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1.
Cr-doped ZnO thin films are prepared on glass substrates by the magnetron sputtering technique. An X-ray diffraction (XRD) is used to analyze the structural properties of the thin films. It indicates that all the thin films have a preferential c-axis orientation. The peak position of the (002) plane shifts to the higher 2θ value, and the peak intensity decreases with the increase of Cr doping. The results of the scanning electron microscopy (SEM) show that the surface morphology becomes loose with the incre...  相似文献   

2.
黄凯  吕建国  张莉  唐震  余江应  李平  刘峰 《半导体学报》2012,33(5):053003-5
采用溶胶-凝胶法在Si(111)制备了一系列Mg掺杂的ZnO薄膜。用X射线衍射仪、原子力显微镜和接触角测试仪测量薄膜的微结构、表面形貌和表面接触角。结果表明:Mg掺杂ZnO薄膜仍为六角纤锌矿型结构,所有薄膜均具有较好的c轴择优取向。随着Mg掺杂含量的增加,薄膜的粗超度从2.14nm增大到9.56nm,薄膜表面接触角由89? 减小到 82?。通过对薄膜交替进行紫外光照和黑暗放置(或热处理),可以实现其表面疏水与超亲水性之间的可逆转化,光诱导可逆转化效率随Mg掺杂含量的增加而增大。  相似文献   

3.
通过直流磁控溅射法在ITO薄膜上沉积的ZnO薄膜可以作为CdTe太阳电池的高阻层。通过XRD,可见-红外可见光谱仪和四探针法分析了制备薄膜的结构,光学和电学性质。通过紫外光电子能谱和X射线光电子能谱深度刻蚀法分析了ITO/ZnO和ZnO/CdS薄膜的界面性质。结果表明:ZnO 作为高阻层有良好的光学和电学性质。ZnO 薄膜降低了ITO和CdS之间的势垒。 制备出来电池有ZnO(没有ZnO)的能量转换效率和量子效率是12.77% (8.9%) 和 >90% (79%)。 进一步,通过AMPS-1D模拟分析了ZnO薄膜厚度对于CdTe太阳电池的影响。  相似文献   

4.
Un-doped and lead (Pb) doped ZnO thin films were deposited by sol–gel spin coating technique. Structural, morphological and optical properties of the films were investigated by means of Pb doping, in the range of 1–4% (with 1 at% step). X-ray diffraction results indicated that all films have hexagonal wurtzite crystal structure. (002) Reflection peak has been seen as the most intense peak and the highest texture coefficient value. Grain size values of the films varied from 19.68 nm to 13.37 nm with the increasing Pb incorporation. The top-view and cross sectional scanning electron microscope images demonstrated that the films were made up of wrinkle network structures and the films' thicknesses changed in the range of 400–276 nm. The direct optical band gap was calculated in 3 different functions and a significant harmony was observed among them. Additionally, all results indicated that the direct optical band gap and the Urbach values of the films increase with the increasing Pb doping content. Besides, the effects of Pb content on the photoluminescence properties of ZnO films were evaluated and it was observed that the decrease in the photoluminescence intensity was based on the Pb content. Moreover, the correlation between the optical and structural properties suggested that the optical band gap of Pb doped ZnO films were influenced by the lattice parameters a and c.  相似文献   

5.
目前CdS材料的制备方法有很多种,但是最常用的是化学水浴法。本文研究了浓度、反应溶液pH值、温度、沉积时间对CdS缓冲层薄膜的影响,对CIGS薄膜太阳能电池缓冲层CdS薄膜的制备方法进行了论述。  相似文献   

