共查询到20条相似文献,搜索用时 15 毫秒
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Lei Fu Hanqin Gao Mei Yan Shouzhu Li Xinyu Li Zhifei Dai Shaoqin Liu 《Small (Weinheim an der Bergstrasse, Germany)》2015,11(24):2938-2945
Polyoxometalates (POMs) have shown encouraging antitumor activity. However, their cytotoxicity in normal cells and unspecific interactions with biomolecules are two major obstacles that impede the practical applications of POMs in clinical cancer treatment. Derivatization of POMs with more biocompatible organic ligands is expected to cause a synergetic effect and achieve improved bioactivity and biospecificity. Herein, the synthesis of an amphiphilic organic–inorganic hybrid is reported by grafting a long‐chain organoalkoxysilane lipid onto a POM. The amphiphilic POM hybrid could spontaneously assemble into the vesicles and exhibits enhanced antitumor activity for human colorectal cancer cell lines (HT29) compared to that of parent POMs. This detailed study reveals that the amphiphilic nature of POM hybrids enables the as‐formed vesicles to easily bind to the cell membranes and then be uptaken by the cells, thus leading to a substantial increase in antitumor activity. Such prominent antitumor action is mostly accomplished via cell apoptosis, which ultimately results in cell death. Our finding demonstrates that novel POM hybrids‐based drugs with increased bioactivity could be obtained by decorating POMs with selective organic ligands. 相似文献
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Hybrid Perovskite Light‐Emitting Diodes Based on Perovskite Nanocrystals with Organic–Inorganic Mixed Cations
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Xiaoli Zhang He Liu Weigao Wang Jinbao Zhang Bing Xu Ke Lin Karen Yuanjin Zheng Sheng Liu Shuming Chen Kai Wang Xiao Wei Sun 《Advanced materials (Deerfield Beach, Fla.)》2017,29(30)
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Naureen Akhtar Alexey O. Polyakov Aisha Aqeel Pavlo Gordiichuk Graeme R. Blake Jacob Baas Heinz Amenitsch Andreas Herrmann Petra Rudolf Thomas T. M. Palstra 《Small (Weinheim an der Bergstrasse, Germany)》2014,10(23):4912-4919
Perovskite‐based organic–inorganic hybrids hold great potential as active layers in electronics or optoelectronics or as components of biosensors. However, many of these applications require thin films grown with good control over structure and thickness—a major challenge that needs to be addressed. The work presented here is an effort towards this goal and concerns the layer‐by‐layer deposition at ambient conditions of ferromagnetic organic–inorganic hybrids consisting of alternating CuCl4‐octahedra and organic layers. The Langmuir‐Blodgett technique used to assemble these structures provides intrinsic control over the molecular organization and film thickness down to the molecular level. Magnetic characterization reveals that the coercive field for these thin films is larger than that for solution‐grown layered bulk crystals. The strategy presented here suggests a promising cost effective route to facilitate the excellently controlled growth of sophisticated materials on a wide variety of substrates that have properties relevant for the high density storage media and spintronic devices. 相似文献
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Novel Hybrid Organic‐Inorganic Spin‐on Resist for Electron‐ or Photon‐Based Nanolithography with Outstanding Resistance to Dry Etching
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Erika Zanchetta Gioia Della Giustina Gianluca Grenci Alessandro Pozzato Massimo Tormen Giovanna Brusatin 《Advanced materials (Deerfield Beach, Fla.)》2014,26(5):674-674
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K. E. Gonsalves L. Merhari H. Wu Y. Hu 《Advanced materials (Deerfield Beach, Fla.)》2001,13(10):703-714
Ultra large‐scale integration (ULSI) should lead to 100 nm production circuits by 2006 as predicted by the Semiconductor Industry Association (SIA). For sub‐100 nm lithography it is desirable to synthesize higher performance and higher contrast resists. An optimum combination of high contrast necessary for sub‐100 nm resolution, high sensitivity for high throughput can be achieved by carefully engineering organic–inorganic nanocomposites, acting as optimum resists for a given lithographic process. This review outlines emerging approaches towards the achievement of these goals. A section also highlights selected state‐of‐the‐art organic resists. Nanocomposite resists for sub‐100 nm features have included the incorporation of fullerene C60 in a commercial resist ZEP520 (see Figure). Alternatively, nanoscale silica particles were incorporated in the polymer backbone as covalently bonded pendant clusters. The dispersion of 8–10 nm silica particles in a chemically amplified resist has also been reported. In all these approaches, a higher softening temperature (Tg) and increased rigidity, due to increased density of the film resulted. Higher etch resistance as well as increased mechanical properties and also enhanced resist performance for nanometer pattern fabrication have been obtained in these nanocomposites. Alternative approaches to conventional lithography, based on self‐assembled nanostructures, incorporating inorganic features as well as nanoimprinting via silicon polymer precursors, are also discussed. 相似文献