InSe Schottky Diodes Based on Van Der Waals Contacts

2D semiconductors are excellent candidates for next‐generation electronics and optoelectronics thanks to their electrical properties and strong light‐matter interaction. To fabricate devices with optimal electrical properties, it is crucial to have both high‐quality semiconducting crystals and ideal contacts at metal‐semiconductor interfaces. Thanks to the mechanical exfoliation of van der Waals crystals, atomically thin high‐quality single‐crystals can easily be obtained in a laboratory. However, conventional metal deposition techniques can introduce chemical disorder and metal‐induced mid‐gap states that induce Fermi level pinning and can degrade the metal‐semiconductor interfaces, resulting in poorly performing devices. In this article, the electrical contact characteristics of Au–InSe and graphite–InSe van der Waals contacts, obtained by stacking mechanically exfoliated InSe flakes onto pre‐patterned Au or graphite electrodes without the need for lithography or metal deposition is explored. The high quality of the metal‐semiconductor interfaces obtained by van der Waals contact allows to fabricate high‐quality Schottky diodes based on the Au–InSe Schottky barrier. The experimental observation indicates that the contact barrier at the graphite–InSe interface is negligible due to the similar electron affinity of InSe and graphite, while the Au–InSe interfaces are dominated by a large Schottky barrier.     

MoS2/MoTe2 Heterostructure Tunnel FETs Using Gated Schottky Contacts

2D transition metal dichalcogenide based van der Waals materials are promising candidates to realize tunnel field effect transistors (TFETs) with a steep subthreshold swing (SS) for low‐power applications. Their atomically flat, self‐passivated layers offer potentially defect free interlayer tunneling. There are still several issues that need to be addressed to experimentally achieve a steep SS, e.g., the Schottky contacts, impact of thick layers, and device architecture with respect to gate configuration. This paper resolves these challenges by experimentally demonstrating MoS₂/MoTe₂ TFETs and their electrical characteristics, in conjunction with ab initio simulations and surface Kelvin probe microscopy. The Schottky barrier's effect at the contact regions are isolated by fabricating individual buried gates below the contacts. Devices with different top and bottom gate configurations are produced to understand the impact of gate placement on the heterostructure characteristics. Quantum transport simulations are performed on MoS₂/MoTe₂ multilayer stack to evaluate the impact of multiple layers on TFET performance, effect of gate placement, and the mechanism behind indirect tunneling over the heterojunction region. This work highlights the influence of the Schottky contacts, multiple layers and the role of different gate configurations on the band‐to‐band tunneling phenomenon in 2D heterojunction TFETs.     

基于肖特基接触的碳纳米管场效应晶体管

由于具有独特的一维纳米结构、稳定的化学特性和优异的电学性能,单壁碳纳米管被认为是制作高性能电子器件以及下一代纳米电路的理想材料,作为新型基础电子元件的一种,碳纳米管场效应晶体管一直是研究的热点。研究了一种基于非对称肖特基接触的碳纳米管场效应晶体管,金属钯与金属铝分别作为电极材料制作出的碳纳米管场效应晶体管分别表现出p型和n型的导通特性,当这两种金属分别作为源、漏电极制作在单根半导体性单壁碳纳米管的两端时,便构成了非对称肖特基接触结构碳纳米管场效应晶体管。器件表现出了优良的整流特性,整流比达到103,在栅压的调控下,正向电流的开关比接近103。     

