Superconducting MgB2 Thin Film Detector for Neutrons

The superconducting neutron detector using high-quality ¹⁰B-enriched MgB₂ thin films at higher operating temperatures has been proposed, where a resistance change induced by the nuclear reaction of neutron and ¹⁰B in MgB₂ is used to detect a neutron. Cold neutrons from a nuclear research reactor irradiated the MgB₂ detector, and the output voltage was clearly observed through a low-noise amplifier by using a digital oscilloscope. The out-of-equilibrium thermodynamics was investigated by means of the time-dependent Ginzburg-Landau equations by using the Earth Simulator.      

Single-step sputtered Cu2SnSe3 films using the targets composed of Cu2Se and SnSe2

Cu₂SnSe₃ thin films were prepared by single-step D.C. sputtering at 100-400 °C for 3 h using targets composed of Cu₂Se and SnSe₂ in three different ratios of 2/1 (target A), 1.8/1 (target B), and 1.6/1 (target C). The advantages of self-synthesized SnSe₂ instead of commercially available SnSe for depositing Cu₂SnSe₃ thin films were demonstrated. Effects of target composition and substrate temperature on the properties of Cu₂SnSe₃ thin films were investigated. Structure, surface morphology, composition, electrical and optical properties at different process conditions were measured. The 400 °C-sputtered films obtained from target B display with direct band gap of 0.76 eV, electrical resistivity of 0.12 Ω cm, absorption coefficient of 10⁴-10⁵ cm^− 1, carrier concentration of ∼ 1.8 × 10¹⁹ cm^− 3, and electrical mobility of 2.9 cm²/V s.     

Superconducting YBa2Cu3O7-δ thick films on Ba2RETaO6 (RE = Pr5 Nd, Eu, and Dy) substrates

Thick films of YBa₂Cu₃O_7-δ fabricated on polycrystalline Ba₂RETaO₆ (where RE = Pr, Nd. Eu, and Dy) substrates by dip-coating and partial melting techniques are textured and oaxis oriented, showing predominantly (00/) orientation. All the thick films show a superconducting zero resistance transition of 90 K. SEM studies clearly indicate platelike and needlelike grain growth over a wide area of the thick films. The values of the critical current density for these thick films are ∼10⁴ A/cm² at 77 K as determined by the nonresonant R.F. absorption method. Various processing conditions that affect the critical current density of thick films are also discussed.     

Tl2Ba2CaCu2O8 thin films on 2 in. LaAlO3(0 0 1) substrates

High quality Tl₂Ba₂CaCu₂O₈ (Tl-2212) superconducting thin films are prepared on both sides of 2 in. LaAlO₃(0 0 1) substrates by off-axis magnetron sputtering and post-annealing process. XRD measurements show that these films possess pure Tl-2212 phase with C-axis perpendicular to the substrate surface. The thickness unhomogeneity of the whole film on the 2 in. wafer is less than 5%. The superconducting transition temperatures T_cs of the films are around 105 K. At zero applied magnetic field, the critical current densities J_cs of the films on both sides of the wafer were measured to be above 2 × 10⁶ A/cm² at 77 K. The microwave surface resistance R_s of film was as low as 350 μΩ at 10 GHz and 77 K. In order to test the suitability of Tl-2212 thin films for passive microwave devices, 3-pole bandpass filters have been fabricated from double-sided Tl-2212 films on LaAlO₃ substrates.     

Overview about the optical properties and mechanical stress of different dielectric thin films produced by reactive-low-voltage-ion-plating

