Microlens fabricated in silicon on insulator using porous silicon

In order to realize the planar gradient refractive index (GRIN) microlens which is based upon porous silicon (PSi) and fabricated on silicon on insulator (SOI), a novel anodization method is used by applying lateral electric field. The microlens with smooth variation of the effective optical thickness is achieved. The lens is transparent in the infrared region, including the optical communication window (1.3 μm<λ<1.6 μm). This approach also allows the fabrication of an array of such lenses on SOI, and the GRIN microlens can be used as potential components in future silicon-based integrated optical circuits.     

多孔硅的孔隙对硫化锌/多孔硅光电性质的影响

为了研究衬底多孔硅(PS)的孔隙对硫化锌/多孔硅(ZnS/PS)复合体系的光学性能和电学性质的影响,采用脉冲激光沉积方法在不同孔隙度的PS衬底上沉积了硫化锌薄膜。利用X射线衍射仪、扫描电子显微镜、荧光分光光度计和Ⅰ-Ⅴ特性曲线分别研究了PS衬底上ZnS薄膜的晶体结构、表面形貌和ZnS/PS复合体系的光学和电学性质。结果表明,沉积的ZnS薄膜呈立方相晶体结构,沿β-ZnS(111)晶向择优取向生长。随着衬底PS孔隙的增多,ZnS薄膜衍射峰的强度减小,且薄膜表面出现一些空洞和裂缝;在ZnS/PS复合体系的光致发光谱中,PS的发光相对于未沉积ZnS薄膜的PS有所蓝移,随着PS孔隙的增多,该蓝移量增大,而且在光谱中间550nm左右出现了一个新的绿光发射,归因于ZnS的缺陷中心发光。ZnS的蓝、绿光与PS的红光相叠加,整个ZnS/PS复合体系呈现出较强的白光发射。ZnS/PS异质结的Ⅰ-Ⅴ特性曲线呈现出与普通二极管相似的整流特性,在正向偏置下,电流密度较大,电压降较低;在反向偏置下,电流密度接近于0。随着衬底PS孔隙的增多,正向电流增大。该项研究结果为固态白光发射器件的实现奠定了基础。     

Isolation of silicon film grown on porous silicon layer

We have investigated a new technology for dielectric isolation of a Si film grown epitaxially on a porous silicon layer. After oxidation of the porous silicon layer, a Si on Ohcidized Porous Silicon(SOPS) structure can be obtained. It is proposed that micropores pinch off quickly in the interfacial region between the porous silicon layer and the epitaxial film. A minimum yield calculated from Rutherford backscattering spectra of the epitaxial silicon film is 5.3%, and an electron Hall mobility of 600cm²/V.s is obtained in the film with a carrier concentration of 1 x 10¹⁷ /cm³. MOSFETs were fabricated on the SOPS structure.     

The influence of hydrogen plasma on the electroreflectance spectrum and the spectrum of electron states of porous silicon

Porous Si samples were investigated by the electroreflectance modulation spectroscopy. The presence of minibands, which are responsible for the existence of photoluminescence bands (red, green, and blue), is revealed. It is established that the miniband responsible for the blue band vanishes upon the treatment of a porous Si surface in H⁺ plasma. Passivation of the surface with hydrogen also leads to strain relaxation both in porous films and in the Si substrate. The origin of electron states in the band gap of Si nanocrystallites is established.     

NH3／H2O2溶液腐蚀下多孔硅光致荧光

用光致荧光谱、傅里叶变换红外光谱（ＦＴＩＲ）和扫描电子显微镜（ＳＥＭ）对用阳极氧化法制成的多孔硅层在１％ＮＨ３／Ｈ２Ｏ２溶液中的腐蚀现象进行了研究。红外分析表明，Ｓｉ－Ｏ键和Ｈ－Ｏ键的强度随ＮＨ３／Ｈ２Ｏ２溶液的腐蚀时间的增加而增加，Ｓｉ－Ｈ键强主匠随腐蚀时间增加而减少。光致荧光谱的峰值在腐蚀开始时先下降后上升，半高宽变窄，谱峰的以边明显蓝移。分析研究表明，１％ＮＨ３／Ｈ２Ｏ２溶液对多孔硅层有腐蚀     

The optical second-harmonic generation from porous silicon

Second-harmonic generation from porous silicon with a magnitude of two orders greater than that from the original silicon crystalline wafers is discussed. The measured effective second-order nonlinear susceptibility X⁽²⁾_ps.eff for a p-type porous silicon is 1.96×10^-7 esu. The susceptibility is estimated on the base of a bulk property rather than on quantum confinement owing to its large surface to volume ratio     

Carrier transport in porous silicon

Carrier transport in porous silicon layers has been studied by the time-of-flight method in the strong injection mode at temperatures T=290–350 K and electric field strengths F=(1.5–7)×10⁴ V cm^?1. The electron and hole drift mobilities μ_e≈2×10^?3 cm² V^?1 s^?1 and μ_h≈6×10^?4 cm² V^?1 s^?1 were obtained at T=292 K and F=4×10⁴ V cm^?1. An exponential temperature dependence of drift mobility with activation energy of ～0.38 and ～0.41 eV for, respectively, electrons and holes was established. It is shown that the type of time dependences of the photocurrent associated with carrier drift and the superlinear dependence of the transit time on the reciprocal of the voltage applied to a sample allow use of the concept of space-charge-limited currents under the conditions of anomalous dispersive transport. The experimental data are accounted for in terms of the model of transport controlled by carrier trapping into localized states with energy distribution near the conduction and valence band edges described by an exponential function with a characteristic energy of ～0.03 eV.     

