Spatially separated atomic layer deposition of Al2O3, a new option for high‐throughput Si solar cell passivation

A next generation material for surface passivation of crystalline Si is Al₂O₃. It has been shown that both thermal and plasma‐assisted (PA) atomic layer deposition (ALD) Al₂O₃ provide an adequate level of surface passivation for both p‐ and n‐type Si substrates. However, conventional time‐resolved ALD is limited by its low deposition rate. Therefore, an experimental high‐deposition‐rate prototype ALD reactor based on the spatially separated ALD principle has been developed and Al₂O₃ deposition rates up to 1.2 nm/s have been demonstrated. In this work, the passivation quality and uniformity of the experimental spatially separated ALD Al₂O₃ films are evaluated and compared to conventional temporal ALD Al₂O₃, by use of quasi‐steady‐state photo‐conductance (QSSPC) and carrier density imaging (CDI). It is shown that spatially separated Al₂O₃ films of increasing thickness provide an increasing surface passivation level. Moreover, on p‐type CZ Si, 10 and 30 nm spatial ALD Al₂O₃ layers can achieve the same level of surface passivation as equivalent temporal ALD Al₂O₃ layers. In contrast, on n‐type FZ Si, spatially separated ALD Al₂O₃ samples generally do not reach the same optimal passivation quality as equivalent conventional temporal ALD Al₂O₃ samples. Nevertheless, after “firing”, 30 nm of spatially separated ALD Al₂O₃ on 250 µm thick n‐type (2.4 Ω cm) FZ Si wafers can lead to effective surface recombination velocities as low as 2.9 cm/s, compared to 1.9 cm/s in the case of 30 nm of temporal ALD Al₂O₃. Copyright © 2011 John Wiley & Sons, Ltd.     

Thin Al2O3 passivated boron emitter of n‐type bifacial c‐Si solar cells with industrial process

We have presented thin Al₂O₃ (~4 nm) with SiN_x:H capped (~75 nm) films to effectively passivate the boron‐doped p⁺ emitter surfaces of the n‐type bifacial c‐Si solar cells with BBr₃ diffusion emitter and phosphorus ion‐implanted back surface field. The thin Al₂O₃ capped with SiN_x:H structure not only possesses the excellent field effect and chemical passivation, but also establishes a simple cell structure fully compatible with the existing production lines and processes for the low‐cost n‐type bifacial c‐Si solar cell industrialization. We have successfully achieved the large area (238.95 cm²) high efficiency of 20.89% (front) and 18.45% (rear) n‐type bifacial c‐Si solar cells by optimizing the peak sintering temperature and fine finger double printing technology. We have further shown that the conversion efficiency of the n‐type bifacial c‐Si solar cells can be improved to be over 21.3% by taking a reasonable high emitter sheet resistance. Copyright © 2017 John Wiley & Sons, Ltd.     

Laser processing of Al2O3/a‐SiCx:H stacks: a feasible solution for the rear surface of high‐efficiency p‐type c‐Si solar cells

We explore the potential of laser processing aluminium oxide (Al₂O₃)/amorphous silicon carbide (a‐SiC_x:H) stacks to be used at the rear surface of p‐type crystalline silicon (c‐Si) solar cells. For this stack, excellent quality surface passivation is measured with effective surface recombination velocities as low as 2 cm/s. By means of an infrared laser, the dielectric film is locally opened. Simultaneously, part of the aluminium in the Al₂O₃ film is introduced into the c‐Si, creating p+ regions that allow ohmic contacts with low‐surface recombination velocities. At optimum pitch, high‐efficiency solar cells are achievable for substrates of 0.5–2.5 Ω cm. Copyright © 2012 John Wiley & Sons, Ltd.     

