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1.
In this paper we have shown that polycrystalline films corresponding to Tl-2223 phase can be grown by employing high thalliation temperatures and short thalliation times. Ultrasonically deposited precursor films corresponding to Ba2Ca2.2Cu3.3Ox(Agy) have been thalliated under high vacuum (∼ 10-5 torr) at 890°C to obtain single phase Tl-2223 films. An off-stoichiometric and unreacted pellet of composition Tl2.05Ba2Ca2Cu3Oz has been used as source of Tl. We have shown that oxygen ambient is not necessary for the growth of Tl-2223 phase. The as-thalliated films have Tc’s in the range 123 K ±0.70 K. TheT c has been found to be independent of the addition of AgNO3 to the precursor. The zero field transportJ c has been observed to be > 1.2 X 105 A/cm2 at 77 K. NearT c (110 K-122 K),J c has been observed to follow the power lawJ c ∞ (1-T/T c )p,p 2. A power law withp tt 1.4 has been observed for the temperature range 70 K-110 K. An optimum doping of Ag has been observed to induce about 25% increase inJ c and it also leads to uniform and enlarged grain growth. The surface morphology of Ag free samples contains plate like grains having arbitrary shapes. In contrast to this 0.35 Ag doped sample exhibits nearly rectangular plate like grains  相似文献   

2.
We report measurements of the convective thermal conductance of3He-4He mixture films near the Kosterlitz-Thouless transition. The thickness of our4He films is 14.7 and 19.1 Å above the inert layer and the3He concentration ranged from 0.033 to almost 2%. The thermal response is tested for the critical behavior as observed in pure films, and it is found to be preserved in the mixture films case. However, the parametersb, D/a 2 andT c exhibit a strong dependence on the concentration. The mixture film conductance at fixedT-T c is found to decrease upon addition of3He implying a decrease in the 2D correlation length. Mixture films thus exhibit 2D behavior over a narrower temperature range than pure films. Further, for temperaturesT c , the largest measurable conductance decreases sharply with the addition of3He. We attribute this behavior to a3He-4He scattering mechanism and a3He induced free-vortex density.  相似文献   

3.
Thin films of YBa2Cu3O7– (YBCO) have been grownin situ on silicon single-crystal (100) substrate by using SrTiO3 as a buffer layer. The deposition has been carried out by on-axis rf magnetron sputtering method. The deposition condition have been optimized by studying the plasma characteristics and correlating them with the superconducting performance of the film. Films deposited at substrate temperature in the range of 680–700°C from stoichiometric YBCO targets in an argon + oxygen mixture (31) are superconducting and showc-axis epitaxy. Compositional confirmation has been carried out using Rutherford backscattering. Scanning tunneling microscopy of the films reveal formation of well-defined layered structure with some defects in the initial stages ofin situ growth of the films. Films grown on SrTiO3 substrates have excellent crystalline quality (XRD), transition temperatureT c0=81 K and the critical current densityJ c >2×105 A/cm2 for unpatterned films at 77 K. On silicon substrates using buffer layers thein situ deposited YBCO films shows a higher transition width andT c0 is also slightly less (71 K).  相似文献   

4.
High-T c superconducting Bi2Sr2CaCu2Ox films withT c off =80 K were prepared by the dipping method of sol-gel processing using inorganic salts. The influence of the preparation conditions on the superconducting properties of the derived material is reviewed. Bi, Sr, Ca and Cu nitrates were used as raw materials. Glycerol was used as solvent. The thickness of films made by the dip method was about 0.5 m. The films were crystallized by heat-treatment at 830°C for 10 min.T c off of films was 80 K andJ c at 77 K was more than 8 kA cm–2. Synthesis of high-T c superconducting films was very easy and the crystallization of films was possible with a relatively low heat-treatment temperature.  相似文献   

