双层辉光等离子制备TiN渗镀层的耐蚀性能

利用双层辉光等离子表面合金化技术,在Q235钢表面直接合成TiN渗镀层,该渗镀层由TiN颗粒均匀分布的扩散层及表面TiN沉积层组成。将TiN渗镀层与Q235钢基体和1Cr18Ni9Ti不锈钢在4%的NaOH溶液、l mol/L H2SO4溶液和3.5%NaCl溶液中分别进行电化学腐蚀对比试验。结果表明:在4%的NaOH溶液中,TiN渗镀层的耐蚀性能比Q235钢提高了26.8倍,与1Cr18Ni9Ti不锈钢相当;在l mol/L H2 S04溶液中,TiN渗镀层耐腐蚀性能比Q235钢提高了10.5倍,比1Crl8Ni9Ti不锈钢提高了1.65倍;在3.5%的NaCl溶液中,TiN渗镀层耐腐蚀性能比Q235钢提高了10.3倍,但比1Crl8Ni9Ti不锈钢稍差。TiN渗镀层耐酸碱性溶液腐蚀性能要比耐盐溶液腐蚀性能强。     

双层辉光离子多元共渗中的源极变化

观察了双层辉光渗金属过程中源极溅射后的成分以及形貌 ,利用X射线衍射对源极溅射表面进行了相分析 ,并且用Thermo cale软件进行了相计算。结果表明 :在辉光溅射条件下源极的成分和形貌发生了较大的变化 ,溅射后源极表面主要析出相为 μ相和Laves相 ,用Thermo cale软件热力学相计算结果与X射线衍射结果基本吻合     

利用双层辉光放电形成Mo-N硬质镀层

用双层辉光放电在钛合金Ti6Al4V表面形成了Mo-N硬质镀层。用X射线衍射仪和纳米压入仪分别对镀层的相结构、硬度和弹性模量进行了研究，并用涂层压入仪对镀层与基体间的结合强度进行了测定。结果表明：Ti6Al4V表面形成了均匀的Mo—N硬质镀层，镀层厚约10μm，由面心立方结构Mo2N化合物构成；Mo2N硬质镀层的硬度和弹性模量分别为13．80GPa和261．65GPa;镀层与基体间具有较好的结合强度。     

双辉等离子表面冶金Ti-Cu阻燃合金的制备工艺

为解决整体阻燃钛合金存在的比强度低、加工性差及价格昂贵等问题,利用双层辉光离子渗金属技术,在Ti-6Al-4V的表面渗入Cu元素,在其表面形成Ti-Cu阻燃合金层.研究了温度、保温时间、源极电压、工件电压、极间距等工艺参数对渗层显微组织、成分及厚度的影响,得出了适合的工艺参数.870℃渗铜3.5 h,渗层厚度可达到200μm以上.阻燃合金层的成分呈梯度分布,显微组织为基体组织加弥散分布的Ti2Cu金属间化合物.初步阻燃实验证明,渗Cu合金层起到了预期的阻燃效果.     

双层辉光等离子多元共渗源极成分设计

以工业纯铁表面形成Fe-11W-7Mo-23Co型合金为例,阐述了双层辉光离子多元共渗的源极成分设计思路.通过对工业纯铁表面进行W、Mo、Co多元共渗,探讨了合金元素溅射产额的不同对源极溅射成分的影响.结果表明,双层辉光离子多元共渗时,源极成分设计可以忽略合金元素溅射产额的影响.     

Microstructure and corrosion resistance of Fe-Al intermetallic coating on 45 steel synthesized by double glow plasma surface alloying technology

A binary Fe-Al alloyed layer was synthesized on 45 steel by means of double glow plasma surface alloying technique. The corrosion-resisting layer prepared is composed of a sedimentary layer and a diffusion layer, with a total thickness of about 180 μm. The aluminum content of the alloyed layer shows gradual change from surface to the inside of substrate. The ideal profile is beneficial to the metallurgical bonding of the surface alloying layer with substrate materials. The microstructure of both layers consists of the Fe-Al intermetallic compound, which is FeAl with B2 structure in the sedimentary layer and Fe3Al with incompletely ordered DO3 structure in the diffusion layer. The protective film exhibits high micro-hardness. In comparison with the substrate of 45 steel, the corrosion resistance of the aluminized sample is much higher in 2.0% Na2S and 0.05 mol/L Na2SO4 + 0.5 mol/L NaCl mixed solutions.     