High‐efficiency black silicon interdigitated back contacted solar cells on p‐type and n‐type c‐Si substrates

This work demonstrates the high potential of Al₂O₃ passivated black silicon in high‐efficiency interdigitated back contacted (IBC) solar cells by reducing surface reflectance without jeopardizing surface passivation. Very low reflectance values, below 0.7% in the 300–1000 nm wavelength range, together with striking surface recombination velocities values of 17 and 5 cm/s on p‐type and n‐type crystalline silicon substrates, respectively, are reached. The simultaneous fulfillment of requirements, low reflectance and low surface recombination, paves the way for the fabrication of high‐efficiency IBC Si solar cells using black silicon at their front surface. Outstanding photovoltaic efficiencies over 22% have been achieved both in p‐type and n‐type 9‐cm² cells. 3D simulations suggest that efficiencies of up to 24% can be obtained in the future with minor modifications in the baseline fabrication process. Copyright © 2015 John Wiley & Sons, Ltd.     

Novel field‐effect passivation for nanostructured Si solar cells using interfacial sulfur incorporation

Surface passivation of a nanostructured Si solar cells plays a crucial role in collecting photogenerated carriers by mitigating carrier recombination at surface defect sites. Interface modification by additional sulfur (S) incorporation is proposed to enhance the field‐effect passivation performance. Here, we report that simple annealing in a H₂S ambient induced additional negative fixed charges at the interface between atomic‐layer‐deposited Al₂O₃ and nanostructured Si. Annealing at various temperatures allowed us to control the S concentration and the fixed charge density. The optimized S incorporation at the interface significantly enhanced the negative fixed charge density and the minority carrier lifetime up to ~5.9 × 10¹² cm⁻² and ~780 μs, respectively. As a result, the internal quantum efficiency was nearly two times higher in the blue response region than that of control cells without S incorporation. Copyright © 2017 John Wiley & Sons, Ltd.     

多孔硅表面的Al2O3钝化处理

用A12O3钝化的方法对多孔硅进行了后处理，获得了光致发光强度强、发光稳定的样品。通过对样品进行傅里叶变换红外吸收谱的测试和分析，指出了A12O3结构的产生是实验中多孔硅发光稳定性提高的原因。     

99Al2O3陶瓷的烧成工艺

以两种结构的99Al2O3陶瓷的烧成为例,研究了烧成工艺对烧成结果的影响,分析了99Al2O3陶瓷烧成时开裂的原因,并提出了有效的解决方案.     

K2O-B2O3-SiO2/Al2O3LTCC复合基板材料性能研究

采用K2O-B2O3-SiO2玻璃与Al2O3复合烧结,制备了K2O-B2O3-SiO2/Al2O3低温共烧陶瓷(LTCC)复合基板材料,研究了不同组分含量对体系微观结构和性能的影响。结果表明,复合基板材料的相对介电常数εr和介质损耗均随着Al2O3含量的增加而增加,当Al2O3质量分数为45%时,复合基板材料的介质损耗为0.0085,εr为4.55(1MHz)。抗弯强度可达到160MPa。     

钙铝硼硅玻璃/氧化铝复合材料性能研究

通过高温熔融法制备的CaO-Al2O3-B2O3-SiO2玻璃粉末与α-Al2O3粉末按照质量分数50:50混合,烧结制备了钙铝硼硅玻璃/氧化铝系低温共烧陶瓷材料,研究了烧结温度对复合材料的物相组成、微观结构、力学性能及介电性能的影响.结果表明,875℃烧结制备的复合材料性能最佳,抗弯强度为164 MPa,介电常数为7.8,介电损耗为0.001 3,热膨胀系数为5.7×10-6/℃,具有良好的综合性能,可用作低温共烧陶瓷基板材料.     

玻璃粉料粒度对B-Al-Si/Al2O3性能的影响

通过改变球磨时间,得到不同粒度的B2O3-Al2O3-SiO2(简称B-Al-Si或BAS)玻璃粉料。在玻璃粉料中混入质量分数为40%的Al2O3陶瓷粉末,用流延法制备了低温共烧BAS/Al2O3玻璃/陶瓷复相材料。研究了烧结温度和玻璃的粒度对复相材料的烧结性能、介电性能和热稳定性的影响。结果表明:在800～900℃,材料致密化后析出钙长石晶体;球磨1h的玻璃粉料与w(Al2O3)40%混合烧结的复相材料的性能最优,850℃保温30min后,于10MHz测试,其εr=7.77,tanδ=1×10-4;扫描电镜显示其微观结构致密,有少量闭气孔。     

