AC and dielectric properties of thermally evaporated p-type (Sb2Te3)70 (Bi2Te3)30 thin films

Thin films of (Sb₂Te₃)₇₀ (Bi₂Te₃)₃₀ were prepared by thermal evaporation. The composition of the film was confirmed by energy dispersive analysis (EDAX). X-ray diffraction studies showed that the film was polycrystalline with grain size of 4.39 Å and with a preferred orientation in the (0 1 5) directions. Al/((Sb₂Te₃)₇₀ (Bi₂Te₃)₃₀)/Al (MSM) thin film capacitors are formed and its AC and dielectric studies were carried out using a digital LCR metre at various frequencies (12 Hz–100 kHz) and temperatures (303–483 K). The dielectric constant for a film of thickness 3000 Å was found to be 86 for 1 kHz at room temperature. The temperature coefficient of capacitance (TCC) and temperature coefficient of permittivity (TCP) were estimated as 684 and 1409 ppm/K for 10 kHz at 303 K, respectively. The activation energy was estimated as 1.190 eV for frequency of 100 kHz at 303 K. The AC conductivity of the films was found to be a hopping mechanism.     

Effect of copper diffusion on photovoltaic characteristics of CuGaSe2–GaAs cells

CuGaSe₂–GaAs heterojunctions were fabricated by fast evaporation of polycrystalline CuGaSe₂ from a single source on n-type GaAs substrates. The best CuGaSe₂–GaAs photocell (without an antireflective coating) exhibited an efficiency of 11.5%, J_sc=32 mA/cm², V_oc=610 mV and FF=0.60. The spectral distribution of photosensitivity of CuGaSe₂–GaAs junctions extends from 400 to 900 nm. The CuGaSe₂ films were characterized by X-ray diffraction (XRD) and scanning electron microscope (SEM) techniques. XRD analysis indicated that the thin films were strongly oriented along the (1 1 2) plane. SEM studies of CuGaSe₂ films showed nearly stoichiometric composition with grain size about 1–2 μm. The energy dispersive X-ray spectroscopy (EDX) analysis of Cu concentration distribution in n-type GaAs showed that Cu diffused from the film into n-type GaAs during the growth process resulting in formation of the latent p–n homojunction in substrate. The diffusion coefficient of Cu in GaAs at growth temperature (520°C) estimated from EDX measurements was 6×10⁻⁸ cm²/s.     

Electrical conduction studies of hot wall deposited CdSexTe1−x thin films

CdSe_xTe_1−x thin films of different compositions have been deposited on cleaned glass substrates using the hot wall deposition technique under conditions very close to thermodynamical equilibrium with minimum loss of material. The electrical conductivity of the deposited films has been studied as a function of temperature. All the films showed a transition from phonon-assisted hopping conduction through the impurity band to grain-boundary-limited conduction in the conduction/valence band at temperature around 325 K. The conductivity has been found to vary with composition; it varied from 0.0027 to 0.0198 Ω⁻¹ cm⁻¹ when x changed from 0 to 1. The activation energies of the films of different compositions determined at 225 and 400 K have been observed to lie in the range 0.0031–0.0098 and 0.0285–0.0750 eV, respectively. The Hall-effect studies carried out on the deposited films revealed that the nature of conductivity (p or n-type) was dependent on film composition; films with composition x=0 and 0.15 have been found to be p-type and the ones with composition x=0.4, 0.6, 0.7, 0.85 and 1 have been observed to exhibit n-type conductivity. The carrier concentration has been determined and is of the order of 10¹⁷ cm⁻³. The majority of carrier mobilities of the films have been observed to vary from 0.032 to 0.183 cm² V⁻¹ s⁻¹ depending on film composition. The study of the mobility of the charge carriers with temperature in the range of 300–450 K showed that the mobility increased with power of temperature indicating that the type of scattering mechanism in the studied temperature range is the ionized impurity scattering mechanism.     

