Optical properties of NiO thin films fabricated by electron beam evaporation

Nickel oxide (NiO) thin films were deposited onto quartz substrates by the electron beam deposition technique, and obtained high crystal quality after annealing at 1173 K. The structural and microstructural properties of the films were studied by X-ray diffraction (XRD) and atomic force microscope (AFM), respectively. We focus on the optical characterization of the films, indicating the enhancement of the crystal quality, which was confirmed by the photoluminescence and Raman spectrum. Furthermore, PL studies exhibited room temperature emission at 377 nm, and also shown high ultraviolet/visible rejection ratio (>100).     

Effects of oxygen flow rate on microstructure and optical properties of aluminum oxide films deposited by electron beam evaporation technique

Reactive evaporation technique has been used to deposit thin films of alumina (Al₂O₃) on crystalline Si substrates at ambient temperatures in an electron beam (e-beam) evaporation system using alumina granules as evaporant material. The loss of oxygen due to dissociation of alumina has been compensated by bleeding high purity oxygen gas into the system during evaporation. A set of samples were prepared at different flow rates of oxygen and the films have been characterized by Spectroscopic Ellipsometry (SE), Atomic Force Microscopy (AFM), Grazing Incidence X-ray Reflectivity (GIXR) and X-ray Photoelectron Spectroscopy (XPS) measurements. The density and optical properties of the films showed interesting variation with oxygen flow rates.     

Dielectric properties of ytterbium oxide films deposited by electron beam evaporation

Experimental data for the dielectric properties of thin ytterbium oxide (Yb₂O₃) films deposited in MIM structures are presented. Yb₂O₃ films were obtained by reactive vacuum evaporation using an electron beam. The capacitance of the MIM structures was determined for various dielectric thicknesses (d = 30?200 nm) over the temperature range 130–600 K at a frequency of 1 kHz. The dielectric permittivity and temperature coefficient of capacitance were determined. The influence of various electrodes on the structure capacitance was examined. The breakdown field strength was determined. The results are compared with those previously obtained for Yb₂O₃.     

Optical properties of erbium oxide thin films deposited by electron beam evaporation

Erbium oxide thin films were deposited by electron beam evaporation on substrates heated to 300 °C. The effect of the introduction of oxygen on the structural, chemical and optical properties of the films was investigated. The films were characterized using X-ray diffraction, X-ray photoelectron spectroscopy and normal-incidence transmittance and reflectance. The films had microcrystallites embedded in an amorphous matrix, and their stoichiometry was dependent on the oxygen partial pressure. The transmittance spectra of the films revealed that they were optically inhomogeneous. A model based on an inhomogeneous layer was applied to extract the refractive index and extinction coefficient from the transmittance and reflectance spectra.     

Studies on tin oxide films prepared by electron beam evaporation and spray pyrolysis methods

Transparent conducting tin oxide thin films have been prepared by electron beam evaporation and spray pyrolysis methods. Structural, optical and electrical properties were studied under different preparation conditions like substrate temperature, solution flow rate and rate of deposition. Resistivity of undoped evaporated films varied from 2.65 × 10⁻² ω-cm to 3.57 × 10⁻³ ω-cm in the temperature range 150–200°C. For undoped spray pyrolyzed films, the resistivity was observed to be in the range 1.2 × 10⁻¹ to 1.69 × 10⁻² ω-cm in the temperature range 250–370° C. Hall effect measurements indicated that the mobility as well as carrier concentration of evaporated films were greater than that of spray deposited films. The lowest resistivity for antimony doped tin oxide film was found to be 7.74 × 10⁻⁴ ω-cm, which was deposited at 350°C with 0.26 g of SbCl₃ and 4 g of SnCl₄ (SbCl₃/SnCl₄ = 0.065). Evaporated films were found to be amorphous in the temperature range up to 200°C, whereas spray pyrolyzed films prepared at substrate temperature of 300– 370°C were poly crystalline. The morphology of tin oxide films was studied using SEM.     

