Properties of amorphous Si thin film anodes prepared by pulsed laser deposition

Amorphous Si (a-Si) thin film anodes were prepared by pulsed laser deposition (PLD) at room temperature. Structures and properties of the thin films were investigated using X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM) and electrochemical measurements. Galvanostatic charge/discharge tests of half cells using lithium counter electrode were conducted at a constant current density of 100 μA/cm² in different voltage windows. Cyclic voltammetry (CV) was obtained between 0 and 1.5 V at various scan rates from 0.1 to 2 mV/s. The apparent diffusion coefficient (D_Li) calculated from the CV measurements was about ∼10⁻¹³ cm²/s. The Si thin film anode was also successfully coupled with LiCoO₂ thin film cathode. The a-Si/LiCoO₂ full cell showed stable cycle performance between 1 and 4 V.     

Manganese oxide thin films prepared by pulsed laser deposition for thin film microbatteries

Manganese oxide thin films with various oxidation states (MnO, Mn₃O₄ and Mn₂O₃) have been prepared by pulsed laser deposition using a Mn target at different oxygen partial pressures. The structural and morphological features of the as-deposited thin films are characterized by X-ray diffraction, Raman, field emission scanning electron microscopy (FESEM). The oxidation states of Mn in different thin films are investigated by X-ray photoelectron spectroscopy for both Mn 2p and 3s levels. It is found that the structure, surface morphology, and Mn oxidation state of the thin films can be tuned by oxygen partial pressure during the deposition. As anode for thin film lithium-ion microbatteries, the Mn₃O₄ thin film electrode exhibits the largest reversible capacity up to 800 mAh g⁻¹ with good cycling stability and excellent rate capability. The promising electrochemical performance of the Mn₃O₄ thin film electrode indicates the potential application of Mn₃O₄ thin film anode in all solid-state thin film microbatteries.     

Structural and optical properties of tellurite thin film glasses deposited by pulsed laser deposition

Tellurite (TeO₂-TiO₂-Nb₂O₅) thin film glasses have been produced by pulsed laser deposition at room temperature at laser energy densities in the range of 0.8-1.5 J/cm² and oxygen pressures in the range of 3-11 Pa. The oxygen concentration in the films increases with laser energy density to reach values very close to that of the bulk glass at 1.5 J/cm², while films prepared at 1.5 J/cm² and pressures above 5 Pa show oxygen concentration in excess of 10% comparing to the glass. X-ray photoelectron spectroscopy shows the presence of elementary Te in films deposited at O₂ pressures ≤ 5 Pa that is not detected at higher pressures, while analysis of Raman spectra of the samples suggests a progressive substitution of TeO₃ trigonal pyramids by TeO₄ trigonal bipyramids in the films when increasing their oxygen content. Spectroscopic ellipsometry analysis combined with Cauchy and effective medium modeling demonstrates the influence of these compositional and structural modifications on the optical response of the films. Since the oxygen content determines their optical response through the structural modifications induced in the films, those can be effectively controlled by tuning the deposition conditions, and films having large n (2.08) and reduced k (< 10^− 4) at 1.5 μm have been produced using the optimum deposition conditions.     

Structural and optical properties of neodymium-doped lutetium fluoride thin films grown by pulsed laser deposition

Neodymium-doped lutetium fluoride (Nd³⁺:LuF₃) thin films were successfully grown on MgF₂ (0 0 1) substrates by pulsed laser deposition (PLD). It is void of cracks that are otherwise prevalent due to structural phase transitions in Nd³⁺:LuF₃ during thin film deposition and bulk crystal growth. Cathodoluminescence (CL) spectra revealed multiple emission peaks, with a dominant peak in the vacuum ultraviolet (VUV) region at 179 nm. This peak has a decay time of 6.7 ns. The ability to grow high quality Nd³⁺-doped fluoride thin films would enable fabrication of VUV light-emitting devices that will enhance applications requiring efficient VUV light sources.     

脉冲激光沉积技术制备薄膜锂电池

脉冲激光沉积(pulsed laser deposition,PLD)是20世纪80年代发展起来的一种全新的制备薄膜技术,具有沉积速率高,再现性能好等优点.近年来,利用PLD技术在全固态薄膜锂电池的研究中取得许多有意义的结果.一系列新型、高质量的电池薄膜材料被成功制备;原位组装的薄膜锂电池表现出良好的电化学性能.本文简要介绍了PLD技术的原理和特点;重点评述PLD在全固态薄膜锂电池阴极薄膜、阳极薄膜和电解质薄膜制备中的应用状况.     

