Formation of various metal nanostructures with thermal annealing to control the effective coupling energy between a surface plasmon and an InGaN/GaN quantum well

We demonstrate the variations of the photoluminescence (PL) spectral peak position and intensity through the surface plasmon (SP) coupling with an InGaN/GaN quantum well (QW) by forming Ag nanostructures of different scale sizes on the QW structure with thermal annealing. By transferring an Ag thin film into a nanoisland structure, we can not only enhance the PL intensity, but also adjust the SP dispersion relation and hence red-shift the effective QW emission wavelength. Such an emission spectrum control can be realized by initially coating Ag films of different thicknesses. Although the screening process of the quantum-confined Stark effect, which can result in PL spectrum blue-shift and intensity enhancement, also contributes to the variations of the emission behaviour, it is found that the SP-QW coupling process dominates in the observed phenomena.     

Fabrication of surface metal nanoparticles and their induced surface plasmon coupling with subsurface InGaN/GaN quantum wells

Based on the fabrication of Ag nanoparticles (NPs) with controlled geometry and surface density on an InGaN/GaN quantum well (QW) epitaxial structure, which contains indium-rich nano-clusters for producing localized states and free-carrier (delocalized) states in the QWs, and the characterization of their localized surface plasmon (LSP) coupling behavior with the carriers in the QWs, the interplay behavior of LSP coupling with carrier delocalization in the QWs is demonstrated. By using the polystyrene nanosphere lithography technique with an appropriate nanosphere size and adjusting the post-fabrication thermal annealing condition, the induced LSP resonance wavelength of the fabricated Ag NPs on the QW sample can match the QW emission wavelength for generating the coherent coupling between the carriers in the QWs and the induced LSP. The coupling leads to the enhancement of radiative recombination rate in the QWs and results in increased photoluminescence (PL) intensity, red-shifted PL spectrum, reduced PL decay time, and enhanced internal quantum efficiency. It is found that the observed effects are mainly due to the LSP coupling with the delocalized carriers in the QWs.     

Nanostructuring Multilayer Hyperbolic Metamaterials for Ultrafast and Bright Green InGaN Quantum Wells

Semiconductor quantum well (QW) light‐emitting diodes (LEDs) have limited temporal modulation bandwidth of a few hundred MHz due to the long carrier recombination lifetime. Material doping and structure engineering typically leads to incremental change in the carrier recombination rate, whereas the plasmonic‐based Purcell effect enables dramatic improvement for modulation frequency beyond the GHz limit. By stacking Ag‐Si multilayers, the resulting hyperbolic metamaterials (HMMs) have shown tunability in the plasmonic density of states for enhancing light emission at various wavelengths. Here, nanopatterned Ag‐Si multilayer HMMs are utilized for enhancing spontaneous carrier recombination rates in InGaN/GaN QWs. An enhancement of close to 160‐fold is achieved in the spontaneous recombination rate across a broadband of working wavelengths accompanied by over tenfold enhancement in the QW peak emission intensity, thanks to the outcoupling of dominating HMM modes. The integration of nanopatterned HMMs with InGaN QWs will lead to ultrafast and bright QW LEDs with a 3 dB modulation bandwidth beyond 100 GHz for applications in high‐speed optoelectronic devices, optical wireless communications, and light‐fidelity networks.     

Study on modulating the indium composition in InGaN quantum wells to improve the luminous efficiency of GaN LED

This study primarily used metal-organic chemical vapor deposition to grow gallium nitride (GaN) light-emitting diode (LED) structures with InGaN quantum wells (QWs). During the InGaN QW growing process, an identical concentration of trimethylindium gas was prepared and introduced at different times (Before(B), Middle(M), and After(A)) into the QW structures for an investigation of the variation in GaN LED luminous efficacy. Because of segregation resulting from the different concentrations of In content of the InGaN QWs during the process and because of the stress resulting from lattice mismatch between atoms, the interaction between segregation and stress forms quantum dots (QDs). Under processes with the appropriate parameters, the QDs can improve the luminous efficacy of GaN LEDs. Postprocess LEDs were measured for their electroluminescence, photoluminescence, cathodoluminescence, thermal stability, light output power, and external quantum efficiency. The QW structures were analyzed and observed using high-resolution transmission electron microscopy. The results revealed that the Before (B) LED had the greatest light output power at 46.6 mW, an increase of approximately 15.6%. Thermal annealing was then used to treat the LED at 850 °C, after which the photoluminescence intensity increased by 1.7 times.

