发展中的溅射靶材

作为制备和生产功能薄膜的方法之一,溅射法广泛应用于许多领域,它是目前备金属薄膜最常用的工艺,作为高用的靶材是一种全新的概念,随着高技术用新材料突飞猛进的发展,世界靶材的市场销售规模日益扩大,本重点介绍了靶材的发展概况,应用分类,制备工艺,技术要求以及中国靶材产业的发展前景等。     

集成电路电极布线用铝合金薄膜及其溅射靶材

近年来 ,铝合金薄膜广泛用作半导体集成电路的电极布线材料。作为制备溅射薄膜材料的铝合金靶材也获得了相应的应用。本文介绍了集成电路电极布线用铝合金薄膜及其溅射靶材的种类和性能 ,铝合金靶材的制备工艺以及铝合金靶材的发展趋势。     

集成电路电极布线用铝合金薄膜及其溅射靶材

近年来,铝合金薄膜广泛用作半导体集成电路的电极布线材料。作为制备溅射薄膜材料的铝合金靶材也获得了相应的应用。本文介绍了集成电路电极布线用铝合金薄膜及其溅射靶材的种类和性能,铝合金靶材的制备工艺以及铝合金靶材的发展趋势。     

铝合金功能薄膜与溅射靶材

近年来,铝合金广泛用于生产多种功能薄膜,作为制备高性能溅射薄膜用的铝合金靶材也得到了相应的应用。本重点介绍应用于不同领域的几种铝合金功能薄膜,简述了铝合金薄膜与溅射靶材的制备工艺、铝合金靶材的显微结构及其对溅射薄膜性能的影响,最后指出了铝合金薄膜及溅射靶材的发展趋势。     

铝合金功能薄膜与溅射靶材

近年来 ,铝合金广泛用于生产多种功能薄膜。作为制备高性能溅射薄膜用的铝合金靶材也得到了相应的应用。本文重点介绍应用于不同领域的几种铝合金功能薄膜 ,简述了铝合金薄膜与溅射靶材的制备工艺、铝合金靶材的显微结构及其对溅射薄膜性能的影响 ,最后指出了铝合金薄膜及溅射靶材的发展趋势     

氧化锌铝(ZAO)陶瓷靶材制备及其薄膜性能

溶胶-凝胶方法制备的ZnO和Al2O3混合粉末经冷压预成型加真空低压烧结,制备了高致密度(相对密度99%)、低成本的ZAO陶瓷靶材.研究了ZAO靶材与无氧铜的粘接性能.用中频交流磁控溅射ZAO靶材的工艺制备了ZAO薄膜.利用SEM和XRD分析测试了陶瓷靶材断口形貌以及靶材和薄膜的结构.试验结果表明制得的ZAO靶材具有良好的粘接性和溅射性能,内部组织致密,靶材中有明显的ZnAl2O4相.在优化沉积工艺条件下,制备的ZAO薄膜方块电阻为35 Ω,电阻率可达3.84×10-4 Ω·cm,可见光透过率(λ=550 nm)可达91.1%.沉积态的ZAO薄膜具有很好的结晶性,并呈现(002)择优取向.ZAO薄膜有明显的紫外吸收限,带隙Eg约为3.76 eV.ZAO靶材的工业化磁控镀膜试验也取得了较好的结果.     

磁性陶瓷靶材的制备及其应用研究

薄膜制备过程中溅射靶材的利用率很低,导致薄膜材料制备成本很高。以自制的高纯度纳米晶镍钴锌/二氧化硅复合铁氧体粉体为原料,冷等静压后高温烧结制备得到铁氧体复合靶材。用XRD、EPMA和SEM分析靶材的化学成分和微观形貌。结果表明：靶材为尖晶石型铁氧体和二氧化硅的复合材料,收缩率达14.37%,能在高真空多功能磁控溅射仪正常工作,并成功制备得到性能良好的软磁薄膜。整个制备过程工艺简单,操作方便可行,大大降低了靶材的制备成本。     

铜铟镓硒薄膜的真空制备工艺及靶材研究现状

阐述了两种真空法制备铜铟镓硒(CIGS)薄膜的工艺原理和工艺过程,比较和分析了两工艺的优缺点;介绍了溅射靶材的熔融铸造法和粉末冶金法,列举了靶材制备中所需的温度、压强、保温时间等参数。最后分析认为,用均匀细小的黄铜矿相CIGS粉末压制烧结成四元靶材,经溅射成膜后退火处理,可制备出优异的CIGS薄膜,具有更广阔的应用前景。     

