密度也降到最低,约为沉积态薄膜的五分之一。试验结果表明,硅薄膜在适当的温度下退火可以有效地降低近红外区膜层的光学吸收,这对硅薄膜在光学薄膜器件研制中具有重要应用。     

沉积温度对反应电子束蒸发TiO2薄膜结构和光学性能的影响

TiO2具有较高的折射率,在光学方面有着广泛的应用.文中采用等离子辅助反应电子束真空蒸镀法,以Ti为膜料、纯度为99.99%的O2为反应气体,在玻璃衬底上制备了TiO2薄膜.使用XRD、OM、SEM分别对50℃、150℃、300℃三个不同沉积温度下制备的薄膜及其经过450℃真空退火1 h后的结构进行了分析,并对薄膜的折射率进行测量.实验结果表明,提高沉积温度可以增加成膜原子的能量及其在衬底上的扩散能力,使沉积的薄膜结构平整致密,具有较高的折射率.     

衬底和退火温度对多晶硅薄膜结构及光学性质影响

通过射频等离子体增强化学气相沉积(RF-PECVD)技术与退火处理制备多晶硅薄膜,研究了衬底和退火温度对所制薄膜的结构及光学性质的影响。本次试验最大的晶粒尺寸是在衬底温度为250℃获得,考虑薄膜表面的质量,最佳的退火温度为635℃,衬底温度为225℃,在玻璃衬底形成的晶粒大于50 nm,光学带隙为1.5 e V。结果表明:衬底温度影响着薄膜中氢含量以及相关的缺陷。随着退火温度的升高,晶化率的提高,光学带隙先减小后增大。     

退火温度对SiC薄膜结构和光学特性的影响

采用磁控溅射技术在p-Si基片上制备出SiC薄膜。将样品放在管式退火炉中通N2保护,分别在400℃,600℃,800℃和1 000℃进行退火处理,研究了退火温度对薄膜结构以及光致发光特性(PL)的影响。发现随着退火温度的升高,薄膜的结晶程度变好,SiC在800℃开始有晶相出现,Si—C峰也在向高波数的方向移动,这主要是由于膜中的Si1-xCx的化学计量发生变化。PL谱中的三个峰:322 nm起源于薄膜中的中性氧空缺,370 nm起源于SiC发光,412 nm起源于薄膜中的C簇。     

退火温度对p型CuCrO_2薄膜结构与光学性能的影响

采用射频磁控溅射法在石英玻璃衬底上制备CuCrO2薄膜,研究退火温度对CuCrO2薄膜结构和光学性能的影响。结果表明:未经退火处理的CuCrO2薄膜为非晶态,颗粒较小,可见光透射率仅为56%。退火处理能够改善CuCrO2薄膜的结构和透光性能。随着退火温度的升高,薄膜结晶化程度逐渐增强,孔洞缺陷逐渐减少,薄膜逐渐变得平整致密,薄膜的透光性能得到改善,薄膜的吸收边向短波方向移动。当退火温度为800℃时,薄膜的性能最优,可见光透射率达到70%。光学带隙宽度为3.06eV。     

退火温度对WO3薄膜结构及气敏性能的影响

采用直流磁控溅射法制备了WO3薄膜,并在350~550℃时对薄膜进行退火处理,研究了退火温度对薄膜结构及气敏性能的影响。结果表明:退火前及350℃退火后的薄膜为非晶态,450℃和550℃退火后的薄膜为WO3–x型晶态;随退火温度的提高,薄膜厚度增加,晶粒度增大。550℃退火后薄膜的厚度,较450℃退火后薄膜厚30nm,晶粒度相差8nm;450℃和550℃退火后的薄膜,在150℃时对体积分数为0.05%的NO2的灵敏度接近于22。     

退火温度对 BNST薄膜结构和性能的影响

采用射频磁控溅射法在Pt/Ti/LaAlO3(100)衬底上制备了BaO-Nd2O3-Sm2O3-TiO2系(BNST)薄膜.研究了退火温度对BNST薄膜结构、表面形貌和介电性能的影响.X线衍射仪(XRD)分析表明,随着退火温度的升高,晶粒逐渐长大.经850℃退火处理的BNST薄膜具有很好的结晶质量.原子力显微镜(AFM)分析表明,在一定范围内提高退火温度所制备的薄膜晶粒致密、大小均匀.LCR测试分析表明,在测试频率为100 kHz时,随着退火温度的升高,BNST薄膜介电常数有所增加,介电损耗则先降低,后增加.实验表明,经850℃退火处理,所制备的BNST薄膜的介电常数达37,介电损耗小于1.2‰.     

