6328全反射介质膜真空镀膜工艺探讨

阐述了6328 全反射介质膜的镀膜原理和实际镀膜工艺,分析了镀膜后必须进行固膜的原因,并给出了镀制6328 全反射介质膜的蒸镀参数和经过固膜后的测量结果分析。     

6328(A)全反射介质膜真空镀膜工艺探讨

阐述了6328(A)全反射介质膜的镀膜原理和实际镀膜工艺,分析了镀膜后必须进行固膜的原因,并给出了镀制6328全反射介质膜的蒸镀参数和经过固膜后的测量结果分析.     

激光器全反射介质膜的制作原理与光学厚度测定

阐述了光学薄膜的镀制原理、反射率推算,阐述了镀制全反射介质薄膜过程中光学厚度的测定方法-极值法测量的原理和所用光线的波长,阐述了得到高反射率的条件,给出了测量膜厚的实验系统装置,并叙述了镀制17层全反射介质薄膜的过程和测量的方法,最后给出了17层全反射介质薄膜的反射率测量结果。     

塑料表面真空蒸镀装饰膜工艺中底涂料中的应用

结合生产实际，本文简单介绍了塑料表面真空蒸镀装饰膜的生产工艺中，底涂料涂装的作用，给出了不同基材塑料底涂料的选用条件，着重分析了不帘式喷涂设备的设计与使用方法。实践表明，采用这种喷涂设备，有利于净化喷涂环境，提高制品质量和工业化生产效率。     

塑料表面真空蒸镀装饰膜工艺中底涂料的应用

结合生产实际，本文简单介绍了塑料表面真空蒸镀装饰膜的生产工艺中，底涂料涂装的作用。给出了不同基材塑料底涂料的选用条件。着重分析了水帘式喷涂设备的设计与使用方法。实践表明：采用这种喷涂设备，有利于净化喷涂环境，提高制品质量和工业化生产效率。     

电子束蒸镀快速沉积铜膜研究

利用电子束蒸镀设备沉积金属薄膜是微电子领域最常见的薄膜沉积工艺之一。然而使用普通钨坩埚电子束蒸镀铜薄膜时,沉积速度非常低。这是因为熔融的铜与钨坩埚是浸润的,当提高电子枪功率时,液态铜的表面自由能随着温度的升高而降低,液态铜会沿着坩埚壁向上铺展,消耗电子束能量。为此,对钨衬埚壁进行结构优化,阻止了电子枪功率较高时液态铜的向上铺展,将铜膜的沉积速度从2?/s提高到20?/s,并对不同沉积速率制备的铜薄膜的粗糙度、均匀性、应力进行对比,验证了该方法的可行性。     

镀膜玻璃膜层均匀性探讨

本文对镀膜玻璃的膜层均匀性问题作了初步的探讨。侧重于从溅射原子的沉积过程来分析边缘效应对膜层横向均匀性的影响。     

通过氧化Cu膜制备Cu_2O薄膜

通过热蒸镀Cu膜并在空气中退火制备Cu2O薄膜,利用X射线衍射(XRD)、能量分散X射线谱(EDX)和原子力显微镜(AFM)研究了已沉积和不同温度退火薄膜的晶体结构、成份和表面形貌。结果表明,Cu膜在200℃退火30分钟可以得到具有单一成份的Cu2O薄膜。四探针测量得到所制备的Cu2O薄膜电阻率为0.22Ωcm。用紫外可见光分光光度计(UV-vis)研究了Cu2O薄膜的光学特性,得出其光学带隙为2.4eV。     

烫印箔用真空蒸发镀锡膜工艺参数的确定

通过对铝和锡2种材料物理性能的理论分析和在高真空连续蒸发卷绕镀铝设备进行的实验,其结果为用于烫印锡膜的真空蒸发镀锡膜提供了合理的工艺参数。     

镀制工艺对TiO2光学膜层折射率影响研究

研究分析了基底温度、沉积速率、氧气分压、离子束辅助沉积等工艺参数和条件对TiO2膜层折射率的影响.研究表明,随着基底温度升高,TiO2光学膜层折射率呈上升趋势;随着沉积速率提高,TiO2膜层折射率存在极值;采用离子束辅助沉积工艺,可以有效提高TiO2膜层折射率值,所制备的TiO2膜为非晶态结构,具有较高的折射率和较小的光学损耗.     

A multilayer thin film capacitive pressure transducer

Translated from Izmeritel'naya Tekhnika, No. 1, pp. 45–47, January, 1992.     