烧结气氛压力对高性能TFT用ITO靶材结瘤性能的研究

通过在烧结过程中调节气氛气压改变烧结压力来制备高性能ITO靶材,采用磁控溅射生长ITO薄膜,采用X射线衍射(XRD)、紫外-可见分光光度计、原子力显微镜(AFM)、扫描电子显微镜等对ITO薄膜进行表征并对靶材表面进行观察。结果表明烧结压力略高于标准大气压(0.105 MPa)工艺条件下制备的ITO靶材表面的结瘤更少。磁控溅射制备的薄膜均处于非晶状态,薄膜的表面粗糙度由0.35nm降低至0.28nm,薄膜的平均光学透过率均高于84%。改善工艺后的ITO靶材制备的ITO薄膜刻蚀残留非常少。在优化的工艺条件下,靶材质量得到有效改善,透明导电氧化物薄膜性能得到提高。     

工艺参数对磁控溅射TaOx薄膜离子导体性能的影响

采用射频反应磁控溅射工艺,以纯钽为靶材,在WO3/ITO/Glass基材上制备TaOx薄膜,研究氧含量、溅射功率等制备工艺参数对TaOx薄膜性能的影响.用三位电极法和透射光谱等方法检测薄膜的离子导电性能,结果表明:所得的TaOx薄膜主要为非晶态,在一定范围内,在较低的溅射功率和较低的氧含量实验条件下制备的TaOx薄膜具有较好的离子导电性能.     

FC/ZnO杂化材料的制备及耐水洗牢度

采用射频磁控溅射法,首先以聚四氟乙烯(PTFE)为靶,氩气为载气,在聚对苯二甲酸乙二醇酯(PET)基底上沉积氟碳(FC)膜,然后以金属锌为靶,氩气为载气,氧气为反应气体,在FC膜上再沉积一层ZnO膜而形成FC/ZnO有机-无机纳米杂化材料。用原子力显微镜(AFM)、X射线光电子能谱仪(XPS)以及静态接触角测定仪对FC膜以及FC/ZnO杂化膜的耐水洗牢度性质进行了研究。结果表明,该法制得的沉积膜接触角都大于90°,呈现出良好的疏水性。FC/ZnO杂化膜由于沉积了无机ZnO膜,其耐水洗牢度较氟碳膜好。     

Fabrication and optical characterization of template-constructed thin films with chiral nanostructure

We report the fabrication of thin films perforated by high aspect ratio helical or chevron pores by an extension of the glancing angle deposition (GLAD) technique. The perforated films were created by transferring the nanostructure of a GLAD template film into target materials such as polymers and spin-on-glasses and subsequently removing the template. The pore shapes are shown to be highly controllable and films designed to suit particular applications are discussed. By a double templating technique, we replicate the structure of the original film using alternate materials, which are typically less suited to the unmodified GLAD technique. Helical films of Cu and Ni were created by this method and the process should be transferable to additional electrodeposited materials. The optical rotatory power of perforated thin films formed on glass substrates was characterized and perforated films were shown to be effective in rotating the polarization plane of linearly polarized incident light by as much as 1.4/spl deg///spl mu/m.     

FC／ZnO杂化材料的制备及结构与性能

采用射频磁控溅射法,分别以聚四氟乙烯(PTFE)和锌为靶,在聚对苯二甲酸乙二醇酯(PET)基底上沉积氟碳(FC)膜以及FC/ZnO的有机-无机纳米杂化材料。用SEM、UV、XPS对氟碳膜和杂化材料进行了表征。结果表明,氟碳膜形成了一种由纳米粒子-纳米孔洞组成的双纳米结构,随着ZnO沉积时间的不同,FC/ZnO杂化膜呈现出不同的表面形貌,杂化膜的生长模式是一种依附于有机核的沉积-扩张生长模式;杂化材料的F/C较低,随着氧化锌沉积时间的增加,F/C出现逐渐增大的趋势;杂化膜是一种多重抗紫外线辐射的功能膜。     

阻隔薄膜在复合软包装材料中的应用与发展动向

按阻隔性的赋予方法对复合软包装材料进行了分类,对阻隔薄膜在复合软包装材料中的应用与开发历程进行了综述。通过对铝箔类、树脂类、透明蒸镀陶瓷类阻隔薄膜的市场动向与发展趋势进行分析,指出透明蒸镀陶瓷阻隔薄膜及其复合软包装材料将是今后环境适应型软包装材料开发的重要方向。     

Influence of microstructure on the electrochemical performance of tin-doped indium oxide film electrodes

