Nonlinear current-voltage properties and accelerated aging behavior of ZPCCL-based varistors with sintering temperature

The nonlinear electrical properties and accelerated aging behavior of the varistors, which are composed of ZnO-Pr₆O₁₁-CoO-Cr₂O₃-La₂O₃ (ZPCCL)-based ceramics, were investigated for different sintering temperatures. The increase of sintering temperature led to more densified ceramics, whereas it decreased the nonlinear properties and varistor voltage. The highest nonlinearity of varistors was obtained from sintering temperature of 1240 °C, in which the nonlinear coefficient is 79.4 and the leakage current is 0.3 μA. However, the highest stability of varistors was obtained from sintering temperature of 1260 °C, in which the %ΔV_1 mA is + 1.9%, the %Δα is − 10.6%, and the %ΔI_L is + 20% for stress state of 95 V_1 mA/150 °C/24 h.     

Statistics on the AC ageing characteristics of single grain boundaries of ZnO varistor

The statistical AC ageing characteristics of single grain boundaries of ZnO varistor were investigated in this paper using the microcontact measurement method. ZnO varistor sample deposited with micro-electrodes was degraded under the ageing stress of 0.85 V_1mA at 135 °C. The electrical properties of 100 grain boundaries were measured after ageing with different time. The results indicate that the distribution of nonlinear coefficients concentrates to the lower region and the leakage current gradually increases in the ageing process. Meanwhile, more grain boundaries with lower breakdown voltage emerge as the ageing time increases, which means that the nonlinearities of these grain boundaries become weak.     

Effect of Er2O3 addition on the microstructure, electrical properties, and stability of Pr6O11-based ZnO ceramic varistors

The microstructure, electrical properties, and stability of Pr₆O₁₁-based ZnO varistors, which are composed of ZnO-Pr₆O₁₁-CoO-Er₂O₃ systems, were investigated with Er₂O₃ additive content. The density of ceramics was in the range of 84–88% of TD at 1300 °C and 93–98% of TD at 1350 °C, and greatly affected the stability. Most of the added-Er₂O₃ were segregated at nodal points. The varistors with 0.5 mol% Er₂O₃ sintered at 1300 °C exhibited the best nonlinear current-voltage characteristics, which the nonlinear exponent is 52.8 and the leakage current is 9.8 A. All the varistors sintered at 1300 °C, even under relatively weak stress, exhibited the thermal runaway within short time in order of high leakage current. On the contrary, the stability of varistors sintered at 1350 °C exhibited far higher stability than that at 1300 °C. Particularly, the varistors with 0.5 mol% Er₂O₃ exhibited not only relatively good nonlinear current-voltage characteristics, which the nonlinear exponent is 34.8 and the leakage current is 7.4 A, but also excellent stability, which the variation rates of varistor voltage, nonlinear exponent, and leakage current are below 1%, 3%, and 3%, respectively, even under more severe stress such as (0.80 V _{1 mA}/90 °C/12 h) + (0.85 V _{1 mA}/115 °C/12 h) + (0.90 V _{1 mA}/120 °C/12 h).     

Microstructure and electrical properties of Sm2O3 doped Bi2O3-based ZnO varistor ceramics

The dependence of the bulk density, microstructure and dc electrical properties of bismuth oxide (Bi₂O₃)-based zinc oxide (ZnO) varistor ceramics for various samarium oxide (Sm₂O₃) contents was investigated. The value of bulk density was found to 5.43-5.50 g cm⁻³ with Sm₂O₃ (mol%) content. The maximum value of bulk density is observed to be 5.50 for 0.30 mol% Sm₂O₃ containing varistor ceramics. The grain sizes for all the samples calculated from the scanning electron micrographs were found to decrease as Sm₂O₃ increases. The presence of ZnO phases, Bi-rich phases, spinel phases and Sm₂O₃ phases were observed in the samples by the energy dispersive X-ray analysis and X-ray diffraction analysis. As the Sm₂O₃ amount increased in the Bi₂O₃-based ZnO varistor ceramics, the nonlinear coefficient, α increased up to 0.10 mol%, reaching a maximum value of 58 and then decreased. The breakdown electric field, E_b, increased with the increase of Sm₂O₃ content with a maximum value of 3220 V cm⁻¹ for the 0.75 mol% Sm₂O₃ doped ZnO varistor ceramics. The leakage current, I_L, showed a minimum value of 1.10 μA for the composition of 0.30 mol% Sm₂O₃ doped Bi₂O₃-based ZnO varistor ceramics. The 0.30 mol% Sm₂O₃-doped Bi₂O₃-based ZnO varistor ceramics sintered at 1200 °C exhibited a good stability for dc accelerated aging stress of 0.90 V_1 mA/90 °C/12 h.     

