CHD/sub 2/OH optically pumped by a waveguide CO/sub 2/ laser: new far-infrared laser lines from the CD/sub 2/ wagging vibrational mode

For the first time, a wide tunability waveguide CO/sub 2/ laser was used to pump the CHD/sub 2/OH molecule for the generation of new FIR laser lines with a large offset. Optoacoustic signals associated with the infrared absorbing transitions of the CD/sub 2/ wagging vibrational mode served as a guide for finding new laser lines. All lines were characterized in wavelength, relative polarization, intensity, optimum pressure of operation, and precise offset measurements.     

Characterization of new FIR laser lines from CHD/sub 2/OH

In this work, we report new optically pumped far-infrared (FIR) laser lines from CHD/sub 2/OH. A waveguide CO/sub 2/ laser of wide tunability (290 MHz) was used as pump source, and a Fabry-Pe/spl acute/rot open cavity was used as a FIR laser resonator. Optoacoustic absorption spectra were used as a guide to search for new FIR laser lines. We could observe 15 new laser lines in the range from 116.4 to 401.4 /spl mu/m. The lines were characterized according to wavelength, relative polarization, relative intensity, and optimum working pressure. The transferred Lamb-dip technique was used to measure the frequency absorption transition both for the new and previously reported laser lines.     

Optical pumping of CHD/sub 2/OH and CH/sub 2/DOH methanol isotopomers by means of a new pulsed CO/sub 2/ laser: characterization of new far-infrared laser emissions

We have reinvestigated CHD/sub 2/OH and CH/sub 2/DOH methanol isotopomers as sources of far-infrared laser radiation using the optical pumping technique. A new waveguide pulsed CO/sub 2/ laser was used, that delivers high peak powers also in the 10-HP CO/sub 2/ band and has allowed us to observe 19 new far-infrared emissions from CHD/sub 2/OH and 8 new far-infrared emissions from CH/sub 2/DOH. Each of them is characterized in wavelength, pump offset from the center of the exciting CO/sub 2/ line, relative polarization, optimum operating pressure and intensity.     

Re-investigation of optically pumped hydrazine far-infrared laser around 11 /spl mu/m from the 10HP and 10P bands of a pulsed CO/sub 2/ laser: new lines and assignments

A high-peak-power (several hundreds of watts) pulsed CO/sub 2/ laser, recently developed in our laboratory, has been used for exciting optically pumped far-infrared laser transitions of N/sub 2/H/sub 4/. A systematic search for N/sub 2/H/sub 4/ absorption coincidences with 10P and 10HP CO/sub 2/ laser emissions has led to the observation of 27 new far-infrared laser lines, excited by 18 different absorption transitions. All of these new lines have been characterized in wavelength, offset, relative polarization, optimum operation pressure and intensity. Using the LaseRitz program, ten of these lines were assigned, corresponding to five laser systems. For other two laser systems possible J and K quantum numbers of the energy levels involved in the laser transitions were given.     

Preparation and growth of thin film Pb/sub 2/Sr/sub 2/Ca/sub 0.5/Y/sub 0.5/Cu/sub 3/O/sub 8+ delta / superconductors by laser ablation

For the first time, the preparation of thin films of superconducting Pb/sub 2/Sr/sub 2/Y/sub 0.5/Ca/sub 0.5/Cu/sub 3/O/sub 8+ delta / material using standard bulk target preparation conditions and the laser ablation technique is reported. In common with much of the bulk characteristics, it is found that the width of the superconducting transition is large, extending from T/sub c,onset/ between 70-83 K and T/sub c,zero/ between 16-20 K.<>     

New far-infrared laser lines from CH/sub 3/OD methanol deuterated isotope

We report on a study of the CH/sub 3/OD molecule in a search for new far-infrared (FIR) laser lines. For optical pumping of large offset vibrational absorption transitions, a continuous-wave waveguide CO/sub 2/ laser with 300 MHz tunability around each line was used for the first time. As a consequence, 17 new far-infrared laser emissions were observed. For these lines, we also present data on wavelength, intensity, offset, relative polarization, and optimum operation pressure.     

