量子阱半导体光放大器的增益偏振相关性研究

应用能带计算理论,研究了张应变量大小、量子阱厚度对量子阱半导体光放大器(SOA)中的增益偏振相关性的影响.采用张应变量子阱为有源区,设计了增益偏振无关的1.55 μm的SOA,它可以在较宽的载流子浓度范围、较宽的光波长范围内满足增益对偏振的不灵敏要求.另外,还采用混合应变量子阱为有源区,设计了增益偏振无关的1.31μm的SOA.     

2μm InGaAsSb/AlGaAsSb应变补偿量子阱结构的数值研究

为了降低2μm半导体激光器的阈值电流并提高器件的输出功率,设计了InGaAsSb/AlGaAsSb应变补偿量子阱结构,并利用SimLastip软件对器件进行了数值模拟.研究表明,在势垒中适当引入张应变可以改善量子阱的能带结构,提高对载流子的限制能力.当条宽为120 μm、腔长为1 000 μm时,采用应变补偿量子阱结构的激光器的阈值电流为91 mA,斜率效率为0.48 W/A.与压应变量子阱激光器相比,器件性能得到明显的改善.     

低偏振灵敏度半导体光放大器

报道了基于混合应变量子阱材料的半导体光放大器 (SOA)。利用张应变量子阱加强了TM模的增益 ,使之接近TE模的增益 ,从而使SOA的偏振灵敏度大为降低。在 150mA的偏置下 ,获得了 2 4dB的小信号增益和 1dB的偏振灵敏度。     

光通信用高性能应变层量子阱激光器

把应变引入量子阱，改变Ⅲ－Ⅴ族体化合物半导体材料的能带结构，从而全面改善半导体激光器的性能，出现了通信用新一代高性能应变层量子阱激光器。     

GaAsSb/GaAs量子阱激光器结构的发光研究

研究了GaAsSb/GaAs应变量子阱及应变补偿量子阱激光器结构的光致发光和电注入发光.结果表明,分子束外延生长温度的改变使量子阱发光性能发生系统性变化,证明生长温度对量子阱中锑的组分和界面质量具有重要影响. 同时,低温光致发光峰的波长随激发功率密度增大发生明显蓝移,具有Ⅱ类量子阱的特点. 应变补偿量子阱激光器在波长为1.3μm附近激射,阈值电流密度约为1.8kA/cm2.     

AlGaInAs/InP应变补偿多量子阱激光器

为了优化在长距离光纤通讯系统中采用的1.31μm波长的量子阱激光器,对AlGaInAs/InP材料的有源区应变补偿的量子阱激光器进行了设计研究。采用应变补偿的方法,根据克龙尼克-潘纳模型理论计算出量子阱的能带结构,设计出有源区由1.12%的压应变AlGaInAs阱层和0.4%的张应变AlGaInAs垒层构成。使用ALDS软件对所设计出的器件进行了建模仿真,对其进行了阈值分析和稳态分析。结果表明,在室温25℃下,该激光器具有9mA的低阈值电流和0.4W/A较高的单面斜率效率;在势垒层采用与势阱层应变相反的适当应变,可以降低生长过程中的平均应变量,保证有源区良好的生长,改善量子阱结构的能带结构,提高对载流子的限制能力,降低阈值电流,提高饱和功率,改善器件的性能。     

1.3μm高增益偏振无关应变量子阱半导体光放大器

采用低压金属有机化学气相外延法 (LP MOVPE)生长并制作了 1 3μm脊型波导结构偏振无关半导体光放大器 (SOA) ,有源区为基于四个压应变量子阱和三个张应变量子阱交替生长的混合应变量子阱 (4C3T)结构 ,压应变阱宽为 6nm ,应变量 1 0 % ,张应变阱宽为 11nm ,应变量 - 0 95 % ;器件制作成 7°斜腔结构以有效抑制腔面反射。半导体光放大器腔面蒸镀Ti3 O5/Al2 O3 减反 (AR)膜以进一步降低腔面剩余反射率至 3× 10 -4以下 ;在 2 0 0mA驱动电流下 ,光放大器放大的自发辐射 (ASE)谱的 3dB带宽大于 5 0nm ,光谱波动小于 0 4dB ,半导体光放大器管芯的小信号增益近 30dB ,在 12 80～ 1340nm波长范围内偏振灵敏度小于 0 6dB ,饱和输出功率大于 10dBm ,噪声指数 (NF)为 7 5dB。     

