共查询到18条相似文献,搜索用时 62 毫秒
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设计一套基于FPGA的微流控芯片的电泳控制系统。该系统采用具有大量控制端口的FPGA作为系统的控制芯片,同时为了节约控制端口,选取串行控制的A/D与D/A芯片;采用USB2.0高速传输接口与上位机通信,满足了实施控制与数据上传的要求;采用VerilogHDL语言对芯片编程后,可同时对30个PCR芯片实施控制,另外还编写了基于Windows XP的驱动程序与控制软件。 相似文献
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针对现有液体流量计对低流与微流分辨力不够的难点,设计了一种基于双差压原理的新型液体微流检测仪.在单差压传感器的另一侧,接有完全相同的取压管和差压传感器,当液体流过导液管时,会同时在两侧的输入管与输出管之间产生压力差,形成双差压.双差压传感器将导液管入口与出口之间的压力差转换成电压输出,经放大电路放大后送单片机实现A/D转换和信号处理,最后显示出流量值.测试结果表明:该微流检测仪分辨力达到0.1 mL/min,每个流量点的重复性优于0.042%,具有设计原理新颖、结构简单、精度高、量程范围宽等优点. 相似文献
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Edge bead due to spin coating has been found to cause an air gap as large as 53 m for a 99-m thick (measured at the wafer center) SU-8 coating over a 4-in. wafer. This caused poor mask width replication and non-uniformity of SU-8 pattern width. We have devised a process using a soft cushion technology to improve mask dimension replication and large-area pattern uniformity. A soft cushion was placed beneath the substrate to produce convex bending of the wafer in order to improve the contact between the mask and photoresist top surface during UV exposure. Dramatic improvements in pattern uniformity, from over 30% variation in SU-8 width across the wafer to less than 10%, and mask width replication, from 54% deviation from mask width to 20%, have been demonstrated. Numerically calculated increases in SU-8 width from the wafer center to the edge bead using the Fresnel diffraction equation match well with observed values. Further, employment of this technique with a narrow (10 m) dark-field mask enabled the fabrication over the entire surface of 4-in. diameter wafers of dense SU-8 gratings separated by microchannels with aspect ratio over 18. 相似文献
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SU-8 is a negative, epoxy type, near-UV photoresist. This resist has been specifically developed for ultrathick, high-aspect-ratio MEMS-type applications using standard lithography equipment. However, in practice, SU-8 has shown to be very sensitive to process parameter variation. The orthogonal array was used in our experiments in order to improve the lithography quality and analyze the interaction among the parameters. The analyses show that the interaction between the exposure dose and post exposure bake has played an important role in adhesion between SU-8 resist and the substrate. The proposed process conditions are given. The output structure has straight sidewall profile, fine line and good space resolution. The aspect ratio is larger than 20. Moreover, several metallic films are used as substrates. The Ti film with oxidation treatment was found to have the strongest adhesion to the resist. The result will help to open possibilities for low-cost LIGA-type process for MEMS applications. 相似文献
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Comb-drive microactuator is widely used in MEMS devices and traditionally is made of silicon as structural material using
silicon-based fabrication technology. Recent development in UV lithography of SU-8 has made it possible to fabricate the ultra
high aspect ratio microstructures with excellent sidewall quality. In this paper, we report a low cost alternative to the
silicon-based comb drive by using cured SU-8 polymer as structural material. The microactuator was designed to have a integrated
structure without assembly or bonding. A unique integration fabrication process was successfully developed based on UV lithography
of SU-8 and selectively metallizing SU-8 polymer structures. Preliminary experimental results have proved the feasibility
of the microactuator and the fabrication technology. 相似文献
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K. D. Vora A. G. Peele B.-Y. Shew E. C. Harvey J. P. Hayes 《Microsystem Technologies》2007,13(5-6):487-493
We have previously demonstrated that it is possible to fabricate densely-packed high aspect ratio structures in SU-8 by means
of a top-plate support member which stiffens the overall structure and prevents pattern collapse. In this work we have computed