ZnO thin films prepared by atomic layer deposition and rf sputtering as an active layer for thin film transistor

Recently, the application of ZnO thin films as an active channel layer of transparent thin film transistor (TFT) has become of great interest. In this study, we deposited ZnO thin films by atomic layer deposition (ALD) from diethyl Zn (DEZ) as a metal precursor and water as a reactant at growth temperatures between 100 and 250 °C. At typical growth conditions, pure ZnO thin films were obtained without any detectable carbon contamination. For comparison of key film properties including microstructure and chemical and electrical properties, ZnO films were also prepared by rf sputtering at room temperature. The microstructure analyses by X-ray diffraction have shown that both of the ALD and sputtered ZnO thin films have (002) preferred orientation. At low growth temperature T_s ≤ 125 °C, ALD ZnO films have high resistivity (> 10 Ω cm) with small mobility (< 3 cm²/V s), while the ones prepared at higher temperature have lower resistivity (< 0.02 Ω cm) with higher mobility (> 15 cm²/V s). Meanwhile, sputtered ZnO films have much higher resistivity than ALD ZnO at most of the growth conditions studied. Based upon the experimental results, the electrical properties of ZnO thin films depending on the growth conditions for application as an active channel layer of TFT were discussed focusing on the comparisons between ALD and sputtering.     

Structure, morphology and electrical characterizations of direct current sputtered ZnO thin films

ZnO thin films were deposited on glass substrates by direct current (DC) sputtering technique at room temperature (RT) to 400 °C with a 99.999% pure ZnO target. Then the samples deposited at RT were annealed in air from the RT to 400 °C. The effects of substrate temperature (T_s) and annealing treatment (T_a) on the crystallization behavior and the morphology have been studied by X-ray diffraction and atomic force microscopy. We also compared the structural properties of samples deposited at 400 °C on glass to those deposited on Pt/silicon substrate. The resistivity, surface roughness and size of the grains have also been studied and correlated to the thickness of ZnO films deposited on Pt/Si substrates. The experimental results reveal that the substrate has a major influence on the structural and morphological properties. For the films deposited on glass, below 400 °C, T_s and T_a have a similar influence on the structure of the films. Moreover, the ZnO samples deposited at RT and annealed in air have poor electrical properties.     

Influence of oxygen pressure on the structural, electrical and optical properties of VO2 thin films deposited on ZnO/glass substrates by pulsed laser deposition

The influence of oxygen pressure on the structural and electrical properties of vanadium oxide thin films deposited on glass substrates by pulsed laser deposition, via a 5-nm thick ZnO buffer, was investigated. For the purposes of comparison, VO₂ thin films were also deposited on c-cut sapphire and glass substrates. During laser ablation of the V metal target, the oxygen pressure was varied between 1.33 and 6.67 Pa at 500 °C, and the interaction and reaction of the VO₂ and the ZnO buffer were studied. X-ray diffraction studies showed that the VO₂ thin film deposited on a c-axis oriented ZnO buffer layer under 1.33 Pa oxygen had (020) preferential orientation. However, VO₂ thin films deposited under 5.33 and 6.67 Pa were randomly oriented and showed (011) peaks. Crystalline orientation controlled VO₂ thin films were prepared without such expensive single crystal substrates as c-cut sapphire. The metal-insulator transition properties of the VO₂/ZnO/glass samples were investigated in terms of electrical conductivity and infrared reflectance with varying temperatures, and the surface composition was investigated by X-ray photoelectron spectroscopy.     

