共查询到20条相似文献,搜索用时 62 毫秒
1.
在国际上第一次采用电子束反应蒸发法在Si(111)衬底上生长了MgxZn1-xO晶体薄膜.能量色散X射线(EDX)特征能谱及X射线衍射(XRD)分析表明薄膜呈立方结构,薄膜的晶面取向依赖于生长温度,在200C温度下生长得到高度(200)取向的立方MgxZn1-xO薄膜,温度过高时得到多晶薄膜.对高度(200)取向的立方MgxZn1-xO薄膜的光荧光激发谱(PLE)分析表明其光学带隙为4.20eV,相对于MgO的带隙红移量为3.50eV.XRD分析还表明立方MgxZn1-xO薄膜与MgO衬底之间的晶格失配仅为0.16%.这使得高质量立方MgxZn1-xO/MgO多量子阱材料的制备成为可能. 相似文献
2.
介绍了在Si衬底和石英玻璃衬底上生长的立方相MgxZn1-xO(0.55≤x≤1)晶体薄膜的物理特性,AFM和XRD等微结构特性表征显示了良好的表面形貌和高度的(111)取向生长特性.采用Manifacier方法,根据透射光谱中的干涉峰,计算得到立方相MgxZn1-xO薄膜的折射率.与已报道的六方相MgxZn1-xO(0≤x≤0.5)薄膜的折射率相类似,在400~800nm的可见光区域,不同Mg含量的立方相MgxZn1-xO薄膜,其折射率随入射波长的色散关系遵循一阶Sellmeier方程.对给定400nm的入射光波长,当薄膜中的Mg含量由55%增至100%时,其折射率由1.89衰减至1.73. 相似文献
3.
采用超声喷雾热解法在石英玻璃衬底上生长出不同组分的宽禁带MgxZn1-xO薄膜(z=0、0.08、0.16、0.25).通过X射线衍射(XRD)、扫描电子显微镜(SEM)和分光光度计等分析测试手段对MgxZn1-xO薄膜的晶体结构、透光性及禁带宽度进行了研究.结果表明,随着Mg含量的增加,MgxZn1-xO薄膜仍然保持着ZnO的纤锌矿结构,没有生成MgO相,Mg可以有效地溶入ZnO的晶格中.MgxZn1-xO薄膜具有良好的透光性,在可见波段的光透过率达85%以上;此外,随着Mg含量的增加,MgxZn1-xO薄膜的吸收边出现蓝移现象,禁带宽度从3.30eV增大到3.54eV. 相似文献
4.
采用低温物理沉积技术在二氧化硅衬底(SiO2/Si(100))和石英玻璃上生长出了MgxZn1-xO(x>0.5)晶体薄膜,并用扫描电镜(SEM)、原子力显微镜(AFM)、X射线衍射(XRD)图谱和紫外-可见光透射光谱对其进行了表征.结果表明,在SiO2/Si(100)和石英玻璃衬底上沉积的MgxZn1-xO(x>0.5)晶体薄膜表面平整,均呈立方结构,且具有高度的(001)择优取向.立方MgxZn1-xO薄膜具有从紫外到近红外波段良好的透明性,折射率为1.7~1.8,随着波长的增大或Mg组分的增大而降低. 相似文献
5.
采用射频磁控溅射法在80℃衬底温度下制备了MgxZn1-xO(x=0.23)薄膜,用X射线衍射(XRD)、高分辨透射电镜(HRTEM)、喇曼(Raman)光谱和原子力显微镜(AFM)研究了薄膜的结构特性.XRD和HRTEM分析结果表明MgxZn1-xO薄膜为单相六角纤锌矿结构,且具有沿c轴的择优取向,晶格常数与ZnO晶体的近似相等.Raman光谱不仅揭示MgxZn1-xO薄膜具有六角纤锌矿结构,而且也表明MgxZn1-xO薄膜的结晶质量比在相同条件下制备的ZnO薄膜好.AFM图像则显示出MgxZn1-xO薄膜为多晶结构. 相似文献
6.
采用射频磁控溅射用x=0.00~0.45的MgxZn1-xO陶瓷靶在Si(100)和石英衬底上生长一系列的MgxZn1-xO薄膜。用XRD、XPS、透射谱和光电导谱对样品进行表征。结果表明用MgxZn1-xO薄膜在x≤0.325时具有单一(002)取向的六方结构,其禁带宽度Eg随x增加而增大,在薄膜表面入射光能量大于禁带宽度时有光电响应,并且在x=0.325时得到了禁带宽度为4.90eV的MgxZn1-xO薄膜。在x≥0.40时出现立方相结构,禁带宽度有所减小,说明此时已为混相薄膜。 相似文献
7.
用射频磁控溅射法在不同衬底上制备出了MgxZn1-xO薄膜。X射线衍射(XRD)和原子力显微镜(AFM)研究结果表明,薄膜为六角纤锌矿结构,具有(002)方向择优取向;随氧分压增加,(002)衍射峰的角度变大,表征薄膜表面粗糙程度的方均根粗糙度减小。室温光致发光谱中有多个紫外及可见光致发光峰,其中344nm发光峰应来源于近带边发射。室温透射谱表明薄膜在可见光区具有极高的透过率,薄膜的吸收边位于340nm附近,进而估算出Mg、Zn1-xO薄膜的带隙宽度为3.59eV,与光致发光结果一致。 相似文献
8.