多层多孔硅的SPM研究

多层我孔硅是采用交替变化脉冲腐蚀电流密度的方法制成的多孔度周期性变化的多孔硅结构,我们用ＡＦＭ对多层多孔硅结构的侧向解理的截面进行观测,得到了不同多孔度层及其界面处的图像。发现不同周期中相同条件下腐蚀得到的多孔硅层,其层厚随周期的不同而不同,从而限制了多孔硅发光峰半宽的缩小,对多层我孔硅的电化学同理作了初步的探讨。     

High-performance inductors integrated on porous silicon

To study the substrate effect on inductor performance, several types of spiral inductors were fabricated on porous silicon (PS), p/sup -/ and p/sup +/ silicon substrate. /spl pi/-network analysis results show that the use of PS effectively reduces the shunt conductance and capacitance. The analysis further shows that the use of PS significantly reduces the eddy current portion of series resistance of inductor, leading to slower increase of the apparent series resistance with increasing frequency. Higher Q-factor and resonant frequency (f/sub r/) result from the reduced shunt conductance, shunt capacitance, and frequency dependence of series resistance. Inductors fabricated on PS regions are subjected to a much less stringent set of constraints than those on bulk Si substrate, allowing for much higher inductance to be achieved without severe sacrifice in Q-factor and f/sub r/. Similarly, much higher Q-factor can be obtained for reasonable inductance and f/sub r/.     

Research on immunosensor based on porous silicon

Porous silicon is functionalized using thermal oxidation and silanization. The HYSA antibodies are immobilized to the porous surface in this paper. The changes in the reflection spectrum and photoluminescence spectrum are investigated when BSA are attached to the PS surface. The result shows that the luminescence peak of PS disappears. After the antigen- antibody reaction, the higher light emission is observed and the reflection spectrum also red shifts. Therefore, this research lays a foundation for the development of sensitive label-free optical immunosensor.     

Research on immunosensor based on porous silicon

Porous silicon is functionalized using thermal oxidation and silanization. The HYSA antibodies are immobilized to the porous surface in this paper. The changes in the reflection spectrum and photoluminescence spectrum are investigated when BSA are attached to the PS surface. The result shows that the luminescence peak of PS disappears. After the antigen-antibody reaction,the higher light emission is observed and the reflection spectrum also red shifts. Therefore,this research lays a foundation for the development of sensitive label-free optical immunosensor.     

一种多孔硅生物免疫传感器的研究

对多孔硅样品进行热氧化和硅烷化处理,通过共价结合的方法将HYSA生物抗体固定到多孔硅的孔洞中;测量了加入BSA发生抗原抗体反应前后的荧光光谱和反射谱.实验结果表明加入生物分子后多孔硅发光峰消失,抗原抗体反应后发光强度增强,反射谱红移.该项研究为开发免标记的多孔硅光学生物免疫传感器奠定了基础.     

The effect of surface species on the photoluminescence of porous silicon

The photoluminescence of porous Si immersed in alcohol exhibits a blue shift and a marked decrease in intensity relatively to dry, as-anodized wafers. However, when the immersed samples are treated with ultraviolet (UV) light for a few minutes, the photoluminescence (PL) peak shifts to longer wavelength. Fourier transform infrared spectroscopy reveals that alkoxy surface species and silicon hydride species backbonded to oxygen atoms appear on the UV-treated samples. Furthermore, the PL characteristics and surface species of the UV-treated samples can be recovered to those of as-anodized wafers by dipping in hydrofluoric acid. These results point out the importance of surface chemistry in the luminescence process of porous Si.     

Evaluation of the influence of an embedded porous silicon layer on the bulk lifetime of epitaxial layers and the interface recombination at the epitaxial layer/porous silicon interface

Porous silicon plays an important role in the concept of wafer‐equivalent epitaxial thin‐film solar cells. Although porous silicon is beneficial in terms of long‐wavelength optical confinement and gettering of metals, it could adversely affect the quality of the epitaxial silicon layer grown on top of it by introducing additional crystal defects such as stacking faults and dislocations. Furthermore, the epitaxial layer/porous silicon interface is highly recombinative because it has a large internal surface area that is not accessible for passivation. In this work, photoluminescence is used to extract the bulk lifetime of boron‐doped (10¹⁶/cm³) epitaxial layers grown on reorganised porous silicon as well as on pristine mono‐crystalline, Czochralski, p⁺ silicon. Surprisingly, the bulk lifetime of epitaxial layers on top of reorganised porous silicon is found to be higher (~100–115 µs) than that of layers on top of bare p⁺ substrate (32–50 µs). It is believed that proper surface closure prior to epitaxial growth and metal gettering effects of porous silicon play a role in ensuring a higher lifetime. Furthermore, the epitaxial layer/porous silicon interface was found to be ~250 times more recombinative than an epitaxial layer/p⁺ substrate interface (S ≅ 10³ cm/s). However, the inclusion of an epitaxially grown back surface field on top of the porous silicon effectively shields minority carriers from this highly recombinative interface. Copyright © 2013 John Wiley & Sons, Ltd.     

