MOCVD外延碲镉汞薄膜的生长工艺选择

金属有机化合物汽相沉积（ＭＯＣＶＤ）技术是制备用于红外焦平面阵列（ＩＲＦＦＰＡ）的高质量碲镉汞（ＨｇＣｄＴｅ）薄膜材料的重要手段。文中讨论了汞源温度、生长温度、衬底材料及互扩散多层工艺（ＩＭＰ）等因素在ＭＯＣＶＤ外延生长碲镉汞薄膜过程中的作用机理,并选择适合的生长条件获得了质量优良的碲镉汞薄膜。     

碳掺杂AlGaAs的MOCVD生长及808 nm大功率激光器

用 CCl4 作为掺杂剂 ,进行了掺碳 Al Ga As层的 LP-MOCVD生长 ,并对其掺杂特性进行了研究 ,分析了各生长参数对掺杂的影响 ;研制了碳掺杂 Al Ga As限制层 80 8nm大功率半导体激光器 ;激光器单面连续波输出功率大于 1 W,功率效率为 0 .7W/ A。     

Multi-wafer growth of highly uniform InGaP/GaAs by low pressure MOVPE

This paper reports on the large area growth of InGaP/GaAs heterostructures for short wavelength applications (λ ∼ 650 nm) by low pressure MOVPE in a vertical, high speed, rotating disk reactor. Highly uniform films were obtained both on a single 50 mm diam wafer at the center of a 5 inch diam wafer platter and on three, 50 mm diameter GaAs wafers symmetrically placed on a 5 inch diam platter. Characterization was performed by x-ray diffraction, SEM, and room temperature photoluminescence (PL) mapping. For the single wafer growth, PL mapping results show that the total range on wavelength was ±2 nm with a 2 mm edge exclusion. The standard deviation of the peak wavelength,σ _w , is 0.7 nm. Thickness uniformity, measured by SEM, is less than 2%. Similar results were obtained for the multi-wafer runs. Each individual wafer has aσ _w of 1.1 nm. The wafers have nearly identical PL maps with the variation of the average wavelength from the three wafers within ±0.1 nm.     

Characterization of QWIP structures prepared on GaAs-patterned substrates

In this work we investigate the preparation of quantum well infrared photodetectors (QWIP) on planar and patterned GaAs substrates. Mesa ridges with various angles between sidewall and substrate (1 0 0) plane were prepared by wet chemical etching. The QWIP structures were grown at a temperature of 700 °C by use of low-pressure MOVPE. Electrical properties and spectral sensitivity of QWIP structures prepared on tilted sidewalls were measured. Our results showed that mesa ridges confined at the sides by facets tilted at 30° to (1 0 0) were most suitable for the QWIP preparation. Asymmetry in room temperature I-V characteristics and a small photovoltaic effect observed at 77 K was ascribed to asymmetric position of delta doping plane in the quantum well.     

Thickness variations during MOVPE growth on patterned substrates

Experiments have been carried out to investigate thickness variations between epitaxial layers grown on ridges or channels and the surrounding planar surface. Results show a remarkable variation in growth velocity, even for relatively wide channels and ridges. Using these findings, a novel laser/waveguide coupling technique, which uses a single epitaxial growth step, is proposed.     

MOCVD生长GaAs/AlGaAs量子阱研究

利用常压MOCVD技术在较低生长速率下生长出多种GaAs/AlGaAs多量子阱结构材料,利用低温PL谱和TEM对材料结构进行了表征。所得势阱和势垒结构厚度均匀平整,最窄阱宽为1.8nm。本研究表明,低速率(γ≤0.5nm/s)连续生长工艺能够避免杂质在界面富集,优于间断生长工艺,且在掺si n~+-GaAs衬底上所得量子阱发光强度高于掺Cr SI-GaAs衬底上的结果。     

Growth of direct bandgap GalnP quantum dots on GaP substrates

GaInP has a direct bandgap for In concentrations higher than approximately 30%, and the band-lineup between GaInP and GaP is type-II for In concentrations less than 60%. Therefore, in order to use GaInP as the active light-emitting layer in an optoelectronic device grown on GaP, the strain induced by the lattice mismatch between GaInP and GaP has to be somehow managed such that formation of crystal defects is suppressed. One method is to grow the layer thinner than the critical thickness. Another method that recently received much attention is to grow strain-induced Stranski-Krastanov islands (sometimes referred to as self-assembled quantum dots). Small droplets of highly latticmismatched materials have been embedded into single crystals without generating defects such as threading dislocations and stacking faults using this method. We have grown a series of GaInP/GaP layers by metalorganic chemical vapor deposition and have studied the light emission from them. Ordered GaInP islands were found to be responsible for the light emission. We present the light emission characteristics of these ordered GaInP/GaP islands, and their dependence on various growth parameters.     