MXene Electrode for the Integration of WSe2 and MoS2 Field Effect Transistors

Recently, MXenes, which are 2D early transition metal carbides and carbonitrides, have attracted wide attention because of their excellent conductivities. Here, the electrode applications of Ti₂C(OH)_xF_y, one member of the MXene family, in WSe₂ and MoS₂ field effect transistors (FETs) are assessed. Kelvin probe force microscopy analysis is performed to determine its work function, which is estimated to be ≈4.98 eV. Devices based on WSe₂/Ti₂C(OH)_xF_y and MoS₂/Ti₂C(OH)_xF_y heterostructures are fabricated with the mechanical transfer method and their electronic performances evaluated. The temperature‐dependent current–voltage transfer characteristics of the devices are determined to extract their Schottky barrier heights. The hole barrier between WSe₂ and Ti₂C(OH)_xF_y is estimated to be ≈0.23 eV and the electron barrier between the MoS₂ band and Ti₂C(OH)_xF_y is ≈0.19 eV, which indicates that the pinning effect occurs at the MoS₂/Ti₂C(OH)_xF_y interface but not at the WSe₂/Ti₂C(OH)_xF_y interface; this difference arises because of the difference between the band structures of WSe₂ and MoS₂. A complementary metal–oxide–semiconductor inverter based on these electrode properties of Ti₂C(OH)_xF_y with MoS₂ (n‐channel) and WSe₂ (p‐channel) is fabricated, which demonstrates that Ti₂C(OH)_xF_y is a promising electrode for future nanoelectronics applications.     

Recent Advances in 2D MXenes for Photodetection

A new class of 2D transition metal carbides, carbonitrides and nitrides, termed MXenes, has emerged as a new candidate for many applications in electronics, optoelectronics, and energy storage. Since their first discovery in 2011, MXenes have gathered increasingly more interest owing to their unique physical, chemical, and mechanical properties that can be tuned by different surface terminations and transition metals. In particular, the intriguing optical and electrical properties, including transparency, saturable absorption, and high conductivity, grant MXenes various roles in photodetectors, such as transparent electrodes, Schottky contacts, photoabsorbers, and plasmonic materials. Given the solution‐processability, MXenes also hold great potential for large‐scale synthesis, and thus are favored for a number of electronic and photonic device applications. In this review, recent advances in photodetectors based on 2D MXenes are summarized. Despite the fact that such applications have only recently been explored compared with other 2D materials, MXenes have shown promise in low‐cost and high‐performance photodetection.     

Improved Ni Schottky Contacts on <Emphasis Type="Italic">n</Emphasis>-Type 4H-SiC Using Thermal Processing

High-temperature processing was used to improve the barrier properties of three sets of n-type 4H-SiC Schottky diodes fabricated with Ni Schottky contacts. We obtained an optimum average barrier height of 1.78 eV and an ideality factor of 1.09 using current–voltage measurements on diodes annealed in vacuum at 500°C for 24 h. Nonannealed contacts had an average barrier height of 1.48 eV and an ideality factor of 1.85. The Rutherford backscattering spectra of the Ni/SiC contacts revealed the formation of a nickel silicide at the interface, accompanied by a substantial reduction in oxygen following annealing.     

Junction Field-Effect Transistors Based on PdSe2/MoS2 Heterostructures for Photodetectors Showing High Responsivity and Detectivity

2D materials have shown great promise for next-generation high-performance photodetectors. However, the performance of photodetectors based on 2D materials is generally limited by the tradeoff between photoresponsivity and photodetectivity. Here, a novel junction field-effect transistor (JFET) photodetector consisting of a PdSe₂ gate and MoS₂ channel is constructed to realize high responsivity and high detectivity through effective modulation of top junction gate and back gate. The JFET exhibits high carrier mobility of 213 cm² V⁻¹ s⁻¹. What is more, the high responsivity of 6 × 10² A W⁻¹, as well as the high detectivity of 10¹¹ Jones, are achieved simultaneously through the dual-gate modulation. The high performance is attributed to the modulation of the depletion region by the dual-gate, which can effectively suppress the dark current and enhance the photocurrent, thereby realizing high detectivity and responsivity. The JFET photodetector provides a new approach to realize photodetectors with high responsivity and detectivity.     

SiC肖特基接触的直接隧穿效应

通过精确求解一维定态薛定谔方程得到电子通过三角形势垒的隧穿几率,模拟了SiC肖特基接触的直接隧穿效应.结果显示该方法比WKB近似更精确,同时也更适合工作在高场条件下的SiC材料,并且能够连续地计算热电子发射电流和隧穿电流.     