Surface passivation of high‐efficiency silicon solar cells by atomic‐layer‐deposited Al2O3

Atomic‐layer‐deposited aluminium oxide (Al₂O₃) is applied as rear‐surface‐passivating dielectric layer to passivated emitter and rear cell (PERC)‐type crystalline silicon (c‐Si) solar cells. The excellent passivation of low‐resistivity p‐type silicon by the negative‐charge‐dielectric Al₂O₃ is confirmed on the device level by an independently confirmed energy conversion efficiency of 20·6%. The best results are obtained for a stack consisting of a 30 nm Al₂O₃ film covered by a 200 nm plasma‐enhanced‐chemical‐vapour‐deposited silicon oxide (SiO_x) layer, resulting in a rear surface recombination velocity (SRV) of 70 cm/s. Comparable results are obtained for a 130 nm single‐layer of Al₂O₃, resulting in a rear SRV of 90 cm/s. Copyright © 2008 John Wiley & Sons, Ltd.     

烧结镍工艺的应用研究

二次金属化工艺现多采用电镀镍工艺技术,镍层在金属化层中所起的作用：优化焊料对金属化层的润湿,保护金属化层免于焊料的侵蚀,增强焊接强度和真空气密性。本文以生产实践为基础探讨获得镍层的工艺技术之异同及实用效果之比对。     

灾害医学救援中应把握的几个要点

制备了具有不同Al2O3含量的(Ca0.7Nd0.3)(Ti0.7Al0.3)O3微波介质陶瓷,并通过XRD、SEM、能谱分析(EDS)及材料介电性能测试结果的分析研究了Al2O3对陶瓷体烧结性能、介电性能和显微结构的影响.结果发现,添加Al2O3后体系主晶相未发生改变,仍为正交钙钛矿结构.Al2O3的添加促进了晶粒的生长,有效地降低了体系的烧结温度,材料的介电常数不随Al2O3的添加发生明显变化,但其品质因数与对应频率的乘积(Q×f)值则随添加量的增大呈先上升后减小的趋势,最高可达25 153 GHz.     

Rear‐Passivated Ultrathin Cu(In,Ga)Se2 Films by Al2O3 Nanostructures Using Glancing Angle Deposition Toward Photovoltaic Devices with Enhanced Efficiency

In this work, for the first time, the addition of aluminum oxide nanostructures (Al₂O₃ NSs) grown by glancing angle deposition (GLAD) is investigated on an ultrathin Cu(In,Ga)Se₂ device (400 nm) fabricated using a sequential process, i.e., post‐selenization of the metallic precursor layer. The most striking observation to emerge from this study is the alleviation of phase separation after adding the Al₂O₃ NSs with improved Se diffusion into the non‐uniformed metallic precursor due to the surface roughness resulting from the Al₂O₃ NSs. In addition, the raised Na concentration at the rear surface can be attributed to the increased diffusion of Na ion facilitated by Al₂O₃ NSs. The coverage and thickness of the Al₂O₃ NSs significantly affects the cell performance because of an increase in shunt resistance associated with the formation of Na₂Se_X and phase separation. The passivation effect attributed to the Al₂O₃ NSs is well studied using the bias‐EQE measurement and J–V characteristics under dark and illuminated conditions. With the optimization of the Al₂O₃ NSs, the remarkable enhancement in the cell performance occurs, exhibiting a power conversion efficiency increase from 2.83% to 5.33%, demonstrating a promising method for improving ultrathin Cu(In,Ga)Se₂ devices, and providing significant opportunities for further applications.     

Bi2O3对Al2O3-ZnO-Bi2O3-B2O3低熔玻璃结构和性能的影响

采用传统的熔淬技术制得了低熔Al2O3-ZnO-Bi2O3-B2O3玻璃,研究了玻璃结构、玻璃特征温度、线膨胀系数(α1)以及密度随Bi2O3含量的变化关系.结果表明:随着Bi2O3含量的增加,玻璃网络中[BO4]取代了部分[BO3],玻璃网络中出现Bi-O结构,玻璃中非桥氧的数量也逐渐增多;软化温度(ts)、玻璃化温度(tg)都是先上升后下降,而线膨胀系数先减小后逐渐增大,玻璃密度先是线性增加,然后增加趋势变大.     