The effect of the microstructure of tin-doped indium oxide (ITO) films on their electrochemical performance was studied using three redox probes, tris(2,2'-bipyridyl ruthenium(II) chloride (Ru(bpy)3(2+/3+)), ferrocyanide (Fe(CN)6(4-/3-)), and ferrocenemethanol (FcCH2H(0/+)). ITO films were deposited using dc magnetron sputtering under a variety of conditions that resulted in films having different degrees of crystallinity, crystallographic texture, sheet resistance, surface roughness, and percent tin. It was found that the electron transfer for all three redox probes used in this study was more efficient at polycrystalline films than at amorphous ITO films. This effect is more pronounced at faster scan rates. The crystallographic texture of the ITO films, surface roughness, and a change in sheet resistance from 7.9 to 13.7 ohms/square did not have an effect on electron-transfer kinetics. ITO films deposited using a 1 wt % SnO2 target and having sheet resistance comparable to films deposited using a 10 wt % SnO2 target had dramatically different microstructure from the films with higher weight percent Sn and were shown to perform poorly when used as electrode materials. We believe that the dramatic differences in electron-transfer kinetics observed at the various ITO films can be attributed to either the different density of defect sites along the grain boundaries or defect sites caused by substitutional Sn in the film.     

纳米金刚石薄膜的制备特点及特性

纳米金刚石薄膜具有金刚石薄膜和纳米材料的双重优异特性，而在制备工艺上又与金刚石薄膜有所不同，通过与金刚石作比较，综述了纳米金刚石薄膜的制备特点，表征方法；并列举了其在场发射、耐磨减摩等领域的应用和其独特性能。     

反应磁控溅射离子镀氮化钛薄膜质量与工艺参数的关系

本文总结了影响反应磁控溅射离子镀氮化钛膜层质量的主要工艺参数。测得了靶极电压与氮气流量、靶极电流与氮气流量、溅射室内压强与氮气流量、氮化钛膜的颜色与氮分压、氮化钛膜的颜色与基板温度、靶极功率与氩气分压的关系以及薄膜层中氮、钛含量沿薄膜表面的分布。上述结果对提高溅射速率和薄膜质量有很大的实际意义。     

纳米高频软磁薄膜材料研究进展

由于高频软磁薄膜材料具有巨大的应用前景因此获得了人们广泛的关注。对纳米合金软磁薄膜、纳米软磁颗粒膜、多层膜以及图形化薄膜进行了分类综述,分别介绍了各类薄膜的制备方法、化学成分、微观结构特点和高频物理性能,并对影响其性能的主要因素进行了讨论。由于纳米高频软磁薄膜材料相对于传统磁性材料具有显著优势,所以纳米合金软磁薄膜有望取代铁氧体作为制作高频磁性器件的主要应用材料。由于纳米软磁颗粒膜、多层膜以及新兴的图形化薄膜具有材料结构设计和物性剪裁的自由度,因此将是今后的重点研究方向。     

Characterization of l‐polylactide and l‐polylactide–polycaprolactone co‐polymer films for use in cheese‐packaging applications

Impact‐modified and unmodified l ‐polylactide and l ‐polylactide–polycaprolactone co‐polymer films were evaluated for their suitability as materials for cheese packaging. The polymers were in some cases compounded with nanoclays as a possible route to enhanced barrier properties and/or with cyclodextrin complexes designed to provide slow release of encapsulated antimicrobials for control of mould growth on packaged cheeses. The materials demonstrated complete biodegradation under controlled composting conditions and the extruded films had acceptable transparency. Moisture uptake by films and a decrease in polymer molecular weight with time of exposure to high humidity were identified as areas of concern, although the polymer stability experiments were undertaken at 25°C and stability at normal cheese storage temperatures (～4°C) is expected to be better. Nanoclay addition enhanced the thermal stability of the polymer but reduction of oxygen and water vapour permeability to target levels through incorporation of 5% w/w nanoclay was not achieved, possibly in part due to inadequate dispersion of the nanoclays in the chosen polymer matrices. On the positive side, a novel impact‐modified polylactide was developed that overcame problems with brittleness in unmodified l ‐polylactide and l ‐polylactide–polycaprolactone co‐polymer films, and tests indicated that a cyclodextrin‐encapsulated antimicrobial (allyl isothiocyanate) incorporated in l ‐polylactide–polycaprolactone co‐polymer films would be effective in controlling fungi on packaged cheeses. Migration of substances from the l ‐polylactide or l ‐polylactide–polycaprolactone films into cheese is not expected to be a problem. Copyright © 2005 John Wiley & Sons, Ltd.