共查询到20条相似文献,搜索用时 125 毫秒
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报道了HgCdTe光导探测器光电参数随温度变化的关系,重点描述了光谱响应变温测试,给出了HgCdTe器件从液氮到室温 之若干个不同温度点测试的光谱响应曲线及器件变温测试的性能参数对照表,并与经验公式计算结果进行对比,给出了相应的测试误差分析。 相似文献
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本文分析了探测器长度对Hg_(1-x)Cd_xTe光导探测器性能的影响。分析是针对工作在77~300K温度范围3~5μm和8~14μm波段的器件进行的。将由几个厂商制造的探测器的实验数据与基于Rittner模型及我们为有阻挡接触点的光导器件开创的理论研究所做的理论预测进行了比较。力图阐明理论与实验结果之间的差异。 相似文献
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本文分析和讨论了碲镉汞材料退火的微观机制和退火条件,根据分析的结果对加速旋转坩埚技术布里奇曼法生长的长波碲镉汞材料进行了低温退火实验,取得了满意的结果。对于0.7mm厚的样品,190~220℃下汞饱和等温退火50~60天可获得电学性能优良的n型材料。77K下载流子浓度n<5×1014cm-3,载流子迁移率μ>1×105cm2/V·S,少子寿命τ>1μs。 相似文献
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霍尔效应和霍尔传感器的教学方法研究 总被引:1,自引:0,他引:1
磁电效应(电磁感应、霍尔效应、磁致电阻效应)是磁场与物质之间的重要的物理效应。只有深入理解电磁学原理,才能进一步学好霍尔传感器。本文针对现有教材状况,强调从理解电磁学中带电粒子在磁场、电场中的运动规律开始,进而深入学习霍尔效应和霍尔传感器。本文还介绍了用形象生动的教学方法,使学生扎实牢固地掌握该知识。 相似文献
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Mahabub A. Bhuiyan Zakhar R. Kudrynskyi Debarati Mazumder Jake D. G. Greener Oleg Makarovsky Christopher J. Mellor Evgeny E. Vdovin Benjamin A. Piot Inna I. Lobanova Zakhar D. Kovalyuk Marina Nazarova Artem Mishchenko Kostya S. Novoselov Yang Cao Laurence Eaves Go Yusa Amalia Patan 《Advanced functional materials》2019,29(3)
The transfer of electronic charge across the interface of two van der Waals crystals can underpin the operation of a new class of functional devices. Among van der Waals semiconductors, an exciting and rapidly growing development involves the “post‐transition” metal chalcogenide InSe. Here, field effect phototransistors are reported where single layer graphene is capped with n‐type InSe. These device structures combine the photosensitivity of InSe with the unique electrical properties of graphene. It is shown that the light‐induced transfer of charge between InSe and graphene offers an effective method to increase or decrease the carrier density in graphene, causing a change in its resistance that is gate‐controllable and only weakly dependent on temperature. The charge transfer at the InSe/graphene interface is probed by Hall effect and photoconductivity measurmentes and it is demonstrated that light can induce a sign reversal of the quantum Hall voltage and photovoltaic effects in the graphene layer. These findings demonstrate the potential of light‐induced charge transfer in gate‐tunable InSe/graphene phototransistors for optoelectronics and quantum metrology. 相似文献
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为了提高微波功率测量的准确性,文中将平面电磁波作用于霍尔器件,用解析方法得到了霍尔电压的直流分
量与微波功率密度之间的线性关系。基于同轴线设计了通过式与吸收式两种型号的微波功率探测器。以同轴通过式
为例,在0.1 mW~50.0 mW 的微波功率测量范围内,探测器的线性度达98.28%,瞬态响应时间为3 μs~6 μs,频率响应
范围为1 GHz~10 GHz。实验结果与理论分析结果一致,该新型探测器具有线性度好和响应速度快的特点,有望得到更
为广泛的应用。 相似文献
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Yequan Chen Yingmei Zhu Renju Lin Wei Niu Ruxin Liu Wenzhuo Zhuang Xu Zhang Jinghua Liang Wenxuan Sun Zhongqiang Chen Yongsheng Hu Fengqi Song Jian Zhou Di Wu Binghui Ge Hongxin Yang Rong Zhang Xuefeng Wang 《Advanced functional materials》2023,33(33):2370199
The topological Hall effect (THE) is critical to the exploration of the spin chirality generated by the real-space Berry curvature, which has attracted worldwide attention for its prospective applications in spintronic devices. However, the prominent THE remains elusive at room temperature, which severely restricts the practical integration of chiral spin textures. Here, a colossal intrinsic THE is showed up to ≈1.6 µΩ cm in large-area ferromagnet Cr5Te6 thin films epitaxially grown by pulsed laser deposition. Such a THE can be maintained until 270 K, which is attributed to the field-stimulated noncoplanar spin textures induced by the interaction of the in-plane ferromagnet and antiferromagnet infrastructures. The first-principles calculations further verify the considerable Dzyaloshinskii-Moriya interaction in Cr5Te6. This work not only paves the way for robust chiral spin textures near room temperature in large-area low-dimensional ferromagnetic films for practical applications, but also facilitates the development of high-density and dissipationless spintronic devices. 相似文献
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用分子束外延技术在p型Si衬底上生长成了Si/Si1-xGex应变层超晶格和掺铒(Er)SiOx外延层,用无接触法测量了它们的横向磁阻,并且用拟合方法由横向磁阻计算了它们的迁移率。 相似文献
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霍尔传感器的应用探讨 总被引:3,自引:0,他引:3
简要介绍了霍尔元件的基本应用,对霍尔元件的选用原则进行了探讨,对霍尔元件实际应用过程所用到的典型放大电路进行了较为详尽的描述;还探讨了霍尔元件技术指标不等位电势的测量方法,并对霍尔元件直流激励情况下位移测量的方法进行了讨论,以霍尔元件实际应用的个例扩展到霍尔元件的广泛应用。 相似文献
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Changes in electrical as well as surface composition such as chemical and electronic properties of Mg-doped p-type GaN by phosphorus implanting are systematically investigated using Hall effect and X-ray photoelectron spectroscopy (XPS) measurements. It is shown that p-type conductivity of Mg-doped GaN can be improved by implanting P atoms after a proper post-implantation annealing treatment, probably due to the reduction of self-compensation by P atoms substitution on N vacancy sites. XPS analysis is further found that the decrease of surface oxides and the shift of the surface Fermi level toward the valence band edge through P atoms introduced. These experimental results indicate that the P implantation is an effective method to improve p-type conductivity of Mg-doped GaN and reducing the surface barrier height, which can lead to a lower metal contact resistivity to p-type GaN. 相似文献