Effects of oxygen gas flow rate and ion beam plasma conditions on the opto-electronic properties of indium molybdenum oxide films fabricated by ion beam-assisted evaporation

The purpose of the present work is to experimentally study the effects of the oxygen gas flow rate and ion beam plasma conditions on the properties of indium molybdenum oxide (IMO) films deposited onto the polyethersulfone (PES) substrate. Crystal structure, surface morphology, and optoelectronic properties of IMO films are examined as a function of oxygen gas flow rate and ion beam discharge voltage.Experimental results show that the IMO films consist of a cubic bixbyite B-In₂O₃ single phase with its crystal preferred orientation alone B(222). Mo⁶⁺ ions are therefore considered to partially substitute In³⁺ sites in the deposit. Under-controlled ion bombardment during deposition enhances the reaction among those arriving oxygen and metal ion species to condense into IMO film and facilitates a decreased surface roughness of IMO film. The film with ultimate crystallinity and the lowest surface roughness is obtained when the oxygen flow rate of 3 sccm and the discharge voltage of 110 V are employed. This results in the lowest electrical resistivity due mainly to the increased Hall mobility and irrelevant to carrier concentration. The lowest electrical resistivity of 8.63 × 10^− 4 ohm-cm with a 84.63% transmittance at a wavelength of 550 nm can be obtained, which satisfies the requirement of a flexible transparent conductive polymer substrate.     

Transparent and heat-reflecting indium tin oxide films prepared by reactive electron beam evaporation

Transparent and heat-reflecting indium tin oxide films were prepared by electron beam evaporation of In₂O₃9mol.%SnO₂ in an oxygen atmosphere of about 5×10^?4 Torr. A visible absorption of less than 2%, a thermal IR reflectance exceeding 90% and a d.c. resistivity of approximately 3×10^?4 Ω cm were obtained from films 0.4 μm thick deposited at a substrate temperature of 300°C. Films with similar properties could be prepared with substrate temperatures as low as 150°C.     

Ultrafine oxide powders prepared by electron beam evaporation

The surface properties and microstructure of ultrafine oxide powders prepared by vapour phase condensation have been examined by several techniques (electron microscopy, X-ray diffraction, nitrogen adsorption isotherms, infra-red absorption of surface species). All the powders had a very small particle size (<20 nm), and gave type II adsorption Isotherms — typical of non-porous adsorbents. From infra-red absorption studies of water adsorbed on the surface of the oxides, an unusually relaxed and unreactive surface was indicated. The compaction and sintering characteristics of the powders were exceptional, and made them highly suited for ceramic fabrication. The contrasting behaviour of an ultrafine magnesia, consisting of porous pseudomorphic agglomerates, is demonstrated.     

Preparation and characterization of indium zinc oxide thin films by electron beam evaporation technique

In this work, the preparation of In₂O₃-ZnO thin films by electron beam evaporation technique on glass substrates is reported. Optical and electrical properties of these films were investigated. The effect of dopant amount and annealing temperature on the optical and electrical properties of In₂O₃-ZnO thin films was also studied. Different amount of ZnO was used as dopant and the films were annealed at different temperature. The results showed that the most crystalline, transparent and uniform films with lowest resistivity were obtained using 25 wt% of ZnO annealed at 500 °C.     

Characterization of surface oxide films on titanium and bioactivity

Biological properties of titanium implant depend on its surface oxide film. In the present study, the surface oxide films on titanium were characterized and the relationship between the characterization and bioactivity of titanium was studied. The surface oxide films on titanium were obtained by heat-treatment in different oxidation atmospheres, such as air, oxygen and water vapor. The bioactivity of heat-treated titanium plates was investigated by immersion test in a supersaturated calcium phosphate solution. The surface roughness, energy morphology, chemical composition and crystal structure were used to characterize the titanium surfaces. The characterization was performed using profilometer, scanning electronic microscopy, ssesile drop method, X-ray photoelectron spectroscopy, common Bragg X-ray diffraction and sample tilting X-ray diffraction. Percentage of surface hydroxyl groups was determined by X-ray photoelectron spectroscopy analysis for titanium plates and density of surface hydroxyl groups was measured by chemical method for titanium powders. The results indicated that heat-treatment uniformly roughened the titanium surface and increased surface energy. After heat-treatment the surface titanium oxide was predominantly rutile TiO₂, and crystal planes in the rutile films preferentially orientated in (1 1 0) plane with the highest density of titanium ions. Heat-treatment increased the amount of surface hydroxyl groups on titanium. The different oxidation atmospheres resulted in different percentages of oxygen species in TiO₂, in physisorbed water and acidic hydroxyl groups, and in basic hydroxyl groups on the titanium surfaces. The immersion test in the supersaturated calcium phosphate solution showed that apatite spontaneously formed on to the rutile films. This revealed that rutile could be bioactivated. The analyses for the apatite coatings confirmed that the surface characterization of titanium has strong effect on bioactivity of titanium. The bioactivity of the rutile films on titanium was related not only to their surface basic hydroxyl groups, but also to acidic hydroxyl groups, and surface energy. Heat-treatment endowed titanium with bioactivity by increasing the amount of surface hydroxyl groups on titanium and its surface energy.     

