改进清晰度彩色显像管中平板荫罩的设计

为了提高清晰度 ,提出了改进彩色显像管平板荫罩的设计方法 ,对原有 2 5英寸彩色显像管的平板荫罩重新进行了计算。根据计算结果制作了新的平板荫罩 ,经装管测试 ,其分辨率从原来的 50 0多线提高到 70 0线 ,观察不到莫尔效应 ,图像品位良好。     

超平多媒体彩管用平板荫罩的设计方法

提出了一种超平多媒体彩管用平板荫罩的设计计算方法,既提高了管子的分辩率,同时不用制作新的荫罩成形模具,并且新管子的制作可以在普通彩色显像管的流水线上完成。通过装管试验,分辩率从原来的６００余线提高到近８００线,整机显示质量良好。     

改进清晰度彩色显像管中平板荫罩的设计

为了提高清晰度,提出了改进彩色显像管平板荫罩的设计方法,对原有２５英寸彩色显像管的平板荫罩重新地计算。根据计算结果制作了新的平板荫罩,经装管测试,其分辨率从原来的５００多线提高到７００线,观察不到其莫尔效应,图像品位良好。     

阻尼线在纯平CRT荫罩中作用的实验研究

在阴极射线管中荫罩的振动降低了色纯度 ,因此在纯平阴极射线管的荫罩中加阻尼线来减小荫罩的振动。在本文中 ,为了明确阻尼线的作用 ,用非接触测量方法进行测试 ,给出了不同阻尼线的情况下荫罩振动的幅度测量结果。为提高阴极射线管的图像质量提供了一个有力的分析工具。     

阻尼线在纯平CRT荫罩中作用的实验研究

在阴极射线管中荫罩的振动降低了色纯度，因此在纯平阴极射线管的荫罩中加阻尼线来减小荫罩的振动。在本文中，为了明确阻尼线的作用，用非接触测量方法进行测试，给出了不同阻尼线的情况下荫罩振动的幅度测量结果。为提高阴极射线管的图像质量提供了一个有力的分析工具。     

彩管荫罩热膨胀及其抑制方法研究

研究荫罩热拱起现象产生的机理,分析整体拱起、长时拱起、短时拱起以及局部拱起对色偏差的影响程度。采用荫罩内表面喷涂一定厚度的低熔点玻璃抑制荫罩的热拱起;指出由于不同的厚度会产生不同的残留张应力,必须采用合适的厚度使荫罩在不同环境下将Q值保持在正常范围内。文中提出了一套通过试验方法获得最佳厚度参数的工艺流程,并对25英寸彩色显象管荫罩进行试验研究,发现当荫罩金属板与涂层材料厚度比大于0．1时,抑制效果提高趋于缓慢。     

多孔薄膜荫罩热变形的有限元仿真设计

荫罩的热变形使电子束产生着屏偏移 ,进而导致了色纯变坏。本文采用大型软件ANSYS对 1 5英寸荫罩进行了热变形的有限元仿真 ,从而得到了电子束的着屏偏移。建立了包括阴极射线管 (CRT)里所有部件的完整的有限元模型。荫罩被建为无孔连续薄壳的模型 ,对它的表面导热系数和表面弹性模量作了等效的计算。考虑了弹簧片的预应力以及弹簧片和销钉的连接。这样可使我们的分析模型更接近真实情况。本文给出了 50 0、1 0 0 0、1 0 0 0 0s时的热变形和电子束着屏偏移。分析表明 :电子束着屏偏移的最大值发生在 50 0s左右。利用这种分析方法及研究结果可指导新型荫罩的设计和研制。     

彩显平面荫罩振动的实验研究

纯平阴极射线管中荫罩的振动会影响图像的色纯度 ,本文提出了一种新的测试荫罩振动方法 ,介绍了彩显荫罩振动测试系统。该系统采用光电转换和计算机信息处理技术 ,对荫罩的振动进行了非接触式实时测量 ,给出了荫罩振动的幅频特性测量结果 ,为提高CRT的图像质量 ,降低荫罩振动对图像的影响提供了一个有力的工具     

彩显平面荫罩振动的实验研究

纯平阴极射线管中荫罩的振动会影响图像的色纯度，本文提出了一种新的测试荫罩振动方法，介绍了彩显荫罩振动测试系统。该系统采用光电转换和计算机信息处理技术，对荫罩的振动进行了非接触式实时测量，给出了荫罩振动的幅频特性测量结果，为提高CRT的图像质量，降低荫罩振动对图像的影响提供了一个有力的工具。     

