对涂塑复合铝带抗张强度计算方法的探讨

对单面、双面二种涂塑复合铝带的裸铝带和它们不同材料的涂塑层的断裂负荷作了比较试验.进一步证实了涂塑复合铝带,由于它的涂塑层存在着一定的强度作用(尤其是单面涂塑复合铝带,有时它的涂塑层强度几乎与其裸铝带的强度一样,甚至还高些),作者认为,无论是单面涂塑复合铝带,还是双面涂塑复合铝带,都应该取它们的总厚度来计算试样的抗张强度.何况,技术文件规定是测“涂塑复合铝带”抗张强度.而不是测裸铝带的抗张强度.     

磁控溅射陶瓷薄膜(SiOx)阻隔性机理的研究

研究了磁控溅射镀陶瓷薄膜(SiOx)使PET基体阻隔性提高的机理,并对SiOx层的堆积结构做了假设及理论分析,结合SEM形貌表明:磁控溅射SiOx层存在层状结构及针孔随机分布,阻隔性的提高可由努森扩散和层流两种机理加以解释,即在一定的压力差下,阻隔性提高决定于针孔的分布、陶瓷层厚度以及SiOx层数.     

以γ-氯丙基三甲氧基硅烷作活化剂共价修饰季胺盐的纳米SiOx粉体的抗菌性的研究

在纳米SiOx表面通过先接枝高分子聚乙烯亚胺(PEI)长链,再用卤代烷烷基化成高分子季铵盐,制得一种新型的纳米SiOx粉体.抗菌实验表明,采用此工艺制得的纳米SiOx粉体对革兰氏阳性菌、革兰氏阴性茵、酵母茵和霉菌均有较好的抗茵性.对细茵的临界抗茵浓度为1.0mg/ml.热处理和洗涤实验表明抗茵纳米SiOx具有良好的耐热性能和稳定性.     

氧化硅阻隔膜的制备及对水蒸气的阻隔特性研究

利用强流电子束蒸发技术在厚度为12μm的PET基材上制备了阻隔性能优良的高阻隔SiOx薄膜.所制备的SiOx薄膜无色透明,与基材附着牢固;PET基材上的SiOx薄膜厚度不同,对水蒸气的阻隔性能不同.膜厚为340～3200nm时,阻隔性能可提高1～32倍.通过控制真空度和蒸发速率等参数可以控制SiOx薄膜的有关性能.     

涂塑照相纸基生产过程中几个重要工艺参数的选择

1.引言涂塑照相纸基生产,目前国内还是一项新的技术。涂塑照相纸基生产工艺参数的选择,直接影响到产品的质量。国内以前无成功的工业化生产先例,国外又极少有资料介绍,给生产尤其是工艺操作带来一定难度。近年来引进了涂塑照相纸基生产线,经过多方面的努力和探索,我们在涂塑照相纸基生产工艺上得到了一点生产经验。下面针对挤出涂塑照相纸基在生产中的几个工艺参数选择作一探讨。     

大气压下冷等离子弧制备SiO_x涂层超疏水表面

采用冷等离子弧在大气压下以六甲基二硅氧烷为单体制备SiOx超疏水薄膜,研究不同工艺参数对薄膜的结构性能影响。通过傅里叶红外光谱(FTIR)对SiOx薄膜进行了结构分析、通过原子力显微镜(AFM)和数字光学显微镜分析了SiOx薄膜的表面形貌、通过接触角仪测试了所沉积的SiOx薄膜亲/疏水性。在较为详细的研究冷等离子弧制备工艺参数对薄膜的影响后,如基片高度、单体输入量、沉积时间等,我们得到,在基片高度为10cm、单体输入量为90mL.min-1、沉积时间为2min时,可以制备出接触角为160°以上的SiOx超疏水表面。     