Al2O3对Ni60激光熔覆层组织和耐磨性的影响

采用自动送粉激光熔覆技术,在A3钢表面进行了Ni60合金添加Al2O3的激光熔覆试验,通过对工艺参数和Al2O3含量的选取,获得了性能改善的激光熔覆层。对熔覆层横截面进行了硬度测试和显微组织分析,对熔覆层表面进行了X射线衍射物象分析和摩擦磨损试验。结果表明:与纯Ni60激光熔覆层相比,添加适量Al2O3的Ni60激光熔覆层的平均硬度提高300Hv0.3,耐磨性提高4倍。分析认为,Al2O3能够大大提高Ni60激光熔覆层硬度和耐磨性的原因在于:适量Al2O3的加入,可抑制涂层中粗大的脆性硬质相的形成,起到细化晶粒的作用:而形成的Al2Cr4C2细小颗粒增强相均匀弥散分布在组织中,不容易脱落,很好的起着均匀载荷和减摩抗磨作用。     

准连续Ti~(3+):Al_2O_3可调谐激光的研究

本文给出了Ti~(3+):Al_2O_3的准连续可调谐激光的实验结果。采用Nd:YAG内腔倍频532nm的准连续输出作为泵浦源,得到Ti~(3+):Al_2O_3的连续可调谐输出。波长覆盖范围为685nm到821nm。最大输出功率为293mW,斜率效率为20％,在805nm处的窄谱输出功率达240mW,总体转换效举为26％。     

BaTiO_3表面包裹氧化铝的改性研究

采用固相法、非匀相沉淀法、喷雾干燥法三种不同方法,对掺杂Nd、Y、Mn的BaTiO3表面包裹Al2O3,研究了包裹A12O3对BaTiO3基陶瓷的微观形貌、介电常数、介电非线性、容温变化率的影响。结果表明,喷雾干燥法包裹A12O3的BaTiO3基陶瓷性能较优:所制陶瓷粒径为0.6μm,绝缘电阻率达到1011.cm,介电常数变化率为21.5%,容温变化率为58.3%。     

纳米YAG/Al2O3复相陶瓷材料性能与微观结构研究

采用高分子网络凝胶法直接制备YAG纳米粉体，XRD结果表明，所得粉体具纯的YAG相，平均粒径在30nm。通过热压烧结得到了致密YAG／Al2O3烧结体。所得的致密体材料为晶内型和晶间型混合分布。其抗弯强度达498．56MPa，比单相Al2O3陶瓷有大幅度提高。     

Diffusion‐based model of local Al back surface field formation for industrial passivated emitter and rear cell solar cells

In this work, the back surface field (BSF) formation of locally alloyed Al‐paste contacts employed in recent industrial passivated emitter and rear cell solar cell designs is discussed. A predictive model for resulting local BSF thickness and doping profile is proposed that is based on the time‐dependent Si distribution in the molten Al paste during the firing step. Diffusion of Si in liquid Al away from the contact points is identified as the main differentiator to a full‐area Al‐BSF; therefore, a diffusion‐based solution to the involved differential equation is pursued. Data on the Si distribution in the Al and the resulting BSF structures are experimentally obtained by firing samples with different metal contact geometries, peak temperature times and pastes as well as by investigating them by means of scanning electron microscopy and energy dispersive X‐ray spectroscopy. The Si diffusivity in the Al paste is then calculated from these results. It is found that the diffusivity is strongly dependent on the paste composition. Furthermore, the local BSF doping profiles and thicknesses resulting from different contact geometries and paste parameters are calculated from the Si concentration at the contact sites, the diffusivity and solubility data. These profiles are then used in a finite element device simulator to evaluate their performance on solar cell level. With this approach, a beneficial paste composition for any given rear contact geometry can be determined. Two line widths are investigated, and the effects of the different paste properties are discussed in the light of the solar cell results obtained by simulation. Copyright © 2013 John Wiley & Sons, Ltd.