Temperature dependence of the band structure of 3<Emphasis Type="Italic">C</Emphasis>, 2<Emphasis Type="Italic">H</Emphasis>, 4<Emphasis Type="Italic">H</Emphasis>, and 6<Emphasis Type="Italic">H</Emphasis> SiC polytypes

The temperature dependences of significant energy extrema at the high-symmetry points Γ, X, L, K, M, A, and H of the Brillouin zone in the cubic and hexagonal modifications of SiC, as well as the energies of the main interband transitions at these points, were calculated for the first time by the empirical-pseudopotential method. The effect of the temperature dependence of the electron-phonon interaction on the crystal band structure was taken into account via the Debye-Waller factors, and the contribution of the linear expansion of the lattice was accounted for via the temperature dependence of the linear-expansion coefficient. The special features of the temperature dependences of the energy levels and of energies of the interband and intraband transitions are analyzed in detail. The results of the calculations are in good agreement with the known experimental data on the characteristics of SiC-based p-n structures operating in the breakdown mode. For example, the temperature coefficient of the energy of the X_1c–X_3c transition, which is responsible for the narrow violet band in the breakdown-electroluminescence spectra of reverse-biased p-n junctions, was found to be significantly smaller than the temperature coefficients for the interband transitions (from the conduction to valence band). This fact is quite consistent with the experimental curve of the temperature coefficient of the emission spectrum, which has a minimum in the same wavelength range.     

Electrodeposition of <Emphasis Type="Italic">p</Emphasis>-Type Sb<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te<Subscript><Emphasis Type="Italic">y</Emphasis></Subscript> Thermoelectric Films

Thermoelectric Sb _x Te _y films were potentiostatically electrodeposited in aqueous nitric acid electrolyte solutions containing different concentrations of TeO₂. Stoichiometric Sb _x Te _y films were obtained by applying a voltage of −0.15 V versus saturated calomel electrode (SCE) using a solution consisting of 2.4 mM TeO₂, 0.8 mM Sb₂O₃, 33 mM tartaric acid, and 1 M HNO₃. The nearly stoichiometric Sb₂Te₃ films had a rhombohedral structure, R[`3]m R\bar{3}m , with a preferred orientation along the (015) direction. The films had hole concentration of 5.8 × 10¹⁸/cm³ and exhibited mobility of 54.8 cm²/Vs. A more negative potential resulted in higher Sb content in the deposited Sb _x Te _y films. Furthermore, it was observed that the hole concentration and mobility decreased with increasingly negative deposition potential, and eventually showed insulating properties, possibly due to increased defect formation. The absolute value of the Seebeck coefficient of the as-deposited Sb₂Te₃ thin film at room temperature was 118 μV/K.     

3<Emphasis Type="Italic">C</Emphasis>-SiC <Emphasis Type="Italic">p-n</Emphasis> structures grown by sublimation on 6<Emphasis Type="Italic">H</Emphasis>-SiC substrates

Sublimation epitaxy in a vacuum has been employed to grow n-and p-type 3C-SiC layers on 6H-SiC substrates. Diodes have been fabricated on the basis of the p-n structure obtained, and their parameters have been studied by measuring their current-voltage and capacitance-voltage characteristics and by applying the DLTS and electroluminescence methods. It is shown that the characteristics of the diodes studied are close to those of diodes based on bulk 3C-SiC. A conclusion is made that sublimation epitaxy can be used to fabricate 3C-SiC p-n structures on substrates of other silicon carbide polytypes.     

An ultra-low-power CMOS symmetrical OTA for low-frequency <Emphasis Type="Italic">G</Emphasis><Subscript><Emphasis Type="Italic">m</Emphasis></Subscript>-<Emphasis Type="Italic">C</Emphasis> applications

In this paper an ultra-low-power CMOS symmetrical operational transconductance amplifier (OTA) for low-frequency G _m -C applications in weak inversion is presented. Its common mode input range and its linear input range can be made large using DC shifting and bulk-driven differential pair configuration (without using complex approaches). The symmetrical OTA was successfully verified in a standard CMOS 0.35-μm process. The measurements show an open loop gain of 61 dB and a unit gain frequency of 195 Hz with only 800 mV of power supply voltage and just 40 nW of power consumption. The transconductance is 66 nS, which is suitable for low-frequency G _m -C applications.     