     

Performance enhancement of GaN-based light-emitting diodes by surface plasmon coupling and scattering grating

Using the analysis of the evanescent surface plasmon polariton (SPP) mode at the GaN/Ag interface as basis, we propose a light-emitting diode (LED) structure with a plasmonic Ag nanostructure and sapphire grating to enhance external quantum efficiency. The 2D finite-difference time-domain method is used to study the spectral properties of the hybrid structure and the effects of structural parameters on light emission enhancement. The plasmonic Ag nanostructure couples recombination energy to the SPP modes at the GaN/Ag interface, whereas the sapphire grating scatters photons out of the LED chips with high extraction efficiency. Under optimal parameters, external quantum efficiency enhancement increases to approximately eighteen times the original value at a relatively long wavelength.     

Cathodoluminescence study of crystalline quality of (Al, In, Ga)N heterostructures

Wurtzite InGaN/GaN and AlGaN/GaN heterostructures grown by metal organic vapor phase epitaxy were studied using cathodoluminescence (CL) combined with secondary electron microscopy (SEM) and scanning transmission electron microscopy (STEM). The surface morphology of samples containing InGaN layers is dominated by three types of defects: mesa-like hexagonal structures, hexagonal pyramids and micropipes. At the positions of pyramids the whole epilayer is thicker than at defect free positions, while at the positions of micropipes the whole epilayer is much thinner. The luminescence efficiency as well as the emission wavelength are influenced by these defects. In SL structures an increasing SL period thickness in the growth direction was observed. Panchromatic CL images show intensity inhomogeneity in both InGaN/GaN and AlGaN/GaN heterostructure, which are related to local variations of the interface quality. In AlGaN/GaN SQW structures a broad deep-level luminescence band at around 543 nm was observed, which is generally absent in InGaN/GaN heterostructures. This deep-level emission is strongly enhanced in defect positions.     

Efficiency enhancement in a-plane InGaN/GaN light emitters with carbon nanotubes

This study investigates the coupling modes of a-plane InGaN/GaN mutiquantum wells (MQWs) with single-walled carbon nanotubes (SWCNTs). The enhancement of light emissions at resonance photon energies can be explained by the surface plasmon coupling of the MQW-SWCNT hybrid structure. The photoluminescence (PL) enhancement ratios of the indigo (2.90 eV) emission from MQWs with SWCNTs reveal three coupling modes at 2.50 eV, 2.97 eV, and 3.42 eV. In addition, the trend of the PL intensity ratios and efficiencies corresponds to that of the PL enhancement ratios. The PL efficiencies for the green (2.46 eV) and indigo (2.90 eV) emissions of SWCNT-coated MQWs are 32% and 110% better than the corresponding values of uncoated MQWs, respectively. The results show that the MQW-SWCNT hybrid structure has the potential to be applied in high-efficiency light emitters in the visible and ultraviolet range.     

