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Optical antennas that confine and enhance electromagnetic fields in a nanometric region hold great potential for nanobioimaging and biosensing. Probe‐based monopole optical antennas are fabricated to enhance fields localized to <30 nm near the antenna apex in aqueous conditions. These probes are used under appropriate excitation antenna conditions to image individual antibodies with an unprecedented resolution of 26 ± 4 nm and virtually no surrounding background. On intact cell membranes in physiological conditions, the obtained resolution is 30 ± 6 nm. Importantly, the method allows individual proteins to be distinguished from nanodomains and the degree of clustering to be quantified by directly measuring physical size and intensity of individual fluorescent spots. Improved antenna geometries should lead to true live cell imaging below 10‐nm resolution with position accuracy in the subnanometric range.  相似文献   

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In this paper, 3D volumetric energy deposition and local crosslinking of hydrogen silsesquioxane (HSQ) are experimentally and numerically explored in focused helium ion beam lithography (HIBL). In particular, a through‐membrane exposure method is developed to make visible and subsequently to measure the 3D interaction volume and energy deposition of helium ions in HSQ. By comparing the actual dimensions of the crosslinked HSQ structures with Monte Carlo modeling of the spatial distribution of the energy deposition, the critical energy density for crosslinking HSQ is obtained. Finally, 3D nanofabrication of complex crosslinked HSQ nanostructures such as embedded nanochannels and suspended grids is demonstrated using two different exposure configurations. The proposed method expands the 2D point spread function of HIBL into three dimensions, thus opening a new avenue for nanoscale 3D fabrication.  相似文献   

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Color filtering via interaction of visible light with nanostructured surfaces offers high resolution printing of structural colors. A novel approach for color filtering in reflection mode via direct fabrication of subwavelength nanostructures on high‐index, low‐loss, and inexpensive silicon (Si) substrate is developed. Nanostructures having a unique geometry of tapered holes are fabricated exploiting the Gaussian nature of a gallium source focused ion beam (FIB). The fabrication process is rapid and single‐step, i.e., without any pre‐ or postprocessing or mask preparation in contrast to previously reported nanostructures for color filtering. These nanostructures are tunable via FIB parameters and a wide color palette is created. Finite‐difference time‐domain (FDTD) calculations reveal that the unique tapered nanohole geometry facilitates enhanced color purity via selective absorption of a narrow band of incident light wavelengths and makes it possible to obtain a wide variety of colors suitable for realistic color printing applications. The proposed approach is demonstrated for color printing applications via fabrication of butterflies and letters on Si.  相似文献   

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  总被引:1,自引:0,他引:1  
Focused ion beam (FIB) technology has become increasingly popular in the fabrication of nanoscale structures. In this paper, the recent developments of the FIB technology are examined with emphasis on its ability to fabricate a wide variety of nanostructures. FIB-based nanofabrication involves four major approaches: milling, implantation, ion-induced deposition, and ion-assisted etching of materials; all these approaches are reviewed separately. Following an introduction of the uniqueness and strength of the technology, the ion source and systems used for FIB are presented. The principle and specific techniques underlying each of the four approaches are subsequently studied with emphasis on their abilities of writing structures with nanoscale accuracy. The differences and uniqueness among these techniques are also discussed. Finally, concluding remarks are provided where the strength and weakness of the techniques studied are summarized and the scopes for technological improvement and future research are recommended.  相似文献   

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表面等离子体透镜(PL)具有优异的光聚束效应,能够形成突破衍射极限的近场光斑,具有广泛的应用前景.为了获得较小的近场光斑,需要选用较短波长的激光入射.选用355 nm径向偏振光作为入射条件,使用COMSOL多物理场耦合仿真软件优化了同心圆环沟槽型PL的结构参数.结果显示,当圆环沟槽半径与槽间距都与表面等离子激元(SPPs)波的波长相等,且增加同心圆环槽数时,SPPs波在PL中心能形成相长干涉,可以获得较大的光增强效应;随着金属膜厚和槽宽的增加,中心处光强先增大后减小,存在最优值.使用聚焦离子束(FIB)加工制备了所设计的PL结构,加工结果具有较好的尺寸精度,但沟槽截面存在一定的锥度.进一步的仿真结果表明,沟槽横截面的小锥度对PL的聚束效应和光增强效应影响较小.  相似文献   

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An austenitic Fe–25Cr–20Ni (wt.%) alloy was first nitrided in N2–H2 then carburised at 1000°C. The nitridation produced lamellar internal precipitates of Cr2N which grew by discontinuous precipitation at a recrystallised austenite boundary formed at the precipitation front. Subsequent carburisation converted the Cr2N to a mixture of chromium-rich M7C3+CrN, and released nitrogen into the austenite matrix. The submicron CrN precipitates were stabilized by a matrix supersaturated with nitrogen and exhibited a strong orientation relationship with the surrounding austenite. The rejected nitrogen diffused deeper into the alloy to form new, more finely spaced Cr2N lamellae. Carbon diffusion overtook the nitride structure and precipitated finely spaced, lamellar M23C6 by a discontinuous precipitation process. This process is available to the carbides only when a prior boundary is present. This phenomenon, and the ability of nitridation to form a boundary and the inability of carburisation to do so, are interpreted using the energetics of nucleation.  相似文献   