Phonon-Assisted Tunneling from <Emphasis Type="Italic">Z</Emphasis><Subscript>1</Subscript>/<Emphasis Type="Italic">Z</Emphasis><Subscript>2</Subscript> in 4H-SiC

n-Type 4H-SiC bulk samples with a net doping concentration of 2.5 × 10¹⁷ cm⁻³ were irradiated at room temperature with 1-MeV electrons. The high doping concentration plus a reverse bias of up to −13 V ensures high electric field in the depletion region. The dependence of the emission rate on the electric field in the depletion region was measured using deep-level transient spectroscopy (DLTS) and double-correlation deep-level transient spectroscopy (DDLTS). The experimental data are adequately described by the phonon-assisted tunneling model proposed by Karpus and Pere.     

Au-TiB<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>-<Emphasis Type="Italic">n</Emphasis>-6<Emphasis Type="Italic">H</Emphasis>-SiC Schottky barrier diodes: Specific features of charge transport in rectifying and nonrectifying contacts

Mechanism of charge transport in a diode of a silicon carbide’s Schottky barrier formed by a quasi-amorphous interstitial phase TiB _x on the surface of n-6H-SiC (0001) single crystals with an uncompensated donor (nitrogen) concentration of ～10¹⁸ cm^?3 and dislocation density of ～(10⁶–10⁸) cm^?2 has been studied. It is demonstrated that, at temperatures T ? 400 K, the charge transport is governed by the tunneling current along dislocations intersecting the space charge region. At T > 400 K, the mechanism of charge transport changes to a thermionic mechanism with a barrier height of ～0.64 eV and ideality factor close to 1.3.     

A DLTS study of 4<Emphasis Type="Italic">H</Emphasis>-SiC-based <Emphasis Type="Italic">p</Emphasis>-<Emphasis Type="Italic">n</Emphasis> junctions fabricated by boron implantation

Deep-level transient spectroscopy (DLTS) has been used to study p-n junctions fabricated by implantation of boron into epitaxial 4H-SiC films with n-type conductivity and the donor concentration (8–9) × 10¹⁴ cm⁻³. A DLTS signal anomalous in sign is observed; this signal is related to recharging of deep compensating boron-involved centers in the n-type region near the metallurgical boundary of the p-n junction.     

Dual-Frequency Behavior of Stacked High <Emphasis Type="Italic">T</Emphasis><Subscript><Emphasis Type="Italic">c</Emphasis></Subscript> Superconducting Microstrip Patches

The dual-frequency behavior of stacked high T _c superconducting rectangular microstrip patches fabricated on a two-layered substrate is investigated using a full-wave spectral analysis in conjunction with the complex resistive boundary condition. Using a matrix representation of each layer, the dyadic Green’s functions of the problem are efficiently determined in the vector Fourier transform domain. The stationary phase method is used for computing the radiation electric field of the antenna. The proposed approach is validated by comparison of the computed results with previously published data. Variations of the lower and upper resonant frequencies, bandwidth and quality factor with the operating temperature are given. Results showing the effects of the bottom patch thickness as well as the top patch thickness on the dual-frequency behavior of the stacked configuration are also presented and discussed. Finally, for a better comprehension of the dual-frequency operation, a comparison between the characteristics of the lower and upper resonances is given.     

High-temperature nuclear-detector arrays based on 4 <Emphasis Type="Italic">H</Emphasis>-SiC ion-implantation-doped <Emphasis Type="Italic">p</Emphasis><Superscript>+</Superscript>-<Emphasis Type="Italic">n</Emphasis> junctions

Results obtained in a study of spectrometric characteristics of arrays of four detectors based on 4H-SiC ion-implantation-doped p ⁺-n junctions in the temperature range 25–140 °C are reported for the first time. The junctions were fabricated by ion implantation of aluminum into epitaxial 4H-SiC layers of thickness ≤45 μm, grown by chemical vapor deposition with uncompensated donor concentration N _d ? N _a = (4–6) × 10¹⁴ cm^?3. The structural features of the ion-implantation-doped p ⁺-layers were studied by secondary-ion mass spectrometry, transmission electron microscopy, and Rutherford backscattering spectroscopy in the channeling mode. Parameters of the diode arrays were determined by testing in air with natural-decay alpha particles with an energy of 3.76 MeV. The previously obtained data for similar single detectors were experimentally confirmed: the basic characteristics of the detector arrays, the charge collection efficiency and energy resolution, are improved as the working temperature increases.     