不同氧分压下电子束蒸发氧化锆薄膜的特性

在不同的氧分压下用电子束热蒸发的方法制备了氧化锆薄膜。用扫描探针显微镜、X射线衍射仪和分光光度计分别对薄膜的表面粗糙度、微结构和透射谱等特性进行了表征。实验发现,薄膜沉积中氧分压与薄膜性质及微结构有密切的关系。当氧分压由3.0×10-3Pa升高到11×10-3Pa,薄膜的表面粗糙度由3.012nm降低到1.562nm,而薄膜的折射率由2.06降低到2.01。此外,X射线的衍射还发现,薄膜是以四方相为主多相共存的,随着氧分压的增加,特征衍射峰强度逐渐减弱,最后完全变成非晶。     

钛氧膜生物相容性与生物活性的研究与应用

对钛氧膜的生物相容性和生物活性的研究及应用进行了评述.重点讨论了钛氧膜的制备方法、钛氧膜的活化处理方式以及钛氧膜在心血管材料和骨替代材料中的应用前景.     

Indium doped silver oxide thin films prepared by reactive electron beam evaporation technique: electrical properties

The indium doped silver oxide thin films have been prepared at 275 °C on soda lime glass and silicon substrates by reactive electron beam evaporation technique; the deposition rate has been varied (by varying the electron beam current) in the range 0.94–16.88 nm/s keeping the oxygen flow rate constant. These films are polycrystalline. The electrical resistivity for these films decreases with increasing deposition rate. The AIO films prepared with a deposition rate of 5.7 nm/s show near p-type conductivity. The work function has been measured on these films by contact potential method using Kelvin Probe. The surface morphology of the films has been evaluated using atomic force microscopy (AFM). The roles of indium doping and oxygen vacancies in the electrical properties of these films have been analyzed; the ionized impurity scattering is the dominant mechanism controlling the electrical conduction in these films.     

Hierarchical microstructure of a titanium alloy fabricated by electron beam selective melting

Here,a near alpha-type Ti6.5 Al2 Zr1 Mo1 V alloy has been fabricated by electron beam selective melting(EBSM).Near-equiaxed grains existed in the first few layers,whereas elongated columnar prior β grains almost parallel to the building direction formed in the subsequent built layers.Interspacing of β phase gradually decreased as the build height increased.Martensite α' with twins and dislocations emerged and microhardness value reached the maximum in the top region,whereas only α/β phase appeared in other regions in the EBSMed sample.Multiple phase transformations can be observed with the change of peak temperatures during each thermal cycle.With a sufficient dwell time,martensite α' in the middle and bottom regions in-situ decomposed into α+β and coarsened by the heat conduction from the subsequent layers.Fine β precipitates nucleated heterogeneously inside α' plates and at plate-plate interfaces during the subsequent EBSM process.Considering the phase transformation during the heating process and the cooling process,the existence time of different phases was combined with cycle heating and cooling to clarify the dynamic evolution of micro structure under complex thermal history of EBSM,favoring the fabrication of high-performance titanium alloy components.     

Magnetic properties of oxide nanopowders obtained by pulsed electron beam evaporation

The magnetic properties of oxide nanopowders obtained by pulsed electron beam evaporation of targets in a low-pressure gas phase have been studied. Using this method, we obtained Zn-ZnO and ZnO nanopowders with the specific magnetization amounting to 2.8 × 10⁻² and 2 G cm³/g, respectively. Significant room-temperature ferromagnetism has been observed for the fist time in a nanopowder of yttria-stabilized zirconia, where the specific magnetization reached ∼6.7 × 10⁻² G cm³/g.     

电子束蒸发技术制备ITO薄膜的光电特性和微结构研究

利用电子束蒸发技术制备ITO透明导电膜,研究了衬底温度,氧分压以及沉积速率的变化对薄膜光电特性的影响,结果表明在衬底为350℃,氧分压为2.0×10-2 Pa,沉积速率在3 nm/min的条件下制得透过率T81%,电阻率p=1.9×10-3 Ω·cm的ITO透明导电膜.另外我们通过XRD对样品的微结构进行了分析,发现薄膜晶格常数和晶粒大小随制备条件的不同,也有显著的规律变化.