水热法制备Ge/SiOx纳米电缆

以混合的氧化锗粉和硅粉为原料,采用水热法在高温高压下制备出具有核-壳同轴结构的Ge／SiOx纳米电缆。扫描和透射电镜研究表明这种Ge／SiOx纳米同轴电缆的产量高,直径分布均匀,长度可达微米级,并证实其为非晶态SiOx包裹Ge内核的核-壳结构。Ge芯线沿着[211]方向生长。Ge／SiOx纳米同轴电缆的生长过程遵循气-液-固和氧化物辅助生长机制,与原料中GeO2与Si的比率有关。     

反应蒸发制备nmSi-SiOx发光薄膜

报道了用真空反应蒸发制备nmSi/SiOx 薄膜 ,制备出含有不同纳米尺寸硅颗粒的薄膜 ,研究了不同条件下得到的nmSi SiOx 薄膜的结构和组分。实验发现以SiO为蒸发源制备的薄膜能够实现光致发光。初步分析nmSi SiOx 薄膜发光机制可能是由纳米硅量子效应引起的 ,界面效应和缺陷对薄膜PL可能没有贡献 ,解释了有纳米硅颗粒存在但观察不到PL的原因     

硅含量对SiO_x薄膜光学和电学性能的影响

利用射频磁控溅射法通过调节硅(Si)靶的溅射功率制备了不同的富硅氧化硅(SiOx,1相似文献   

SiO_x/低密度聚乙烯纳米材料的性能

将不同ζ电位的水溶性硅溶胶与乙烯-醋酸乙烯酯共聚物(EVA)的四氢呋喃溶液共混,蒸出水和溶剂制得母料,母料与低密度聚乙烯(LDPE)密炼,制备出SiOx/LDPE纳米材料。研究了硅溶胶的ζ电位对SiOx在LDPE纳米材料中粒径和分散性的影响,进而研究对纳米材料力学性能和电学性能的影响。结果发现,硅溶胶的稳定性与SiOx/LDPE纳米材料的性能密切相关,硅溶胶的ζ电位越大,SiOx在纳米材料中的粒径越小,分散越均匀,纳米复合材料的力学性能越高,空间电荷的抑制效果越明显,当ζ电位为-16.80 mV时,SiOx粒径小于100 nm,复合材料的弹性模量为53.73 MPa,断裂伸长率为972.41%,拉伸强度为10.13 MPa,断裂功为12.48 J/m2,电荷的注入量降低为2.5 C/m3~3.0 C/m3。     

高阻隔性塑料包装膜及其应用

介绍了高阻隔性塑料包装膜的种类,分析了各种膜的特点,指出了我国高阻隔性包装膜与国外存在差距,强调应加强这方面的研究.     

Plasmavorbehandlung und Beschichtung von Kunststoffolien. Teil 1: Beschichtung von unbehandelten Kunststoffolien

Plasma Pretreatment and Coating of Polymer Films. Part 1: Coating of Non-treated Polymer Films The food packaging industry demands cheap polymer films possessing a high barrier against permeation of gases, moisture and flavor. Candidates for the most successful materials fulfilling these requirements are vacuum web coated biaxial oriented polypropylene (BOPP) films containing a thin inorganic barrier layer. For a good adhesion of the barrier layer on the BOPP films, the polymer film must be pretreated. The industry uses the Corona atmosphere plasma. This work is separated in three parts. The first part describes the experimental setup and the properties of vacuum web coated layers on polymer films. The next part contains the results of the systematic modification of polymer surfaces by atmosphere and low pressure plasmas. The influence of the surface properties on the final functionality of the coated films is given. In the last part, the discussion of the results of the first and second part reveals systematic relations between the production parameters of the high barrier films and their final functionality. These results firstly reveal the adhesion mechanism of the inorganic barrier layers of the polymer films and the necessary surface properties of the polymer films, in order to get cheap high barrier films by vacuum web coating.     