<Emphasis Type="Italic">p</Emphasis><Superscript>+</Superscript>-Si-<Emphasis Type="Italic">n</Emphasis>-CdF<Subscript>2</Subscript> heterojunctions

Boron diffusion and the vapor-phase deposition of silicon layers are used to prepare ultrashallow p⁺-n junctions and p⁺-Si-n-CdF₂ heterostructures on an n-CdF₂ crystal surface. Forward portions of the I–V characteristics of the p⁺-n junctions and p⁺-Si-n-CdF₂ heterojunctions reveal the CdF₂ band gap (7.8 eV), as well as allow the identification of the valence-band structure of cadmium fluoride crystals. Under conditions in which forward bias is applied to the p⁺-Si-n-CdF₂ heterojunctions, electroluminescence spectra are measured for the first time in the visible spectral region.     

Mechanisms of charge transport in anisotype <Emphasis Type="Italic">n</Emphasis>-TiO<Subscript>2</Subscript>/<Emphasis Type="Italic">p</Emphasis>-CdTe heterojunctions

Surface-barrier anisotype n-TiO₂/p-CdTe heterojunctions are fabricated by depositing thin titanium-dioxide films on a freshly cleaved surface of single-crystalline cadmium-telluride wafers by reactive magnetron sputtering. It is established that the electric current through the heterojunctions under investigation is formed by generation-recombination processes in the space-charge region via a deep energy level and tunneling through the potential barrier. The depth and nature of the impurity centers involved in the charge transport are determined.     

Current flow mechanism in ohmic contact to <Emphasis Type="Italic">n</Emphasis>-4<Emphasis Type="Italic">H</Emphasis>-SiC

Current flow in an In-n-4H-SiC ohmic contact (n ≈ 3 × 10¹⁷ cm⁻³) has been studied by analyzing the temperature dependence of the per-unit-area contact resistance. It was found that the thermionic emission across an ∼0.1-eV barrier is the main current flow mechanism and the effective Richardson constant is ∼2 × 10⁻² A cm⁻² K⁻¹.     

Modulation SQUID electronics working with high-<Emphasis Type="Italic">T</Emphasis><Subscript><Emphasis Type="Italic">c</Emphasis></Subscript> SQUIDs in open space

SQUID electronics optimized for operation in unshielded space with dc high-T _c superconducting quantum interference devices (HTS SQUIDs) are developed, manufactured, and studied. The dynamic characteristics of the SQUID electronics are studied with two magnetic-field sensors based on the HTS SQUIDs: a conventional SQUID sensor with a resolution of 100 fT/Hz^1/2 and a supersensitive SQUID sensor with a resolution of 15 fT/Hz^1/2 at frequencies exceeding 10 Hz and a resolution of 30 fT/Hz^1/2 at a frequency of 1 Hz. Stable operation of the magnetometric channel is demonstrated with both SQUID sensors under urban conditions. On the basis of a complex programmable logic device (CPLD), an ac bias can be realized in the SQUID and the modulation signal can be compensated in the feedback, bias-current, and desired-signal circuits. Such a compensation system is the most appropriate and versatile means of providing stable operation of the magnetometric channel in the presence of the SQUID ac bias, regardless of the type of high-temperature sensor and the configuration of the input contacts in the measurement probe.     

High-efficiency LEDs based on <Emphasis Type="Italic">n</Emphasis>-GaSb/<Emphasis Type="Italic">p</Emphasis>-GaSb/<Emphasis Type="Italic">n</Emphasis>-GaInAsSb/<Emphasis Type="Italic">P</Emphasis>-AlGaAsSb type-II thyristor heterostructures

A new type of light-emitting diodes (LEDs), a high-efficiency device based on an n-GaSb/p-GaSb/n-GaInAsSb/P-AlGaAsSb thyristor heterostructure, with the maximum emission intensity at wavelength λ = 1.95 μm, has been suggested and its electrical and luminescent characteristics have been studied. It is shown that the effective radiative recombination in the thyristor structure in the n-type GaInAsSb active region is provided by double-sided injection of holes from the neighboring p-type regions. The maximum internal quantum efficiency of 77% was achieved in the structure under study in the pulsed mode. The average optical power was as high as 2.5 mW, and the peak power in the pulsed mode was 71 mW, which exceeded by a factor of 2.9 the power obtained with a standard n-GaSb/n-GaInAsSb/P-AlGaAsSb LED operating in the same spectral range. The approach suggested will make it possible to improve LED parameters in the entire mid-IR spectral range (2–5 μm).     