Radiation hardness of porous silicon

The effect of irradiation by 300-keV Ar⁺ ions on the properties of electrochemically produced porous silicon is studied at doses of 5×10¹⁴–1×10¹⁶ cm⁻². Raman scattering and photoluminescence data are used to show that the radiation hardness of porous silicon layers is substantially greater than that of single crystal silicon. Fiz. Tekh. Poluprovodn. 31, 1126–1129 (September 1997)     

化学腐蚀硅表面结构反射率影响因素的研究

单晶硅片在碱溶液中的腐蚀会引起表面结构的变化,利用紫外可见分光光度计测量硅片表面反射率,发现碱溶液的浓度、腐蚀时间、添加剂的选择（无水乙醇或异丙醇）以及添加剂的浓度均对硅片表面反射率有影响。比较几个因素发现碱溶液的浓度和腐蚀时间对硅片表面反射率影响最大。当腐蚀温度为80℃,NaOH固体浓度为15g/L,添加剂无水乙醇体积分数10%时,腐蚀30min得到硅片反射率最低,达到11.15%。     

The influence of crystal orientation on silicon semiconductor processing

Silicon crystallographic orientation effects on semiconductor processing from single crystal growth through completed devices or circuits have been studied. The preferred octahedral crystal habit of silicon provides for stable crystal growth on the {111} plane, but the other low-index planes, {110} and {100}, are becoming more commonly used, in spite of greater difficulty in growth and processing of these crystals. Chemical and physical properties such as etch rates and Young's modulus are affected by orientation. The effect of crystal orientation on technologies such as diffusion under film (DUF), dielectric isolation, epitaxy, selective etch and epitaxial refill, and simultaneous deposition of single crystal and polycrystal silicon are presented. In addition, orientation effects on processes of oxidation, diffusion, alloying, and scribing are discussed.     

Evolution of luminescence properties of natural oxide on silicon and porous silicon

The main aim of this study is to research the features of luminescence properties of natural silicon oxide layers formed on the polished silicon surface, structural silicon surface, and porous silicon films. Luminescence was excited by high-energy electron beams—the local cathodoluminescence method. Cathodoluminescence of the samples was studied 3, 24, and 48 days after preparation. The text was submitted by the authors in English.     

GaN growth on porous silicon by MOVPE

GaN films have been grown at 1050 °C on porous silicon (PS) substrates by metalorganic vapour phase epitaxy. The annealing phase of PS has been studied in temperature range from 300 to 1000 °C during 10 min under a mixture of ammonia (NH₃) and hydrogen (H₂). The PS samples were characterized after annealing by scanning electronic microscope (SEM). We observed that the annealing under the GaN growth conditions does not affect the porous structure.For the growth of the active GaN layer we used a thin AlN layer in order to improve wetting between GaN and PS/Si substrate. The growth of AlN and GaN films was controlled by laser-reflectometry. We estimated the porosity of PS samples from the evolution of the reflectivity signal during the AlN growth. The crystalline quality and surface morphology of GaN films were determined by X-ray diffraction and SEM, respectively. Preferential growth of hexagonal GaN with (0002) direction is observed and is clearly improved when the thickness of AlN layer increases. Epitaxial GaN layers were characterized by photoluminescence.     

Photosensitive heterostructures based on porous nanocrystalline silicon

The features of the manufacturing process, as well as the results of studies on the morphology, electrophysical, and photoelectric properties of photosensitive structures based on silicon containing siliconcarbide and porous silicon layers, are considered. A porous layer is created on the surface of a monocrystalline silicon substrate via electrolytic etching in fluorine-containing solutions. Wafers with a different surface microrelief such as a ground, polished, and textured one, has been used. The carbonization of the samples resulting in the formation of SiC/Si heterostructures has been carried out via gas transport endotaxy in a hydrogen flow using a vertical reactor with cold walls and a graphite container. The structure and composition of the manufactured SiC/Si heterostructures formed on different types of structured surfaces on polycrystalline and monocrystalline silicon, including the surface porous silicon layer, are investigated. It is shown that the process of endotaxy on all the types of surfaces leads to the formation of a single-crystal phase of silicon carbide by cubic modification. Using scanning and transmission electron microscopy, the morphology of the produced structures is investigated. Filiform entities with a different structure have been revealed on nonporous surfaces identified as silicon carbide, whereas the cylindrical or conical structures, whose nature is uncertain, have been observed on porous surfaces. The current-voltage and current-power curves are plotted for all types of manufactured structures, the general form of which indicates the presence of several potential barriers there. The photoelectric properties of the structures and the prospects of their use in photoelectric converters of solar cells are analyzed.