P型张应变Si/SiGe量子阱红外探测器的能带设计

提出P型张应变Si/SiGe量子阱红外探测器(QWIP)结构,应用k·P方法计算应变Si/SiGe量子阱价带能带结构和应变SiGe合金空穴有效质量.结果表明量子阱中引入张应变使轻重空穴反转,基态为有效质量较小的轻空穴态,因此P型张应变Si/SiGe QWIP与n型QWIP相比具有更低的暗电流;而与P型压应变或无应变QWIP相比光吸收和载流子输运特性具有较好改善.在此基础上讨论了束缚态到准束缚态子带跃迁型张应变p-Si/SiGe QWIP的优化设计.     

980 nm应变单量子阱的理论设计

研究了应变单量子阱势阱宽度的计算方法 ,为应变单量子阱的设计提供了理论依据 .对于确定的材料组份 ,根据应变理论及有限深势阱的处理方法 ,系统地计算了 980 nm应变单量子阱宽度 ,理论计算与实验结果相吻合     

P型张应变Si/SiGe量子阱红外探测器的能带设计

提出P型张应变Si/SiGe量子阱红外探测器(QWIP)结构,应用k·P方法计算应变Si/SiGe量子阱价带能带结构和应变SiGe合金空穴有效质量.结果表明量子阱中引入张应变使轻重空穴反转,基态为有效质量较小的轻空穴态,因此P型张应变Si/SiGe QWIP与n型QWIP相比具有更低的暗电流;而与P型压应变或无应变QWIP相比光吸收和载流子输运特性具有较好改善.在此基础上讨论了束缚态到准束缚态子带跃迁型张应变p-Si/SiGe QWIP的优化设计.     

Reduction of noise figure in semiconductor laser amplifiers with Ga1-xInxAs/GaInAsP/InP strained quantum wellstructures

The noise characteristics of semiconductor laser amplifiers (SLAs) in the Ga_1-xIn_xAs/GaInAsP/InP strained quantum well (QW) system are theoretically calculated and analyzed using density-matrix theory and taking into account the effects of band mixing on both the valence subbands and the transition dipole moments. The numerical results show that a reduced noise figure can be obtained in both tensile and compressively strained QW structures due to the increase in differential gain and the decrease in transparent carrier density. From a comparison among compressively strained (x=0.70), unstrained (x=0.53), and tensile strained (x=0.40) QW SLAs at a fixed carrier density and optical confinement factor, it is found that the noise figure of the tensile strained QW reaches its lowest value of 3.4 dB at average input optical power of -20 dB     

Noise analysis of conventional and gain-clamped semiconductoroptical amplifiers

We present a numerical study of the noise of conventional and gain-clamped semiconductor optical amplifiers (SOAs), using a detailed device model. The model makes use of a density-matrix gain calculation, and takes into account the forward and backward amplified spontaneous emission (ASE) spectra and the spatial carrier hole-burning. The device is longitudinally divided into M sections and a rate equation for averaged photon and carrier densities is used for each section. We demonstrate that the accuracy on the calculated noise figure strictly depends on the number of sections M. We obtain a good tradeoff between the results accuracy and the computational complexity with M=8. The model is then applied to study the noise in a distributed Bragg reflector (DBR)-type gain-clamped SOA for varying signal power, pump current, and lasing wavelength. We show that changes in the spatial carrier profile caused by the input signal significantly affect the noise figure, even when the gain is constant. A slight dependence of the noise figure on lasing wavelength is also foreseen, while the dependence on the pump current is negligible. A new method for gain-clamped SOA noise figure reduction is proposed, based on unbalanced Bragg reflectors. An improvement of noise figure (NF) as large as 2 dB is devised     

Optimization of DSF- and SOA-based phase conjugators byincorporating noise-suppressing fiber gratings

We compare the performance of dispersion-shifted-fiber (DSF) and semiconductor-optical-amplifier (SOA) based laser phase conjugators for a 10-Gb/s nonreturn-to-zero system with respect to conversion efficiency, noise figure, and distortion. Fiber gratings are used for signal extraction and amplified spontaneous emission (ASE) suppression, allowing closer wavelength spacing and reducing the conjugation noise figure by up to 12 dB. Despite the higher SOA conversion efficiency, both conjugators give similar noise figures with ASE suppression. However, the DSF-based conjugator has the advantage of distortion tolerance at higher input power     