Low-temperature (77 K) impurity breakdown in <Emphasis Type="Italic">p</Emphasis>-type 4<Emphasis Type="Italic">H</Emphasis>-SiC

The impact ionization of acceptors in aluminum-doped 4H-SiC epitaxial films (Al concentration 2 × 10¹⁵ cm^?3) at a temperature of 77 K is studied. It is found that the impact-ionization coefficient exponentially depends on the reverse electric field: α _p = α*_pexp(?F*/F). The largest ionization coefficient is α* _p = 7.1 × 10⁶ cm^?3 s^?1, and the threshold field is F* = 2.9 × 10⁴ V/cm.     

Structural and Luminescent Properties of SiO<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>N<Subscript><Emphasis Type="Italic">y</Emphasis></Subscript>(Si) Nanocomposite Films

With a view to creating Si LEDs, the structural and luminescent properties of SiO _x N _y films containing Si nanocrystals in the SiO _x N _y matrix are studied experimentally. It is found that the film structure (nanocrystal size and concentration, the presence of an amorphous phase, etc.) and the spectrum and intensity of photoluminescence (PL) and electroluminescence (EL) are strongly dependent on the Si stoichiometric excess δ and annealing conditions. At δ≈ 10%, unannealed films are amorphous and contain Si clusters of size < 2 nm, as deduced from the TEM and microdiffraction data obtained. Annealing at 800–1000°C for 10–60 min produces Si crystals 3–5 nm in size with a concentration of ≈10¹⁸ cm^?3. The annealed films exhibit room-temperature PL and EL over the wavelength range 400–850 nm with intensity peaks located at 50–60 and 60–70 nm, respectively. The PL and EL spectra are found to be qualitatively similar. This suggests that both the PL and the EL should be associated with the formation of luminescent centers at nanocrystal–matrix interfaces and in boundary regions. However, the two phenomena should differ in the mechanism by which the centers are excited. With the EL, excitation should occur by impact processes due to carrier heating in high electric fields. It is found that as δ increases, so does the proportion of large amorphous Si clusters with a high density of dangling bonds. This enhances nonradiative recombination and suppresses luminescence.     

Electrical and gas sensing properties of <Emphasis Type="Italic">por</Emphasis>-Si/SnO<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript> nanocomposite layers

The electrical characteristics and chemical reactant sensitivity of layers of heterogeneous nanocomposites based on porous silicon and nonstoichiometric tin oxide por-Si/SnO _x , fabricated by the magnetron sputtering of tin with subsequent oxidation, are studied. It is shown that, in the nanocomposite layers, a system of distributed heterojunctions (Si/SnO _x nanocrystals) forms, which determine the electrical characteristics of such structures. The sensitivity of test sensor structures based on por-Si/SnO _x nanocomposites to NO₂ is determined. A mechanism for the effect of the adsorption of NO₂ molecules on the current-voltage characteristics of the por-Si(p)/SnO _x (n) heterojunctions is suggested.     

Ab initio calculations of phonon spectra of (GaP)<Subscript><Emphasis Type="Italic">n</Emphasis></Subscript>(AlP)<Subscript><Emphasis Type="Italic">m</Emphasis></Subscript> superlattices

Using the method of linear response, vibrational spectra and densities of states of GaP and AlP crystals and monolayer GaP/AlP superlattices are calculated. Phonon modes of (GaP) _n (AlP) _m superlattices with various numbers of monolayers are calculated for the center of the Brillouin zone. The obtained results are compared with the Raman scattering data and the effect of nonideality of the interface on phonon frequencies is discussed.     

Subnanosecond 4<Emphasis Type="Italic">H</Emphasis>-SiC diode current breakers

Mesa epitaxial 4H-SiC-based p ⁺-p-n ₀-n ⁺ diodes have been fabricated and their reverse recovery characteristics have been measured in modes typical of fast semiconductor current breakers, drift step recovery diodes, and SOS diodes. It has been found that, after the short (～10 ns) pulsed injection of nonequilibrium carriers by a forward current with a density of 200–400 A cm^?2 and the subsequent application of a reverse voltage pulse (with a rise time of 2 ns), diodes can break a reverse current with a density of 5–40 kA cm^?2 in a time of about (or less than) 0.3 ns. A possible mechanism for ultrafast current breaking is discussed.