CVT-growth of AgGaSe2 single crystals: Electrical and photoluminescence properties

Single crystals of AgGaSe₂ were grown by the Chemical Vapor Transport (CVT) -method using iodine as transport agent. Growth temperatures of 770°C and concentrations of the transport agent of 1.6–1.7 mg I₂/cm³ yielded compact single crystals with a size of up to 8 X 5 X 5 mm³ and a habitus dominated by the {112}-faces. The as-grown crystals were highly insulating (σ < 10⁻⁸(Ω cm)⁻¹). Annealing of the crystals in vacuum at 700°C resulted in n-type conductivity of 2 · 10⁻¹ (Ω cm)⁻¹ with a dominant peak in the photoluminescence spectra at 4 K associated with a donor level of 164 meV. Annealing in Se-atmosphere at 600°C lead to p-type conductivity of 6 · 10⁻⁶ (Ωcm)⁻¹ within a surface layer of the AgGaSe₂ single crystals. The corresponding photoluminescence spectra and the activation energy of the electrical conductivity (between 100 K and 300 K) suggest the presence of an acceptor (V_cation) with an activation energy of 60 meV and a donor (V_Se) with an activation energy of 100 meV.     

Electrical resistivity of thermally evaporated bismuth telluride thin films

Semiconducting chalcogenide thin films have been receiving considerable attention in the recent years because of their wide applications in the various fields of science and technology. The studies of the electronic properties of semiconductors have been largely stimulated by attractive micro-electronic device applications. Among the various V–VI compounds, Bismuth Telluride (Bi₂Te₃) is an established low-temperature thermo electric material and is widely employed in thermoelectric generators and coolers. The present work deals with the structural and the electrical characterization of Bi₂Te₃ thin films vacuum deposited on well-cleaned glass substrates. A constant rate of deposition was maintained through out the process. To obtain uniform and homogeneous film thickness through out on all the substrates a rotary drive was employed. Quartz crystal thickness monitor was used to measure the thickness of the samples. From the X-ray diffractogram the Bi₂Te₃ films are found to be amorphous at lower thicknesses and posses hexagonal polycrystalline structure at higher thickness, having lattice parameters a=4.44 Å and c=29.40 Å. The grain size of the Bi₂Te₃ thin films before annealing and after annealing are found to be 100 and 160 Å, respectively. The micro-strain and the dislocation density are found to decrease after annealing. The thermogravimetry–differential thermal analysis (TG–DTA) studies revealed that the Bi₂Te₃ films are non-decomposable. Electrical resistivity, TCR measurements have been carried out as a function of varying temperatures in the range 303–453 K are found to show the size effect. Analyzing the size dependence of electrical resistivity it is found that the electrical resistivity is a linear function of the reciprocal of thickness of the film. The energy gap of Bi₂Te₃ thin film was calculated from the graph ln ρ vs. 1/T and it is found that the energy gap decreases with increasing thickness. From the negative values of TCR, it is inferred that Bi₂Te₃ films exhibit semiconducting behavior.     

Electrochromic properties of heat-treated thin films of CeO2–TiO2–ZrO2 prepared by sol–gel route

CeO₂–TiO₂–ZrO₂ thin films were prepared using the sol–gel process and deposited on glass and ITO-coated glass substrates via dip-coating technique. The samples were heat treated between 100 and 500 °C. The heat treatment effects on the electrochromic performances of the films were determined by means of cyclic voltammetry measurements. The structural behavior of the film was characterized by atomic force microscopy and X-ray diffraction. Refractive index, extinction coefficient, and thickness of the films were determined in the 350–1000 nm wavelength, using nkd spectrophotometry analysis.Heat treatment temperature affects the electrochromic, optical, and structural properties of the film. The charge density of the samples increased from 8.8 to 14.8 mC/cm², with increasing heat-treatment temperatures from 100 to 500 °C. It was determined that the highest ratio between anodic and cathodic charge takes place with increase of temperature up to 500 °C.     