基于Hopfield神经网络噪声数字的识别

噪声数字的识别具有很好的应用前景,也是后期处理的基础。基于离散Hopfield神经网络的联想记忆能力,通过改进神经网络的记忆样本,再利用Hebb规则对改进的记忆样本进行学习,得到权值矩阵,根据待识别的噪声数字的信息联想起记忆的数字。利用改进后的离散Hopfield神经网络对噪声数字进行了识别的实验。实验结果表明,该方法提高了传统网络的记忆能力和识别的正确率。     

半导体光放大器在传输结构和反射结构中的噪声性能实验研究

半导体光放大器（SOA）在光信号处理中起着非常重要的作用。文章比较研究TSOA传输结构和反射结构的不同噪声特性。实验表明,SOA的反射结构与传输结构有着不同的噪声特性,特别是当SOAT作在饱和状态时,SOA对反射信号噪声进行二次抑制,输出噪声特性得到明显改善。     

光纤参量放大器技术及其最新进展

介绍和论述了一种非常有实用前景的基于光纤非线性效应的光参量放大器(OPA)及其最新技术进展．最新发展揭示了它的很多技术特性优于传统的掺铒光纤放大器(EDFA)、半导体光放大器(SOA)和近年来很热门的光纤拉曼放大器(FRA)，如对信号的调制形式、比特率的完全透明性、相位共轭、超宽的增益带宽、很低的噪声指数和具备优异的全光波长转换功能．     

Detailed theoretical investigation of the input power dynamic rangefor gain-clamped semiconductor optical amplifier gates at 10 Gb/s

A detailed theoretical investigation of the input power dynamic range for gain-clamped semiconductor optical amplifier (GC-SOA) gates at 10 Gb/s is presented. We show that although the gain is clamped, the dynamic changes of the carrier distribution in the GC-SOA causes pattern effects on a time scale given by the relaxation frequency of the GC-SOA. Combined with a higher noise figure compared to a conventional SOA, this results in a dynamic range only ~0.5 dB better than for an optimized SOA gate     

Molecular beam epitaxy growth and characterization of InGaP/InGaAspseudomorphic high electron mobility transistors (HEMTs) having achannel layer over critical layer thickness

In_0.5Ga_0.5P/In_xGa_1-xAs (x=0.33 and 0.40), pseudomorphic high electron mobility transistors (p-HEMTs) having a channel layer over the critical layer thickness were grown on patterned and nonpatterned GaAs substrates by using a compound-source molecular beam epitaxy (MBE). Characteristics of the highly strained InGaP/In_xGa_1-xAs (x=0.33 and 0.40) p-HEMTs grown on patterned substrates were compared with those of conventional InGaP/In_0.22Ga_0.78As p-HEMTs grown on a nonpatterned substrate. The highly strained InGaP/In_0.33Ga _0.67As p-HEMT showed substantial improvements in device performances including DC (drain saturation current and transconductance), microwave (f_T and f_max), low-frequency noise (Hooge parameter), and high-frequency noise (minimum noise figure and associated gain) characteristics compared with those of the conventional InGaP/In_0.22Ga_0.78As p-HEMT. The improvements in device performances of the highly strained InGaP/In_0.33Ga_0.67As p-HEMT are attributed to the improved transport property of the high-quality highly strained In_0.33Ga_0.67As channel layer achieved by the use of the patterned substrate growth. The results indicate the potential of highly strained InGaP/In_xGa_1-xAs p-HEMTs having a channel layer in excess of the critical layer thickness grown on patterned GaAs substrates for use in high-performance microwave device applications     

带有低噪声单端转差分电路的射频增益可控放大器

为了改进传统电路中单端转差分电路的噪声性能,提高传统射频可变增益放大器的覆盖范围和步进精度,该文设计了一种带有低噪声单端转差分电路的射频增益可控放大器。该文利用噪声抵消技术降低了噪声系数,利用电容交叉耦合技术展宽电路带宽,利用输出源级跟随器的增益可调功能实现更高的步进精度。电路采用0.18 mm CMOS工艺,1.8 V供电电源,在170-870 MHz频率信号输入下,可以实现最低3.8 dB的噪声系数,55 dB的动态范围,步进精度0.8 dB,消耗14.76 mW的功耗,面积800 mm×600 mm。测试结果表明在覆盖更宽的频段范围下,该文设计的射频可变增益放大器在消耗相同功率条件下与传统的单端转差分电路相比可以达到更低的噪声系数,同时整个可变增益放大器可以提供更高的步进精度。