Effect of growth temperature on the structural and transport properties of magnetite thin films prepared by pulse laser deposition on single crystal Si substrate

Magnetite (Fe₃O₄) thin films are prepared by pulsed laser deposition using an α-Fe₂O₃ target on silicon (111) substrate in the substrate temperature range of 350 °C to 550 °C. X-ray diffraction (XRD) measurement shows that the film deposited at 450 °C is a single phase Fe₃O₄ film oriented along [111] direction. However, the film grown at 350 °C reveals mixed oxide phases (FeO and Fe₃O₄), while the film deposited at 550 °C is a polycrystalline Fe₃O₄. X-ray photoelectron spectroscopy study confirms the XRD findings. Raman measurements reveal identical spectra for all the films deposited at different substrate temperatures. We observe abrupt increase in the resistivity behavior of all the films around Verwey transition temperature (T_V) (125 K-120 K) though the transition is broader in the film deposited at 350 °C. We observe that the optimized temperature for the growth of Fe₃O₄ film on Si is 450 °C. The electrical transport behavior follows Shklovskii and Efros variable range hopping type conduction mechanism below T_V for the film deposited at 450 °C possibly due to the granular growth of the film.     

Thickness dependence of structural, electrical and optical properties of sprayed ZnO:Cu films

ZnO:Cu thin films have been deposited by spray pyrolysis techniques within two different (450 °C and 500 °C) substrate temperatures. The structural properties of ZnO:Cu thin films have been investigated by X-ray diffraction techniques. The X-ray diffraction spectra showed that ZnO:Cu thin films are polycrystalline with the hexagonal structure and show a good c-axis orientation perpendicular to the substrate. The most preferential orientation is along the (002) direction for all spray deposited ZnO:Cu films together with orientations in the (100) and (101) planes also being abundant. Some parameters of the films were calculated and correlated with the film thickness for two different substrate temperatures. The optical properties of ZnO:Cu thin films have been investigated by UV/VIS spectrometer and the band gap values were found to be ranging from 3.29 eV to 3.46 eV.     

Electrical properties and stability against DC accelerated aging stress of ZPCCE-based varistor ceramics

The electrical properties and their stability of varistor ceramics composed of ZnO–Pr₆O₁₁–CoO–Cr₂O₃–Er₂O₃ systems were investigated as a function of Er₂O₃ content and sintering time. The varistor ceramics sintered for 1 h exhibited high nonlinear properties, with the nonlinear exponent close to 50. But the others, except for the varistor doped with 0.5 mol % Er₂O₃, exhibited very poor stability against d.c.-accelerated aging stress due to very low density. On the other hand, the varistors sintered for 2 h exhibited a more or less low nonlinear exponent, compared with those for 1 h, whereas their stability for d.c. stress was greatly improved. In particular, the varistor doped with 2.0 mol % exhibited not only high nonlinearity, with the nonlinear exponent of 47.4 and a leakage current of 1.8 A, but also excellent stability, in which under DC accelerated aging stress such as 0.95 V_{1 mA}/150 °C/12 h, the variation rate of varistor voltage, nonlinear exponent, and leakage current are –0.54 %, –4.41 %, and +155.56 %, respectively.     

Solar cells with Sb2S3 absorber films

CdS/Sb₂S₃/PbS structures were prepared by sequential chemical deposition of CdS, Sb₂S₃ and PbS thin films on TEC-8 (Pilkington) transparent electrically conductive SnO₂ (TCO) coatings. CdS thin films (100 nm) were deposited with hexagonal structure from Cd-citrate bath and of cubic structure from Cd-ammine/triethanolamine bath. Sb₂S₃ thin films were deposited at 40 °C from a solution mixture of potassium antimony tartrate, triethanolamine, ammonia and thioacetamide(TA) or at 1 to 10 °C from a mixture of antimony trichloride and thiosulfate (TS). These films were made photoconductive by heating at temperatures 250 to 300 °C. When heated in the presence of a chemically deposited Se thin film of 300 nm, a solid solution Sb₂S_1.8Se_1.2 resulted. PbS thin films of 100-200 nm thickness were deposited on the TCO/CdS/Sb₂S₃ or TCO/CdS/Sb₂S_1.8Se_1.2 structure. Graphite paint was applied on the PbS film prior to applying a silver epoxy paint. The cell structures were of area 0.4 cm². The best results reported here is for a cell: TCO/CdS(hex-100 nm)/Sb₂S₃(TS-100 nm)/PbS(200 nm) with open circuit voltage (V_oc) 640 mV, short circuit current density 3.73 mA/cm², fill factor 0.29, and conversion efficiency 0.7% under 1000 Wm^− 2 sunlight. Four series-connected cells of area 1 cm² each gave V_oc of 2 V and short circuit current of 1.15 mA.     