6.
Indium-doped zinc oxide (ZnO) nanoparticle thin films were deposited on cleaned glass substrates by spray pyrolysis technique using zinc acetate dihydrate [Zn(CH3COO)2 2H2O] as a host precursor and indium chloride (InCl3) as a dopant precursor. X-ray diffraction results show that all films are polycrystalline zinc oxide having hexagonal wurtzite structure. Upon In doping, the films exhibit reduced crystallinity as compared with the undoped film. The optical studies reveal that the samples have an optical band gap in the range 3.23–3.27 eV. Unlike the undoped film, the In-doped films have been found to have the normal dispersion for the wavelength range 450–550 nm. Among all the films investigated, the 1 at% In-doped film shows the maximum response 96.8% to 100 ppm of acetone in air at the operating temperature of 300 °C. Even at a lower concentration of 25 ppm, the response to acetone in this film has been found to be more than 90% at 300 °C, which is attributed to the smaller crystallite size of the film, leading to sufficient adsorption of the atmospheric oxygen on the film surface at the operating temperature of 300 °C. Furthermore, In-doped films show the faster response and recovery at higher operating temperatures. A possible reaction mechanism of acetone sensing has been explained.  相似文献   

7.
Tandem organic solar cells, in which two single p+in+-homojunctions are connected by a heavily-doped n+p+-ohmic interlayer, were formed in co-deposited films consisting of fullerene and α-sexithiophene simply by doping with molybdenum oxide and cesium carbonate. The single and tandem cells showed open-circuit voltages of 0.85 V and 1.69 V and conversion efficiencies of 1.6% and 2.4%, respectively.  相似文献   

8.
The present study focused on ZnO thin films fabricated by sol-gel process and spin coated onto Si (1 0 0) and quartz substrates. ZnO thin films have a hexagonal würtzite structure with a grain diameter about 50 nm. Optical properties were determined by photoluminescence (PL) and absorption spectroscopy. The absorption spectrum is dominated by a sharp excitonic peak at room and low temperatures. At room temperature, two transitions were observed by PL. One near to the prohibited energy band in ultraviolet (UV) region and the other centered at 640 nm, characteristic of the electronic defects in the band-gap. The spectrum at 6 K is dominated by donor-bound exciton lines and donor-acceptor pair transition. LO-phonon replica and two-electron satellite transitions are also observed. These optical characteristics are a signature of high-quality thin films.  相似文献   

9.
In this work, undoped and lead (Pb)-doped ZnO thin films were deposited on glass substrate using the sol–gel dip-coating process. The effects of different Pb doping concentrations on the structural, morphological, optical, electrical and photoluminescence properties of such films were investigated by X-ray diffraction (XRD), energy-dispersive X-rays (EDS), atomic force microscopy (AFM), UV–vis–NIR spectrophotometry, Hall effect measurement and Photoluminescence (PL) spectroscopy. XRD patterns of the synthesized films exhibited hexagonal wurtzite crystal structure with a c-axis preferred (002) orientation. AFM images showed that film morphology and surface roughness were influenced by the Pb doping level. Incorporation of Pb was confirmed from elemental analysis using EDS. The UV–vis–NIR spectroscopy characterizations demonstrated that all the films were highly transparent with average visible transmission values ranging from 75% to 85%. Electrical measurement shows that carrier concentration and resistivity are dependent on Pb content. Room temperature PL spectra clearly indicated a great dependence of the UV, green and red emissions on the Pb concentration. In particular, the red emission at 2 eV is quenched after introduction of Pb atoms.  相似文献   

10.
Cd掺杂ZnO薄膜的光致发光性能研究   总被引:3,自引:3,他引:0  
郑必举  胡文 《光电子.激光》2013,(10):1942-1947
三元半导体Cd掺杂ZnO薄膜通过脉冲激光法沉积 在石英玻璃基底上,Gd含量x从0增加到0.23。X射线衍射(XRD)图谱表明,所有Zn1-xCd xO薄膜都具有c轴取向的六方纤锌矿结构,而且c轴 晶格常数随着 x的增加而增加。原子力显微镜(AFM)观察到,随着x的增加,Zn1-xCdxO 薄膜的晶粒尺寸逐渐减小。光致发光(PL)和透过率 测量都证实,随着x的增加,薄膜的禁带宽度Eg从3.27eV降低到了2.78eV,同时导致了PL峰半高 宽(FWHM)的变大。PL峰迁移到了可见光范围内,使得Zn1-xCdxO薄膜可以应用在可见光发光二极管及其它高效率的光电 子器件。  相似文献   