Influence of the deposition atmosphere on the characteristics of Pd–Mg thin films prepared by pulsed laser deposition

Bilayered palladium (30 nm thick)–magnesium (350 nm thick) thin films were prepared using the pulsed laser deposition technique in the presence of various background gases (Ar, He and a mixture He + H₂) under different partial pressures (47 and 27 Pa). According to the deposition atmosphere, the Pd/Mg interface shows either a sharp or an extended transition. The electrochemical hydriding properties and the mechanical stability upon cycling of the Pd/Mg film are greatly improved when an extended «intermixing» zone between the Pd and Mg layers is present. The Pd–Mg films prepared under pure helium fulfill these conditions.     

Thickness dependent magnetic properties of BiFeO3 thin films prepared by pulsed laser deposition

BiFe_1 ? xMn_xO₃ thin films having thickness 65 and 130 nm was fabricated on LAO substrates using pulsed laser deposition technique and its structural and magnetic properties were examined. Atomic force microscopy images confirmed that, as the thickness of the films increases the particles size also increases resulting in the decrease of magnetization. The possible cause for the lowering of magnetization with film thickness was discussed. Increase of spontaneous magnetization in BiFeO₃ at room temperature was observed with Mn substitution for Fe. The blocking temperature was found to decrease with increasing film thickness.     

Growth and characterization of non-polar ZnO thin films by pulsed laser deposition

Non-polar ZnO thin films were fabricated on r-plane sapphire substrates by pulsed laser deposition at various temperatures from 100 to 500 °C. The effects of the substrate temperature on structural, morphological and optical properties of the films were investigated. Based on the X-ray diffraction analysis, the ZnO thin films grown at 300, 400 and 500 °C exhibited the non-polar (a-plane) orientation and those deposited below 300 °C exhibited polar (c-plane) orientation. In the optical properties of non-polar ZnO films, there were two photoluminescence peaks detected. The peaks (near-band edge emission, blue emission) are due to electron transitions from band-to-band and shallow donor level to valence band, respectively.     

Optical and structural characteristics of silicon nanoparticles thin film prepared by laser ablation

In this paper thin film of silicon nanoparticles on glass substrates have been prepared by dip-coating method using colloidal silicon nanoparticles generated by nanosecond laser ablation of silicon wafer in ethanol. The resulting nanoparticles and structural properties and morphology of thin film were characterized by UV-Visible absorption spectrometry, transmission electron microscopy, Fourier transform infrared spectroscopy, X-ray diffraction pattern and atomic force microscopy image. Nanoparticles with diameters ~ 9 nm were observed to be formed in the colloidal solution. The atomic force microscopy image of Si nanoparticles thin film shows that the overall average width is about 80 nm.     

Microstructure of Mg-Zn-Ca thin film derived by pulsed laser deposition

Mg₆₀Zn_40−хCa_х (х = 5, 3, 1) powders and thin films have been produced by high energy mechanical alloying (HEMA) and pulsed laser deposition (PLD), respectively and the influence of PLD processing parameters on the microstructures of the Mg-Zn-Ca amorphous thin film was investigated using XRD, TEM, HRTEM and XEDS. Amorphous powder and thin film corresponding to Mg₆₀Zn₃₅Ca₅ composition have been successfully generated. The substrate temperature appears to be the dominant PLD processing parameter among others contributing to the formation of amorphous thin film.     

A study of microstructural and optical properties of nanocrystalline ceria thin films prepared by pulsed laser deposition

Thin films of cerium oxide (CeO₂) have been deposited on (100) Si substrates using pulsed laser deposition technique at various substrate temperatures from room temperature (RT) to 973 K at an optimized oxygen partial pressure of 3 Pa. Structural, morphological and optical properties have been carried out using X-ray diffraction (XRD), Raman, ellipsometry and atomic force microscopy techniques. XRD results showed that the deposited films are polycrystalline with cubic structure. At room temperature, the film showed preferred orientation along (111) plane, while at higher temperatures, it exhibited preferred orientation along (200). The crystallite sizes were calculated and were found to be in the range 17-52 nm. The texture coefficient for (200) reflection increased until 573 K, and then decreased in the temperature range 673-973 K. The Raman peak appeared at 463 cm^− 1 due to the F_2g active mode also confirmed the formation of CeO₂ with a cubic structure. There was a systematic variation in the Raman peak intensity, frequency shift and line broadening with the increase of temperature. The ellipsometry studies showed that the refractive index and band gap increased from 2.2 to 2.6 and 3.4 to 3.6 eV, respectively with increasing substrate temperature from RT to 973 K.     