MIM capacitors using atomic-layer-deposited high-/spl kappa/ (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ dielectrics

Metal-insulator-metal (MIM) capacitors with (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ high-/spl kappa/ dielectric films were investigated for the first time. The results show that both the capacitance density and voltage/temperature coefficients of capacitance (VCC/TCC) values decrease with increasing Al/sub 2/O/sub 3/ mole fraction. It was demonstrated that the (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ MIM capacitor with an Al/sub 2/O/sub 3/ mole fraction of 0.14 is optimized. It provides a high capacitance density (3.5 fF//spl mu/m/sup 2/) and low VCC values (/spl sim/140 ppm/V/sup 2/) at the same time. In addition, small frequency dependence, low loss tangent, and low leakage current are obtained. Also, no electrical degradation was observed for (HfO/sub 2/)/sub 1-x/(Al/sub 2/O/sub 3/)/sub x/ MIM capacitors after N/sub 2/ annealing at 400/spl deg/C. These results show that the (HfO/sub 2/)/sub 0.86/(Al/sub 2/O/sub 3/)/sub 0.14/ MIM capacitor is very suitable for capacitor applications within the thermal budget of the back end of line process.     

Surface and sensing properties of PE-ALD SnO/sub 2/ thin film

SnO/sub 2/ thin films have been deposited by plasma enhanced-atomic layer deposition (PE-ALD) on Si (100) substrate. The dominant oxygen species for post-annealing films were O/sub 2//sup -/, O/sup 2-/ and O/sup -/ for 100, 200 and 400 cycles, respectively. The film for 200 cycles has a good CO sensing property at the highest concentration of O/sup 2-/ species.     

Metal-insulator-metal RF bypass capacitor using niobium oxide (Nb/sub 2/O/sub 5/) with HfO/sub 2//Al/sub 2/O/sub 3/ barriers

A high capacitance density (C/sub density/) metal-insulator-metal (MIM) capacitor with niobium pentoxide (Nb/sub 2/O/sub 5/) whose k value is higher than 40, is developed for integrated RF bypass or decoupling capacitor application. Nb/sub 2/O/sub 5/ MIM with HfO/sub 2//Al/sub 2/O/sub 3/ barriers delivers a high C/sub density/ of >17 fF//spl mu/m/sup 2/ with excellent RF properties, while maintaining comparable leakage current and reliability properties with other high-k dielectrics. The capacitance from the dielectric is shown to be stable up to 20 GHz, and resonant frequency of 4.2 GHz and Q of 50 (at 1 GHz) is demonstrated when the capacitor is integrated using Cu-BEOL process.     

An optical investigation of electronic excitations in the high temperature superconductors YBa/sub 2/Cu/sub 3/O/sub 7- delta / and Bi/sub 2/Sr/sub 2/CaCu/sub 2/O/sub 8+ Delta /

The results of Raman scattering from superconducting gap excitations in the high T/sub c/ compounds YBa/sub 2/Cu/sub 3/O/sub 7- delta / and Bi/sub 2/Sr/sub 2/CaCu/sub 2/O/sub 8+ Delta / are compared. In the normal state, both materials exhibit strong electronic interband scattering which manifests itself as a broad background continuum having both A/sub 1g/ and B/sub 1g/ symmetry components. At low temperatures a redistribution of this electronic scattering occurs, indicative of the formation of a superconducting gap in these compounds. The two symmetries exhibit distinct redistribution, however, denoting strong anisotropy. At temperatures well below T/sub c/, both compounds exhibit residual low-energy scattering, a feature suggestive of the coexistence of normal electrons and superconducting quasi-particles.<>     

La/sub 2/O/sub 3//Si/sub 0.3/Ge/sub 0.7/ p-MOSFETs with high hole mobility and good device characteristics

We have studied high-k La/sub 2/O/sub 3/ p-MOSFETs on Si/sub 0.3/Ge/sub 0.7/ substrate. Nearly identical gate oxide current, capacitance density, and time-dependent dielectric breakdown (TDDB) are obtained for La/sub 2/O/sub 3//Si and La/sub 2/O/sub 3//Si/sub 0.3/Ge/sub 0.7/ devices, indicating excellent Si/sub 0.3/Ge/sub 0.7/ quality without any side effects. The measured hole mobility in nitrided La/sub 2/O/sub 3//Si p-MOSFETs is 31 cm/sup 2//V-s and comparable with published data in nitrided HfO/sub 2//Si p-MOSFETs. In sharp contrast, a higher mobility of 55 cm/sup 2//V-s is measured in La/sub 2/O/sub 3//Si/sub 0.3/Ge/sub 0.7/ p-MOSFET, an improvement by 1.8 times compared with La/sub 2/O/sub 3//Si control devices. The high mobility in Si/sub 0.3/Ge/sub 0.7/ p-MOSFETs gives another step for integrating high-k gate dielectrics into the VLSI process.     