11.
用直流磁控反应溅射法,分别在Si(111)基片及Al2O3陶瓷基片上制备了ZnO薄膜,并进行TiO2、SnO2、Al2O3或CuO的掺杂和退火处理。用XRD分析了退火前后晶型的变化,利用气敏测试系统对各样品进行了气敏特性测试。结果表明:经过700℃退火后的样品,在最佳工作温度为220℃时,对丙酮有很好的选择性和很高的灵敏度(34.794)。掺杂TiO2或SnO2,可提高ZnO薄膜传感器对丙酮的灵敏度(57.963)。  相似文献   

12.
Nanocrystalline Zn1-x CoxO(where x varies from 0 to 0.04 in steps of 0.01) thin films were deposited onto glass substrate by the spray pyrolysis technique at a substrate temperature of 350 ℃. The X-ray diffraction patterns confirm the formation of hexagonal wurtzite structure. The crystal grain size of these films was found to be in the range of 11–36 nm. The scanning electron micrographs show a highly crystalline nanostructure with different morphologies including rope-like morphology for undoped ZnO and nanowalls and semispherical morphology for Co-doped Zn O. The transmittance increases with increasing Co doping. The optical absorption edge is observed in the transmittance spectra from 530 to 692 nm, which is due to the Co2C absorption bands corresponding to intraionic d–d shifts. The direct and indirect optical band gap energies decrease from 3.05 to 2.75 eV and 3.18 to 3.00 eV, respectively for 4 mol% Co doping. The electrical conductivity increases with increasing both the Co doping and temperature, indicating the semiconducting nature of these films. The temperature dependence thermal electromotive force measurement indicates that both undoped and Co-doped ZnO thin films show p-type semiconducting behavior near room temperature. This behavior dies out beyond 313 K and they become n-type semiconductors.  相似文献   

13.
ZnO thin films have been deposited on quartz glass, sapphire, and glass substrates by the sol-gel technique and subjected to different annealing ambients. X-ray diffraction measurements show that all the films are hexagonal wurtzite type. The variations in photoluminescence (PL) and photoconductivity (PC) properties have been correlated to the structural and microstructural changes due to different substrates and annealing ambients. The maximum photoresponse has been observed for the films on quartz substrates. The violet emission in the PL spectra is enhanced for vacuum and nitrogen annealed films. The maximum ultraviolet (UV) photoresponse and photo-to-dark current ratio is observed for ZnO films annealed in air.  相似文献   

14.
The CIGS thin trims are prepared by co-evaporation of elemental In, Ga and Se on the substrates of Mo-coated glasses at 400℃ followed by co-evaporation of elemental Cu and Se at 550℃. We study the structural and electrical properties using XRD, XRF and Hall effect measurements. In general, Cu(In,Ga)sSes phase exists when Cu/(In+Ga) ratio is from 0.17 to 0.27, Cu(In,Ga)3Se5 phase exists for Cu/(In+Ga) ratio between 0.27 and 0.41, Cu2(in,Ga)4Se7 and Cu(In,Ga)2Se3.5 phases exist for Cu/0n+Ga) ratio between 0.41 and 0.61, and OVC(or ODC) and CuIn0.7Ga0.3Se2 phases exist when Cu/(In+Ga) ratio is from 0.61 to 0.88. With the increase of Cu/(In+Ga) ratio, the carrier concentrations of the films gradually increase, but the electrical resistivity gradually decreases.  相似文献   

15.
The CIGS thin films are prepared by co-evaporation of elemental In, Ga and Se on the substrates of Mo-coated glasses at400℃ followed by co-evaporation of elemental Cu and Se at 550℃. We study the structural and electrical properties usingXRD, XRF and Hall effect measurements. In general, Cu(In,Cra)5Se8 phase exists when Cu/(In Ga) ratio is from 0.17 to0.27, Cu(In,Ga)3Se5 phase exists for Cu/(In Ga) ratio between 0.27 and 0.41, Cu2(In,Ga)4Se7 and Cu(In,Ga)2Se3.5 phasesexist for Cu/(In Ga) ratio between 0.41 and 0.61, and OVC(or ODC) and CuIn0.7Ga0.3 Se2 phases exist when Cu/(In Ga)ratio is from 0.61 to 0.88. With the increase of Cu/(In Ga) ratio, the carrier concentrations of the films gradually increase,but the electrical resistivity gradually decreases.  相似文献   