5.
We have studied the structure of YBa2Cu3O7−y (YBCO) high-T c superconductor films obtained by deposition for various times under otherwise identical conditions. Thin YBCO films prepared by the nonaxial laser shadow deposition technique are epitaxial and have microstrains below 1×10−3. The main factor determining variations of the unit cell parameter c in the films is the difference of the crystal block size 〈D〉 in the direction normal to the film surface, which reflects the nanodimensional effects known in oxides.  相似文献   

6.
Thin films of GdBaCuO (GBCO) have been deposited in situ onto LaAlO3 single crystal substrates by inverted cylindrical sputtering pattern (ICP). The superconductive properties of the thin films' dependence on the substrate temperature and sputtering pressure have been systematically investigated. By optimization of the deposition parameter, high-quality c-axis epitaxial GBCO thin films of T c0>92 K were reproducibly grown. The T c of the best sample is as high as 93.2 K. Upon changing the target composition to GdBa2Cu4O y (Gd124), it was observed that the samples always show some a-axis oriented films, implying that excess copper would favor a-axis growth in thin films. The superconductivity of the thin films under higher substrate temperature (T s>800°C) was clearly improved by the procedure of special post-oxygenization at 400°C with an ozone atmosphere. This is very useful for preparing large-area thin films of GBCO.  相似文献   

7.
A novel thin film growth procedure, sequential deposition and annealing (SDA), which contains the advantages of both in situ and ex situ procedures, was proposed. Y1Ba2Cu3O7 – x (YBCO) high temperature superconducting thin films were grown and characterized by the SDA procedure. Purely c-axis-oriented YBCO thin films with no foreign phases and other oriented grains were successfully prepared. The superconducting transition properties of SDA-grown YBCO thin films were measured by measurement of inductance and resistance. The inductance measurements gave a T c onset of 85 K and a T c of 5 K. The resistance measurements gave a T c onset of 90 K and a T c of 5 K. Atomic force microscopy studies showed that SDA-grown YBCO thin films had micrometer-size grains surrounded by many nanometer-size grains. The nanometer-size grains in SDA-grown YBCO thin films are responsible for degradation of superconducting transition properties.  相似文献   

8.
Superconducting YCd 0.3 Ba 2 Cu 3 O 7- thin films have been deposited in-situ onto single crystal MgO substrates using a DC arc-sputtering process. The depositions were carried out in a single chamber deposition system equipped with two target holders. The films deposited at the optimum condition exhibited strong (00l) orientation with a high peak intensity. The best electrical properties were achieved to be 90K for T c , 81K for T zero and the transport critical current density J c =675 A/ cm 2 at 77K and 2.3×10 3 A/cm 2 at 4.2K for the sample deposited at the optimum conditions.  相似文献   

9.
We report the magnetic imaging for underdoped and optimally-dopedLa2–x Sr x CuO4 (LSCO) thin films on single substrates and nearly optimallydoped YBa2Cu3O7–x (YBCO) thin films on tricrystal substrates in the temperature range both below and above T c using scanning SQUID microscopy. Below T c, clear integer- and half-integer quantized vortices were observable. Above T c, however, the inhomogeneous diamagnetic domains appeared. The local diamagnetic domains that led to the Meissner state were found in the broad temperature range for underdoped samples and in the narrow limited temperature range for optimally-doped samples. The results provide evidence that local diamagnetic domains are closely related to the pseudogap state. The continuous connection of the domain state above T c with the state of a half-integer vortex at the tricritical point in the YBCO film below T c also indicates that the diamagnetic domains are also closely related to the occurrence of dx 2-y 2-wave superconductivity.  相似文献   

10.
Thick films of Bi-Sr-Ca-Cu-O were deposited on (100) MgO substrates by screen-printing technique with the starting composition 1112. To attain the superconducting state, the films were subjected to two-step heat-treatment. R-T and XRD have been studied for films annealed at different durations of the second step. InitiallyT c (R=0) increased from 77 to 103 K as the annealing duration was increased after whichT c decreased. Kinetics of the growth of highT c phase is discussed in the light of our results.  相似文献   