双辉离子渗钨钼层渗碳组织的电镜分析

采用双志了子渗金属技术,首先在低碳钢表面渗入合金元素钨、钼,然后作固溶处理,使金属间化合物溶于基体中,接着渗碳,使合金层内形成在碍区弥散、均匀、细小的合金碳化物。经淬及回火后的合金层具有高速钢组织及性能。对渗透了金属层渗碳后的组织进行了电子分析     

TC4合金双辉等离子渗Cr高温氧化行为

研究了双层辉光等离子渗Cr对TC4合金650、750、850℃恒温氧化性能的影响。结果表明：渗Cr后,表面梯度合金层显著提高了TC4合金的高温氧化性能,Ti-Cr互扩散层可有效阻止氧向基体扩散。氧化过程中,Ti、Cr向外扩散形成TiO2/Cr2O3氧化膜,其形态与氧化温度有关。850℃氧化100 h后,渗Cr试样表面形成致密Cr2O3膜,恒温氧化性能优于NiCrAlY热障涂层。     

Preparation of Ni-Cu-Mo-Cr film deposited on AZ31magnesium alloy by double glow sputtering with Cu interlayer

For improving the corrosion resistance of AZ31magnesium alloy, a double glow sputtering deposited Ni-Cu-Mo-Cr film with brush plating Cu interlayer is applied to deposit a metal amorphous/nanocrystal film on AZ31magnesium alloy. Using a brush plated Cu interlayer, the content of noble elements, such as Ni, Cr, and Mo, is higher than that of a Ni-based film without Cu interlayer. The microstructure of the Ni-Cu-Mo-Cr alloy film with the brush plated Cu interlayer confirms that the film is classified into two regions, i.e., an amorphous layer on the outmost surface and an underlying nanocrystalline layer with a grain size of less than 5 nm. The Ni-based alloy amorphous film formed on AZ31magnesium alloy was investigated using an electrochemical polarization measurement. Compared with the AZ31 magnesium alloy, the sputter-deposited Ni-based alloy film and the sputter-depostion Ni-based alloy film with a brush plated Cu interlayer formed on AZ31 magnesium alloy exhibit obvious passivation phenomena.     

Ti2AlNb基O相合金双辉等离子渗碳层摩擦磨损性能

利用双层辉光等离子表面合金化技术在Ti2AlNb基O相合金表面进行渗碳处理,采用SEM、EDS、XRD、硬度仪及摩擦磨损试验机对其组织成分、元素分布、相组成、硬度及耐磨性能进行研究.结果表明,在Ti2AlNb基O相合金表面形成了约30μm的渗碳层,渗碳层表面硬度为1053 HV0.1,且硬度随渗层厚度梯度递减.渗碳层和基体平均摩擦因数分别为0.4和0.75,渗碳层比磨损率为基体比磨损率的1/17.双层辉光等离子渗碳技术明显提高了Ti2A1Nb基O相合金的耐磨性.     

直流辉光氧等离子体刻蚀金刚石膜的研究

在直流辉光放电等离子体装置上，利用不同直流功充和工作气压下产生的氧等离子体对CVD金刚石厚膜的表面进行了刻蚀。利用扫描电子显微镜、Raman光谱和电子微量分析天平，分别对刻蚀前后金刚石膜表面的形貌、结构和刻蚀速率进行了观测。结果发现：在工作气压一定时，刻蚀速率随着直流功率的增加而增大，并且刻蚀由各向同性转变为各向异性。但过高的直流功率会导致金刚石膜表面沉积出无定形碳。基于实验研究结果和相关基本理论建立了刻蚀模型，并根据模型得到了影响刻蚀的主要原因在于等离子体中的电子温度和金刚石膜的悬浮鞘电位。     

Oxidation of double glow plasma discharge coatings of iridium on molybdenum for liquid fuelled rocket motor casings

Abstract

Dense and uniform coatings of iridium (Ir), 5–7 μm in thickness, were deposited onto molybdenum (Mo) substrates by double glow plasma discharge in the temperature range of 800–850°C at 35 Pa. During deposition, the Mo substrate was biased at a voltage of ?300 V while the 99·9% Ir target was at a bias voltage of ?800 V. After deposition, the Ir coating was ablated using an oxyacetylene torch with a flame temperature of ～2000°C to determine the high temperature stability of the coated substrate. The morphology and microstructure of the Ir coating were observed using scanning electron microscopy while the composition and structure were measured using X-ray diffraction and energy dispersive spectroscopy. The thickness of the as deposited Ir coating was uniform and the interface between the coating and the substrate exhibited excellent adhesion with no evidence of delamination and cracks. After exposure to the flame, the surface of the as ablated coating presented imperfections including pores, bulges and cracks; however, the Ir coating retained sufficient adhesion to limit the weight loss of the Ir coated Mo substrate to 10 mg cm^?2 s^?1.     

Effect of Er incorporation on structural and element distribution of Zr alloyed layers prepared using double glow plasma surface alloying

A special target structure for erbium (Er)-zirconium (Zr) co-deposition is proposed, based on the hollow cathode effect. To study the effect of rare earth on the alloyed layer, Zr-Er alloyed layers with different quantity proportion of Er and Zr elements were prepared on Ti-based substrate using double glow plasma surface alloying. The microstructure and composition of the alloyed layers were analysed by XRD and SEM-EDS. Results showed that Er element grows perpendicular to the Ti-based substrate in the alloyed layers, and it was found that the growth structure had an opposite effect on the diffusion of the Zr element. Interestingly, as the concentration of Er element increases, the addition of Er element to a certain extent affects the crystallisation of the Zr-Er alloyed layer and reduces the diffusivity of the Zr element.     