Application of pulsed laser deposited zinc oxide films to thin film transistor device

Transparent zinc oxide (ZnO) thin films were deposited on various substrates using a pulsed laser deposition (PLD) technique. During the PLD, oxygen pressure and substrate temperature were varied in order to find an optimal preparation condition of ZnO for thin film transistor (TFT) application. Dependence of optical, electrical and crystalline properties on the deposition conditions was investigated. The ZnO thin films were then deposited on SiN/c-Si layer structures in order to fabricate a TFT device. The pulsed laser deposited ZnO films showed a remarkable TFT performance: field effect mobility (μ_FE) of 2.4-12.85 cm²/V s and ratio of on and off current (R_on/off) in 2-6 order range. Influence of ZnO preparation conditions on the resulting TFT performance was discussed.     

Preparation and investigation of VOx thin films of n- and p-types

In this work we present first results on the synthesis of vanadium oxide semi-transparent conducting thin films of p- and n-types. The films were deposited by thermal evaporation method in vacuum, on: silicon, glass, sapphire, and gold substrates. Temperature of substrate during deposition was set around 250 °C. As deposited films were of a p-type of conductivity. Thermal annealing at 420 °C of as-deposited films in air at atmospheric pressure resulted in a change in the conductivity type.Optical, electrical and thermal properties of the deposited films were studied. The topography of the films was studied using AFM microscope. P-N structures were created using VO_x films on silicon and glass substrates. Electrical measurements had shown a non-linear behaviour of the samples.     

Growth of ZnO layers for transparent and flexible electronics

We have deposited and characterised ZnO on flexible and transparent plastic polymer. We employed a specially designed vapour phase growth system with elemental sources for zinc and oxygen and deposited thin ZnO films at temperatures below 400 °C. Basic photoluminescence characterisation confirms ZnO. Ohmic contacts were fabricated on these layers and the layers exhibit significantly high electron concentration with carrier mobility μ of up to 10.78 cm² V⁻¹ s⁻¹. Furthermore, we show how these layers can be processed with conventional device processing techniques.     

Effect of annealing on the electrical and optical properties of electron beam evaporated ZnO thin films

Zinc oxide thin films have been grown on (100)-oriented silicon substrate at a temperature of 100 °C by reactive e-beam evaporation. Structural, electrical and optical characteristics have been compared before and after annealing in air by measurements of X-ray diffraction, real and imaginary parts of the dielectric coefficient, refractive index and electrical resistivity. X-ray diffraction measurements have shown that ZnO films are highly c-axis-oriented with a full width at half maximum (FWMH) lower than 0.5°. The electrical resistivity increases from 10⁻² Ω cm to reach a value about 10⁹ Ω cm after annealing at 750 °C. The FWHM decreases after annealing treatment, which proves the crystal quality improvement. Ellipsometer measurements show the improvement of the refractive index and the real dielectric coefficient after annealing treatment at 750 °C of the ZnO films evaporated by electron beam. Atomic force microscopy shows that the surfaces of the electron beam evaporated ZnO are relatively smooth. Finally, a comparative study on structural and optical properties of the electron beam evaporated ZnO and the rf magnetron deposited one is discussed.     

The effect of nitrogen on the properties of zinc nitride thin films and their conversion into p-ZnO:N films

Zinc nitride thin films were deposited by magnetron sputtering using ZnN target in plasma containing either N₂ or Ar gases. The rf-power was 100 W and the pressure was 5 mTorr. The properties of the films were examined with thermal treatments up to 550 °C in N₂ and O₂ environments. Films deposited in Ar plasma were opaque and conductive (ρ ∼ 10^− 1 to 10^− 2 Ω cm, N_D ∼ 10¹⁸ to 10²⁰ cm^− 3) due to excess of Zn in the structure. After annealing at 400 °C, the films became more stoichiometric, Zn₃N₂, and transparent, but further annealing up to 550 °C deteriorated the electrical properties. Films deposited in N₂ plasma were transparent but very resistive even after annealing. Both types of films were converted into p-type ZnO upon oxidation at 400 °C. All thermally treated zinc nitride films exhibited a shoulder in transmittance at around 345 nm which was more profound for the Ar-deposited films and particularly for the oxidized films. Zinc nitride has been found to be a wide band gap material which makes it a potential candidate for transparent optoelectronic devices.     