新颖的不对称荫罩式等离子体显示板的研究

本文讨论了一种新颖的不对称荫罩式等离子体显示板。在结构上,它与现有的荫罩式等离子体显示板（SMPDP）不同的是,荫罩上每个单元的后开口对称中心偏离其前开口对称中心。通过对4″实验板的制作、测试和分析,研究了不对称SMPDP的放电性能。并对不对称SMPDP的扫描电极进行优化,使其与现有的对称SMPDP相比,在放电强度、静态工作范围、寻址放电的速度、发光效率等方面有了较大提高。     

基于归一化RGB色彩模型的阴影处理方法

通过分析影像上阴影区域的属性,提出了一种基于阴影属性的高分辨率遥感影像阴影检测和去除算法。利用阴影区域蓝色分量偏高的特性,对归一化B分量和原始B分量进行阈值检测,并结合小区域去除和数学形态学处理,得到较精确的阴影区域;然后,分别在RGB空间和HSI空间对各个独立的阴影区域与其邻近的非阴影区域进行匹配,完成阴影去除操作;最后沿着阴影边界做一次中值滤波以减轻边缘效应。仿真结果验证了算法的有效性,并且显示在HSI空间获得了更好的补偿效果。     

Sensitivity of coded mask telescopes

Simple formulas are often used to estimate the sensitivity of coded mask x-ray or gamma-ray telescopes, but these are strictly applicable only if a number of basic assumptions are met. Complications arise, for example, if a grid structure is used to support the mask elements, if the detector spatial resolution is not good enough to completely resolve all the detail in the shadow of the mask, or if any of a number of other simplifying conditions are not fulfilled. We derive more general expressions for the Poisson-noise-limited sensitivity of astronomical telescopes using the coded mask technique, noting explicitly in what circumstances they are applicable. The emphasis is on using nomenclature and techniques that result in simple and revealing results. Where no convenient expression is available a procedure is given that allows the calculation of the sensitivity. We consider certain aspects of the optimization of the design of a coded mask telescope and show that when the detector spatial resolution and the mask to detector separation are fixed, the best source location accuracy is obtained when the mask elements are equal in size to the detector pixels.     

Pulsed laser deposition of YBCO thin films in a shadow mask configuration

We present an investigation on a modified pulsed laser deposition method (PLD) that employs plume geometric shadowing (Nd:YAG laser, 1.06 μm, 2.5 J/cm², YBCO target). A plane shadow mask and a newly proposed helical mask were used. The aim of our approach was to improve the film surface morphology. The study investigated the influence of the main geometrical parameters of the two configurations on the plume propagation and film morphology. Using the shadow plane mask method we deposited extremely smooth YBCO films with a roughness of 4–5 nm (RMS), which is an improvement of two orders of magnitude compared with standard PLD. The helical shadow mask allows deposition of films of the same roughness as in the plane mask case, but brings further improvement by eliminating the film thickness non-uniformity, typical for plane mask configuration. In both cases the deposition rate decreased up to 7–12 times compared with standard PLD.     

Shadow Detection and Removal From Photo-Realistic Synthetic Urban Image Using Deep Learning

Recently, virtual reality technology that can interact with various data is used for urban design and analysis. Reality, one of the most important elements in virtual reality technology, means visual expression so that a person can experience threedimensional space like reality. To obtain this realism, real-world data are used in the various fields. For example, in order to increase the realism of 3D modeled building textures real aerial images are utilized in 3D modelling. However, the aerial image captured during the day can be shadowed by the sun and it can cause the distortion or deterioration of image. To resolve this problem, researches on detecting and removing shadows have been conducted, but the detecting and removing shadow is still considered as a challenging problem. In this paper, we propose a novel method for detecting and removing shadows using deep learning. For this work, we first a build a new dataset of photo-realistic synthetic urban data based on the virtual environment using 3D spatial information provided by VWORLD. For detecting and removing shadow from the dataset, firstly, the 1-channel shadow mask image is inferred from the 3-channel shadow image through the CNN. Then, to generate a shadow-free image, a 3-channel shadow image and a detected 1-channel shadow mask into the GAN is executed. From the experiments, we can prove that the proposed method outperforms the existing methods in detecting and removing shadow.     