Preparation and study of structural and optical properties of CSVT deposited CuInSe2 thin films

A simple close-spaced vapour transport (CSVT) system has been designed and fabricated. Copper indium diselenide (CuInSe₂) thin films of wide range of thickness (4000–60000 Å) have been prepared using the fabricated CSVT system at source temperatures 713, 758 and 843 K. A detailed study on the deposition temperature has been made and the temperature profile along with the reaction kinetics is reported. The composition of the chemical constituents of the films has been determined by energy dispersive X-ray analysis. The structural characterization of the as-deposited CuInSe₂ films of various thicknesses has been carried out by X-ray diffraction method. The diffractogram revealed that the CuInSe₂ films are polycrystalline in nature with chalcopyrite structure. The structural parameters such as lattice constants, axial ratio, tetragonal distortion, crystallite size, dislocation density and strain have been evaluated and the results are discussed. The surface morphology of the as-deposited CuInSe₂ thin films has been studied using scanning electron microscope. The transmittance characteristics of the CuInSe₂ films have been studied using double beam spectrophotometer in the wavelength range 4000–15000 Å and the optical constants n and k are evaluated. The absorption coefficient has been found to be very high and is of the order of 10⁵–10⁶ m⁻¹. CuInSe₂ films are found to have a direct allowed transition and the optical band gap is found to be in the range 0.85–1.05 eV.     

TiO2 thin films as protective material for transparent-conducting oxides used in Si thin film solar cells

Nb-doped TiO₂ films have been fabricated by RF magnetron sputtering as protective material for transparent-conducting oxide (TCO) films used in Si thin film solar cells. It is found that TiO₂ has higher resistance against hydrogen radical exposure, utilizing the hot-wire CVD (catalytic CVD) apparatus, compared with SnO₂ and ZnO. Further, the minimum thickness of TiO₂ film as protective material for TCO was experimentally investigated. Electrical conductivity of TiO₂ in the as-deposited film is found to be 10⁻⁶ S/cm due to the Nb doping. Higher conductivity of 10⁻² S/cm is achieved in thermally annealed films. Nitrogen treatments of Nb-doped TiO₂ film have been also performed for improvements of optical and electric properties of the film. The electrical conductivity becomes 4.5×10⁻² S/cm by N₂ annealing of TiO₂ films at 500 °C for 30 min. It is found that the refractive index n of Nb-doped TiO₂ films can be controlled by nitrogen doping (from n=2.2 to 2.5 at λ = 550 nm) using N₂ as a reactive gas. The controllability of n implies a better optical matching at the TCO/p-layer interface in Si thin film solar cells.     

Pyrite (FeS2) thin films prepared by spray method using FeSO4 and (NH4)2Sx

A simple spray method for the preparation of pyrite (FeS₂) thin films has been studied using FeSO₄ and (NH₄)₂S_x as precursors for Fe and S, respectively. Aqueous solutions of these precursors are sprayed alternately onto a substrate heated up to 120°C. Although Fe–S compounds including pyrite are formed on the substrate by the spraying, sulfurization of deposited films is needed to convert other phases such as FeS or marcasite into pyrite. A single-phase pyrite film is obtained after the sulfurization in a H₂S atmosphere at around 500°C for 30 min. All pyrite films prepared show p-type conduction. They have a carrier concentration (p) in the range 10¹⁶–10²⁰ cm⁻³ and a Hall mobility (μ_H) in the range 200–1 cm²/V s. The best electrical properties (p=7×10¹⁶ cm⁻³, μ_H=210 cm²/V s) for a pyrite film prepared here show the excellence of this method. The use of a lower concentration FeSO₄ solution is found to enhance grain growth of pyrite crystals and also to improve electrical properties of pyrite films.     

Optical and electrical properties of semiconducting WS2 thin films: From macroscopic to local probe measurements

