Influence of using amorphous silicon stack as front heterojunction structure on performance of interdigitated back contact-heterojunction solar cell (IBC-HJ)

Interdigitated back contact-heterojunction (IBC-HJ) solar cells can have a conversion efficiency of over 25%. However, the front surface passivation and structure have a great influence on the properties of the IBC-HJ solar cell. In this paper, detailed numerical simulations have been performed to investigate the potential of front surface field (FSF) offered by stack of n-type doped and intrinsic amorphous silicon (a-Si) layers on the front surface of IBC-HJ solar cells. Simulations results clearly indicate that the electric field of FSF should be strong enough to repel minority carries and cumulate major carriers near the front surface. However, the over-strong electric field tends to drive electrons into a-Si layer, leading to severe recombination loss. The n-type doped amorphous silicon (n-a-Si) layer has been optimized in terms of doping level and thickness. The optimized intrinsic amorphous silicon (i-a-Si) layer should be as thin as possible with an energy band gap (E_g) larger than 1.4 eV. In addition, the simulations concerning interface defects strongly suggest that FSF is essential when the front surface is not passivated perfectly. Without FSF, the IBC-HJ solar cells may become more sensitive to interface defect density.     

Effect of the front surface field on crystalline silicon solar cell efficiency

The present paper reports on a simulation study carried out to determine and optimize the effect of the high–low junction emitter (n⁺-n) on thin silicon solar cell performance. The optimum conditions for the thickness and doping level of the front surface layer with a Gaussian profile were optimized using analytical solutions for a one dimensional model that takes on the theory relevant for highly doped regions into account. The photovoltaic parameters of silicon solar cells with front surface field layer (n⁺-n-p structure) and those of the conventional one (n-p structure) are compared. The results indicate that the most important role played by the front surface field layer is to enhance the collection of light-generated free carriers, which improves the efficiency of the short wavelength quantum. This is achieved by a drastic reduction in the effective recombination at the emitter upper boundary, a property primarily responsible for the decrease in the emitter dark current density. The findings also indicate that the solar cell maximum efficiency increase by about 2.38% when the surface doping level of the n⁺-region and its thickness are equal to 2.10²⁰ cm^?3 and 0.07 μm, respectively.     

Aluminum alloy back p–n junction dendritic web silicon solar cell

A new silicon solar cell structure is presented in which the p–n junction is formed by alloying aluminum with n-type silicon, and where this p–n junction is located at the back (unilluminated) side of the cell. With a phosphorus front diffusion, the resultant n⁺np⁺ structure has been implemented using dendritic web silicon substrates which are 100 μm thick and doped with antimony to 20 Ω cm. Such a structure eliminates shunting of the p–n junction, provides an effective front surface field, enables a high minority carrier lifetime in the base, and is immune to light-induced degradation. Using only production-worthy, high-throughput processes, aluminum alloy back junction dendritic web cells have been fabricated with efficiencies up to 14.2% and with corresponding minority carrier (hole) lifetime in the base of 115 μs.     

Determination of front surface recombination velocity of silicon solar cells using the short-wavelength spectral response

A method of determination of recombination velocity S_f of minority carriers at the front surface of an n⁺–p–p⁺(p⁺–n–n⁺) silicon solar cell in which the n⁺(p⁺) front emitter is made by diffusion of dopant impurity in the p(n) region is presented. This method uses the short-wavelength spectral response of the cell to determine S_f and is applicable if the front emitter of the cell has a linearly varying built-in field. It was applied to a p⁺–n–n⁺ solar cell that had a Gaussian distribution of the dopant impurity in the p⁺ front emitter up to a depth of 0.078 μm from the surface. Using the spectral response data of cell in 380 nm<λ< 500 nm range S_f was found to have a nearly constant value 6×10⁵ cm s⁻¹ in 400 nm<λ<460 nm range. Below and above this wavelength range the value of S_f was found to be slightly smaller. For comparison the value of S_f was also determined assuming the p⁺ region to be uniformly doped, and this value was found to be significantly smaller than based on the diffused emitter model. The analysis showed that for a diffused junction cell, the assumption that the front emitter is uniformly doped, ignores the presence of the built-in field in the emitter region and leads to overestimation of minority carrier recombination in the emitter. Consequently for a given contribution of the front emitter region to the spectral response of the cell, this assumption underestimates the front surface recombination and determines a smaller value of S_f. On the other hand, the present method can be expected to determine a realistic value of S_f independent of λ for most diffused junction silicon solar cells using the spectral response data in a suitable short-wavelength range since each such cell indeed has a built-in electric field in the emitter region.     