Thin films of Ta₂O₅, Nb₂O₅, and HfO₂ were deposited by reactive-low-voltage-ion-plating (RLVIP) on unheated glass and silicon substrates. The film thickness was about 200 nm. Optical properties as well as mechanical film stress of these layers were investigated in dependence of various deposition parameters, i.e. arc current and oxygen partial pressure. For an arc current in the range between 40 and 50 A and an oxygen partial pressure of at least 11 · 10^− 4 mbar good results were obtained. The refractive index and film thickness were calculated from spectrophotometric transmission data using the Swanepoel theory. For example at 550 nm wavelength the refractive index for thin RLVIP-Nb₂O₅-films was found to be n₅₅₀ = 2.40. The optical absorption was obtained by photo-thermal deflection spectrometry. For the investigated materials absorption coefficients in the range of k = 5 · 10^− 4 at 515 nm wavelength were measured. The mechanical film stress was determined by measuring the difference in bending of silicon substrates before and after the deposition process. For dense films, i.e. no water vapour sorption on atmosphere, the mechanical film stress was always compressive with values of some hundred MPa. In case of films deposited with higher arc currents (I_arc > 60A) and lower oxygen pressure (< 15 · 10^− 4 mbar) the influence of a post deposition heat treatment at 350 °C for 4 h on air was also investigated. For these films the properties could clearly be improved by such treatment. However, by using lower arc currents and higher oxygen partial pressure during the ion plating process, immediately dense and environmental stable films with good optical as well as mechanical properties could be achieved without post deposition heat treatment. All the results obtained will be presented in graphs and diagrams.     

Electron transport in InGaO3(ZnO)m (m=integer) studied using single-crystalline thin films and transparent MISFETs

We have investigated the characteristics of transparent metal-insulator-semiconductor field-effect transistors (MISFETs) fabricated using InGaO₃(ZnO)_m (m=integer) single-crystalline thin films as n-channel layers and amorphous alumina as gate insulator films. The MISFETs exhibit good characteristics such as insensitivity to visible light illumination, off-current as low as ∼1 nA with a positive threshold voltage of ∼3 V and on/off current ratio of 10⁵. The field-effect mobility increased from ∼1 to ∼10 cm² (V s)⁻¹ as the m-value increased. Room temperature Hall mobility also increased. However, unexpectedly these values were lower than the field-effect mobility. It is explained by existence of shallow localized state in the homologous compounds.     

Studies on polycrystalline Cd0.96Zn0.04Te thin films prepared by vacuum evaporation

Polycrystalline Cd_0.96Zn_0.04Te thin films are deposited onto glass substrates (Corning 7059) kept at room temperature by vacuum evaporation. The films exhibit zinc blende structure with predominant (1 1 1) orientation. The rms roughness of the films evaluated by atomic force microscope is 3.7 nm. The band gap energy of the films measured by optical transmittance measurement is 1.539 eV. The photoluminescence (PL) spectrum of the films shows intense emission due to free and bound exciton recombination and no emission associated with crystal imperfection and PL line shapes give indications of the high quality of the layers. These films have been implanted with properly mass analyzed Boron ions (¹⁰B⁺) and the effect of implantation has been analyzed by X-ray diffraction, Raman scattering and optical transmittance measurements and the results are explained on the basis of the implantation induced surface roughness and lattice disorder.     

Large third-order optical nonlinearity of SrBi2Nb2O9 thin films fabricated by pulsed laser deposition

SrBi₂Nb₂O₉ (SBN) thin films with a single phase of layered perovskite structure have been fabricated on fused quartz substrates at room temperature by pulsed laser deposition. The XRD and AFM analysis indicated that the films had better crystallinity, less rough surface morphology, and larger grain size with increasing oxygen pressure. The nonlinear optical properties of the samples were determined using a single beam Z-scan technique at a laser wavelength of 532 nm with laser duration of 25 ps. The real and imaginary parts of the third-order nonlinear optical susceptibility χ⁽³⁾ of the films were measured to be 3.18 × 10^− 8 esu and 5.94 × 10^− 9 esu, respectively.     