Effects of nano-structured photonic crystals on light extraction enhancement of nitride light-emitting diodes

The light extraction efficiency of an InGaN/GaN light-emitting diode (LED) can be enhanced by incorporating nano-structured photonic crystals inside the LED structure. We employed plane wave expansion (PWE) method and finite difference time domain (FDTD) method to reveal the optical confinement effects with the relevant parameters. The results showed that band-gap modulation could increase the efficiency for light extraction at the lattice constant of 200 nm and depth of 200 nm for the 468-nm LED. Focused ion beam (FIB) using Ga created the desired nano-structured patterns. The LED device micro-PL (photoluminescence) results have demonstrated that the triangular photonic crystal arrays could increase the peak illumination intensity by 58%. The peak wavelength remained unchanged. The integrated area under the illumination peak was increased by 75%. As the patterned area ratio was increased to 85%, the peak intensity enhancement was further improved to 91%, and the integrated area was achieved at 106%.     

基于双蓝光有源区激发YAG:Ce荧光粉的高显色性白光LED

在(0001)蓝宝石衬底上利用金属有机化学气相沉积系统,分别生长含有p-AlGaN电子阻挡层和反对称n-AlGaN层的双蓝光波长发射的InGaN/GaN混合多量子阱发光二极管(LED)。结果发现,与传统的具有p-AlGaN电子阻挡层的双蓝光波长LED相比,这种n-AlGaN层能有效改善电子和空穴在混合多量子阱活性层中的分布均匀性和减少电子溢出,并减弱双蓝光发射光谱对电流的依赖性。此外,基于这种双蓝光波长发射的芯片与YAG:Ce荧光粉封装成白光LED能实现高显色性的白光发射,在20 mA电流驱动下,6500 K色温时显色指数达到91,而基于单蓝光芯片的白光LED显色指数只有75。     

High-efficiency InGaN/GaN/AlGaN light-emitting diodes with short-period InGaN/GaN superlattice for 530–560 nm range

A new method of forming the active region in high-efficiency InGaN/GaN/AlGaN light-emitting diode (LED) structure for long-wave green range is described. The introduction of a short-period InGaN/GaN superlattice situated immediately under the emitting quantum well and overgrown with GaN layer at reduced temperature leads to a more than tenfold increase in the efficiency of emission. For the proposed LEDs, the maximum quantum efficiency was 12% at 552 nm and 8% at 560 nm.     

Submicrometre resolved optical characterization of green nanowire-based light emitting diodes

The electroluminescent properties of InGaN/GaN nanowire-based light emitting diodes (LEDs) are studied at different resolution scales. Axial one-dimensional heterostructures were grown by plasma-assisted molecular beam epitaxy (PAMBE) directly on a silicon (111) substrate and consist of the following sequentially deposited layers: n-type GaN, three undoped InGaN/GaN quantum wells, p-type AlGaN electron blocking layer and p-type GaN. From the macroscopic point of view, the devices emit light in the green spectral range (around 550 nm) under electrical injection. At 100 mA DC current, a 1 mm2 chip that integrates around 10(7) nanowires emits an output power on the order of 10 μW. However, the emission of the nanowire-based LED shows a spotty and polychromatic emission. By using a confocal microscope, we have been able to improve the spatial resolution of the optical characterizations down to the submicrometre scale that can be assessed to a single nanowire. Detailed μ-electroluminescent characterization (emission wavelength and output power) over a representative number of single nanowires provides new insights into the vertically integrated nanowire-based LED operation. By combining both μ-electroluminescent and μ-photoluminescent excitation, we have experimentally shown that electrical injection failure is the major source of losses in these nanowire-based LEDs.     

Influence of the interaction between two Ag nanoparticles on optical properties of Ag/PGMEA nanocomposite materials

We report local electric field calculations in Ag/PGMEA nanocomposite materials using the dipole discrete approximation. We employ calculation and simulation to show that the nanoparticle radius and the interparticle distance could control and tune the surface plasmon resonances, which influence the extinction spectra and the near-field enhancement of Ag/PGMEA nanostructures. With decreasing interparticle distance, the near-field coupling between particles will induce the shift of surface plasmon resonance peak and improve the near-field intensity. With increasing radius (r), the resonance wavelength peak is red-shifted because of the interaction between two Ag nanoparticles. At 449 nm, the highest near-field enhancement factor obtained in the center of the gap was 30.5 for two interacting Ag nanoparticles of r = 11 nm with a gap of 5 nm.     

