高能氧化锌压敏元件研究

为了提高ZnO压敏元件的通流能力,采用化学共沉淀法制得含七种组分的复合添加剂。用此复合添加剂、ZnO、SiO2及Al(NO3)3的混合溶液,经球磨后,制成φ10mm×1mm氧化锌压敏元件。通过TEM和粒度测试,分析了复合添加剂的尺寸和晶粒的均匀性,并对元件的微区成分和性能进行了测试。结果表明:采用化学共沉淀法制备的复合添加剂粉体粒径小,在元件中的分布较传统方法均匀;用该添加剂制备的氧化锌压敏元件的2ms方波通流能力超过705J/cm3,是传统方法的两倍多。     

ZnO压敏电阻器性能的改进

采用溶胶一凝胶(Sol-Gel)法制备了ZnO压敏电阻器的复合纳米添加剂.用该添加剂与ZnO、Sb2O3混合球磨后按传统工艺制备出氧化锌压敏电阻器,对其电性能进行了测试,并对其结果进行了分析.实验结果表明,用Sol-Gel法制备的复合纳米添加剂制成的元件具有粉体掺杂均匀,晶粒粒径小且分布均匀的特点,其电性能也较固相合成工艺有了很大提高.     

共沉淀法制备ZnO压敏电阻复合添加剂

利用化学共沉淀法制备zn0压敏电阻器复合添加剂,讨论了新方法对ZnO压敏电阻器电学性能的影响.实验结果证明,合理的共沉淀配方.可以显著提高ZnO压敏电阻器的8/20μs通流能力以及2ms能量耐量值,并且对小电流性能也有部分提高.     

提高ZnO压敏电阻器电性能的研究

采用sol-gel法制备了复合纳米添加剂。将其与ZnO,Sb2O3混合,球磨后按传统工艺制备了ZnO压敏电阻器。通过粒度测试,分析了复合纳米添加剂的粒径大小;借SEM分析了电阻器的微观形貌,并测试了电阻器的电性能。结果表明:添加剂的粒径集中在100nm以下,用该添加剂制成的电阻器微观结构更均匀,其8/20μs通流能力达2500A,2ms方波能量耐受能力达46J。     

液相法制备ZnO压敏电阻的研究

利用化学共沉淀法和Sol-Gel法制备,ZnO压敏电阻器的部分添加剂粉料,经过成份验证后与其他添加剂和ZnO主料混合制备压敏元件.元件在烧结后,经过热处理和电老练,其性能较传统的固相球磨制备元件提高很多.液相法制备压敏元件,元件内部晶粒大小分布均匀、气孔率低,而经过电老练,气孔再一次减少,因此得到了高性能的ZnO压敏元件.     

ZnO压敏电阻器复合添加剂制备技术

论述了利用化学共沉淀法制备ZnO压敏电阻器复合添加剂的原理和方法,讨论了氨水、碳酸氢铵等8种试剂作为沉淀剂的可行性。实验结果表明,合理地选择复合沉淀剂和沉淀条件,可以显著地提高压敏电阻器的通流能力、降低残压比,并可降低烧结温度和成本,有广阔的推广应用价值。     

复合玻璃粉在ZnO压敏电阻用银浆料中的作用

ZnO压敏电阻器对所用银浆附着力要求较高,通过对ZnO压敏电阻器用银浆料中玻璃粉的研究,提出了用复合玻璃粉制备ZnO压敏电阻器用银浆料。浆料经不同温度烧成后,测得了烧成膜与基体附着力的数据,复合玻璃粉S2:S5的最佳质量比为1:2.5,复合玻璃粉添加量(质量分数)为3.5%时,可显著提高浆料对基体的附着力。结果表明:可采用适合于480~580℃烧成温度的复合玻璃粉来提高烧成膜的致密性及对基体的附着力。并对其机理进行了探讨。     

Nb_2O_5掺杂量对ZnO压敏电阻器性能的影响

通过掺杂微量Nb2O5制备了ZnO压敏电阻器,运用扫描电子显微镜(SEM)和电性能测试手段分析了Nb2O5掺杂对ZnO压敏电阻器微观结构和电性能的影响,测量了晶界势垒高度φH,并探讨了其对ZnO压敏电阻器性能的影响。结果表明:掺杂适量的Nb2O5可以明显改善ZnO压敏电阻器的微观结构和电性能;当Nb2O5的掺杂量为摩尔分数0.10%时,所制ZnO压敏电阻器的晶粒尺寸最大,且压敏电压V1mA、非线性系数α和φH值分别为174V,30和0.463 eV。     

四价添加剂掺杂ZnO压敏电阻器的性能

基于理论研究的结果,用固相法研究了四价添加剂对ZnO压敏电阻器性能的影响和作用机理.结果表明,优选的四价添加剂掺杂能有效降低ZnO晶粒的电阻率和残压比;通过提高晶界氧的电离度,可使晶界势垒高度上升,提高了ZnO的压敏电压梯度.     