Photosensitive WS₂ thin films are obtained by annealing in presence of a crystallization promoter like Ni or Co. Conventional optical and electrical measurements (conductivity, Hall effect, photoconductivity) are completed by various local probe investigations like scanning tunneling microscopy (STM) and conductive atomic force microscopy (AFM). This thorough study clarifies the respective role of the crystallites and the grain boundaries in the macroscopic measurements and gives information on the properties and on the photovoltaic prospect of the films. The optical properties of the thin films are comparable to those of WS₂ single crystals, with absorption excitonic peaks of same intensity at 1.94 and 2.36 eV. The films show a p-type behavior with a carrier concentration of p10²³ m⁻³ and a Hall mobility of μ_H10×10⁻⁴ m² V⁻¹ s⁻¹ at room temperature. The Hall mobility is thermally activated with an activation energy of 60–90 meV. The photoconductivity spectra show the first indirect transition at 1.35 eV and a decrease of the quantum efficiency at the excitonic-transitions energies. The transport in the film plane is mainly governed by the potential barriers at the grain boundaries. Using a conducting AFM, the crystallite edges are shown to be degenerate semiconductors, while STM current–voltage (I–V) spectroscopy indicates that the flat WS₂ crystallites have a low density of surface states on the basal planes. Submicron solid-state junctions are fabricated on the film by depositing gold electrodes on single WS₂ crystallites (with an electrode surface of 0.2 μm²). Under illumination the p-WS₂/Au micro-junctions show open circuit-voltages of up to 520 mV. The collection of photo-generated carriers is limited by recombination at the grain boundaries.     

Photoconductivity of Cu(In, Ga) Se2 films

Polycrystalline CuIn_{1 − x}Ga_xSe₂ (0 ≤ x < 0.3) films (CIGS) were deposited by coevaporating the elements from appropriate sources onto glass substrates (substrate temperature 720 to 820 K). Photoconductivity of the polycrystalline CIGS films with partially depleted grains were studied in the temperature range 130–285 K at various illumination levels (0–100 mW/cm²). The data at low temperature (T < 170 K) were analyzed by the grain boundary trapping model with monovalent trapping states. The grain boundary barrier height in the dark and under illumination were obtained for different x-values of CuIn_1−xGa_xSe₂ films. Addition of Ga in the polycrystalline films resulted in a significant decrease in the barrier height. Variation of the barrier height with incident intensity indicated a complex recombination mechanism to be effective in the CIGS films.     

Optical and electrochemical properties of V2O5:Ta Sol–Gel thin films

Vanadium and tantalum-doped vanadium pentoxide, V₂O₅ and V₂O₅:Ta thin films (2.5 and 5 mol% of Ta) were prepared using sol–gel dip-coating technique.The coating solutions were prepared by reacting vanadium (V) oxytripropoxide and tantalum ethoxide (V) as precursors using anhydrous isopropyl alcohol as solvent.The films were deposited on a transparent glass substrate with ITO conducting film by dip-coating technique, with a withdrawal of 20 cm/min from the vanadium–tantalum solution and heat treated at 300 °C for 1 h. The resulting films were characterized by cyclic voltammetry, optical spectroscopy and by X-ray diffraction analysis (XRD). XRD data show that the films thermally treated at 300 °C were crystalline.A charge density of 70 mC/cm² was obtained for the film with 5 mol% of Ta, with an excellent stability up to 1500 cycles.     

Boron-doped diamond-like amorphous carbon as photovoltaic films in solar cell

In this paper, the photovoltaic feature of metal-boron carbide-silicon (MCS) solar cell was reported. The boron-doped diamond-like carbon thin film on n-silicon substrate has been prepared using arc-discharge plasma chemical vapor deposition (PCVD) technique. The conductivity and the resistivity of the film were measured by Bio-Rad Hall5500PC system to be p-type semiconductor and 3–12 Ω cm/□, respectively. The boron content in the films was about 0.8–1.2%, obtained from Auger electron spectroscopy (AES), and some microcrystalline diamond grains (0.5–1.0 μm) embedded in the mainly amorphous network were revealed through scanning electron microscope (SEM) and Raman spectrum. The performance of Au/C(B)/n-Si heterojunction solar cells has been given under dark I–V rectifying curve and I–V working curve (with 100 mW cm⁻² illumination). A measurement of open-circuit voltage V_oc=580 mV and short-circuit current density J_sc=32.5 mA cm⁻² was obtained. Accordingly, the energy conversion efficiency of the device was tentatively determined to be about 7.9% in AM 1.5, 100 mW/cm² illuminated.     