the tensile stresses induced in the top-plate structures due to the capillary forces that arise between the columns due to
the surface tension of the drying liquid. We have further studied the dynamic behavior of the structure after an instantaneous
force. Based on these results, we have shown that the predicted optimal thickness of the top-plate structure is sufficient
to maintain structural integrity. 相似文献
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SU-8 resist was used as a core/cladding waveguide material to fabricate a Mach–Zehnder interferometer (MZI) for biochemical sensing. The refractive index of the SU-8 resist was fine-tuned with a Δn of 0.004 for single-mode transmission. The UV lithography processes of the SU-8 resist were also optimized to pattern the high resolution (1 μm) and high aspect ratio (AR = 6) Y-branch structure of the optical interferometer. Optical measurements reveal that the SU-8 MZI chip can efficiently transmit the NIR laser (λ = 1310 nm) with a total loss less than 6 dB. When one branch of the MZI is in contact with the analyte, the interfered intensity stabilizes after the soaking time exceeds 5 min. NaCl solution with a concentration of 10−9 g/l can be detected using the SU-8 MZI chip. In the future, the polymer MZI chip can be mass-produced by molding process (or the LIGA process). The low-cost, label-free, real-time and high-sensitivity MZI chip will benefit many applications related to biological, environmental and industrial detection. 相似文献
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This paper presents a study on UV-lithography of thick SU-8 resist using air gap compensation and optimal wavelength selection for ultra-high aspect ratio microstructures. Both numerical simulations and experiments were conducted to study effects of different lithography conditions: broadband light source with and without air gap compensation, filtered light source with glycerol liquid, and filtered light source with Cargille refractive index matching liquid. A thick PMMA sheet was used as an optical filter to eliminate most of the i-line components of a broadband light source. Using the filtered light source and gap compensation with the Cargille refractive index liquid perfectly matching that of SU-8, patterns with feature sizes of 6 μm thick, 1150 μm tall (aspect ratio of more than 190:1) and high quality sidewalls were obtained. Microstructures with height up to 2 mm and good sidewall quality were also obtained and presented. The study also proved that Cargille refractive index matching liquid is compatible with UV-lithography of SU-8 and may be used as an effective air gap compensation solution. 相似文献
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为提高船舶吃水检测精度,研制了基于STC8A8K+MS5837的高精度船舶吃水监测系统;该系统利用压力传感器MS5837高精度的特点,并结合液体压强与深度的关系解决船舶吃水测量精度低的问题,同时单片机STC8A8K将吃水数据通过RS485总线发送给上位机;上位机以Cortex-A9处理器为核心,搭载了Linux操作系统,液晶屏上可以显示实时数据,并且可以通过USB接口导出测量数据,保存数据以供后续研究;现场实验表明,该系统具有安装方便、实时性高的优点,其测量精度可达0.1 mm。 相似文献
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Simulation and experimental validation of a SU-8 based PCR thermocycler chip with integrated heaters and temperature sensor 总被引:6,自引:0,他引:6
We present a SU-8 based polymerase chain reaction (PCR) chip with integrated platinum thin film heaters and temperature sensor. The device is fabricated in SU-8 on a glass substrate. The use of SU-8 provides a simple microfabrication process for the PCR chamber, controllable surface properties and can allow on chip integration to other SU-8 based functional elements. Finite element modeling (FEM) and experiments show that the temperature distribution in the PCR chamber is homogeneous and that the chip is capable of fast thermal cycling. With heating and cooling rates of up to 50 and 30 °C/s, respectively, the performance of the chip is comparable with the best silicon micromachined PCR chips presented in the literature. The SU-8 chamber surface was found to be PCR compatible by amplification of yeast gene ribosomal protein S3 and Campylobacter gene cadF. The PCR compatibility of the chamber surfaces was enhanced by silanization. 相似文献