梯度ZnO低压压敏陶瓷的研制

采用材料梯度化设计思路,将传统电子陶瓷工艺的单层装料一次干压成型工序改进为逐层装料一次干压成型工序。沿着实现ZnO压敏陶瓷低压化的主要途径:减小ZnO压敏电阻器瓷片的厚度和增大ZnO平均晶粒尺寸,在烧结温度1 100℃下,制备出电学性能理想的梯度ZnO低压压敏陶瓷。该陶瓷的压敏电压为8 V/mm,非线性系数为19,漏电流为13μA;其克服了瓷片机械强度劣化及能量耐受能力下降的缺陷。该制备工艺简单,为ZnO压敏电阻器的低压化提供了新方案。     

Mechanism and Development of TiO_2-Doped ZnO-Bi_2O_3-Based Varistors

This paper reviews the history of ZnO varistor,discribes its properties and recenttechnological status and forecasts its evolution.The future development trend is to produce the low-voltage high-energy multi-layer ZnO varistors.After the two additives are classified by their functions,the effect mechanism of Bi_2O_3 and TiO_2 additives are researched theoretically.TiO_2 will make ZnO graingrow bigger and V_ImA/mm be depressed down.Especially the colloid TiO_2 additive in the scale ofnanometer brings about a new method to realize the low voltage of ZnO varistor,which resolves theproblem of how to disturb nanometer powder evenly.Moreover the sintering temperature has prominenteffect on the electrical properties of ZnO varistors.Generally,the appropriate sintering temperature forlow-voltage ZnO varistor ceramics should not be more than 1 250℃.These provide an effective methodand rationale for studying low-voltage ZnO varistors.     

Mechanism and Development of TiO2-Doped ZnO-Bi2O3-Based Varistors

This paper reviews the history of ZnO varistor, discribes its properties and recent technological status and forecasts its evolution. The future development trend is to produce the low-voltage high-energy multi-layer ZnO varistors. After the two additives are classified by their functions, the effect mechanism of Bi2O3 and TiO2 additives are researched theoretically. TiO2 will make ZnO grain grow bigger and V1mA/mm be depressed down. Especially the colloid TiO2 additive in the scale of nanometer brings about a new method to realize the low voltage of ZnO varistor, which resolves the problem of how to disturb nanometer powder evenly. Moreover the sintering temperature has prominent effect on the electrical properties of ZnO varistors. Generally, the appropriate sintering temperature for low-voltage ZnO varistor ceramics should not be more than 1 250℃. These provide an effective method and rationale for studying low-voltage ZnO varistors.     

叠烧对ZnO压敏电阻中Bi_2O_3挥发的控制

采用高能球磨法制备ZnO压敏电阻混合粉体。用XRD、SEM对其形貌和微观结构进行了表征。研究了叠烧烧结时,不同位置ZnO压敏电阻中Bi2O3的挥发情况及对其电性能的影响。结果表明:中心位置处ZnO压敏电阻的非线性系数为31,较表层提高100%;其漏电流为6.0μA,电位梯度为345V/mm。Bi2O3的挥发,呈现从中心到表层逐步加剧的趋势。     

Characterisation of ZnO-based varistors prepared from nanometre Precursor powders

Nanometre precursor powders of ZnO and various additives are synthesised by a new technology, namely chemical coprecipitation and plasma pyrolysis. Transmission electron microscopy (TEM) and the Brunauer–Emmett–Teller (BET) method are employed to illustrate the precursor powders' properties. The ZnO and additive composite powders are composed of spherical particles whose size is about 10–50 nm. Varistors are prepared by sintering the precursor powders at 1050 °C. Scanning electron microscopy (SEM) results show that the average grain size of the varistors is about 1.0 μm. The prepared ZnO-based varistors have excellent electronic properties. Analytical results reveal that the breakdown voltage is 500.0 V mm⁻¹ and the non-linear coefficient is about 54.0. Copyright © 2000 John Wiley & Sons, Ltd.     

Bi_2O_3和Sb_2O_3的预复合对ZnO压敏电阻性能的影响

采用固相法对Bi2O3和Sb2O3进行了预复合,并研究了不同比例的Bi2O3与Sb2O3预复合对ZnO压敏电阻致密度,晶粒结构和电学性能的影响。结果表明:当Bi2O3与Sb2O3的摩尔比为0.7:1.0时,ZnO压敏电阻的综合性能最优,其晶粒生长得最为均匀致密,电位梯度达到361V/mm,非线性系数为86,漏电流密度为7×10–8A/cm2;另外,在耐受5kA电流下的8/20μs脉冲电流波后,其残压比和压敏电压变化率分别为2.6和2.5%。     

纳米ZnO掺杂对压敏阀片电性能和组织的影响

研究了纳米级ZnO粉料对压敏阀片的压敏电压、漏电流和压比的影响,并对其微观结构进行了分析研究,从理论上探讨了纳米ZnO影响压敏阀片电性能与微观结构的机理。研究结果表明,氧化锌压敏阀片中加入纳米ZnO后,其压敏电压显著提高。在质量分数为0~30%的范围内,随着纳米ZnO含量的增加,压敏阀片的压敏电压明显提高,其压比也呈升高趋势。当纳米ZnO含量为30%时,压敏电压约达547.54 V/mm,压比为1.149。在0~10%的范围内,随着纳米ZnO含量的增加,压敏阀片的漏电流呈下降趋势,而在10%~30%的时,漏电流又随纳米ZnO的含量的增加而升高。当纳米ZnO的含量为10%时,漏电流最小,为0.6 mA。     

复合纳米添加法制备ZnO压敏电阻器

提出了一种利用复合纳米添加剂改善ZnO压敏电阻的晶界效应和微观特性，以获得高性能ZnO电阻片的方案，并通过化学共沉淀法制备了多元复合纳米添加剂。实验分析表明，此方案能提高通流50％以上，并能显著改善器件的微观均一性，制得的复合添加剂选择性好，易于实现工业化生产。