阻隔薄膜在复合软包装材料中的应用与发展动向

按阻隔性的赋予方法对复合软包装材料进行了分类,对阻隔薄膜在复合软包装材料中的应用与开发历程进行了综述。通过对铝箔类、树脂类、透明蒸镀陶瓷类阻隔薄膜的市场动向与发展趋势进行分析,指出透明蒸镀陶瓷阻隔薄膜及其复合软包装材料将是今后环境适应型软包装材料开发的重要方向。     

Plasmavorbehandlung und Beschichtung von Kunststoffolien. Teil 3: Auswertung der experimentellen Ergebnisse und Diskussion

Plasma Pretreatment and Coating of Polymer Films. Part 3: Analysis of the Experimental Results and Discussion The food packaging industry demands cheap polymer films possessing a high barrier against permeation of gases, moisture and flavour. Candidates for the most successful materials fulfilling these requirements are vacuum web coated biaxial oriented polypropylene (BOPP) films containing a thin inorganic barrier layer. For a good adhesion of the barrier layer on the BOPP films, the polymer film must be pretreated. The industry uses the Corona atmosphere plasma. This work is separated in three parts. The first part describes the experimental setup and the properties of vacuum web coated layers on polymer films[1] The next part contains the results of the systematic modification of polymer surface by atmosphere and low pressure plasmas[2]. The influence of the surface properties on the final functionality of the coated films is given. In the last part, the discussion of the results of the first and second part reveals systematic relations between the production parameters of the high barrier films and their final functionality. These results firstly reveal the adhesion mechanism of the inorganic barrier layers of the polymer films and the necessary surface properties of the polymer films, in order to get cheap high barrier films by vacuum web coating.     

Plasmavorbehandlung und Beschichtung von Kunststoffolien. Teil 2: Experimentelle Ergebnisse der Plasmavorbehandlung von Kunststoffolien

Plasma Pretreatement and Coating of Polymer Films. Part 2: Experimental Results of the Plasma Pretreatment of Polymer Films The food packaging industry demands cheap polymer films possessing a high barrier against permeation of gases, moisture and flavor. Candidates for the most successful materials fulfilling these requirements are vacuum web coated b iaxial o riented p olypropylene (BOPP) films containing a thin inorganic barrier layer. For a good adhesion of the barrier layer on the BOPP films, the polymer film must be pretreated. The industry uses the Corona atmosphere plasma. This work is separated in three parts. The first part describes the experimental setup and the properties of vacuum web coated layers on polymer films [1]. The next part contains the results of the systematic modification of po } ymer surface by atmosphere and low pressure plasmas. The influence of the surface properties on the final functionality of the coated films is given. In the last part, the discussion of the results of the first and second part reveals systematic relations between the production parameters of the high barrier films and their final functionality. These results firstly reveal the adhesion mechanism of the inorganic barrier layers of the polymer films and the necessary surface properties of the polymer films, in order to get cheap high barrier films by vacuum web coating.     

Microstructure of porous anodic oxide films on aluminium

Microstructure of porous anodized films of aluminium prepared in sulphuric acid solution are different from those prepared in an oxalic or phosphoric acid solution. Transmission electron microscopy reveals a multilayer or higher order structure in the former films. Infrared spectra and specific surface area were also studied for these films and new functional properties of the films suitable for new materials were found. In contrast to the fibrous colloidal structure in the cells and barrier layer in the conventional films anodized in a sulphuric acid solution at d.c. 15 V, a network structure is formed in the cells and barrier layer in the hard films prepared at higher voltage of d.c. 25 V. The microstructure changes according to the anodizing conditions. A new model for these sulphuric acid films is presented, i.e. the cell walls are constructed from five layers and the fracture of the films occurs at the centre of the cell walls. Centre barrier layer (4 to 6 nm in thickness) composed of aluminium oxide of high crystallinity was found in a barrier layer at the bottom of the pore, and the thickness is independent on the applied voltage of the anodizing. Increase in thickness of the barrier layer due to applied voltage is governed by that of the outer barrier layer.     