Surface alloying of Cu with Ti by double glow discharge process

The surface of pure copper alloyed with Ti using double glow discharge process was investigated. The morphology, structure and forming mechanism of the Cu-Ti alloying layer were analyzed. The microhardness and wear resistance of the Cu-Ti alloying layer were measured, and compared with those of pure copper. The results in-dicate that the surface of copper activated by Ar and Ti ions bombardment is favorable to absorption and diffusion of Ti element. In current experimental temperature, as the Ti content increases, the liquid phase occurs between the deposited layer and diffused layer, which makes the Ti ions and atoms easy to dissolve and the thickness of Cu-Ti al-loying layer increase rapidly. After cooling, the structure of the alloying layer is composed of CuTi, Cu4Ti and Cu(Ti) solid solution. The solid solution strengthening and precipitation strengthening effects of Ti result in high surface hardness and wear resistance.     

Reduction of TiO2 with hydrogen cold plasma in DC pulsed glow discharge

The reduction of TiO2 to Ti2O3 with hydrogen cold plasma generated by a DC pulsed glow discharge was realized under 2 500 Pa at 1 233 K. Only a little of Ti10O19 and Ti9O17 was detected for using molecular hydrogen.Enhancement effects of hydrogen cold plasma on the reduction were discussed in terms of thermodynamic coupling,kinetics and plasma sheath. The exited hydrogen species are considered more effective reducing agents. It is instructive to reduce refractory oxides with plasma hydrogen at the reduced temperature.     

CuCo2Be表面等离子喷涂NiAl涂层的物相组成及其形成机理

选用等离子喷涂技术在CuCo2Be合金表面制备了NiAl涂层.用DTA,XRD,SEM,EDS等分析手段探讨了NiAl涂层的形成机理及其组成涂层的化合物、物相的形成特点及规律.结果表明,由DTA分析可知选用的NiAl复合粉末在在600~671.81℃范围内出现两个放热峰,推测在此温度范围内发生两次放热反应;SEM,EDS分析表明,涂层组织呈现明显的层状,镍铝化合物为角状,XRD分析发现涂层物相在成形的不同阶段和时间内其生成的化合物类型、数量都呈现不同的变化.利用XRD,EDS分析界面处各相的生成及元素的分布、扩散情况,研究表明在界处存在一定的元素扩散,界面除了机械锚合也存在一定的微冶金结合.     

钛合金双层辉光放电离子无氢渗碳制备工艺研究

采用双层辉光离子无氢渗碳的方法对钛合金进行表面强化处理，提高了钛合金的表面强度，改善了其耐磨性；同时避免了氢脆的产生。研究表明钛合金Ti6A14V双辉离子无氢渗碳合理的工艺参数为：温度880℃~980℃；气压28~40Pa：工件与源极之间距离6～14mm；源极电压600V~800V；阴极电压260V~400V；保温时间2～5h。处理后在钛合金表面形成了高硬改性层，耐磨擦性显著提高。     

Fast chemical vapor deposition of microcrystalline silicon by applying magnetic field to hollow electrode enhanced radio frequency glow plasma

Fast chemical vapor deposition of microcrystalline silicon by applying magnetic field to hollow electrode enhanced radio frequency (rf) glow plasma has been investigated. We have already developed a plasma generation technique called hollow electrode enhanced rf glow plasma transportation (HEEPT). In this study, we equipped a HEEPT system with a hollow cylinder shaped permanent magnet around an orifice prepared at the center of the counter electrode. The plasma was characterized by plasma emission spectroscopy. Silicon thin films were deposited on a glass substrate. It was found that increasing the magnetic flux density resulted in increasing plasma emission intensity, film deposition rate, and crystallinity. The maximum deposition rate of 6.9 nm/s was achieved with high crystallinity and photo-sensitivity at a plasma excitation frequency of 13.56 MHz, a substrate temperature of 300 °C and a magnetic flux density of 75 mT. Our results indicate that the magnetic field is effective in promoting fast chemical vapor deposition of microcrystalline silicon thin films with photo-sensitivity using the HEEPT technique. We consider that the effectiveness is due to a decrease of electron temperature caused by drift motion of electrons in the magnetic field inside the orifice.     

Plasma boronizing of Ti6AlV4 using solid precursors by double glow plasma alloying technique

Solid state B-offerings （FeB compound） were used for plasma-assisted boronizing on Ti6Al4V alloy by double glow discharge plasma alloying technique （DGPSA）. During all experiment processing there was no harmful and toxic. The thickness and morphology, phase formation, elements concentrations and wear properties of boride layers were examined by means of optical microscopy, Vickers microhardness, X-ray diffraction, glow discharge optical emission spectroscopy and Ball-disk wear tests. The results show that friction coefficient of boride alloying samples versus cortmdum ball is lower than that of Ti6Al4V samples, as well as wear rate. This indicates that plasma-assisted boronizing of Ti6Al4V alloy has a high potential for industrial applications under tribological conditions.