Structural,optical and electrical properties of In4Sn3O12 films prepared by pulsed laser deposition

Highly conducting (σ ∼ 2.6 × 10³ Ω⁻¹ cm⁻¹) In₄Sn₃O₁₂ films have been deposited using pulsed laser deposition (PLD) on glass and quartz substrates held at temperatures between 350 and 550 °C under chamber pressures of between 2.5 and 15 mTorr O₂. The crystallinity and the surface roughness of the films were found to increase with increasing substrate temperature. Electron concentrations of the order of 5 × 10²⁰ cm⁻³ and mobilities as high as 30 cm² V⁻¹ s⁻¹ were determined from Hall effect measurements performed on the films. Fitting of the transmission spectral profiles in the ultra-violet–visible spectrum has allowed the determination of the refractive index and extinction coefficient for the films. A red-shift in the frequency of plasmon resonance is observed with both increasing substrate temperature and oxygen pressure. Effective masses have been derived from the plasma frequencies and have been found to increase with carrier concentration indicating a non-parabolic conduction band in the material In₄Sn₃O₁₂. The optical band-gap has been determined as 3.8 eV from the analysis of the absorption edge in the UV. These results highlight the potential of these films as lower In-content functional transparent conducting materials.     

Growth and applications of superconducting and nonsuperconducting oxide epitaxial films

Growth and characterization of high-temperature-superconducting YBa₂Cu₃O₇ and several metallic-oxide thin films by pulsed laser deposition is described here. An overview of substrates employed for epitaxial growth of perovskite-related oxides is presented. Ag-doped YBa₂Cu₃O₇ films grown on bare sapphire are shown to giveT _c=90 K, critical current >10⁶ A/cm² at 77 K and surface resistance =450μΩ. Application of epitaxial metallic LaNiO₃ thin films as an electrode for ferroelectric oxide and as a normal metal layer barrier in the superconductor-normal metal-superconductor (SNS) Josephson junction is presented. Observation of giant magnetoresistance (GMR) in the metallic La_0·6Pb_0·4MnO₃ thin films up to 50% is highlighted.     

Evidence for Irradiation Triggered Nonuniform Defects Distribution in Multiharmonic Magnetic Susceptibility of Neutron Irradiated YBa<Subscript>2</Subscript>Cu<Subscript>3</Subscript>O<Subscript>7−</Subscript><Subscript><Emphasis Type="Italic">δ</Emphasis></Subscript>

Multiharmonic ac-magnetic susceptibilityx ₁,x ₂,x ₃, of neutron irradiated Li-doped YBa₂Cu₃O_7−x has revealed a nonmonotonic dependence of all harmonics on the neutron fluence. The irradiation has a strongly depressive influence on the intergrain connection suggesting an increase of the effective thickness of the intergranular Josephson junction at a neutron fluence of 0.98 × 10¹⁷ cm⁻². Less damaged are the intragrain properties. A spectacular enhancement of the superconducting intragranular properties reflected in the characteristics of all harmonics was observed at highest fluence φ=9.98 × 10¹⁷ cm⁻². We assume that this effect results from the development of a space inhomogeneous distribution with alternating defectless and defect-rich regions.     

New intelligent multifunctional SiO2/VO2 composite films with enhanced infrared light regulation performance,solar modulation capability,and superhydrophobicity

Abstract

Highly transparent, energy-saving, and superhydrophobic nanostructured SiO₂/VO₂ composite films have been fabricated using a sol–gel method. These composite films are composed of an underlying infrared (IR)-regulating VO₂ layer and a top protective layer that consists of SiO₂ nanoparticles. Experimental results showed that the composite structure could enhance the IR light regulation performance, solar modulation capability, and hydrophobicity of the pristine VO₂ layer. The transmittance of the composite films in visible region (T_lum) was higher than 60%, which was sufficient to meet the requirements of glass lighting. Compared with pristine VO₂ films and tungsten-doped VO₂ film, the near IR control capability of the composite films was enhanced by 13.9% and 22.1%, respectively, whereas their solar modulation capability was enhanced by 10.9% and 22.9%, respectively. The water contact angles of the SiO₂/VO₂ composite films were over 150°, indicating superhydrophobicity. The transparent superhydrophobic surface exhibited a high stability toward illumination as all the films retained their initial superhydrophobicity even after exposure to 365 nm light with an intensity of 160 mW^.cm^?2 for 10 h. In addition, the films possessed anti-oxidation and anti-acid properties. These characteristics are highly advantageous for intelligent windows or solar cell applications, given that they can provide surfaces with anti-fogging, rainproofing, and self-cleaning effects. Our technique offers a simple and low-cost solution to the development of stable and visible light transparent superhydrophobic surfaces for industrial applications.     