In-situ inspection of cracking in atomic-layer-deposited barrier films on surface and in buried structures

Thin inorganic barrier films deposited on plastics are essential to provide protection from moisture- and oxygen-aided degradation while maintaining a flexible substrate. Mechanical bending of the barrier films, causes stress-induced cracks that may lead to significant reduction or loss of barrier protection. In-situ characterization of film cracking on the nanoscale, transparent, and conformal atomic-layer-deposited (ALD) thin films is challenging especially when these films are in a buried layer structure. We developed a technique that can inspect in real-time the cracking of the stressed barrier films using laser scanning confocal microscopy. The in-situ inspection avoids the inaccurate measurement of the crack onset strain associated with the crack “close-up” phenomenon. SU8 cover-coat is applied to form a buried ALD layer structure and in-situ inspection demonstrates the cracking of the ALD film in real-time underneath the cover-coat. This technique is nondestructive, versatile, and allows rapid and large-area inspection of different types of barrier films.     

微小缺陷对铝塑复合软包装材料阻隔性影响的研究

以铝箔及镀铝复合软包装薄膜为主要研究对象,采用揉搓和对折实验来模拟微孔、裂缝等微小缺陷对铝塑复合软包装材料阻隔性的影响,并用金相显微镜观察分析材料表面微观变化。研究表明,随着揉搓和对折次数的增加,各种材料的阻氧、阻湿性能均有不同程度的降低;与全塑复合材料相比,铝塑复合材料阻隔性受揉搓和对折的次数影响更大;铝塑复合材料中,镀铝复合材料阻隔性最易受到微小缺陷影响;铝箔复合材料中铝箔的厚度也在一定程度上影响其阻隔性受缺陷影响的程度。     

聚乳酸单轴拉伸膜的包装特性研究

目的研究了不同拉伸比的PLLA薄膜的热学性能、阻隔性能和热收缩性能。方法采用双螺杆挤流延试验机单轴拉伸制备了不同拉伸比的PLLA热收缩膜和定向拉伸膜,采用差示扫描量热分析仪(DSC)、透湿仪和透氧仪对不同拉伸比的PLLA薄膜的热学性能和阻隔性能进行了评估,并对PLLA膜的热收缩性进行了测定。结果热收缩膜的拉伸比由1增大到6.5时,PLLA的结晶度由0.2%增加到41.8%,结晶速率明显提高,阻隔性得到了一定的改善。随着拉伸比例的增大,热收缩率随之增大。定向拉伸膜的结晶度得到了大幅度提高,其阻隔性也得到了改善,但不呈现热收缩性。结论通过单轴拉伸可以有效地提高PLLA薄膜的结晶速率和结晶度,经过中等拉伸比例的PLLA薄膜,其阻湿阻氧能力相对较强。     

Effect of under-layer treatment of Ta/TaN barrier film on corrosion between Cu seed and Ta in chemical-mechanical-polishing slurry

Tantalum/tantalum nitride (Ta/TaNx) composite film is widely used as a copper (Cu) diffusion barrier layer. In order to reduce via-resistance, an additional argon (Ar) re-sputtering process is used to thin the barrier thickness at the feature bottom. In this study, the effect of Ar re-sputtering of the under-layer of TaNx barrier films on the corrosion between Cu seeds and upper Ta films in chemical-mechanical-polishing (CMP) slurries was investigated. The results show that Ar re-sputtering of the under-layer of the TaNx barrier has a strong influence on the corrosion of Cu seeds and Ta films. The equivalent circuit, simulated using data from electrochemical analysis, reveals changes in resistance and capacitance elements of the Cu-Ta electrochemical system, proving that the phase transformation of upper Ta films under different TaNx conditions leads to different degrees corrosion of Cu seeds and the Ta films.