In Situ Formation of Multiple Schottky Barriers in a Ti3C2 MXene Film and its Application in Highly Sensitive Gas Sensors

The main gas‐sensing mechanisms of 2D materials are surface charge transfer by analytes and Schottky barrier (SB) modulation at the interface between the metallic and semiconducting surfaces. In particular, dramatic differences in the gas‐sensing performances of 2D materials originate from SB modulation. However, SB sites typically exist only at the interface between the semiconducting channel material and the metal electrode. Herein, in situ formed multiple SBs in a single gas‐sensing channel are demonstrated, which are derived from the heterojunction of metallic Ti₃C₂ and semiconducting TiO₂. In stark contrast with previous techniques, edge‐oxidized Ti₃C₂ flakes are synthesized by solution oxidation, allowing the uniform formation of TiO₂ crystals on all flakes that comprise the gas sensing channel. Oxidized colloidal solutions are subjected to vacuum filtration to automatically form SB sites at the multiple inter‐flake junctions in both the outer surface and inner bulk regions of the film. The TiO₂/Ti₃C₂ composite sensor shows 13.7 times higher NO₂ sensitivity as compared with pristine Ti₃C₂ MXene, while the responses of the reducing gases are almost unchanged. The results suggest a new strategy for improving gas‐sensing performance by maximizing the density of SB sites through a simple method.     

Engineering Field Effect Transistors with 2D Semiconducting Channels: Status and Prospects

The continuous miniaturization of field effect transistors (FETs) dictated by Moore's law has enabled continuous enhancement of their performance during the last four decades, allowing the fabrication of more powerful electronic products (e.g., computers and phones). However, as the size of FETs currently approaches interatomic distances, a general performance stagnation is expected, and new strategies to continue the performance enhancement trend are being thoroughly investigated. Among them, the use of 2D semiconducting materials as channels in FETs has raised a lot of interest in both academia and industry. However, after 15 years of intense research on 2D materials, there remain important limitations preventing their integration in solid‐state microelectronic devices. In this work, the main methods developed to fabricate FETs with 2D semiconducting channels are presented, and their scalability and compatibility with the requirements imposed by the semiconductor industry are discussed. The key factors that determine the performance of FETs with 2D semiconducting channels are carefully analyzed, and some recommendations to engineer them are proposed. This report presents a pathway for the integration of 2D semiconducting materials in FETs, and therefore, it may become a useful guide for materials scientists and engineers working in this field.     

Achieving Ultrahigh Electron Mobility in PdSe2 Field-Effect Transistors via Semimetal Antimony as Contacts

Even though atomically thin 2D semiconductors have shown great potential for next-generation electronics, the low carrier mobility caused by poor metal–semiconductor contacts and the inherently high density of impurity scatterings remains a critical issue. Herein, high-mobility field-effect transistors (FETs) by introducing few-layer PdSe₂ flakes as channels is achieved, via directly depositing semimetal antimony (Sb) as drain–source electrodes. The formation of clean and defect-free van der Waals (vdW) stackings at the Sb–PdSe₂ heterointerfaces boosts the room temperature transport characteristics, including low contact resistance down to 0.55 kΩ µm, high on-current density reaching 96 µA µm⁻¹, and high electron mobility of 383 cm² V⁻¹ s⁻¹. Furthermore, metal–insulator transition (MIT) is observed in the PdSe₂ FETs with and without hexagonal boron nitride (h–BN) as buffer layers. However, the layered h–BN/PdSe₂ vdW stacking eliminates the interference of interfacial disorders, and thus the corresponding device exhibits a lower MIT crossing point, larger mobility exponent of γ ∼ 1.73, significantly decreased hopping parameter of T₀, and ultrahigh electron mobility of 2,184 cm² V⁻¹ s⁻¹ at 10 K. These findings are expected to be significant for developing high mobility 2D-based quantum devices.     