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作为超精密切削加工刀具的理想材料,单晶体金刚石材料的加工制造方法直接决定了刀具切削加工表面的精度和质量.由于金刚石材料具有明显的各向异性,在传统的金刚石刀具机械刃磨法中需要综合考虑制备工艺和刀具性能的协同关系,主要包括不同晶面表现出显著的物理机械性能差异、不同晶向存在显著的难磨和易磨方向等.本文针对聚焦离子束(FIB)技术加工金刚石刀具的过程中,金刚石材料性质对聚焦离子束加工质量、加工效率的影响规律等关键工艺开展了研究.研究发现,与传统的机械刃磨法相比,聚焦离子束加工是基于高能离子束的轰击溅射实现材料的去除,聚焦离子束加工中存在的级联碰撞现象显著弱化了金刚石材料各向异性的影响.  相似文献   

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Metal nanowires are one of the potential candidates for nanostructured sensing elements used in future portable devices for chemical detection; however, the optimal methods for fabrication have yet to be fully explored. Two routes to nanowire fabrication, electron-beam lithography (EBL) and focused ion beam (FIB) etching, are studied, and their electrical and chemical sensing properties are compared. Although nanowires fabricated by both techniques exhibit ohmic conductance, I-V characterization indicates that nanowires fabricated by FIB etching exhibit abnormally high resistivity. In addition, the resistivity of nanowires fabricated by FIB etching shows very low sensitivity toward molecular adsorption, while those fabricated by EBL exhibit sensitive resistance change upon exposure to solution-phase adsorbates. The mean grain sizes of nanowires prepared by FIB etching are much smaller than those fabricated by EBL, so their resistance is dominated by grain-boundary scattering. As a result, these nanowires are much less sensitive to molecular adsorption, which mediates nanowire conduction through surface scattering. The much reduced mean grain sizes of these nanowires correlate with Ga ion damage caused during the ion milling process. Thus, even though the nanowires prepared by FIB etching can be smaller than their EBL counterparts, their reduced sensitivity to adsorption suggests that nanowires produced by EBL are preferred for chemical and biochemical sensing applications.  相似文献   

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Abstract

Discs of (pure nickel 15mm diameter and 4mm thickness) have been polished to a 1 μm finish, aluminised using a standard pack CVD process to give a β-NiAl coating and then the surface of this coating polished to a 1 μm finish again. Samples have then been isothermally oxidised in a muffle furnace for 1, 2, 4, 8, 16, 32, 64, 128, 256, 512 and 1024 hours at 950°C, and subjected to surface and cross-sectional microscopy and analysis. Scales were also cross-sectioned and imaged using Focused Ion Beam Milling. The oxidation rate was determined to be 2:6×10?13 g2 cm?4 s?1 and for times less than 512 hours the predominant alumina phase was θ alumina. Al depletion effects were observed due to both oxidation and interdiffusion between the Ni substrate and the NiAl coating. Using these effects, it has been shown that tensile strains of up to 9% can arise and these strains readily explain the formation of intrefacial elliptical pores observed by FIB cross sectioning. FIB sectioning also indicated that different coating grains exhibit different oxide-coating interfaces which arise due to different grain orientations. The faceting of the coating-oxide interface and the development of cuboidal faceted coating structures beneath spalled oxide is thought to be due to substructure development (sub-grain development or recrystallisation) arising from the plastic strains generated by Al depletion effects.  相似文献   

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Electron beam-induced shrinkage provides a convenient way of resizing solid-state nanopores in Si(3) N(4) membranes. Here, a scanning electron microscope (SEM) has been used to resize a range of different focussed ion beam-milled nanopores in Al-coated Si(3) N(4) membranes. Energy-dispersive X-ray spectra and SEM images acquired during resizing highlight that a time-variant carbon deposition process is the dominant mechanism of pore shrinkage, although granular structures on the membrane surface in the vicinity of the pores suggest that competing processes may occur. Shrinkage is observed on the Al side of the pore as well as on the Si(3) N(4) side, while the shrinkage rate is observed to be dependent on a variety of factors.  相似文献   

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概述了基于聚焦离子束(Focused Ion Beam,FIB)加工技术制备金刚石切削刀具的相关研究进展,并介绍了金刚石刀具在超精密加工领域的研究背景及其制造现状。作为一种先进的微纳制造技术,聚焦离子束已在微尺度金刚石刀具制造研究中发挥了重要作用。针对金刚石刀具的刃口半径、刃形精度等核心参数,国内外相关研究者开展了聚焦离子束制造方法与工艺优化研究,实现了高质量刀具的制造,聚焦离子束加工可获得刃口半径为15~22nm的金刚石刀具制造。从微观切削基础和微纳光学元件制造两个角度,论述了聚焦离子束制造金刚石刀具的应用研究进展,介绍了其在纳米切削机理、微纳尺度光学元件制造中的应用。最后从提高FIB制造效率、应用研究拓展等角度,对该领域未来的发展进行了展望。  相似文献   

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Direct focused-ion-beam writing is presented as an enabling technology for realizing functional spin-wave devices of high complexity, and demonstrate its potential by optically-inspired designs. It is shown that ion-beam irradiation changes the characteristics of yttrium iron garnet films on a submicron scale in a highly controlled way, allowing one to engineer the magnonic index of refraction adapted to desired applications. This technique does not physically remove material, and allows rapid fabrication of high-quality architectures of modified magnetization in magnonic media with minimal edge damage (compared to more common removal techniques such as etching or milling). By experimentally showing magnonic versions of a number of optical devices (lenses, gratings, Fourier-domain processors) this technology is envisioned as the gateway to building magnonic computing devices that rival their optical counterparts in their complexity and computational power.  相似文献   

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