Spectroscopic and stimulated emission characteristics of Nd/sup 3+/ in transparent Y/sub 2/O/sub 3/ ceramics

Nd:Y/sub 2/O/sub 3/ ceramic materials have been synthesized using the vacuum sintering technique with the raw materials prepared by the nanocrystalline methods. The TEM measurements reveal the excellent optical quality of the ceramic with low pore volume and narrow grain boundary. The radiative spectral properties of Nd:Y/sub 2/O/sub 3/ ceramic have been evaluated by fitting the Judd-Ofelt model with the absorption and emission data. Individual Stark levels for /sup 2s+1/L/sub J/ manifolds are obtained from the absorption and fluorescence spectra and are analyzed to identify the stimulated emission channels possible in the Nd:Y/sub 2/O/sub 3/ ceramic. Laser performance studies reveal two stimulated emission channels at 1074.6- and 1078.6-nm wavelengths with stimulated emission cross sections of 7.63/spl times/10/sup -20/ and 6.35/spl times/10/sup -20/ cm/sup 2/. With 1.5 at % Nd:Y/sub 2/O/sub 3/ ceramic acting as a laser medium, we obtained a slope efficiency of 32% with 160-mW output power and pump threshold of 200 mW at 1078.6 nm.     

Modeling of tunneling currents through HfO/sub 2/ and (HfO/sub 2/)/sub x/(Al/sub 2/O/sub 3/)/sub 1-x/ gate stacks

We present a physical modeling of tunneling currents through ultrathin high-/spl kappa/ gate stacks, which includes an ultrathin interface layer, both electron and hole quantization in the substrate and gate electrode, and energy band offsets between high-/spl kappa/ dielectrics and Si determined from high-resolution XPS. Excellent agreements between simulated and experimentally measured tunneling currents have been obtained for chemical vapor deposited and physical vapor deposited HfO/sub 2/ with and without NH/sub 3/-based interface layers, and ALD Al/sub 2/O/sub 3/ gate stacks with different EOT and bias polarities. This model is applied to more thermally stable (HfO/sub 2/)/sub x/(Al/sub 2/O/sub 3/)/sub 1-x/ gate stacks in order to project their scalability for future CMOS applications.     

A novel high-/spl kappa/ SONOS memory using TaN/Al/sub 2/O/sub 3//Ta/sub 2/O/sub 5//HfO/sub 2//Si structure for fast speed and long retention operation

A novel high-/spl kappa/ silicon-oxide-nitride-oxide-silicon (SONOS)-type memory using TaN/Al/sub 2/O/sub 3//Ta/sub 2/O/sub 5//HfO/sub 2//Si (MATHS) structure is reported for the first time. Such MATHS devices can keep the advantages of our previously reported TaN/HfO/sub 2//Ta/sub 2/O/sub 5//HfO/sub 2//Si device structure to obtain a better tradeoff between long retention and fast programming as compared to traditional SONOS devices. While at the same time by replacing hafnium oxide (HfO/sub 2/) with aluminum oxide (Al/sub 2/O/sub 3/) for the top blocking layer, better blocking efficiency can be achieved due to Al/sub 2/O/sub 3/'s much larger barrier height, resulting in greatly improved memory window and faster programming. The fabricated devices exhibit a fast program and erase speed, excellent ten-year retention and superior endurance up to 10/sup 5/ stress cycles at a tunnel oxide of only 9.5 /spl Aring/ equivalent oxide thickness.     

High-performance Pt/SrBi/sub 2/Ta/sub 2/O/sub 9//HfO/sub 2//Si structure for nondestructive readout memory

Metal-ferroelectric-insulator-semiconductor (MFIS) capacitors with 390-nm-thick SrBi/sub 2/Ta/sub 2/O/sub 9/ (SBT) ferroelectric film and 8-nm-thick hafnium oxide (HfO/sub 2/) layer on silicon substrate have been fabricated and characterized. It is demonstrated for the first time that the MFIS stack exhibits a large memory window of around 1.08 V at an operation voltage of 3.5 V. Moreover, the MFIS memory structure suffers only 18% degradation in the memory window after 10/sup 9/ switching cycles. The excellent performance is attributed to the formation of well-crystallized SBT perovskite thin film on top of the HfO/sub 2/ buffer layer, as evidenced by the distinctive sharp peaks in X-ray diffraction (XRD) spectra. In addition to its relatively high /spl kappa/ value, HfO/sub 2/ also serves as a good seed layer for SBT crystallization, making the proposed Pt/SrBi/sub 2/Ta/sub 2/O/sub 9//HfO/sub 2//Si structure ideally suitable for low-voltage and high-performance ferroelectric memories.     