Growth of ribbon-shaped crystals of gadolinium gallium garnet for bubble memory substrates

In preliminary work to adapt the edge-defined, film-fed growth (EFG) process to GGG, a number of 1 cm wide × 0.5 mm thick ribbon crystals were obtained. Most of the crystals contained longitudinal thermal stress patterns and associated dislocation arrays. Also evident were occasional arrays of microvoids just under the external surface. In one case where the thermal stresses were avoided, the crystal quality appeared to be sufficient for use in magnetic bubble devices. Off-stoichiometric inclusions on the gallia-rich side were eutectic structures of gallia and garnet and on the gadolinia-rich side were an unidentified gadolinium-rich compound. Lattice parameter measurements of the EFG crystals show that the effective distribution coefficients are much higher than those for the Czochralski growth method. B. Siegel is now with Man Labs., Cambridge, Mass., and H. Lingertat is now with GTE Laboratory, Waltham, Mass.     

短周期AlGaAs/GaAs超晶格的MOCVD生长及X射线衍射研究

生长了短周期 Al Ga As/ Ga As超晶格 ,并通过双晶 X射线衍射谱 ,对 MOCVD超薄层Al Ga As、Ga As的生长进行了研究。从衍射谱卫星峰的级数及 Pendellosong干涉条纹的出现 ,定性地对晶格结构及界面作出评价。 X光衍射测量结果与 HEMT结构电学性能测试结果有较好的对应关系。     

Spatial ordering of self-organized InGaAs/AlGaAs quantum disks on GaAs (311)B substrates

We report the control of self-organization of In_xGa_1−xAs/AlGaAs quantum disks on GaAs (311)B surfaces using a novel technique based upon lithography-defined SiN dot arrays. A strained InGaAs island array selectively grown using the SiN dots provides periodic strain field. When the pitch of lateral ordering corresponds with the period of the strain field, self-organized quantum disks stacked on the InGaAs islands are precisely arranged just as the buried SiN dot array. The spacing of the array element is 250–300 nm (x = 0.3) and around 150 nm (x = 0.4). Vertical alignment by strain is achieved at a very thick (95 nm) separating layer. Characterization using atomic force microscopy reveals the size-fluctuation of disk is dramatically improved with spatial ordering.     

Characterizing the layer properties of AlGaAs/GaAs heteroface solar cell structures by specular spectral reflectance

A cheap and non-destructive method for characterizing wafers prior to, during, and after processing is presented. This method is based on optical reflectance measurements. Its application to AlGaAs/GaAs heteroface solar cell structures allows the determination of the thickness of both the cap and window layers, the aluminum composition (even if it is graded) of the window layer and both the thickness and composition of surface oxide (if any). The feasibility of the procedure and method here presented is demonstrated by applying it to two kinds of structures grown by MOCVD (metal organic chemical vapor deposition) and LPE (liquid phase epitaxy). The results obtained are validated experimentally by SIMS and Raman. Finally, the influence of several calculation parameters on the final result is analyzed.     

生长压力对MOCVD GaN材料晶体质量的影响

使用氮化物MOCVD外延生长系统,采用传统的两步生长法在76.2 mm c面蓝宝石衬底上生长了不同压力的GaN薄膜样品.研究发现提高高温GaN的生长压力,初期的三维生长时间增长,有利于提高GaN薄膜的晶体质量.同时采用XRD、PL谱和湿化学腐蚀方法研究了样品的位错特性,结果表明高压生长的样品能够降低位错密度,起到改善G...     

Optimization of buffer layers for AlGaAs/InGaAs/GaAs pseudomorphic high electron mobility transistors by atmospheric pressure metalorganic chemical vapor deposition

Pseudomorphic AlGaAs/InGaAs/GaAs high electron mobility transistors (HEMT) incorporating various types of buffer layers were fabricated (D = 0.50 × 100μm) and characterized by Hall-effect measurements, low temperature photoluminescence (PL), and room temperature IV characteristics. The devices fabricated with a thick (5000Å) undoped high purity GaAs buffer layer grown at 650° C showed poor pinch-off characteristics, high output conductance and large leakage currents (>2 mA at pinch-off). Devices incorporating an undoped high purity GaAs (3000Å) buffer layer grown at 550° C showed sharp pinch-off characteristics, low output conductance, and low leakage currents (1.3 mA at pinch-off). Low temperature growth of GaAs (550° C) enhanced carbon incorporation resulting in increasedp-type characteristics. This type of buffer layer provided additional barrier height between the active layer and the substrate reducing the injection of electrons into the substrate.     

MOCVD growth of AlGaAs/GaAs structures on nonplanar {111} substrates: Evidence for lateral gas phase diffusion

We investigate the MOCVD growth characteristics of AlGaAs on nonplanar {111}A and {111}B substrates. Growth over features etched into the {111} substrates is found to be highly anisotropic and asymmetric. The ratio of growth rates on adjacent facets is strongly dependent on the depth of the etched feature during growth, and is strikingly different between AlGaAs and GaAs layers. These observations suggest a large difference in the surface chemistry of Al and Ga species under these growth conditions and indicate that the column III element determines the relative growth rates of different facets during nonplanar growth. The results also provide strong evidence that lateral gas phase diffusion of reactants can be perhaps more significant than surface migration as a mechanism determining the incorporation sites of column III elements. Growth characteristics on nonplanar {111} substrates are markedly different than those observed for nonplanar growth on {100} substrates, creating a new set of design tools for the single step growth of guided wave devices such as lasers, modulators and waveguides.     