沉积温度对电子束蒸发沉积ZrO2薄膜性质的影响

摘要ZrO2薄膜样品在不同的沉积温度下用电子束蒸发的方法沉积而成。利用X射线衍射(XRD)仪和原子力显微镜(AFM)检测了ZrO2薄膜的晶体结构和表面形貌，发现室温下沉积ZrO2薄膜样品为非晶结构，随着沉积温度升高．ZrO2薄膜出现明显的结晶现象，在薄膜中同时存在四方相及单斜相。薄膜表现为自由取向生长，晶粒尺寸随沉积温度升高而增大。同时发现薄膜中的残余应力随沉积温度的升高，由张应力状态变为压应力状态，这一变化主要是薄膜结构变化引起的内应力的作用结果。同时讨论了不同沉积温度对ZrO2薄膜光学性质的影响。     

基片温度对电子束蒸发的ZnS薄膜性能的影响

采用电子束蒸发在不同基片温度下沉积ZnS薄膜,研究了基片温度对薄膜性能的影响.结果表明:不同基片温度下沉积的ZnS薄膜均呈多晶状态,为体心立方(闪锌矿)结构的β-znS,并具有明显的(111)面择优取向,导电类型为n型.随着成膜时基片温度的提高,薄膜结晶度越来越好,透过率增大,载流子浓度增大,而电阻率减小.     

电子束热蒸发非晶硅薄膜红外光学特性

采用Ar+离子束辅助电子束热蒸发技术制备非晶硅(a-Si)薄膜,利用正交实验研究了薄膜红外光学常数与工艺参数之间的关系.采用椭偏仪和分光光度计分析了薄膜沉积速率、基底温度和工作真空度对非晶硅薄膜的折射率和消光系数的影响.实验结果表明:影响a-Si薄膜光学特性的主要因素是沉积速率和基底温度,工作真空度的影响最小.随着沉积...     

Structural and optical properties of polycrystalline CdS thin films deposited by electron beam evaporation

Highly crystalline and transparent cadmium sulphide(CdS) films were deposited on glass substrate by electron beam evaporation technique.The structural and optical properties of the films were investigated.The X-ray diffraction analysis revealed that the CdS films have a hexagonal structure and exhibit preferred orientation along the(002) plane.Meanwhile,the crystalline quality of samples increased first and then decreased as the substrate temperature improved,which is attributed to the variation in film thickness.UV-vis spectra of CdS films indicate that the absorption edge becomes steeper and the band gap present fluctuation changes in the range of 2.389-2.448 eV as the substrate temperature increased.The photoluminescence peak of the CdS films was found to be broadened seriously and there only emerges a red emission band at 1.60 eV.The above results were analyzed and discussed.     

A study of sputter deposited silicon films

Thermal annealing, oxidation, and impurity doping of room-temperature dc magnetron sputter deposited silicon films are examined. It was found that even with a fine grain structure, the films can be doped to the desired sheet resistances suitable for device applications, although the sheet resistances are higher (2 to 5 times) than those obtained from single crystal silicon. It was also found that pre-diffusion annealing decreases sheet resistance of boron-doped films, but increases the sheet resistance of phosphorus-doped films, this is correlated to the different behavior of boron and phosphorus at the grain boundaries. Oxidation rates are enhanced in both boron-doped and phosphorus doped films. Film thickness reductions of 11 to 31% after high temperature processes was observed. Effects of doping on the shrinkage in film thickness are presented.     

Effect of thermal annealing on structural and optical properties of titanyl phthalocyanine thin films

Thin films of titanyl phthalocyanine (TiOPc) have been deposited on both fused quartz and glass substrates by the thermal evaporation technique. The structural and optical properties of the as-deposited and annealed films have been reported. The structural features of the as-deposited and annealed films have been studied by X-ray diffraction (XRD), field-emission scanning electron microscopy (FESEM), and Fourier-transform infrared (FT-IR) technique. The optical constants (refractive index, n, and absorption index, k) of the films have been presented for the first time in the wavelength range 200–2500 nm by using spectrophotometric measurements at nearly normal incidence. The band gaps of the as-deposited film at 1.48 eV and 2.5 eV corresponding to Q-band and B or Soret band were red-shifted to 1.15 eV and 2.19 eV, respectively, when the film annealed at 433 K.     