Large‐Area Chemical Vapor Deposited MoS2 with Transparent Conducting Oxide Contacts toward Fully Transparent 2D Electronics

2D semiconductors are poised to revolutionize the future of electronics and photonics, much like transparent oxide conductors and semiconductors have revolutionized the display industry. Herein, these two types of materials are combined to realize fully transparent 2D electronic devices and circuits. Specifically, a large‐area chemical vapor deposition process is developed to grow monolayer MoS₂ continuous films, which are, for the first time, combined with transparent conducting oxide (TCO) contacts. Transparent conducting aluminum doped zinc oxide contacts are deposited by atomic layer deposition, with composition tuning to achieve optimal conductivity and band‐offsets with MoS₂. The optimized process gives fully transparent TCO/MoS₂ 2D electronics with average visible‐range transmittance of 85%. The transistors show high mobility (4.2 cm² V^?1 s^?1), fast switching speed (0.114 V dec^?1), very low threshold voltage (0.69 V), and large switching ratio (4 × 10⁸). To our knowledge, these are the lowest threshold voltage and subthreshold swing values reported for monolayer chemical vapor deposition MoS₂ transistors. The transparent inverters show fast switching properties with a gain of 155 at a supply voltage of 10 V. The results demonstrate that transparent conducting oxides can be used as contact materials for 2D semiconductors, which opens new possibilities in 2D electronic and photonic applications.     

Accurate Extraction of Schottky Barrier Height and Universality of Fermi Level De-Pinning of van der Waals Contacts

Due to Fermi level pinning (FLP), metal-semiconductor contact interfaces result in a Schottky barrier height (SBH), which is usually difficult to tune. This makes it challenging to efficiently inject both electrons and holes using the same metal—an essential requirement for several applications, including light-emitting devices and complementary logic. Interestingly, modulating the SBH in the Schottky–Mott limit of de-pinned van der Waals (vdW) contacts becomes possible. However, accurate extraction of the SBH is essential to exploit such contacts to their full potential. In this study a simple technique is proposed to accurately estimate the SBH at the vdW contact interfaces by circumventing several ambiguities associated with SBH extraction. Using this technique on several vdW contacts, including metallic 2H-TaSe₂, semi-metallic graphene, and degenerately doped semiconducting SnSe₂, it is demonstrated that vdW contacts exhibit a universal de-pinned nature. Superior ambipolar carrier injection properties of vdW contacts are demonstrated (with Au contact as a reference) in two applications, namely, a) pulsed electroluminescence from monolayer WS₂ using few-layer graphene (FLG) contact, and b) efficient carrier injection to WS₂ and WSe₂ channels in both n-type and p-type field effect transistor modes using 2H-TaSe₂ contact.     

Analog Circuit Applications Based on All‐2D Ambipolar ReSe2 Field‐Effect Transistors

Complementary circuits based on 2D materials show great promise for next‐generation electronics. An ambipolar all‐2D ReSe₂ field‐effect transistor (FET) with a hexagonal boron nitride gate dielectric is fabricated and its electronic characteristics are comprehensively studied by temperature dependence and noise measurements. Ambipolar transfer characteristics are achieved owing to the tunable Fermi level of the graphene contact and negligible and 30 meV Schottky barrier heights for the n‐ and p‐channel regimes, respectively. An inverter is also fabricated to demonstrate ambipolar ReSe₂ FET operation in a logic circuit. Furthermore, a p/n switchable unipolar FET is designed and shows potential for building complimentary circuits from a signal device. This work demonstrates the potential of all‐2D ReSe₂ FETs and makes available new approaches for designing next‐generation devices.     

Gate-Last MoS2 Transistors for Active-Matrix Display Driving Circuits

Advancements in display technology have primarily focused on discovering new materials to develop thin-film transistors (TFTs) that complement mainstream technologies. The emerging 2D semiconductors are one of the most promising candidates due to their ultra-thin thickness, exceptional electrical qualities, and large-scale availability. However, these atomically thin materials are delicate and typically prepared through standard gate-first fabrication processes, necessitating their transfer onto specific substrates. In this study, a demonstration of an in situ gate-last process for 2D semiconductor-based TFTs technology is presented. This approach bypasses the yield-limiting transfer process, enabling large-scale display applications. The as-fabricated MoS₂ TFTs retains their intrinsic properties with a current density reaching ≈≈10 µA µm⁻¹. Additionally, it is successfully showcased that the two transistor-one capacitor active-matrix display driving circuits with a high pixel yield. The patterned matrix exhibits no crosstalk and can be driven by either the pulse amplitude modulation or pulse width modulation scheme, offering flexible applications.     