Characteristics of HfO/sub 2/ pMOSFET prepared by B/sub 2/H/sub 6/ plasma doping and KrF excimer laser annealing

The electrical characteristics of HfO/sub 2/ pMOSFETs prepared by B/sub 2/H/sub 6/ plasma doping and excimer laser annealing were investigated. Various metal gate electrodes were evaluated to protect the high-/spl kappa/ oxide during laser irradiation. Although the aluminum gate electrode showed superior reflectivity to the laser, the equivalent oxide thickness was increased due to the interaction between aluminum and HfO/sub 2/, which resulted in reduced capacitance. In contrast, the Al-TaN stacked gate showed good reflectivity up to laser energy of 500 mJ/cm/sup 2/ and improved capacitance was obtained compared with the Al gate. For the first time, the electrical characteristics of a HfO/sub 2/ pMOSFET with an Al-TaN gate fabricated by plasma doping and excimer laser annealing were demonstrated. It was also demonstrated that plasma doping and excimer laser annealing combined with a metal gate could be applied for high-/spl kappa/ oxide MOSFET fabrication.     

GaN MOS device using SiO/sub 2/-Ga/sub 2/O/sub 3/ insulator grown by photoelectrochemical oxidation method

We report on a SiO/sub 2/-Ga/sub 2/O/sub 3/ gate insulator stack directly grown on n-type GaN by the photoelectrochemical oxidation method. The resultant MOS devices are fabricated using standard photolithography and liftoff techniques. The effect of annealing temperature on the SiO/sub 2/-Ga/sub 2/O/sub 3//n-type GaN MOS devices is investigated. The properties of high breakdown field, low gate leakage current, and low interface state density are investigated for the MOS devices.     

A novel strained Si/sub 0.7/Ge/sub 0.3/ surface-channel pMOSFET with an ALD TiN/Al/sub 2/O/sub 3//HfAlO/sub x//Al/sub 2/O/sub 3/ gate stack

Proof-of-concept pMOSFETs with a strained-Si/sub 0.7/Ge/sub 0.3/ surface-channel deposited by selective epitaxy and a TiN/Al/sub 2/O/sub 3//HfAlO/sub x//Al/sub 2/O/sub 3/ gate stack grown by atomic layer chemical vapor deposition (ALD) techniques were fabricated. The Si/sub 0.7/Ge/sub 0.3/ pMOSFETs exhibited more than 30% higher current drive and peak transconductance than reference Si pMOSFETs with the same gate stack. The effective mobility for the Si reference coincided with the universal hole mobility curve for Si. The presence of a relatively low density of interface states, determined as 3.3 /spl times/ 10/sup 11/ cm/sup -2/ eV/sup -1/, yielded a subthreshold slope of 75 mV/dec. for the Si reference. For the Si/sub 0.7/Ge/sub 0.3/ pMOSFETs, these values were 1.6 /spl times/ 10/sup 12/ cm/sup -2/ eV/sup -1/ and 110 mV/dec., respectively.     

Blue energy upconversion emission in thulium-doped-SiO/sub 2/-P/sub 2/O/sub 5/ channel waveguides excited at 1.064 /spl mu/m

Blue energy upconversion emission in Tm/sup 3+/-doped SiO/sub 2/-P/sub 2/O/sub 5/ channel waveguides off-resonance pumped by infrared radiation is reported. The waveguide samples were excited by a single continuous-wave laser source at 1.064 /spl mu/m. Two distinct blue emission signals around 450 and 480 nm, in addition to red at 660 nm and near-infrared at 800-nm less intense emissions were observed. The upconversion excitation mechanism was assigned to stepwise multiphoton absorption processes followed by nonradiative multiphonon-assisted relaxation processes. Infrared-to-blue conversion efficiencies with respect to the absorbed pump power of /spl sim/6.0/spl times/10/sup -7/ for this off-resonance pumping scheme was measured. The dependence of the infrared-to-blue upconversion mechanism upon the excitation power and thulium content is also examined.     

Interfacial polarisation in Al-Y/sub 2/O/sub 3/-SiO/sub 2/-Si capacitor

The variation by a factor of 2 in the observed permittivity of yttrium oxide film is explained in terms of interfacial polarization based on the Y/sub 2/O/sub 3//SiO/sub 2/ double-layer model. Provided the dielectric relaxation time constants of the two layers are grossly dissimilar, the model can also explain the frequency independence of the composite capacitor.<>