在蓝宝石(0001)衬底上低温生长立方相MgxZn1-xO(x〉0.5)晶体薄膜,用X射线衍射(XRD)和透射光谱分析高温退火对薄膜的结构和光学性质的影响.结果表明;对Mg0.53Zn0.47O薄膜,在900℃的退火温度下,(0002)衍射峰以及透射光谱上双吸收边的出现均表明有六方结构从其立方结构中分离出来;但对于Mg含量高于55%的样品,即使经历了1000℃的高温退火,也不会有任何相分裂现象出现.而电学测试结果表明,高温下热稳定性良好的立方相Mg0.55Zn0.45O晶体薄膜还能用于金属-绝缘体-半导体的绝缘层,并且漏电流小.由此可以判断,x≥0.55的超饱和MgZn1-xO薄膜具有稳定的立方相晶体结构和优良的光学、电学性质,因而是制作高质量的光电子器件和量子阱激光器的理想材料. 相似文献
9.
采用分子束外延的方法在BaF2衬底(111)上制备出了高质量的Pb1-xSrxSe(0≤X≤0.050)薄膜.X射线衍射结果表明,Pb1-xSrxSe薄膜为立方相NaCl型晶体结构,没有观察到SrSe相分离现象,薄膜的取向为平行于衬底(111)晶面.薄膜晶格常数随Sr含量的增加逐渐增大,Sr含量由Vegard公式得到.再用理论模拟Pb1-xSrxSe薄膜透射光谱的方法得到了相应的带隙.最后通过介电函数模型拟合得到了PbSe和Pb1-xSrxSe薄膜在光子能量位于基本带隙附近的折射率n和吸收系数a. 相似文献
10.
利用射频磁控溅射技术在玻璃衬底上沉积了MgxZn1-xO(x=0~0.2)薄膜.采用X射线衍射仪、紫外-可见光分光光度计和荧光光谱仪研究了Mg掺杂量对MgxZn1-xO薄膜结构与光学性能的影响.XRD图谱表明,MgxZn1-xO薄膜均为六角纤锌矿结构,并且呈现出C轴择优生长特性,当x>0.1时薄膜出现(100)面衍射峰,薄膜的c轴择优生长特性减弱,随着x值的增加,晶格常数c逐渐减小.紫外可见光透射光谱表明,Mg的掺入提高了薄膜在可见光范围内的透过率,同时使薄膜的禁带宽度增大.PL谱分析显示,Mg的掺入使薄膜的紫外发射峰和蓝光发射带发生蓝移,当x=0.1时近带边发射峰与杂质发射的强度比值最高. 相似文献
11.
Z.Y. Nuru C.J. Arendse T.F.G. Muller M. Maaza 《Materials Science and Engineering: B》2012,177(14):1194-1199
We report on the microstructure and optical properties of AlxOy–Pt–AlxOy interference-type multilayer films, deposited by electron beam (e-beam) deposition onto corning 1737 glass, silicon (1 1 1) and copper substrates. The structural properties were investigated by Rutherford backscattering spectrometry, X-ray diffraction, scanning electron microscopy, energy dispersive X-ray spectroscopy and atomic force microscopy. The optical properties were extracted from specular reflection/transmission, diffuse reflectance and emissometer measurements. The stratification of the coatings consists of a semi-transparent middle Pt layer sandwiched between two layers of AlxOy. The top and bottom AlxOy layers were non-stoichiometric with no crystalline phases present. The Pt layer is in the fcc crystalline phase with a broad size distribution and spheroidal shape in and between the rims of AlxOy. The surface roughness of the stack was found to be comparable to the inter-particle distance. The optical calculations confirm a high solar absorptance of ∼0.94 and a low thermal emittance of ∼0.06 for the multilayer stack, which is attributed not only to the optimized nature of the multilayer interference stacks, but also to the specific surface morphology and texture of the coatings. These optical characteristics validate the spectral selectivity of the AlxOy–Pt–AlxOy interference-type multilayer stack for use in high temperature solar-thermal applications. 相似文献
12.
A high-pressure technique was adopted to obtain perovskite-type . A new perovskite was characterized to have a cubic symmetry with ; Li and Nb ions in the B-site of perovskite lattice may be in a random arrangement. 相似文献
13.
The preparation conditions of the high TC ceramic superconductor Ba(Pb,Bi)O3 is correlated with the superconducting transition. Transition onsets of all materials are similar, but transition widths and transition completeness is strongly dependent on firing temperature. Only materials prepared over a narrow temperature range, resulting in a nearly ideal weight loss, have a complete and narrow transition. 相似文献
14.
