共查询到19条相似文献,搜索用时 656 毫秒
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设计、制作并测试了1.55 m 光波长的微带线行波电极电光调制器。如果聚合物材料的电光系数33=30 pm/V,中心电极L 为20 mm,设计的调制器性能参数半波电压为6.70 V。用自主合成的发色团分子组成二阶非线性光学聚合物材料做为芯层制作的聚合物调制器,对调制器的各项性能参数进行了直流、低频和微波性能的测试,采用不同极化方法,在1.55 m 波长上测得低频半波电压分别为10.5 V(电晕极化)和4.9 V(接触极化),折算得芯层材料的电光系数分别为21 pm/V 和45 pm/V。测得消光比为24 dB。用矢量网络分析仪测试电极系统的微波性能,S 参数反映了此电极系统具有低的微波传输损耗和反射损耗。 相似文献
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聚合物共面波导行波电极电光调制器 总被引:2,自引:1,他引:1
用聚合物材料BPAN-NT设计并初步成功制作了共面波导(CPW)行波电极电光调制器。用反应离子刻蚀(RIE)的方法制作脊波导,通过电晕极化使芯层有电光效应,利用电镀方法制作厚行波电极。对调制器的各项特性参数进行了测试,测得调制器的微波损耗系数0α=0.9 dB/cm.(GHz)1/2、在1.317μm波长上Vπ=250 V,由此算得芯层材料的电光系数3γ3=3.7 pm/V,同时测得消光比为13.49dB、插入损耗为18.6 dB,在8 GHz的微波频率上观察到了调制光信号,理论计算3 dB光调制带宽为43.77 GHz。 相似文献
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针对幅值强、频带宽、持续时间短等脉冲电场测量需求,本文提出一种基于电光聚合物缺陷光子晶体的全介质脉冲电场传感器.在周期性分布的光子晶体中引入电光聚合物作为缺陷层,外界电场的作用下,电光聚合物的折射率发生改变,这将会引起光子晶体的谐振频率偏移,监测谐振频率的变化即可实现被测电场测量.本文通过理论分析与数值模拟光入射角度不同且入射波的偏振状态不同时,光子晶体的结构参数对光子晶体传输光谱特征的影响规律,验证了该传感器的电场敏感特性.仿真结果表明,通过合理设计传感器的结构参数,结合波长-光强解调系统,基于电光聚合物缺陷光子晶体的电场传感器的电场分辨力可以达到约30V/m,最高可测量场强则可达到兆V/m量级. 相似文献
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基于SU-8材料的无源-有源集成式电光开关设计与制备 总被引:1,自引:1,他引:0
对基于SU-8紫外负性光刻胶的无源-有源集成 式电光开关进行了系统的研究。 首先用物理掺杂的方法制备出价格 低廉、性能良好的主客掺杂型电光材料DR1/SU-8,反射法测量其电光系数约为11. 5pm/V@1310nm。为减小器件的插入损耗, 设计了有源芯层为DR1/SU-8、无源芯层为SU-8的倒脊形混合集成式波导结构。制作完 CPW行波电极后,对器件进行接 触极化。实验测得开关的上升时间和下降时间分别为5.6μs和5.2μs,插入损耗为13.8dB,与只用DR1/SU-8作为波导芯层的 器件相比,插入损耗减小了约2.8dB。实验结果表明,这种无源-有 源集成式电光波导有效地减小了器件的插入损耗,为制备 低损耗的电光器件和单片多功能集成器件奠定了一定的基础。 相似文献
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该文基于MEMS电场敏感芯片,研制出了一种新型的地面大气电场传感器,解决了现有场磨式电场仪易磨损、功耗大、故障率高等问题。敏感芯片采用SOIMUMPS加工工艺制备,其芯片面积仅为5.5 mm5.5 mm。该文提出了传感器敏感芯片的弱信号检测方法,设计出了满足环境适应性的传感器整体结构方案,并建立了传感器的灵敏度分析模型。对电场传感器进行测试,测量范围为-50 kV/m~50 kV/m,总不确定度为0.67%,分辨力达到10 V/m,功耗仅为0.62 W。外场试验结果表明,MEMS地面大气电场传感器在晴天和雷暴天的电场探测结果,与Campbell公司场磨式电场仪探测结果都有较好的一致性,说明该传感器能满足预测雷暴要求,实现雷电监测和预警功能。 相似文献
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InGaAs-AlAsSb double and triple quantum well (QW) structures were designed in an effort to shorten the wavelength to less than 2 μm for possible application to intersubband unipolar lasers. Wavelengths corresponding to the intersubband separation, the minimum and maximum operating electric field, optical-phonon-limited nonradiative scattering time, and escape time from the QW were simulated. It was found that suitable nonradiative transition times can be obtained by properly designing the coupling layer thickness for both kinds of QW's. The minimum wavelength is 1.5 μm and an operating electric field is above 130 kV/cm for wavelengths <2 μm in the double QW. On the other hand, the minimum operating electric field is less than 10 kV/cm and the minimum wavelength is about 1.7 μm for the triple QW. The triple QW is suitable for an electric-field induced wavelength tunable laser 相似文献