CdO/Cu2O solar cells by chemical deposition

CdO and Cu₂O thin films have been grown on glass substrates by chemical deposition method. Optical transmittances of the CdO and Cu₂O thin films have been measured as 60–70% and 3–8%, respectively in 400–900 nm range at room temperature. Bandgaps of the CdO and Cu₂O thin films were calculated as 2.3 and 2.1 eV respectively from the optical transmission curves. The X-ray diffraction spectra showed that films are polycrystalline. Their resistivity, as measured by Van der Pauw method yielded 10⁻²–10⁻³ Ω cm for CdO and approximately 10³ Ω cm for Cu₂O. CdO/Cu₂O solar cells were made by using CdO and Cu₂O thin films. Open circuit voltages and short circuit currents of these solar cells were measured by silver paste contacts and were found to be between 1–8 mV and 1–4 μA.     

Electrochemical deposition of Zn3P2 thin film semiconductors on tin oxide substrates

Zn₃P₂ semiconductor thin films were prepared by electrodeposition technique form aqueous solutions. The deposition mechanism was investigated by cyclic voltammetry technique. Crystal structure, morphology and composition of as deposited and annealed Zn₃P₂ thin films grown on SnO₂/glass substrates were determined by X-ray diffraction, scanning electron microscopy, and energy dispersive X-ray analysis. X-ray diffraction data indicated the formation of Zn₃P₂ as the predominant phase for both as-deposited and annealed films. The compositions of the deposited films were controlled by the bath temperature, deposition potential and Zn/P ratio in the solution.The dark current–voltage measurements of SnO₂/Zn₃P₂/C devices indicated a rectifying behavior and a reverse saturation current density of 1.7×10⁻⁷ A/cm², which is in good accordance with that obtained from films prepared using vacuum technique. Also, the capacitance–voltage measurements showed that the number of interface states and the built in potential are in the order of 5×10⁻⁹ cm⁻³ and 0.85 V, respectively. These preliminary results for Zn₃P₂ thin films reveal that, this semiconductor material can be used for solar cell applications.     

Investigation of pulsed non-melt laser annealing on the film properties and performance of Cu(In,Ga)Se2 solar cells

Pulsed non-melt laser annealing (NLA) has been used for the first time to modify near-surface defects and related junction properties in Cu(In,Ga)Se₂ (CIGS) solar cells. CIGS films deposited on Mo/glass substrates were annealed using a 25 ns pulsed 248 nm laser beam at selected laser energy density in the range 20–60 mJ/cm² and pulse number in the range 5–20 pulses. XRD peak narrowing and SEM surface feature size increase suggest near-surface structure changes. Dual-beam optical modulation (DBOM) and Hall-effect measurements indicate NLA treatment increases the effective carrier lifetime and mobility along with the sheet resistance. In addition, several annealed CdS/CIGS films processed by NLA were fabricated into solar cells and characterized by photo- and dark-J–V and quantum efficiency (QE) measurements. The results show significant improvement in the overall cell performance when compared to unannealed cells. The results suggest that an optimal NLA energy density and pulse number for a 25 ns pulse width are approximately 30 mJ/cm² and 5 pulses, respectively. The NLA results reveal that overall cell efficiency of a cell processed from an unannealed film increased from 7.69% to 13.41% and 12.22% after annealing 2 different samples at the best condition prior to device processing.     

Highly conducting transparent nanocrystalline Cd1−xSnxS thin film synthesized by RF magnetron sputtering and studies on its optical, electrical and field emission properties

