具有超晶格缓冲层的780nm量子阱半导体激光器

在衬底面制作超晶格缓冲层可以有效地掩埋体材料的缺陷，使闵值电流大幅度降低，提高光功率。     

量子阱激光器超晶格缓冲层的研究

在量子阱半导体激光器结构中采用优化超晶格缓冲层来掩埋衬底缺陷，获得了性能优良的激光器。对超晶格缓冲层所具有的“量子阱陷阱效应”进行了理论分析。     

LP－MOCVD生长伸张应变InGaAs／InP多量子阱的研究

首先从理论上研究了在应变情况下量子阱中能级的计算，然后利用ＬＰ－ＭＯＣＶＤ研究了ＩｎＧａＡｓ／ＩｎＰ组份的控制及生长条件，最后生长伸张应变为０．５％的四个量子阱ＩｎＧａＡｓ／ＩｎＰ结构材料，利用ＰＬ光谱测量得最小阶宽为１．８ｎｍ。     

K·P方法计算InGaAs／InP应变量子阱的增益矩阵元

应用Ｋ·Ｐ微扰法计算能带的基本方法，在考虑偏振随波矢变化的情况下，分别计算了无应变、１％压缩应变和１％伸张应变下４．０ｎｍ阱宽ＩｎＧａＡｓ／ＩｎＰ量子阱的增益矩阵元，计算表明，增益矩阵元的偏振因子随波失的变化而发生很大的变化。     

LP－MOCVD生长伸张应变InGaAs／InP多量子阱的研究

首先从理论上研究了在应变情况下量子阱中能级的计算，然后利用ＬＰ－ＭＯＣＶＤ研究了ＩｎＧａＡｓ／ＩｎＰ组份的控制及生长条件，最后生长伸张应变为０．５％的四个量子阱ＩｎＧａＡｓ／ＩｎＰ结构材料，利用ＰＬ光谱测量得最小阶宽为１．８ｎｍ。     

具有超晶格缓冲层的量子阱激光器的研制

在衬底表面制作超晶格缓冲层可以有效地掩埋体材料的缺陷，使阈值电流大幅度降低，光功率成倍增长。所研制出的量子阱激光器室温脉冲平均线性光功率大于２０ｍＷ（未镀反射膜），波长为７７８ｎｍ，最低阈值电流为３０ｍＡ，阈值电流密度为４００～６００Ａ／ｃｍ２，谱线宽度为５ｎｍ。     

InGaAs/GaAs应变层短周期超晶格的Wannier-Stark效应

本文利用光电流谱方法研究了10—300K温度范围内In_(0.2)Ga_(0.8)As/GaAs应变层短周期超晶格的Wannier-Stark效应,在室温及低温下均观察到明显的吸收边场致“蓝移”现象,并对Stark-ladder激子跃迁的能量位置及振子强度随电场的变化给予详细讨论。实验结果表明,利用In_(0.2)Ga_(0.8)As/GaAs应变层超晶格的Wannier-Stark效应可以制作0.98μm波长范围的电光调制器和自电光双稳器件。     

Ⅲ—Ⅴ族超晶格量子阱结构红外探测器最新进展

半导体超晶格量子阱作为新一代微电子器件材料而迅速堀起,亦为寻求品质优异、具有特殊性能的红外探测器材料开拓了一个全新的能带工程领域。本文综述了国外发展很快的Ⅲ-Ⅴ族超晶格量子阱红外器件,着重介绍近两年的新成果。     

新型InGaAs/InP多量子阱异质结构掺杂超晶格光波导调制器

提出一种新型的InGaAs/InP多量子阱异质结构掺杂超晶格光波导调制器。这种结构的器件结合了多量子阱大的光吸收非线性和掺杂超晶格低激发强度的优点,因此具有低驱动偏压差、高通断比率和高的调制响应速率。低的驱动偏压差、小的器件尺寸以及通过扩散形成的分隔接触电极结构(因此可以和传统的平面加工技术兼容),使这种器件特别适合于作为大规模光电集成的单元光调制器和光开关。     

快速热退火提高应变InAs／InP量子阱结构的晶体质量

研究了快速热退火对应变ＩｎＡｓ／ＩｎＰ单晶子阱结构光学性质的影响。样品经最佳条件７００℃，５ｓ的快速热退火，８Ｋ温度下量子阱的荧光强度地加了４倍，量子阱荧光峰仅蓝移１．５ｍｅＶ。     