Investigation of V-defects formation in InGaN/GaN multiple quantum well grown on sapphire

In the growth of InGaN multiple quantum well structure, V-pits has been observed to be initiated at the threading dislocations which propagate to the quantum well layers with high indium composition and substantially thick InGaN well. A set of samples with varying indium well thickness (3-7.6 nm) and composition (10-30%) are grown and characterized by photoluminescence (PL), X-ray diffraction, transmission electron microscopy and atomic force microscopy. The indium content and the layer thicknesses in InGaN/GaN quantum well are determined by high-resolution X-ray diffraction (XRD) and TEM imaging. With indium composition exceeding 10%, strain at the InGaN/GaN interface leads to the generation of V-pits at the interlayers of the MQW. Higher indium composition and increase in thickness of a period (InGaN well plus the GaN barrier) appear to enhance pits generation. With thicker InGaN well and reduction in thickness of GaN to InGaN (or the R ratio), pit density is substantially reduced, but it results in greater inhomogeneity in the distribution of indium in the InGaN well. This leads to a broadened PL emission and affect the PL emission intensity.     

Epitaxial self-alignment: A new route to hybrid active plasmonic nanostructures

Concepts of lateral ordering of epitaxial semiconductor quantum dots (QDs) are for the first time transferred to hybrid nanostructures for active plasmonics. We review our recent research on the self-alignment of epitaxial nanocrystals of In and Ag on ordered one-dimensional In(Ga)As QD arrays and isolated QDs by molecular beam epitaxy. By changing the growth conditions the size and density of the metal nanocrystals are easily controlled and the surface plasmon resonance wavelength is tuned over a wide range in order to match the emission wavelength of the QDs. Photoluminescence measurements reveal large enhancement of the emitted light intensity due to plasmon enhanced emission and absorption down to the single QD level.     

Improvement in light output intensity of InGaN/GaN multiple-quantum-well blue light-emitting diode by SiO2/Si3N4 distributed Bragg reflectors and silver back mirror

In this article, the light output intensity of InGaN/GaN multiple-quantum-well (MQW) light emitting diodes (LEDs) is improved by using SiO₂/Si₃N₄ distributed Bragg reflectors (DBRs) as window layer and Ag back mirror. The SiO₂/Si₃N₄ DBRs can take several advantages, such as high reflectance with less number of DBR, passive characteristics, and high reliability due to growth in one pump down growth system. The experimental results indicated that InGaN/GaN LEDs with the 3-pair of SiO₂/Si₃N₄ DBRs show a maximum light output intensity of 64 mcd under 20 mA driving current and an improvement of 42% as compared to that of InGaN/GaN LEDs without SiO₂/Si₃N₄ DBRs. In addition, the turn-on voltage, forward resistance, and full width at half maximum (FWHM) of the emission spectra for InGaN/GaN LEDs with the 3-pair of SiO₂/Si₃N₄ DBRs and Ag back mirror are 3.23 V, 16 Ω, and 22.4 nm under 20 mA forward current.     

Linearly polarized light emission from InGaN/GaN quantum well structure with high indium composition

We fabricated yellow (575 nm) emitting a-plane InGaN/GaN light emitting diode (LED). Microstructure and stress relaxation of the InGaN well layer were observed from the images of dark field transmission electron microscopy. The LED chip was operated at 3.7 V, 20 mA, and the polarization-free characteristic in nonpolar InGaN layer was confirmed from a small blue-shift of approximaely 1.7 nm with increase of current density. The high photoluminescence (PL) efficiency of 30.4% showed that this non-polar InGaN layer has a potential of application to green-red long wavelength light emitters. The PL polarization ratio at 290 K was 0.25 and the energy difference between two subbands was estimated to be 40.2 meV. The low values of polarization and energy difference were due to the stress relaxation of InGaN well layer.     