High‐Performance Field Effect Transistors Using Electronic Inks of 2D Molybdenum Oxide Nanoflakes

Planar 2D materials are possibly the ideal channel candidates for future field effect transistors (FETs), due to their unique electronic properties. However, the performance of FETs based on 2D materials is yet to exceed those of conventional silicon based devices. Here, a 2D channel thin film made from liquid phase exfoliated molybdenum oxide nanoflake inks with highly controllable substoichiometric levels is presented. The ability to induce oxygen vacancies by solar light irradiation in an aqueous environment allows the tuning of electronic properties in 2D substoichiometric molybdenum oxides (MoO_3?x). The highest mobility is found to be ≈600 cm² V^?1 s^?1 with an estimated free electron concentration of ≈1.6 × 10²¹ cm^?3 and an optimal I_On/I_Off ratio of >10⁵ for the FETs made of 2D flakes irradiated for 30 min (x = 0.042). These values are significant and represent a real opportunity to realize the next generation of tunable electronic devices using electronic inks.     

Large‐Area Bilayer ReS2 Film/Multilayer ReS2 Flakes Synthesized by Chemical Vapor Deposition for High Performance Photodetectors

Rhenium disulfide (ReS₂) is attracting more and more attention for its thickness‐depended direct band gap. As a new appearing 2D transition metal dichalcogenide, the studies on synthesis method via chemical vapor deposition (CVD) is still rare. Here a systematically study on the CVD growth of continuous bilayer ReS₂ film and single crystalline hexagonal ReS₂ flake, as well as their corresponding optoelectronic properties is reported. Moreover, the growth mechanism has been proposed, accompanied with simulation study. High‐performance photodetector based on ReS₂ flake shows a high responsivity of 604 A·W^?1, high external quantum efficiency of 1.50 × 10⁵ %, and fast response time of 2 ms. ReS₂ film‐based photodetector exhibits weaker performance than the flake one; however, it still demonstrates a much faster response time (≈10³ ms) than other reported CVD‐grown ReS₂‐based photodetector (≈10⁴–10⁵ ms). Such good properties of ReS₂ render it a promising future in 2D optoelectronics.     

Improved Schottky Contacts on <Emphasis Type="Italic">n</Emphasis>-Type 4H-SiC Using ZrB<Subscript>2</Subscript> Deposited at High Temperatures

We report on improved electrical properties and thermal stability of ZrB₂ Schottky contacts deposited on n-type 4H-SiC at temperatures between 20°C and 800°C. The Schottky barrier heights (SBHs) determined by current-voltage measurements increased with deposition temperature, from 0.87 eV for contacts deposited at 20°C to 1.07 eV for those deposited at 600°C. The Rutherford backscattering spectroscopy (RBS) spectra of these contacts revealed a decrease in oxygen peak with an increase in the deposition temperature and showed no reaction at the ZrB₂/SiC interface. These results indicate improved electrical and thermal properties of ZrB₂/SiC Schottky contacts, making them attractive for high-temperature applications.     

Fully-Depleted PdTe2/WSe2 van der Waals Field Effect Transistor with High Light On/Off Ratio and Broadband Detection

Due to its unique band structure and topological properties, the 2D topological semimetal exhibits potential applications in photoelectric detection, polarization sensitive imaging, and Schottky barrier diodes. However, its inherent large dark current hinders the further improvement of the performance of the semimetal-based photodetectors. In this study, a van der Waals (vdWs) field effect transistor (FET) composed of semimetal PdTe₂ and transition metal dichalcogenides (TMDs) WSe₂ is fabricated, which exhibits high sensitivity photoelectric detection performance in a wide band from visible light (405 nm) to mid-infrared (5 µm). The dark current and the noise level in the device are greatly suppressed by the effective control of the gate. Benefiting from the extremely low dark current (1.2 pA), the device achieves an optical on/off ratio up to 10⁶, a high detectivity of 9.79 × 10¹³ Jones and a rapid response speed (219 and 45 µs). This research demonstrates the latent capacity of the 2D topological semimetal/TMDs vdWs FET for broadband, high-performance, and miniaturized photodetection.