Optimized rapid thermal process for high efficiency silicon solar cells

Rapid thermal processing is opening new possibilities for a low-cost and environmentally safe silicon solar cell production, keeping the process time at high temperature in the order of 1 min, due to enhanced diffusion and oxidation mechanisms. Controlling the surface concentration of the junction is one of the major parameters, in order to obtain suitable front surface recombination velocities. Simultaneous diffusion of phosphorus and aluminum is used to realize emitter and back surface field in a single high-temperature step, with optimized gettering effect. Controlling the mentioned parameters on industrial 1 Ω cm Cz material lead in 17.5% efficient solar cells on a surface of 25 cm². All results are discussed in terms of process temperature, dopant source concentration and effective process time, below 1 min including high heating and cooling rates.     

A numerical model of p–n junctions bordering on surfaces

Many solar cell structures contain regions where the emitter p–n junction borders on the surface. If the surface is not well passivated, a large amount of recombination occurs in such regions. This type of recombination is influenced by the electrostatics of both the p–n junction and the surface, and hence it is different from the commonly described recombination phenomena occurring in the p–n junction within the bulk. We developed a two-dimensional model for the recombination mechanisms occurring in emitter p–n junctions bordering on surfaces. The model is validated by reproducing the experimental I–V curves of specially designed silicon solar cells. It is shown under which circumstances a poor surface passivation, near where the p–n junction borders on the surface, reduces the fill factor and the open-circuit voltage. The model can be applied to many other types of solar cells.     

Simple analytical solution and efficiency improvement of polysilicon emitter solar cells

A simple analytical model has been developed to simulate the performance of solar cells with polysilicon contact on the front surface. The polysilicon layer with a columnar grain structure is modeled by an effective recombination velocity using a two-dimensional transport equation. A one-dimensional transport equation in the single-crystal emitter is solved, taking into account bulk recombination and non-uniformly doped emitter. Then, simple analytical expressions for the emitter reverse saturation current and light-generated current densities are obtained. The collection of the light-generated carriers in polysilicon layer has been discussed and an analytical solution of the light-generated current is derived. The results show that the polysilicon layer can result in a decrease in emitter reverse saturation current density and an increase in solar cell photovoltaic parameters. In fact, the emitter region should not be treated as a ‘dead layer’ because thin polysilicon layer front surface contact gives an improvement of about 60 mV for the open-circuit voltage, 3.6 mA/cm² for the photocurrent, and 3.9% for the cell efficiency.     

Amorphous silicon/p-type crystalline silicon heterojunction solar cells with a microcrystalline silicon buffer layer

Undoped hydrogenated amorphous silicon (a-Si:H)/p-type crystalline silicon (c-Si) structures with and without a microcrystalline silicon (μc-Si) buffer layer have been investigated as a potential low-cost heterojunction (HJ) solar cell. Unlike the conventional HJ silicon solar cell with a highly doped window layer, the undoped a-Si:H emitter was photovoltaically active, and a thicker emitter layer was proven to be advantageous for more light absorption, as long as the carriers generated in the layer are effectively collected at the junction. In addition, without using heavy doping and transparent front contacts, the solar cell exhibited a fill factor comparable to the conventional HJ silicon solar cell. The optimized configuration consisted of an undoped a-Si:H emitter layer (700 Å), providing an excellent light absorption and defect passivation, and a thin μc-Si buffer layer (200 Å), providing an improved carrier collection by lowering barrier height at the interface, resulting in a maximum conversion efficiency of 10% without an anti-reflective coating.     

Planar rear emitter back contact silicon heterojunction solar cells

A planar rear emitter back contact silicon heterojunction (PreBC-SHJ) solar cell design is presented, which combines the advantages of different high efficiency concepts using point contacts, back contacts, and silicon heterojunctions. Electrically insulated point or stripe contacts to the solar cell absorber are embedded within a planar hydrogenated amorphous silicon emitter layer deposited at low temperature on the rear side. The new solar cell design requires less structuring and allows large structure sizes, enabling the use of low-cost patterning technologies such as inkjet printing or screen printing. By means of numerical computer simulation the efficiency potential of back contacted heterojunction solar cells is shown to exceed 24%. First PreBC-SHJ solar cells have been realized and exhibit higher short circuit currents than our state-of-the-art front contacted silicon heterojunction reference solar cells.     