Characterisation of strained (111)B InGaAs/GaAs quantum well lasers with intracavity optical modulator

We have studied InGaAs/GaAs quantum well (QW) lasers with an intracavity saturable absorber grown on (111)B GaAs. The effect of the built-in piezoelectric field, resulting from strained growth, on the gain/absorption spectra is modelled theoretically and measured experimentally. With the piezoelectric field opposing and exceeding the intrinsic field in our structure an externally applied reverse bias can be used to change the net-field in the well from forward to reverse via the flat-band condition. Changing the field in the QW of the passive section influences its absorptive behaviour, changing the light output characteristics. Large hysteresis loops in the light output versus current relation are observed which can be tailored by the applied bias. Additionally, the change in absorption with applied bias provides the possibility of integrated amplitude modulation, avoiding the direct modulation of the active section. An extinction ratio of −11 dB was measured when changing the bias at the absorber by 1 V.     

Optical and structural properties of MOVPE grown GaxIn1−xAs/InP strained multiple quantum well atructures

This paper presents a study of the structural and optical properties of strained GaInAs/ InP multiple quantum well (MQW) structures fabricated by LP-MOVPE. The composition of the Ga _x In_1−x As films ranged fromx = 0.17 tox = 1.0 and was determined by sputtered neutral mass spectrometry (SNMS) on thick layers. The structures of the MQW samples with well widths from 1.5 to 5 nm were investigated by high resolution x-ray diffraction (HR-XRD). Simulations of the diffraction patterns showed that transition layers of approximately 2 monolayer (ML) thickness with high lattice mismatch exist at the interfaces. Photoluminescence (PL) measurements indicate well widths of a multiple of a monolayer with local variations of one monolayer. The PL peak energies vary smoothly with the Ga concentration. These results were confirmed by optical absorption measurements.     

(InAs)/sub 1//(GaAs)/sub 4/ superlattice strained quantum well laser at 980 nm

The first successful MBE growth of (InAs)/sub 1//(GaAs)/sub 4/ short-period superlattice (SPS) strained quantum well lasers emitting at approximately 980 nm is reported. The SPS consists of six periods of one and four monolayers of InAs and GaAs, respectively. The measured threshold current density was approximately 100 A cm/sup -2/ for 0.96 mm long lasers. Devices have operated up to 170 degrees C with a characteristic temperature T/sub 0/ of 148 K. The (InAs)/sub m//(GaAs)/sub n/ superlattice is an ordered counterpart of the InGaAs random alloy, and provides an alternative method fabricating high speed electronic and photonic devices.<>     

量子阱激光器的阈值电流和外量子效率

地于半导体分别限制单量子阱激光器，为了降低阈值电流，提高外量子效率，分析和讨论了影响阈值电流和外量子效率的各种因素，并做了一定的数值计算，给出了量佳结构参数。     

Ge_xSi_(1-x)/Si超晶格量子阱红外探测器和焦平面阵列现状

文章主要介绍 Ge_xSi_(1-x)/Si 超晶格量子阱长波红外探测器和新颖的红外焦平面阵列的现状。     

GexSi1—x／Si应变层超晶格的结构特性与器件应用

近年来,Ge_xSi_(1-x)/Si 应变层超晶格的研究日渐活跃与成熟。本文试从半导体物理与器件应用的角度出发,着重介绍了这种超晶格的各种结构特性,并简要评述了以 Ge_xSi_(1-x)/Si 异质结形成的各种新型半导体器件的研究进展。     

GexSi1—xSi应变层和超晶格及其临界厚度

异质外延层的性能和质量,往往取决于异质结构的特性。文章讨论了Ge_xSi-(1-x)/Si 应变层和应变层超晶格中的应变、位错和临界厚度,并比较了实验结果。     

调制掺杂AlGaAs/InGaAs/GaAs应变量子阱结构的研究

报道调制掺杂AlGaAs/InGaAs/GaAs应变量子阱结构的分子束外延生长、变温霍尔效应和电化学c—v测量,并对输运性质进行了讨论。用这种材料研制的PM-HEMT(pseudomorphic high electron mobility transistors)器件,栅长0.4μm,在12GHz下噪声系数1.03dB,相关增益7.5dB。