新型荫罩式PDP单元结构的优化设计

本文讨论了新型荫罩式PDP单元结构的变化对放电的影响 ,从放电强度和放电效率的角度对单元结构进行优化设计。研究了取代介质障壁的荫罩的高度、宽度变化和荫罩内边界形状的变化对放电的影响 ,给出了不同结构下平均粒子浓度随时间的变化曲线和放电效率的变化趋势。模拟结果表明荫罩边界为内斜式的结构在响应时间、峰值浓度和放电效率上都具有较大优势 ,是一种较好的单元结构     

Spatial and temporal evolution of plasma discharge in a 42-inch shadow mask plasma display panel

A new type of AC PDP with shadow mask (shadow mask PDP, SMPDP) has been presented for its effective structures with lower cost. In order to improve the image quality and reduce the cost further, a single-scan driving scheme is applied to 42-inch WXGA SMPDP. High-speed address is successfully obtained by offsetting the scan voltage from the final voltage of the ramp-down waveform. A new erase pulse is used before the sustain pulses to eliminate the misfiring. The two distinguished characters of the new driving waveform can realize 1.2 μs to 0.9 μs high speed addressing in 42-inch WXGA SMPDP prototypes. New MgO materials and the optimized process conditions provide 50 ns statistical delay time. A high speed image intensified charge coupled device (ICCD) camera and a photosensor amplifier are used to investigate the discharge of the ON and OFF cells in the reset, address, erase-before-sustain and sustain periods. The experimental results demonstrate that the stable high-speed addressing and valid sustaining can be obtained in the new driving waveforms in 42-inch WXGA SMPDP. The experimental results can help us to understand the discharge and help us to optimize the driving scheme of SMPDP.     

Optical performance of extreme ultraviolet lithography mask with an indium tin oxide absorber

In this study, we propose a new extreme ultraviolet (EUV) binary mask with an indium tin oxide (ITO) absorber. The optical constant of ITO film at 13.5 nm wavelength in the EUV regime was determined by means of X-ray reflectivity measurements and the chemical composition was determined using Rutherford backscattering spectrometry. The reflectance of a binary mask with an ITO absorber layer at various thicknesses was also measured to investigate the optical performance in the EUV regime. It was found that the extinction coefficient of ITO film is higher than that of a typical absorber layer, TaN, and that the reflectance of the ITO absorber in the binary mask at a wavelength of 13.5 nm is reduced to 0.62% at a thickness of 45 nm. Therefore, it is expected that the ITO film can be employed as a thin absorber of a binary mask to reduce the geometrical shadow effect in extreme ultraviolet lithography.     

Three-dimensional shape reconstruction by phase-shifting shadow moire

Shadow moiré shows contour lines of an object with respect to a master grating plane; they result from the interference between the lines of the master grid and their shadow projected by a point source of light. In best cases the sensitivity of this procedure is a few tenths of a millimeter. The introduction of a phase-shifting procedure gives a better resolution, but the problem in practice is how can we shift the phase of the interferogram into shadow moiré? A complete study is presented showing the influence of different parameters. It is shown that only one possibility is available. Some applications to threedimensional shape reconstructions are presented with an accuracy of 0.01 mm, showing that the potentiality of shadow moiré is greatly improved.     

彩色显像管静会聚漂移问题的研究

在采用传统精密一字形电子枪的彩色显像管中，若聚焦电压发生变化，静会聚将产生漂移。如果聚焦电压变化700V，那么21英寸彩管将有大约0．3mm的静会聚漂移。由于静会聚漂移值超过荧光粉节距的50％，所以，静会聚漂移对彩色显像管的分辨率影响很大（若彩色显示管有更精细的荧光粉节距和更高的分辨率，对其影响更大），在高质量彩管设计中必须克服静会聚漂移。对此讨论了产生静会聚漂移的原因，提出了一种克服静会聚漂移的电子枪，并通过数值计算获得了较理想的结果。如果聚焦电压变化700V，采用新枪的21英寸彩管的静会聚漂移仅0．006mm，与原枪相比，屏上电子束斑变化很小。     

采用双向偏置曝光的成像干涉光刻技术

成像干涉光刻技术(IIL)具有干涉光刻技术(IL)的高分辨力和光学光刻技术(OL)产生任意形状集成电路特征图形的能力。在IIL中,按掩模图形的不同空间频率成份分区曝光,并使其在抗蚀剂基片上非相干叠加,得到高分辨抗蚀剂图形。本文在研究一般三次曝光IIL原理基础上,提出采用沿X轴正、负方向以及沿Y轴正、负方向偏置的双向偏置照明,分别曝光 X方向、-X方向、 Y方向、-Y方向的高空间频率分量并与垂直于掩模方向的低空间频率分量曝光相结合的五次曝光IIL。理论和计算模拟表明,该方法可以提高图形对比度和分辨力,并减小因调焦误差引起的图形横向位移误差,有利于改善抗蚀剂图形质量。