16.
用脉冲激光沉积(PLD)方法在Si(111)和蓝宝石衬底上制备的氧化锌薄膜,在不同的退火温度和不同的退火氛围中进行了退火处理.退火温度及退火氛围对ZnO薄膜的结构和发光特性的影响用X射线衍射(XRD)谱和光致发光谱进行了表征.实验结果表明,随着退火温度的提高,ZnO薄膜的压应力减小,并向张应力转化.在不同的退火温度退火...  相似文献   

17.
采用sol-gel法在石英衬底上制备了ZnO薄膜,通过改变溶胶浓度、涂敷层数及退火温度,研究了ZnO薄膜的形貌、结构性能及光学性能。结果表明,薄膜具有六方纤锌矿结构,表面均匀致密,晶粒大小在25~35nm之间,Zn含量为0.8mol/L的溶胶经旋涂并在500℃下退火1h后可获得最高的可见光透射率,平均透射率约为94%。获得的ZnO薄膜的光学带隙在3.27~3.29eV之间。  相似文献   

18.
氧化锌(ZnO)具有适合基于pn结的各种光电器件,例如紫外光子探测器、发光二极管和激光二极管等应用的理想性质。虽然多年来已可获得高质量的n型ZnO,但是由于本征缺陷的自补偿效应较强等原因,稳定低阻且为p型导电的ZnO薄膜一直难于制备。通过对部分有关文献的归纳分析,主要介绍了近年来在p型掺杂方面的进展,以及不同方法制备的p型ZnO薄膜的空穴浓度、迁移率及电阻率等性能参数。  相似文献   

19.
Zinc oxide thin films have been grown by electrodeposition technique onto Cu and ITO-coated glass substrates from an aqueous zinc nitrate solution with addition of sodium thiosulfate at 90℃.The effects of sodium thiosulfate on the electrochemical deposition of ZnO were investigated by cyclic voltammetry and chronoamperometry techniques.Deposited films were obtained at -0:60 V vs.SCE and characterized by XRD,SEM,FTIR, optical,photoelectrochemical and electrical measurements.Thickness of the deposited film was measured to be 357 nm.X-ray diffraction results indicated that the synthesized ZnO has a pure hexagonal wurtzite structure with a marked preferential orientation along (002) plane.FTIR results confirmed the presence of ZnO films at peak 558 cm-1.SEM images showed uniform,compact morphology without any cracks and films composed of large flower-like ZnO agglomerates with star-shape.Optical properties of ZnO reveal a high optical transmission (>80%) and high absorption coefficient (α>105 cm-1)in visible region.The optical energy band gap was found to be 3.28 eV.Photoelectrochemical measurements indicated that the ZnO films had n-type semiconductor conduction.Electrical properties of ZnO films showed a low electrical resistivity of 6.54 Ω·cm,carrier concentration of -1.3×1017cm-3 and mobility of 7.35 cm2V-1s-1.  相似文献   

20.
本文利用溶胶-凝胶旋涂法在玻璃衬底上制备了 本征、N单掺和Li-N共掺的ZnO薄膜。 研究Li掺杂量的改变对薄膜的晶体结构、表面形貌、透过性能和发光性能的影响。采用了紫 外-可见分光光度计(UV-VIS)、光致发光谱(PL)、扫描电子显微镜(SEM)和X射线衍 射 仪(XRD)等表征手段对样品进行了测试。结果表明:Li掺杂量的改变对薄膜的结构和性能 都有一定的影响,随着Li掺杂量的增加,(002)衍射峰强度增大,晶 粒尺寸先增加后减小, 紫外发射峰的强度和薄膜的透过性能同样是先增强后减弱。当Li元素的原子比为6at%时, 薄膜的c轴择优取向明显,结晶性能最好,薄膜紫外发光最强,透过率最大。  相似文献   

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