A simple general analytical solution for the quantum efficiency of front-surface-field solar cells

The optimisation of a FSF solar cell or a BSF thin film solar cell necessitates an understanding of the characteristics of an illuminated high-low junction. However, except for minority carrier reflection, the photocurrent collection property of the light-generated carriers in the high region by a high-low junction has rarely been treated previously. It is the purpose of this paper to present a simple solution for the contribution of the light-generated current from the high region. The model shows that a high-low junction may be very efficient in light-generated current collection, and this property is primarily responsible for the increase of the short wavelength quantum efficiency using a FSF. The effects of the FSF layer doping concentration and its thickness on the quantum efficiency are discussed by using the computed results; the optimisation of the FSF is then made. The calculations take into account the high doping effects of degeneracy and bandgap narrowing.     

The influence of porous silicon coating on silicon solar cells with different emitter thicknesses

The influence of the emitter thickness on the photovoltaic properties of monocrystalline silicon solar cells with porous silicon was investigated. The measurements were carried out on n⁺p silicon junction whose emitter depth was varied between 0.5 and 2.2 μm. A thin porous silicon layer (PSL), less than 100 nm, was formed on the n⁺ emitter. The electrical properties of the samples with PS were improved with decrease of the n⁺p junction depth. Our results demonstrate short-circuit current values of about 35–37 mA/cm² using n⁺ region with 0.5 μm depth. The observed increase of the short-circuit current for samples with PS and thin emitter could be explained not only by the reduction of the reflection loss and surface recombination but also by the additional photogenerated carriers within the PSL. This assumption was confirmed by numerical modeling. The spectral response measurements were performed at a wavelength range of 0.4–1.1 μm. The relative spectral response showed a significant increase in the quantum efficiency of shorter wavelengths of 400–500 nm as a result of the PS coating. The obtained results point out that it would be possible to prepare a solar cell with 19–20% efficiency by the proposed simple technology.     

n型太阳电池硼扩散制备正面发射极工艺研究

对于n-PERT电池,硼扩散是形成p-n结的关键工艺并且直接影响电池性能。为优化正面硼扩散掺杂层的性能,研究液态源(BBr3)扩散过程中推进温度和推进时间对硼表面掺杂浓度和结深的影响,并且结合PC1D的模拟结果,分析不同的正面硼发射极对n-PERT太阳电池性能的影响。研究结果表明,推进温度在950~970℃范围变化时,随着推进温度的升高,结深由0.4μm增加到0.63μm,硼表面掺杂浓度由4.3×1019cm-3增加到5.9×1019cm-3;推进时间由25 min增加到40 min过程中,结深由0.47μm增加到0.64μm,硼表面掺杂浓度有较小的下降;当发射极表面浓度较低,结深较深时,有利于提升电池性能;该实验在模拟计算和工艺优化的基础上制备出效率为20.03%的nPERT电池。     

Double porous silicon layer on multi-crystalline Si for photovoltaic application

Double porous silicon (d-PS) layers formed by acid chemical etching on a top surface of n⁺/p multi-crystalline silicon solar cells were investigated with the aim to improve the performance of standard screen-printed silicon solar cells. First a macro-porous layer is formed on mc-Si. The role of this layer is texturization of surface. Next, the cells have been manufactured using standard technology based on screen-printing metallization. Finally, a second mezo-porous layer in n⁺ emitter of cell has been produced. The role of this PS layer is to serve as an antireflection coating. In this way, we have obtained d-PS layers on these solar cells. The paper present observation of d-PS microstructure with SEM as well as measurements of its effective reflectance at the level of 2.5% in the 400–1000 nm length wave range. The efficiency of the solar cells with this structure is about 12%.     

Aluminium BSF in silicon solar cells

The purpose of this work is to develop a back surface field (BSF) for industrial crystalline silicon solar cells and thin-film solar cells applications. Screen-printed and sputtered BSFs have been realised on structures which already have a n⁺p back junction due to the diffusion of the phosphorus in both faces of the wafer during solar cell emitter elaboration. Rapid thermal annealing temperatures from 700°C to 1000°C have been used. Thickness of the BSF has been measured by SIMS and confronted to the theoretical expected value and simulations. Electrical and optical measurements have been done in order to characterise the BSF. For 250 μm thick industrial solar cells, 6% relative increase in photocurrent has been reached.     