ZnO thin films deposited by a CVT technique in closed ampoules

ZnO thin films were prepared on quartz glass, Si (100), and sapphire (001) substrates by a chemical vapour transport (CVT) technique. During the growing processes, the source and substrate temperatures were maintained at 1000 °C and 600 °C, respectively. The scanning electron microscopy (SEM) and X-ray diffraction (XRD) measurements showed that the crystalline qualities of ZnO thin films were sensitively dependent on substrates. ZnO thin film deposited on sapphire substrate exhibited the best morphology with the largest crystallite size of more than 20 μm. Meanwhile, the XRD patterns showed that ZnO thin film deposited on sapphire substrate was strongly c-axis preferred-oriented with high crystalline quality. The optical properties of ZnO thin films were investigated by photoluminescence (PL) spectroscopy at room temperature (RT). The results suggested that the optical properties of ZnO thin films were highly influenced by their crystalline qualities and surface morphologies.     

Structural, optical, and electrical properties of tin sulfide thin films grown by spray pyrolysis

Tin sulfide (SnS) thin films have been prepared by spray pyrolysis (SP) technique using tin chloride and N, N-dimethylthiourea as precursor compounds. Thin films prepared at different temperatures have been characterized using several techniques. X-ray diffraction studies have shown that substrate temperature (T_s) affects the crystalline structure of the deposited material as well as the optoelectronic properties. The calculated optical band gap (E_g) value for films deposited at T_s = 320-396 °C was 1.70 eV (SnS). Additional phases of SnS₂ at 455 °C and SnO₂ at 488 °C were formed. The measured electrical resistivity value for SnS films was ∼ 1 × 10⁴ Ω-cm.     

Structural and optical studies of nanocrystalline V2O5 thin films

We report the structural and optical properties of nanocrystalline thin films of vanadium oxide prepared via evaporation technique on amorphous glass substrates. The crystallinity of the films was studied using X-ray diffraction and surface morphology of the films was studied using scanning electron microscopy and atomic force microscopy. Deposition temperature was found to have a great impact on the optical and structural properties of these films. The films deposited at room temperature show homogeneous, uniform and smooth texture but were amorphous in nature. These films remain amorphous even after postannealing at 300 °C. On the other hand the films deposited at substrate temperature T_S > 200 °C were well textured and c-axis oriented with good crystalline properties. Moreover colour of the films changes from pale yellow to light brown to black corresponding to deposition at room temperature, 300 °C and 500 °C respectively. The investigation revealed that nanocrystalline V₂O₅ films with preferred 001 orientation and with crystalline size of 17.67 nm can be grown with a layered structure onto amorphous glass substrates at temperature as low as 300 °C. The photograph of V₂O₅ films deposited at room temperature taken by scanning electron microscopy shows regular dot like features of nm size.     

Effect of sintering process on electrical properties and ageing behavior of ZnO–V2O5–MnO2–Nb2O5 varistor ceramics

The effect of sintering process on microstructure, electrical properties, and ageing behavior of ZnO–V₂O₅–MnO₂–Nb₂O₅ (ZVMN) varistor ceramics was investigated at 875–950 °C. The sintered density decreased from 5.52 to 5.44 g/cm³ and the average grain size increased from 4.4 to 9.6 μm with the increase of sintering temperature. The breakdown field (E_{1 mA}) decreased from 6991 to 943 V/cm with the increase of sintering temperature. The ZVMN varistor ceramics sintered at 900 °C led to surprisingly high nonlinear coefficient (α = 50). The donor concentration (N_d) increased from 3.33 × 10¹⁷ cm⁻³ to 7.64 × 10¹⁷ cm⁻³ with the increase of sintering temperature and the barrier height (Φ_b) exhibited the maximum value (1.07 eV) at 900 °C. Concerning stability, the varistors sintered at 925 °C exhibited the most stable accelerated ageing characteristics, with %ΔE_{1 mA} = 1.5% and %Δα = 13.3% for DC accelerated ageing stress of 0.85 E_{1 mA}/85 °C/24 h.