共查询到20条相似文献,搜索用时 156 毫秒
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介绍了气体小流量系统现场校验的基本组成部分,及为克服现场校准流量源不稳定所设计的恒流量装置,从而保证了现场校验结果的准确性,实现了气体小流量系统的现场校准。 相似文献
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介绍了应用可编程逻辑控制器(PLC)和差压传感器构建稳流采样系统实现大气采样器采样流量恒定的设计原理和应用。 相似文献
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W. Jitschin 《真空研究与实践》2003,15(4):188-193
In the testing of leak tightness and in the localisation of leaks by means of a test gas, proper operation and sensitivity of the employed instrument must be checked by a certified reference leak. In the so‐called sniffer mode of operation, the component under test is filled to overpressure with the test gas, so that in case of a leak there is a gas flow from the component to atmosphere. The atmospheric gas is sucked by the instrument and probed for its test gas content. For checking the instruments performance, commercial test leaks are available for various gas species, which deliver a well‐defined leakage. Construction and properties of such a test leak are described. The leak has an internal gas reservoir and a capillary as leak element. Because the inlet pressure at the capillary is kept constant by a pressure controller, the leakage remains constant over several years despite the gradual pressure decrease in the gas reservoir. The calibration of the leakage via the volume flow rate is described in detail. The volume flow rate can be measured by a liquid drop in a measuring capillary as well as a displacement piston in a dosing syringe. 相似文献
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张兆华 《制冷与空调(北京)》2014,(8):36-37
介绍单螺杆式冷水机组中油压差控制器的作用,以及油压差控制器在机组回油系统中的设计,并通过实例对设计方案进行分析比较,排除油压差控制器频繁报警现象,总结油压差控制器在系统设计过程中应注意事项。 相似文献
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本文建立了两种控制器(单通道最优控制器(SCOC)和多变量线性二次高斯控制器(LQG))以改善跨临界CO2引射制冷系统的运行效率。首先建立了SCOC,通过在线调节喷嘴喉部面积,搜索系统最优的气冷器压力;其次针对SCOC作用下制冷量不可控的缺点,设计了LQG以实现系统制冷量可调。将两种控制器分别应用于实验系统中,结果表明:SCOC能够驱使系统不断接近给系统的最优气冷器压力,给定工况下获得最大制热系数COPh为3.15,但导致系统制冷量的不可控。在LQG的作用下,气冷器压力、系统制冷量得到独立控制,显示了很好的参数跟随性,然而LQG无法保证系统的稳态运行效率。研究指出两种控制器各有优缺点,若实现满足系统负荷需求的同时保持系统最高的运行效率,需要设计结合两种算法特点的新型控制器。 相似文献
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本文介绍了一种基于分子流传感元件的真空腔体漏率测量方法,该方法通过分子流传感元件测量真空腔体整体漏率,采用的测量装置由气体流量测量系统、真空抽气系统、恒温系统等部分组成.在测量系统中,流经传感元件的气流处于分子流状态,通过测量传感元件两端的差压,计算质量流量,可以得到真空腔体的整体漏率.实验中对多个真空腔体漏率的测量结... 相似文献
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Dr. Franz Josef Schittko 《真空研究与实践》2011,23(5):22-26
Questions about vacuum molecular pumps For experiments about gas friction we used a turbomolecular pump with magnetic bearings. The blade system was replaced by a cylinder of carbon fiber materal. lt rotates in a stationary aluminium cylinder at a distance of 0. 8 and 0. 4 millimeters at a rotating speed up to 48000 rpm. We got a linear dependance of the reciprocal values of pressure and viscosity in good agreement with other experiments in that field. Preparing experiments showed us our apparatus is working like a pump too. We saw differential pressures in dependance of flow and gas pressures. In our sytem pumping works against the flow resistance. The pumping range is limited by a graph showing the compensation of pumping and resistance. Here we have no flow through the system but only in tangential direction by the rotation The experiments showed graphs with 2 arms showing the compensaion of pumping and flow resistance. In the range between the arms the pressure difference reaches the highbest negativ numbers. That is the point of best pumping. The position of this point decreases to lower rotation frequencies with rising gas pressure and flow. The question is: what are the reasons for this behavior? Possibly the molecular pump developped by Siegbahn uses this effect. It makes higher compression rates by lowering the friction speed. The molecular pump of the Holweck type has at a constant rotation speed an optimal pumping effect at a certain nitrogen gas pressure and flow. At this optimum the pump makes high compression rates for additional hydrogen or helium. 相似文献
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Norbert Pcheim 《真空研究与实践》1995,7(1):39-46
In reactive processes a process gas is fed into the process chamber after evacuation. The most important precondition for a reproceable process is a stable process pressure. Pressure control is carried out either by controlling the gas flow on the gas inlet side or by regulating the effective pumping speed on the chamber output side. The application of the user determines, which of the two sysstms is best suited. Plasma enhanced etching and coating processes encounter a growing importance in the semiconductor industry. At the same time applications have expanded to improvement procedures of metallic surfaces and production of computer hard discs, based on plasma processes as reactive vapour deposition and sputtering. For many of these applications pressure control via the gas input is sufficient. But the increasing demands on the quality of the micro structures with modern surface processes can only be satisfied by independent control of the gas flow and the process pressure. Pressure control independent of the gas flow is achieved by controlling the effective pumping speed of the vacuum pump. The presented paper starts with the general theory of pressure control, and deals with the various aspects of pressure control, including downstream pressure control with throttle valvê, adaptive controller and sensor. 相似文献
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研究了木聚糖酶和β-木糖苷酶的超滤分离过程中,气体鼓泡的作用、气体流量、液相流量和操作压强对溶剂透过率和分离因数的影响.结果发现,通入少量的空气即能显著改善溶剂透过率和分离因数,这种改善效果与操作条件相关,液相进料速度较低、操作压强较高时,气体鼓泡所产生的效果较为明显.在实验条件下,空气的通入可使溶剂透过率增加近60%,分离因数提高了9倍左右,增加到了36倍.适宜的空气流量为25~50 mL/min;在气体鼓泡的情况下,溶剂透过率随操作压强线性地增加,而分离因数不受操作压强影响. 相似文献