Silicon thin-film solar cells on insulating intermediate layers

An interdigitated front grid structure for both the emitter and base was simulated and realized. This contact design is suitable for thin-film solar cells on insulating substrates or insulating intermediate layers. Confirmed efficiencies of up to 18.2% were achieved on a 46 μm thick epitaxial silicon layer which was grown on a SIMOX wafer with an implanted compact SiO₂ intermediate layer.Samples with and without a highly doped back surface field were prepared to study the influence of the back-side recombination velocity. L_eff values of 250 and 52 μm, corresponding to S_back values of 800 and 10⁵ cm/s, respectively, were measured, thus, underlining the importance of a low back-side recombination velocity. The optical confinement properties of the SiO₂ intermediate layers were calculated depending on the angle of the incident rays. An angle from the plane normal which is larger than 23° is necessary in order to achieve the condition of total internal reflection.Future work will focus on recrystallized Si layers on foreign substrates [1]. Since the surface of the silicon layer is fairly rough after the recrystallisation process, another set of masks was designed which is more tolerant to aligning accuracy. This is mainly relevant for the area where the base contacts are located between the locally diffused emitter. The technology for CVD Si-layer deposition, zone melting recrystallization (ZMR), as well as for a simplified solar cell process is under investigation.     

Analysis of thin silicon solar cells for high efficiency

A comprehensive theoretical analysis taking into account the contribution from both the emitter and base regions having finite surface recombination velocity has been developed for computing short-circuit current, open-circuit voltage, and efficiency of thin AR coated thin silicon solar cells with textured front surface. The dependence of efficiency on the front surface and back surface recombination velocities and on the cell parameters have been investigated in details for varying cell thickness considering the effects of bandgap narrowing and Auger recombination in the material. It is shown that efficiency exceeding 24% can be attained with silicon solar cells having thickness as low as 25 μm provided both front and back surfaces are well passivated (S < 10³cm/s) and the doping concentration in the base and emitter are in the range of 5 × 10¹⁶ to 10¹⁷cm⁻³ and 10¹⁸ to 5 × 10¹⁸cm⁻³, respectively. It is also shown that an efficiency of about 23% can be obtained for thin cells of 25 μm thickness with a much inferior quality materials having diffusion length of about 40 μm.     

Effect of edge junction isolation on the performance of laser doped selective emitter solar cells

The effect of laser and chemical edge junction isolation on electrical performance of industrially manufactured laser doped selective emitter solar cells with light induced plated n-type contacts is investigated in this work. Directly after the formation of the aluminium back surface field, photoluminescence images indicates that laser edge junction isolation causes substantial damage around the perimeter of the cell, extending several millimeters from the laser edge isolation groove. On finished devices, regions of high series resistance are evident around the perimeter, caused by parasitic plating nucleating in the damaged laser grooved region which induce shunting and inhibits further plating taking place in the surrounding regions. The use of chemical edge junction isolation eliminates both of these issues and can result in efficiency gains of more than 2% absolute compared to that fabricated using laser edge isolation, suggesting a far superior method of edge junction isolation for the industrial manufacture of laser doped selective emitter solar cells with light induced plated contacts.     

Large area 15.8% n-type mc-Si screen-printed solar cell with screen printed Al-alloyed emitter

A record efficiency of 15.8% (independently confirmed at Fraunhofer ISE calibration laboratory) is reported on large area (120 cm²) n-type mc-Si rear junction Si solar cell. Minor modifications to the industrial process for p-type, such as optimization of Al-alloyed screen-printed emitter and phosphorus front surface field, led to an improvement in cell properties. Large improvement in short-circuit current of the cell was possible by decreasing the cell thickness to 130 μm.     

A simple technology to improve crystalline-silicon solar cell efficiency

The manufacturing of high-efficiency crystalline-silicon (c-Si) solar cells involves advanced technologies and sophisticated equipment not available in third-world country laboratories. This paper shows that conversion efficiencies in the 15–16% range can be achieved with a simple laboratory process. The main steps, which only require the use of analytic grade chemicals, are: (a) diffusion of a phosphorus-doped emitter layer on a textured surface; (b) deposition of narrow top metal contacts using a ph otolithography process; (c) Al alloyed back surface field, and d) a chemically sprayed tin dioxide antireflective coating.     

Analysis of anomalous current–voltage characteristics of silicon solar cells

The current–voltage characteristics of solar cells, under illumination and in the dark, represent a very important tool for characterizing the performance of the solar cell.The PC-1D computer program has been used to analyze the deviation of the dark current–voltage characteristics of p–n junction silicon solar cells from the ideal two-diode model behavior of the cell, namely the appearance of “humps” in the I–V characteristics. The effects of the surface recombination velocity, the minority-carrier lifetimes in the base — and emitter regions of the solar cell, as well as the temperature dependence of the I–V characteristics have been modeled using PC-1D.It is shown that the “humps” in the I–V characteristics arise as a result of recombination within the space-charge region of the solar cell, occurring when conditions for recombination are different from the simple assumptions of the Sah–Noyce–Shockley theory.