Photoconductive properties of lead iodide films prepared by electron beam evaporation

Lead iodide(PbI_2) films have been prepared by the electron beam evaporation technique,and their photoconductive response to visible light was investigated under different deposition and illumination conditions.It is found that the films' photoconductive response speed increases and the relative sensitivity decreases with the increase of substrate temperature due to the opposite requests for photo-carrier lifetime.Further,appropriately increasing the film's thickness and rising substrate temperature simu...     

退火温度对ZnO掺杂ITO薄膜性能的影响

利用电子束蒸镀方法,在K8玻璃衬底上沉积ZnO掺杂ITO(ZnO-ITO)与ITO薄膜。研究不同退火温度对ZnO-ITO薄膜的微观结构的影响;对比分析了在不同退火温度条件下,ZnO-ITO和无掺杂ITO薄膜的光电性能。结果发现,ZnO-ITO薄膜具有较大的晶粒尺寸,随着退火温度的上升,晶体结构得到改善,表面粗糙度减小,薄膜的光电性能显著提高。ZnO-ITO薄膜经过500℃退火后得到最佳的综合性能,其表面均方根粗糙度(RMS)为32.52nm,电阻率为1.43×10-4Ω.cm;对442nm波长的光,透射率可达98.37%;与ITO薄膜相比,ZnO-ITO薄膜具有显著的抗PEDOT:PSS溶液腐蚀的能力。     

退火温度对电子束沉积Ag/TiO2薄膜光学性质和光催化性能的影响

研究了退火温度对电子束制备Ag/TiO₂薄膜光学 性质和光催化性能的影响。在石英玻璃、硅片 上沉积了Ag/TiO₂复合薄膜,在空气氛围下,进行了400℃, 500℃的退火一小时.用紫外-可见分光光度 计、X射线衍射仪(XRD) 、原子力显微镜(AFM)对沉积和退火后的薄膜分别进行光学、结构、 形貌分析。结 果表明:300℃下制备的Ag/TiO₂复合薄膜为无定形结构,400℃以上薄呈多晶态。吸光度和表面粗糙度 随退火温度的增加而增大,薄膜的光学带隙随退火温度的增加而减小。锐钛矿相表现出了更 好的光催化性能。     

Photoelectric properties of Cu2ZnSnS4 thin films deposited by thermal evaporation

正Sn/Cu/ZnS precursor were deposited by evaporation on soda lime glass at room temperature,and then polycrystalline thin films of Cu_2ZnSnS_4(CZTS) were produced by sulfurizing the precursors in a sulfur atmosphere at a temperature of 550℃for 3 h.Fabricated CZTS thin films were characterized by X-ray diffraction,energy dispersive X-ray spectroscopy,ultraviolet-visible-near infrared spectrophotometry,the Hall effect system,and 3D optical microscopy.The experimental results show that,when the ratios of[Cu]/([Zn]+[Sn]) and[Zn]/[Sn]in the CZTS are 0.83 and 1.15,the CZTS thin films possess an absorption coefficient of larger than 4.0 x 10~4 cm~(-1) in the energy range 1.5-3.5 eV,and a direct band gap of about 1.47 eV.The carrier concentration,resistivity and mobility of the CZTS film are 6.98 x 10~(16) cm~(-3),6.96Ω-cm,and 12.9 cm~2/(V-s),respectively and the conduction type is p-type.Therefore,the CZTS thin films are suitable for absorption layers of solar cells.     

Photoconductive properties of lead iodide films prepared by electron beam evaporation

Lead iodide (PbI2) films have been prepared by electron beam evaporation technique, and their photoconductive response to visible light was investigated under different deposition and illumination conditions. It is found that the films’ photoconductive response speed increases and the relative sensitivity decreases with the increase of substrate temperature due to the opposite requests for photo-carrier lifetime. Further, appropriately increasing the film’s thickness and rising substrate temperature simultaneously can effectively balance the opposite demands. Under the optimized conditions of substrate temperature of 200℃, source-substrate distance of 30cm and deposition time of 10min, the prepared films exhibit best response properties. In addition, the response to illumination with different wavelengths was also measured, revealing that the decline of response performance with increasing wavelength is due to lower photon energy of incident light.