Spectrally selective AlxOy/Pt/AlxOy multilayer absorber coatings were deposited onto corning 1737 glass, Si (111) and copper substrates using electron beam (e-beam) vacuum evaporator at room temperature. The employment of ellipsometric measurements and optical simulation was proposed as an effective method to optimize and deposit multilayer solar absorber coatings. The optical constants (n and k) measured using spectroscopic ellipsometry, showed that both AlxOy layers, which used in the coatings, were dielectric in nature and the Pt layer was semi-transparent. The optimized multilayer coatings exhibited high solar absorptance α ∼ 0.94 ± 0.01 and low thermal emittance ? ∼ 0.06 ± 0.01 at 82 °C. The Rutherford backscattering spectroscopy (RBS) data of AlxOy/Pt/AlxOy multilayer absorber indicated the AlxOy layers present in the coating were nearly stoichiometry. The scanning electron microscope analysis (SEM) result indicated that the average diameter and inter-particles distance of Pt grains were statistically about 146 ± 0.17 nm and 6-10 ± 0.2 nm respectively. 相似文献
15.
S. Nomura J. Kuwata S.J. Jang L.E. Cross R.E. Newnham 《Materials Research Bulletin》1979,14(6):769-774
The electrostriction in crystals has been investigated using a strain gauge method. In the ferroelectric phase below 140 C, the strain vs the electric field shows a hysteresis, which is ascribed to the effect of ferroelectric domains. A quadratic relation holds between the strain x and the electric polarization P as x = QP2 above about 170 C in the paraelectric phase. Values of the electrostrictive Q coefficients are determined from the measurements near 190 C, as Q11 = 1.6·10?2m4/C2, Q12 = ?0.86·10?2m4/C2, and Q44 = 0.85·10?2m4/C2. 相似文献
16.
The monoclinic-to-tetragonal structure transition of oxides V1?xMox02 with has been studied by means of DTA, X-ray diffraction, magnetic susceptibility (powder samples) and electrical conductivity (single crystals) measurements within the temperature region 80 K to 400 K. A linear decrease of the transition temperature of 11 K per atom % Mo was observed. The magnetic susceptibility of the low temperature phase was found to be temperature independent paramagnetic for all preparations. Electrical conductivity measurements on the same phase showed crystals with to be semiconducting, while a metallic behavior was observed in the region . 相似文献
17.
A. Rogalski 《Thin solid films》1980,67(1):179-186
heterojunctions with a long wavelength spectral cutoff (λc ≈ 6 μm) were prepared using the double-channel hot wall technique. The electrical and photoelectrical properties of the heterojunctions at 77, 197 and 300 K were investigated. Detectors with RoA equal to 170 Ω cm2 and a quantum efficiency of 25–40% were obtained. Reasons for the shift of the long wavelength spectral cutoff of the heterojunctions towards shorter wavelengths are given. 相似文献
18.
SixCyHz films have been prepared at 200°C by reactive plasma deposition from SiH4 and CH4 diluted in helium in a tubular reactor. These films have a ratio s (equal to ranging from 0.2 to 0.8, a refractive index ranging from 1.96 to 2.6 and an optical energy band gap in the range 2.7-2.2 eV. The total quantity of hydrogen in the film is 40% when s=0.5. Infrared analysis shows that these films have large fractions of homonuclear bonds and that this material is best described as a polymer. Mass spectrometric measurements of the gaseous products formed in the SiH4-CH4-He plasma have been performed and the results are related to the composition of the deposited layers. 相似文献
19.
We have studied the influence of surface fields H/sub p/ (generated by either direct or alternating core current) on soft magnetic properties of amorphous and nanocrystalline Fe/sub 73.5/Cu/sub 1/Nb/sub 3/Si/sub 15.5/B/sub 7/ ribbon. While in an amorphous ribbon the coercive field H/sub c/ decreases with H/sub p/, in the same optimally annealed ribbon (H/sub c/=1.3 A/m, M/sub m//spl ap/M/sub s/) H/sub c/ increases with H/sub p/ for all the explored types of H/sub p/ (static and dynamic with different phases with respect to that of the magnetizing field H). The unexpected increase of H/sub c/ in nanocrystalline ribbon is associated with the influence of H/sub p/ on the surface and main (inner) domain structure. Here, we develop a model that takes into account this influence and explains the experimental results. 相似文献
20.
Integration of NiSix based fully silicided metal gates with HfO2 high-k gate dielectrics offers promise for further scaling of complementary metal-oxide- semiconductor devices. A combination of high resolution transmission electron microscopy and small probe electron energy loss spectroscopy (EELS) and energy dispersive X-ray analysis has been applied to study interfacial reactions in the undoped gate stack. NiSi was found to be polycrystalline with the grain size decreasing from top to bottom of NiSix film. Ni content varies near the NiSi/HfOx interface whereby both Ni-rich and monosilicide phases were observed. Spatially non-uniform distribution of oxygen along NiSix/HfO2 interface was observed by dark field Scanning Transmission Electron Microscopy and EELS. Interfacial roughness of NiSix/HfOx was found higher than that of poly-Si/HfO2, likely due to compositional non-uniformity of NiSix. No intermixing between Hf, Ni and Si beyond interfacial roughness was observed. 相似文献