Needle-like LiFePO4 thin films prepared by an off-axis pulsed laser deposition technique

Lithium iron phosphate (LiFePO₄) thin films were prepared by pulsed laser deposition with an off-axis geometry. Amorphous, needle-like and crystallized granular thin films were prepared on Si and titanium substrates. The preferred orientation of these crystallized LiFePO₄ thin films is (120). Microstructures of the deposited films are dependant on the substrate temperature (room temperature, 500 °C and 700 °C) and Ar pressure (5 Pa and 30 Pa) in the chamber. The needle-like film grows following a self-shadowing mechanism. LiFePO₄ thin film with high crystallinity shows a voltage plateau which is a typical feature of the phase transition reaction for bulk material, while the sloped profiles are observed clearly in the charging and discharging curves of LiFePO₄ thin films with low cystallinity.     

Growth and characterization of nitrogen-doped TiO2 thin films prepared by reactive pulsed laser deposition

Nitrogen-doped titanium dioxide (TiO₂) thin films were grown on (001) SiO₂ substrates by reactive pulsed laser deposition. A KrF* excimer laser source (λ = 248 nm, τ_FWHM ≅ 10 ns, ν = 10 Hz) was used for the irradiations of pressed powder targets composed by both anatase and rutile phase TiO₂. The experiments were performed in a controlled reactive atmosphere consisting of oxygen or mixtures of oxygen and nitrogen gases. The obtained thin film crystal structure was investigated by X-ray diffraction, while their chemical composition as well as chemical bonding states between the elements were studied by X-ray photoelectron spectroscopy. An interrelation was found between nitrogen concentration, crystalline structure, bonding states between the elements, and the formation of titanium oxinitride compounds. Moreover, as a result of the nitrogen incorporation in the films a continuous red-shift of the optical absorption edge accompanied by absorption in the visible spectral range between 400 and 500 nm wavelength was observed.     

Uniformity of gallium doped zinc oxide thin film prepared by pulsed laser deposition

Recently, transparent conducting oxide thin films have attracted attention for the application to transparent conducting electrodes. In this work, we evaluated the uniformity of electrical, optical and structural properties for gallium doped zinc oxide thin films prepared on the 10 × 10 cm² silica glass substrate by pulsed laser deposition. The resistivity, carrier concentration, mobility, bonding state and atomic composition of the film were uniform along in-plane and depth direction over the 10 × 10 cm² area of the substrate. The film showed the average transmittance of 81-87%, resistivity of 1.4 × 10^− 3 Ω cm, carrier concentration of 9.7 × 10²⁰/cm³ and mobility of 5 cm²/Vs in spite of the amorphous X-ray diffraction pattern. The gradual thickness distribution was found, however, the potential for large-area and low temperature deposition of transparent conducting oxide thin film using pulsed laser deposition method was confirmed.     

Structural and electrical properties of LuMnO3 thin film prepared by chemical solution method

Hexagonal LuMnO₃ thin films have been prepared based on a chemical solution deposition method. These films were deposited by spin-coating technique and annealed at different temperatures from 750 °C up to 850 °C, based on the thermogravimetric and differential thermal analysis results. An amorphous phase is observed in the film annealed at 750 °C, while a pure LuMnO₃ hexagonal phase is reached in the films annealed at 800 °C and 850 °C, along with a visible enhancement in the grain morphology as the annealing temperature increase. Low temperature magnetic analysis of the LuMnO₃ films annealed at 850 °C reveals several magnetic transitions, which are consistent with those reported for both LuMnO₃ ceramics and single crystals. Moreover, the emergence of a canted spin arrangement was evidenced from the temperature dependence of the specific induced magnetization and magnetic hysteretic cycles. No significant effect of the substrate on the magnetic properties was also sorted out. Dielectric measurements reveal the existence of a complex frequency behavior of the dielectric permittivity, which can be associated with relaxation processes arising from the interfaces film/electrodes.     

ZnO thin films prepared by pulsed laser deposition

Zinc oxide (ZnO) thin films were deposited on soda lime glass substrates by pulsed laser deposition (PLD) in an oxygen-reactive atmosphere. The structural, optical, and electrical properties of the as-prepared thin films were studied in dependence of substrate temperature and oxygen pressure. High quality polycrystalline ZnO films with hexagonal wurtzite structure were deposited at substrate temperatures of 100 and 300 °C. The RMS roughness of the deposited oxide films was found to be in the range 2-9 nm and was only slightly dependent on substrate temperature and oxygen pressure. Electrical measurements indicated a decrease of film resistivity with the increase of substrate temperature and the decrease of oxygen pressure. The ZnO films exhibited high transmittance of 90% and their energy band gap and thickness were in the range 3.26-3.30 eV and 256-627 nm, respectively.