Transparent conducting Cd_1−xSn_xS thin films have been synthesized by radio frequency magnetron sputtering technique on glass and Si substrates for various tin concentrations in the films. X-ray diffraction studies showed broadening of peaks due to smaller crystal size of the Cd_1−xSn_xS films, and SEM micrographs showed fine particles with average size of 100 nm. Sn concentration in the films was varied from 0% to 12.6% as determined from energy-dispersive X-ray analysis. The room-temperature electrical conductivity was found to vary from 8.086 to 939.7 S cm⁻¹ and corresponding activation energy varied from 0.226 to 0.076 eV. The optimum Sn concentration for obtaining maximum conductivity was found to be 9.3%. The corresponding electrical conductivity was found to be 939.7 S cm⁻¹, and the mobility 49.7 cm² V⁻¹ s⁻¹. Hall measurement showed very high carrier concentrations in the films lying in the range of 8.0218×10¹⁸–1.7225×10²⁰ cm⁻³. The conducting Cd_1−xSn_xS thin films also showed good field emission properties with a turn on field 4.74–7.86 V μm⁻¹ with variation of electrode distance 60–100 μm. UV–Vis–NIR spectrophotometric studies of the films showed not needed the optical band gap energy increased from 2.62 to 2.80 eV with increase of Sn concentration in the range 0–12.6%. The optical band gap was Burstein–Moss shifted, and the corresponding carrier concentration obtained from the shift also well matched with that obtained from Hall measurement.     

The electro-optical properties of amorphous indium tin oxide films prepared at room temperature by pulsed laser deposition

The electrical and optical properties of pulsed laser deposited amorphous indium tin oxide films at room temperature are discussed. The films were grown from indium oxide (In₂O₃) targets of different tin (Sn) doping content (0, 5 and 10 wt%) at different oxygen pressures (P_O2) ranging from 1×10⁻³ to 5×10⁻² Torr. The electrical and optical properties of the films were examined by Hall measurements and optical spectrophotometry. It was found that high conductivity amorphous films could be prepared at room temperature irrespective of the Sn doping content. The properties of these films deposited from 0, 5, 10 wt% Sn-doped In₂O₃ targets show a similar response to changes in P_O2. The maximal conductivity of (4.0, 2.1 and 1.8)×10³ S/cm and optical transmittance (visible) higher than 90% were obtained at P_O2 region of (1–1.5)×10⁻² Torr. An undoped In₂O₃ film produced the highest conductivity of 4×10³ S/cm in these studies.     

Initial results of CdS/CuInTe2 heterojunction formed by flash evaporation

The CuInTe₂ thin films is one of the most attractive semiconductors for solar cells applications, since its direct band gap energy (Eg≈1 eV) is suitable as an absorber in photovoltaic conversion. In this letter the CuInTe₂ thin films are prepared by flash evaporation technique. X-ray diffraction measurements on the as-deposited CuInTe₂ film showed that these films consist mainly of the chalcopyrite phase. The junction formation in the n-CdS/p-CuInTe₂ cell has been investigated using current–voltage (I–V) and capacitance-voltage (C–V) measurements.     

Temperature effect on the electrical properties of undoped NiO thin films

Undoped NiO thin films have been prepared onto glass substrate by e-beam evaporation of the element Ni in vacuum at 2 × 10⁻⁴ Pa. The as-deposited Ni films were then oxidized in air by heating about 2 h at a temperature of 470 K and then the oxidized Ni films are turned into NiO thin films. From the deposition time and film thickness after annealing in air, an effective deposition rate of NiO thin films was about 6.67 nms⁻¹. X-ray diffraction (XRD) study shows the NiO films are amorphous in nature. SEM studies of the surface morphology of NiO films exhibit a smooth and homogeneous growth on the entire surface. The elemental composition of NiO films is estimated by Energy Dispersive Analysis of X-rays (EDAX) method. The effects of temperature on the electrical properties of NiO thin films were studied in details. The heating and cooling cycles of the samples are reversible in the investigated temperature range after successive heat-treatment in air. Thickness dependence of conductivity is well in conformity with the Fuchs–Sondheimer theory. Temperature dependence of electrical conductivity shows a semiconducting behavior with activation energy. The thickness dependence of activation energy as well as thermopower studies was done within 293–473 K temperature range, respectively. Thermopower study indicates the NiO films a p-type semiconductor. Optical study in the wavelength range 0.3 < λ<1.2 μm range exhibits a high transmittance in the visible as well as in the near infra-red. Calculation from the optical data, the NiO sample exhibits a band gap at 3.11 eV, which does agree well with earlier reported values. These studies may be of importance for the application of this material in energy efficient surface coating devices.