11.
Niobium nitride films with a value for Tc of up to 17.3 K have been prepared by reactive magnetron and diode sputtering in Ar and N2 gas mixture. Alteration of Tc and N2 ion implantation into NbN films was studied. It is shown that small doses of implanted ions cause an abrupt decrease of Tc to 12.8 K. Annealing at 900°C restores the high Tc By the tunnel effect, the magnitude of the energy gap is 3.05 Me V at 1.56 K for NbN with Tc = 17.1 K and 22/kTc = 4.14. The existence of an undersurface layer has been discovered, whose width is of the order of the coherence length, with a lower Tc, of 12.0–12.8 K. The superconductivity of this layer above Tc is due to the proximity effect. NbN tunnel junctions are made with a density of the Josephson current i=(1.7-2.87) · 103 A cm?2.  相似文献   

12.
The thermal resistance between liquid3He and copper potassium tutton salt (CPS) has been measured through its magnetic ordering temperature (T c=29.6 mK). The thermal resistanceR for pure3He has a broad minimum near 60 mK and increases continuously throughT cwith decreasing temperature, except for a dip atT c. BelowT c,R is proportional toT –1.5. Effects of4He coating have been studied by stepwise addition of4He into liquid3He. The thermal resistance increased drastically for the liquid containing 150 ppm4He and more for 95%4He. By sudden depressurization of the liquid3He containing 480 ppm4He, a considerable decrease ofR was observed. SinceR for pure3He was much smaller than the calculated Kapitza resistance, the present experimental results indicate the existence of surface magnetic coupling between liquid3He and CPS.  相似文献   

13.
Epitaxial Tl-2201 films are prepared on single crystal LaAlO 3 and SrTiO 3 by thallization of thallium-free precursor films made by laser ablation. Thallization is carried out in two consecutive steps. In the first step, at 720 °C, a smooth and epitaxial film is produced. The second thallization, at 820 °C, improved film crystallinity and the T c . The films were characterized by X-ray diffraction and by resistance and susceptibility measurements. For a film on single crystal LaAlO 3 , the FWHM of the scan (0,0,10) was 0.27°. T c was 84K while J c , reached 1.6×10 6 A/ cm 2 at 77K. A film on single crystal SrTiO 3 exhibited somewhat lower T c (78 K) while J c was much smaller (9.5×10 3 A/cm 2 at 70.4K).  相似文献   

14.
The superconducting transition temperatures of Cd and Zn films deposited upon a liquid3He-cooled substrate increase compared to the bulk values. In disordered Cd, values of around 0.9 K are obtained, while correspondingT c for Zn is about 1.4 K. These values agree well with theoretically predicted ones. For a Cd0.9Ge0.1, probably amorphous, film,T c is further increased to about 1.6 K in approximate agreement with theory. The ratio between the energy gap andT c , 2(0)/k B T c , remains considerably lower than 3.53 in all the disordered films. This, as well as fairly broad transition ranges and the shape of the fluctuation pairing contribution to the conductance, is taken as an indication of structural inhomogeneities of the films. In pure, quenchcondensed Mg films, no superconductivity is detected above 0.35 K.  相似文献   

15.
The in situ process—laser ablation in combination with thermal evaporation of Tl2O—has turned out to be a preparation method for single-phase and epitaxial TlBa2Ca2Cu3O9 (1223) thin films with T c values up to 109 K. It was found by several groups that a partial substitution of Tl by Bi simplifies the phase development of the 1223 compound in the usual two-step process. We have investigated the influence of the Bi doping on the in situ growth. X-ray measurements show that the films consisted mainly of the 1223 compound. In 300-nm thin films there was no evidence of a Bi amount in the crystal structure, but thinner films (80 nm) show a small amount of Bi. We concluded that Bi doping supports the phase development of the 1223 compound only in an early stage of the film growth. The Bi-doped films have higher T c values up to 114 K, higher j c values up to 6 × 105 A/cm2 (77 K, 0 T), and lower surface resistances of 56 m (77 K, 87 GHz) than the undoped films.  相似文献   