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Sanghadasa M. Ashley P.R. Guenthner A.J. Lindsay G.A. Bramson M.D. 《Lightwave Technology, Journal of》2009,27(21):4667-4677
TE-pass and TM-pass polarizing waveguides were fabricated by adjusting the birefringence properties of multi-layer stacks. The desired values of indices of refraction and birefringence were obtained by the proper selection and customization of core and cladding materials. The technique developed was used in the fabrication of waveguides in various design configurations such as etched ribs, backfilled trenches and photobleached channels. Both passive and active (electro-optic) core materials were successfully used in demonstrating the polarization extinction ratios as high as 61 dB. To our knowledge, this is the highest extinction ratio reported with polarizing polymer waveguides. In the case of electro-optic polymer waveguides, the designs were modified to enhance the electric field strength in the core without compromising the polarizing extinction ratios of the waveguides. 相似文献
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铌酸锂晶体光学电场传感器为全介质结构,具有宽带宽、对被测电场干扰小的优点,但其灵敏度较低。因此,分析了晶体几何尺寸对传感器灵敏度的影响机理,得出通过增加沿外加电场方向的晶体尺寸同时减少晶体横截面上沿外加电场垂直方向的晶体尺寸来提高传感器的灵敏度。使用COMSOL仿真分析了铌酸锂晶体不同厚度、宽度、长度对晶体内部电场强度的影响,得出晶体厚度从15 mm减小到3 mm和宽度从3 mm增加到22 mm时,晶体内部电场强度分别提高约5.1倍和12.3倍;晶体长度从15 mm变化到55 mm时,晶体内部的电场强度变化仅约为5%。设计并研制出晶体尺寸分别为3 mm×3 mm×42.2 mm (x×y×z),3 mm×6 mm×42.2 mm (x×y×z),6 mm×6 mm×42.2 mm(x×y×z)的三只铌酸锂晶体电场传感器,并搭建工频电场测试平台,测试得出三只电场传感器的灵敏度分别为0.243 mV/(kV·m-1)、0.758 mV/(kV·m-1)、0.150 mV/(kV·m-1)。当晶体厚度和长度一定且晶体宽度从3 ... 相似文献
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The electrooptic (EO) modulation of 1.32 μm laser light is measured in Mach-Zehnder channel waveguides fabricated with diazo-dye-substituted polymers with coplanar-waveguide (CPW) or microstrip (MS) electrodes. Two types of channel waveguide fabricated by photobleaching or O2 reactive-ion etching (RIE) exhibit the same EO coefficients r33 under the same poling condition. However, the photobleached waveguides show a lower half-wave voltage than the RIE-fabricated ones because of both the optical power concentration in a core layer and the existence of an EO active cladding layer. These tendencies are well explained by considering “effective” overlap integrals between the optical and electric fields, including the distribution of EO-active regions. The maximum r33 value (26 pm/V) of the poled diazo-dye-substituted polymer is obtained with an RIE-fabricated MS-modulator 相似文献
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《Proceedings of the IEEE. Institute of Electrical and Electronics Engineers》2009,97(12):2053-2059