Luminescence and lasing in GaN epitaxial layers and InGaN/GaN quantum well heterostructures under optical and electron-beam excitation

Interrelation between stimulated and excitonic emission intensity of GaN epitaxial layers and yellow luminescence intensity as well as correlation between photoluminescence and laser properties of InGaN based multiple quantum well heterostructures was investigated. It was found among all studied undoped GaN epitaxial layers that the higher intensity of the yellow luminescence and so the higher concentration of the yellow luminescence related centres the higher is the excitonic, electron–hole plasma and stimulated emission intensity. It was shown that a small Stokes shift and a high ratio of the luminescence intensity from InGaN quantum well layers to the photoluminescence intensity from GaN barrier layers indicate high laser quality of the multiple quantum well heterostructures. The lowest full width at half maximum of the laser line was 0.04 nm, the highest operating temperature was 585 K, the lowest threshold was 100 kW cm⁻², the highest characteristic temperature was 164 K and the highest wavelength was 442.5 nm. The far-field patterns of the laser emission from the MQW lasers consist of two approximately symmetrical high brightness spots localized at angles =±30–35°.     

Investigations of selectively grown GaN/InGaN epitaxial layers

We have studied GaN/InGaN heterostructures grown by selective area low pressure metalorganic vapor phase epitaxy (LP-MOVPE). A GaN layer already grown on the c-face of sapphire has been used as substrate, partly masked by SiO₂. In a second epitaxial step a GaN/InGaN single heterostructure and GaN/InGaN/GaN double heterostructures were grown on the unmasked rectangular fields. We obtained good selectivity for GaN and for InGaN. A larger growth rate as compared to planar epitaxy and strong growth enhancement at the edges was observed. Spatially resolved measurements of the luminescence show an increase in indium incorporation of about 80% at the edges. Besides the larger indium offering at the edges, this is due to an enhanced growth rate. Very smooth facets are obtained. The influence of pressure on the surface morphology and growth enhancement was investigated.     

Photonic crystal-assisted light extraction from a colloidal quantum dot/GaN hybrid structure

We present a study of the light extraction from CdSe/ZnS core/shell colloidal quantum dot thin films deposited on quantum well InGaN/GaN photonic crystal structures. The two-dimensional photonic crystal defined by nanoimprint lithography is used to efficiently extract the guided light modes originating from both the quantum dot thin films and the InGaN quantum wells. Far-field photoluminescence spectra are used to measure the extraction enhancement factor of the quantum dot emission (x1.4). Microphotoluminescence measurements show that the guided mode effective extraction lengths range between 70 and 180 microm, depending on the wavelength of light.     

Localized Surface Plasmon Induced Position‐Sensitive Photodetection in Silicon‐Nanowire‐Modified Ag/Si

Surface plasmon‐based approaches are widely applied to improve the efficiency of photoelectric devices such as photosensors and photocells. In order to promote the light absorption and electron–hole pair generation in devices, metallodielectric nanostructures are used to boost the growth of surface plasmons. Here, silicon nanowires (SiNWs) are used to modify a metal–semiconductor structure; thus, Ag/SiNWs/Si is manufactured. In this system, a large increased lateral photovoltaic effect (LPE) is detected with a maximum positional sensitivity of 65.35 mV mm^?1, which is ≈53‐fold and 1000‐fold compared to the conventional Ag/Si (1.24 mV mm^?1) and SiNWs/Si (0.06 mV mm^?1), respectively. It is demonstrated that localized surface plasmons (LSPs) contribute a lot to the increment of LPE. Furthermore, through the surface‐enhanced Raman scattering spectra of rhodamine‐6G and finite‐difference time‐domain simulation, it is illustrated that silver‐coated SiNWs support strong LSPs. The results propose an enhancement mechanism based on LSPs to facilitate the photoelectric conversion in LPE and offer an effective way to improve the sensitivity of photodetectors.