Process monitoring during post-annealing of YBa2Cu3O7 thin films containing fluorine

The post-annealing method of producing thin films of YBa₂Cu₃O₇ (YBCO) has taken on a new impetus due to the recent work showing that films of the highest quality can be made by using low partial pressures of oxygen during the annealing cycle. Here it is shown that for films produced by using BaF₂ as a source material, the post-annealing procedure can be closely controlled by monitoring the F that evolves due to the water vapor reaction with BaF₂. The use of an ion-sensitive electrode allowed small F evolution rates (about 1 ng s^–1) to be detected above background, sufficient to measure the F evolution rate from even the smallest samples used. The time interval during which F evolves was found to increase with increasing YBCO film area being annealed.     

Synthesis and characterization of Cu2ZnSnS4 absorber layers by an electrodeposition-annealing route

An electrodeposition-annealing route to films of the promising p-type absorber material Cu₂ZnSnS₄ (CZTS) using layered metal precursors is studied. The dependence of device performance on composition is investigated, and it is shown that a considerable Cu-deficiency is desirable to produce effective material, as measured by photoelectrochemical measurements employing the Eu^3+/2+ redox couple. The differing effects of using elemental sulphur and H₂S as sulphur sources during annealing are also studied, and it is demonstrated that H₂S annealing results in films with improved crystallinity.     

High Critical Current Density YBa2Cu3Ox Tapes Using the RABiTs Approach

Progress in the fabrication of epitaxial, high-J _c, biaxially aligned YBCO thick films on Rolling-assisted biaxially textured substrates (RABiTs) is reported. RABiT substrates comprise a biaxially textured metal substrate with epitaxial oxide buffer layers suitable for growth of superconductors. Oxide buffer layers have been deposited using three techniques: laser ablation, electron-beam evaporation, and sputtering. Epitaxial YBCO films grown using laser ablation on such substrates have critical current densities approaching 3 × 10⁶ A/cm² at 77 K in zero field and have field dependences similar to epitaxial films on single crystal ceramic substrates. Critical current densities in excess of 0.2 MA/cm² have been obtained on stronger, nonmagnetic substrates. In addition, samples with J _e of 12.5 kA/cm² at 77 K have been fabricated. The highest strain tolerence obtained so far is 0.7% in compression and 0.25% in tension. Deposited conductors made using this technique offer a potential route for the fabrication of long lengths of high-J _c wire capable of carrying high currents in high magnetic fields and at elevated temperatures.     

The Influence of Bi Doping on the In Situ Growth of TlBa2Ca2Cu3O9 High-Tc Films

The in situ process—laser ablation in combination with thermal evaporation of Tl₂O—has turned out to be a preparation method for single-phase and epitaxial TlBa₂Ca₂Cu₃O₉ (1223) thin films with T _c values up to 109 K. It was found by several groups that a partial substitution of Tl by Bi simplifies the phase development of the 1223 compound in the usual two-step process. We have investigated the influence of the Bi doping on the in situ growth. X-ray measurements show that the films consisted mainly of the 1223 compound. In 300-nm thin films there was no evidence of a Bi amount in the crystal structure, but thinner films (80 nm) show a small amount of Bi. We concluded that Bi doping supports the phase development of the 1223 compound only in an early stage of the film growth. The Bi-doped films have higher T _c values up to 114 K, higher j _c values up to 6 × 10⁵ A/cm² (77 K, 0 T), and lower surface resistances of 56 m (77 K, 87 GHz) than the undoped films.     