LiTaO3晶体的生长及其光学性能的研究

采用硅钼棒作加热体，用提拉法生长ＬｉＴａＯ＿３晶体。测试了晶体的光折变阈值、双折射梯度和消光比。用ＬｉＴａＯ＿３晶体制成光波导基片，全息法研究光波导基片的光折变性能，取得良好的结果。     

Optical properties of Cl-doped ZnSe epilayers grown on GaAs substrates

We have determined the optical properties of a series of Cl-doped ZnSe epilayers grown on GaAs substrates using ellipsometry and prism coupling. Initially, the carrier concentrations were determined using Hall measurements for samples between 6.30×10¹⁶ cm⁻³ and 9.50×10¹⁸ cm⁻³. Using a variable angle spectroscopic ellipsometer in the energy range between 0.7 eV and 6.5 eV, we then obtained experimental spectra for each of the samples. By incorporating a three-layer model to simulate the experimental data, we determined the complex dielectric functions for these Cl-doped ZnSe epilayers. In order to facilitate this modeling procedure, we have complemented the ellipsometric results with prism coupling experiments that measured the film thickness and the index of refraction (at discrete wavelengths) very precisely. For the fundamental band gap, we observe a blue shift with respect to the doping concentration, which can be explained by the Burstein-Moss effect. In addition, we have determined the critical point parameters related to these specimens by fitting the second derivatives of both the real and the imaginary parts of the dielectric functions. Similar to several doped III-V semiconductors reported thus far, we find that in Cl-doped ZnSe epilayers, both E₁ and E₁ + Δ ₁ red shift, as well as a broadening with respect to the doping concentration.     

Growth of high quality CdTe on Si substrates by molecular beam epitaxy

We have systematically studied the growth of CdTe (lll)B on Si(001)with different atomic step structures, defined uniquely by miscut tilt angle and direction. X-ray double crystal rocking curve (DCRC) analysis has been used to evaluate the crystalline quality and twin content of the films. High-resolution electron microscopy has been used to examine the CdTe(lll)B/Si(001) interface and to follow the microstructural evolution as a function of distance from the interface. Our results show that the formation of double domains and twins is very sensitive to the tilt parameters. When growth conditions are optimized, twins are not observed at distances greater than about 2.5 microns from the substrate surface. The best quality films exhibit a DCRC FWHM of 60 arc sec, for a film thickness of 17 μm, the lowest value ever reported for heteroepitaxial growth of CdTe on Si or GaAs. In efforts to improve the nucleation process, precursors such as Te and As have been used, and we have shown that they improve the stability of the heterointerface.     

GaAs microlens arrays grown by shadow masked MOVPE

This paper describes the fabrication of high quality GaAs microlenses and microlens arrays using shadow masked metalorganic vapor phase epitaxial (MOVPE) growth (SMMG). Microlenses with apertures as small as 30 μm were fabricated and focal lengths down to 40 μm were measured. The smaller lenses closely fit the theoretical behavior of ideal spherical lenses while larger lenses (focal length >80 μm) showed a more complex physical shape and could not be modeled as spherical. This deviation from a spherical shape is expected from simulation of SMMG. The full width at half maximum of the beam waist was <2 μm for all sizes of microlens indicating that these lenses are compatible with coupling to single mode fibers.     

AlN外延薄膜的生长和特征

文章研究了AlN薄膜的晶体质量、表面形貌、应力等性质与AlN生长工艺的依赖关系。通过对低温成核厚度、成核温度和高温生长AlN所用Ⅴ／Ⅲ比的研究，制备出了具有较好晶体质量的AlN薄膜。高分辨三晶X射线衍射给出AlN薄膜的（002）和（105）的半高宽分别为16．9arcsec和615arcsec，接近国际上报道的较好结果。原子力显微镜对表面形貌的分析表明AlN薄膜的粗糙度为5．7nm。拉曼光谱表明E2（high）模向高能方向移动，说明蓝宝石上外延的AlN薄膜处于压应变状态。光学吸收谱在204nm处具有陡峭的带边吸收，也表明了AlN外乏正薄膜具有辅好妯晶体盾量。     

蓝宝石上AlN基板的MOCVD外延生长

结合 AlN 成核缓冲层技术和NH3流量调制缓冲层方法,采用 MOCVD 在(0001)面蓝宝石衬底上生长了 AlN 基板,用扫描电镜、原子力显微镜及 X 射线衍射仪对样品进行了表征,结果表明基板无裂纹,其平均粗糙度为0.35 nm,(0002)和(1012)回摆曲线 FWHM 分别为 37"和712".详细论述了AlN基板的生长模式、位错行为和应力释放途径.