An evaporated multilayer thin film RC notch filter

The fabrication and characteristics of multilayer film C-R-NC filters are discussed. The results of experimental study are found to be in good agreement with the theory. The circuit is suitable for fabrication in hybrid integrated circuit technology as it yields better performance than equivalent R-C-NR structures in certain active configurations.     

Spectroscopic analysis of dipole interaction of metallic nanoparticles in dielectric multilayer dielectric thin film

Using electron beam gun PVD system, the thin film with multiple alternative layers of SiO₂ + Ag (300 nm)/SiO₂ (10-60 nm) was deposited on silica substrate. Annealing test was undertaken for optical absorption analysis. The annealing agglomerated metallic nanoparticles in each layer has enhancement effect for plasmon resonance absorption, these precipitated nanoparticles also cause absorption peak red shift. When the thickness of alternative dielectric layer becomes small enough, there is a coupling phenomenon between the electric dipoles of nanaoparticles in the alternative metallic particle doped layers.     

Selective excitation of eigenmodes in a multilayer thin film resonator on bulk acoustic waves

We consider a method of control over the operating frequency of a resonator on bulk acoustic waves, which is based on the selective excitation of eigenmodes. The frequency switching is achieved by using several layers of a ferroelectric in the paraelectric state and applying a control voltage of appropriate magnitude and polarity to each layer. The principle of selectivity is formulated and the criterion function is defined, which ensure the most effective excitation of a selected eigenmode with the possible suppression of parasitic modes. An example of using this function for a resonator switched between four eigenmodes is presented.     

应力对多层薄膜窄带滤光片透射特性的影响

利用薄膜应力公式和弹性力学的小挠度弯曲理论,分析了多层薄膜应变与薄膜厚度变化的关系,建立起基片曲率与薄膜厚度变化关系的理论模型,提出了多层薄膜各层厚度不均匀变化的关系式。膜厚均匀变化只影响中心波长的漂移,而这种膜厚不均匀变化不仅引起中心波长也引起光谱的退化。在基片由10mm厚减薄到1．0mm时,对100GHz的窄带滤光片的模拟结果为中心波长减小0．977nm;0．5dB带宽减小0．19nm。引入膜厚随机误差的模拟结果为中心波长减小1．066nm;纹波增加0．36dB;峰值插损增加0．32dB,光谱进一步退化了。说明了基片曲率变化引起的光学薄膜厚度变化的不均匀性是引起这种窄带干涉滤光片光谱退化的主要原因之一。     

Cu-In多层膜后硒化法制备CuInSe2多晶薄膜及性能的研究

CuInSe2是优异的薄膜太阳能电池吸收层材料.本文在玻璃衬底上真空蒸镀Cu-In多层膜后,硒化制得了CuInSea多晶薄膜.通过SEM和XRD微观形貌结构分析发现,薄膜的晶粒分布比较均匀,在相同的实验条件下,元素原子比在化学计量比的附近能够获得比较大的晶粒.测量了薄膜的厚度和方块电阻,并由此计算了薄膜的电阻率,发现了薄膜的电阻率随着Se含量的增加呈增大趋势.对薄膜的光透过率测量显示,在可见光的范围内,1.8 μm厚的薄膜的光透过率小于0.7%.XRD物相分析显示,元素比例在化学计量比(CuInSe=112)附近能够制得单一相的CuInSe2多晶薄膜.     

Fabrication of thromboresistant multilayer thin film on plasma treated poly (vinyl chloride) surface

Layer-by-layer deposited anticoagulant multilayer films were prepared on ammonia plasma treated poly (vinyl chloride) (PVC). Fourier transform infrared spectroscopy-attenuated total reflectance (FTIR-ATR) and contact angle results revealed the presence of –NH₂ on the ammonia plasma treated PVC surfaces and the layer-by-layer self-assembly process. The stability of multilayer film was studied with the radio labeled method. The remainder bovine serum albumin (BSA) in cross-linked 5(heparin/BSA) multilayer films dipped in phosphate buffered saline (PBS, pH 7.4) was more than 90% in 40 days. The static platelet adhesion result indicated the anticoagulant multilayer films deposited on the plasma treated PVC reduced platelet adhesion drastically and no thrombus forming. The plasma recalcification time revealed that the multilayer modified surfaces greatly prolonged the plasma recalcification time. Such an easy processing and shape-independent method may have good potential for surface modification of cardiovascular devices.