Transparent conducting ZnO thin films deposited by vacuum arc plasma evaporation

A high rate deposition of co-doped ZnO:Ga,F and ZnO-In₂O₃ multicomponent oxide thin films on large area substrates has been attained by a vacuum arc plasma evaporation method using oxide fragments as a low-cost source material. Highly transparent and conductive ZnO:Ga,F and ZnO-In₂O₃ thin films were prepared on low temperature substrates at a deposition rate of approximately 375 nm/min with a cathode plasma power of 10 kW. A resistivity of 4.5×10⁻⁴ Ω cm was obtained in ZnO:Ga,F films deposited at 100 °C using ZnO fragments co-doped with 1 wt.% ZnF₂ and 1 wt.% Ga₂O₃ as the source material. In addition, the stability in acid solution of ZnO films was improved by co-doping. It was found that the Zn/(In+Zn) atomic ratio in the deposited ZnO-In₂O₃ thin films was approximately the same as that in the fragments used. The ZnO-In₂O₃ thin films with a Zn/(In+Zn) atomic ratio of approximately 10-30 at.% deposited on substrates at 100 °C exhibited an amorphous and smooth surface as well as a low resistivity of 3-4×10⁻⁴ Ω cm.     

Crystal Structure and Superconductivity of MgB2 Thin Films Grown on Various Oxide Substrates

The crystal structure and superconductivity of MgB₂ thin films grown on various oxide substrates were investigated by X-ray diffraction and resistance measurement. The films were prepared by a two-step method, in which precursors B films were annealed in Mg vapor at 900C. The X-ray diffraction shows that the MgB₂ films grown on C–AL₂O₃, R–AL₂O₃, and MgO (001) are c-axis oriented while the films grown on SrTiO₃ (001), LaAlO₃ (001), and ZrO₂ (001) are aligned with the (101) direction normal to the substrate planes. All the grown films show superconductivity and their transition temperature varies with the substrates in the range of 34–39 K. We think that the transition temperature variation is probably due to the lattice matching between the film and the substrate, as well as the interdiffusion at the film/substrate interface. The experimental results suggest that if there is no severe interdiffusion at the film/substrate interface in the high temperature annealing process, more substrates could be used for the growth of MgB₂ films using the two-step method.     

Properties of La-substituted Na0.5Bi4.5Ti4O15 ferroelectric thin films

Ferroelectric Na_0.5La_0.5Bi₄Ti₄O₁₅ (NaLaBTi) thin films were prepared by a chemical solution deposition method. The NaLaBTi thin films annealed at 750 °C under oxygen atmosphere were randomly oriented polycrystalline. Electrical properties of the NaLaBTi thin films were compared to Na_0.5Bi_4.5Ti₄O₁₅ thin films and better properties were observed in the NaLaBTi thin films. Remnant polarization (2P_r) and coercive electric field (2E_c) were 43 µC/cm² and 204 kV/cm at an applied electric field of 478 kV/cm, respectively. Leakage current density was 1.95 × 10^− 6 A/cm² at 100 kV/cm. Dielectric constant and dielectric loss were 805 and 0.05 at 1 kHz, respectively. Switchable polarization was suppressed by 15% after 1.44 × 10¹⁰ switching cycles.     

Influences of post-annealing on structural and electrical properties of Bi1.5Zn1.0Nb1.5O7 thin films prepared by pulsed laser deposition

Bi_1.5Zn_1.0Nb_1.5O₇ (BZN) thin films were prepared on Pt/TiO₂/SiO₂/Si(100) substrates at 650 °C under an oxygen pressure of 10 Pa by using pulsed laser deposition process. The crystallinity, microstructure and electrical properties of BZN thin films were investigated to verify the influences of post-annealing thermal process on them. The X-ray diffractometer (XRD) results indicate that all Bi_1.5Zn_1.0Nb_1.5O₇ thin films without post-annealing process or with post-annealing in situ vacuum chamber and in oxygen ambient exhibit a cubic pyrochlore structure. The improved crystallinity of BZN thin films through post-annealing was confirmed by XRD and scanning electron microscope (SEM) analysis. Dielectric constant and loss tangent of the as-deposited BZN thin films are 160 and 0.002 at 10 kHz, respectively. After annealing, dielectric properties of thin films are significantly improved. Dielectric constant and loss tangent of the in situ annealed films are 181 and 0.0005 at 10 kHz, respectively. But the films post-annealed in O₂ oven show the largest dielectric constant of 202 and the lowest loss tangent of 0.0002, which may attribute to the increase in grain size and the elimination of oxygen vacancies. Compared with the as-deposited BZN thin films, the post-annealed films also show the larger dielectric tunability and the lower leakage current density.