16.
Abstract

Thin polycrystalline zinc-doped indium oxide (In2O3–ZnO) films were prepared by post-annealing amorphous films with various weight concentrations x of ZnO in the range 0x 0.06. We have studied the dependences of the resistivity ρ and Hall coefficient on temperature T and magnetic field H in the range 0.5T 300 K, H6 Tfor 350 nm films annealed in air. Films with 0x0.03 show the superconducting resistive transition. The transition temperature Tc is below 3.3 K and the carrier density n is about 1025–1026 m?3. The annealed In2O3–ZnO films were examined by transmission electron microscopy and x-ray diffraction analysis revealing that the crystallinity of the films depends on the annealing time. We studied the upper critical magnetic field Hc2 (T) for the film with x = 0.01. From the slope of dHc2 /dT, we obtain the coherence length ξ (0) ≈ 10 nm at T = 0 K and a coefficient of electronic heat capacity that is small compared with those of other oxide materials.  相似文献   

17.
Bi(Pb)SrCaCuO films have been deposited on single (MgO) and polycrystalline (poly MgO, CuO) substrates by DC sputtering. All the films became superconducting after post-annealing them in air. The films on single crystal MgO showedT c onset at 120 K andT c at 92 K. However, the extrapolated zero resistivity is obtained at 106 K. The ac susceptibility showed an onset at 106 K and a sharp transition at 85 K. The films on poly MgO and poly CuO had aT c=72 K. The preparation, X-ray diffraction and morphology of these samples are presented.  相似文献   

18.
Surface impedance measurements on highly c-axis epitaxial Nd 1+x Ba 2–x Cu 3 O 7 (x=0, 0.09 and 0.12) films grown by d.c. magnetron sputtering on LaAlO 3 substrates are presented. It is found that the zero temperature London penetration depth correlates well with the critical temperature of the films and with the corresponding number of carriers. The low temperature penetration depth follows a linear T law for optimally doped Nd123 sample and a T 2 law in Nd-rich samples. In the case of the heavily underdoped samples (T c < 60K) the T 2 law extends to temperatures higher than T c/2. The possible role of the Nd/Ba ions substitution on the penetration depth and surface resistance is discussed.  相似文献   

19.
Thin films of YBa2Cu3O7?δ (YBCO) have been grownin situ on silicon single-crystal (100) substrate by using SrTiO3 as a buffer layer. The deposition has been carried out by on-axis rf magnetron sputtering method. The deposition condition have been optimized by studying the plasma characteristics and correlating them with the superconducting performance of the film. Films deposited at substrate temperature in the range of 680–700°C from stoichiometric YBCO targets in an argon + oxygen mixture (3∶1) are superconducting and showc-axis epitaxy. Compositional confirmation has been carried out using Rutherford backscattering. Scanning tunneling microscopy of the films reveal formation of well-defined layered structure with some defects in the initial stages ofin situ growth of the films. Films grown on SrTiO3 substrates have excellent crystalline quality (XRD), transition temperatureT c0=81 K and the critical current densityJ c >2×105 A/cm2 for unpatterned films at 77 K. On silicon substrates using buffer layers thein situ deposited YBCO films shows a higher transition width andT c0 is also slightly less (71 K).  相似文献   

20.
We have studied the surface structure of rf-sputtered Nb3Ge films by means of reflection electron diffraction and Auger electron spectroscopy. It is found that a tetragonal Nb5Ge3 phase exists, being partly disordered, at the surface of high-T c films, whereas A15 phase is predominant in the body of the film as proved by x-ray diffraction. The tetragonal surface phase is replaced by an amorphous phase in thin films of <1000 Å, where reducedT c 's as compared with those of thick films are found. Single A15 phase occurs at the surface of Ge-deficient films which have lowT c 's. Auger analysis has shown a pronounced Ge-rich layer with a depth of 60–100 Å, depending on film composition and thickness. At the top of the surface layer, Ge is enriched beyond a composition corresponding to Nb5Ge3. It is inferred that the Ge-rich layer is responsible for formation of the tetragonal phase.Work supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture of Japan.  相似文献   

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