Advances in monocrystalline Si thin film solar cells by layer transfer

The transfer of monocrystalline Si films enables the fabrication of efficient thin film solar cells on glass or plastic foils. Chemical vapor deposition serves to epitaxially deposit Si on quasi-monocrystalline Si films obtained from thermal crystallization of a double-layer porous Si film on a Si wafer. A separation layer that forms during this crystallization process allows one to separate the epitaxial layer on top of the quasi-monocrystalline film from the starting Si wafer after solar cell processing. Independently confirmed thin film solar cell efficiencies are 15.4% and 16.6% for thin film solar cells transferred to a glass superstrate with a total Si film thickness of 24.5 and 46.5 μm, respectively, and a cell area of 4 cm². Device simulations indicate an efficiency potential above 20%.     

Reactive ion etching (RIE) technique for application in crystalline silicon solar cells

Saw damage removal (SDR) and texturing by conventional wet chemical processes with alkali solution etch about 20 micron of silicon wafer on both sides, resulting in thin wafers with which solar cell processing is difficult. Reactive ion etching (RIE) for silicon surface texturing is very effective in reducing surface reflectance of thin crystalline silicon wafers by trapping the light of longer wavelength. High efficiency solar cells were fabricated during this study using optimized RIE. Saw damage removal (SDR) with acidic mixture followed by RIE-texturing showed the decrease in silicon loss by ∼67% and ∼70% compared to conventional SDR and texturing by alkaline solution. Also, the crystalline silicon solar cells fabricated by using RIE-texturing showed conversion efficiency as high as 16.7% and 16.1% compared with 16.2%, which was obtained in the case of the cell fabricated with SDR and texturing with NaOH solution.     

Thin film solar cells on glass based on the transfer of monocrystalline Si films

Thin film solar cells based on monocrystalline Si films are transferred onto a glass superstrate. Chemical vapor deposition serves to epitaxially deposit Si on quasi-monocrystalline Si films obtained from thermal crystallization of a double-layer porous Si film on a Si wafer. A separation layer that forms during this crystallization process allows one to separate the epitaxial layer on top of the quasi-monocrystalline film from the starting Si wafer. At present, we achieve an independently confirmed efficiency of 10.6% with a thin film solar cell of an area of 1.92 cm² that consists of a 24.5 μm thick Si film transferred to glass. Device simulation indicates an efficiency potential of around 17%.     

Thin film silicon solar cells on glass by substrate thinning

We report on the fabrication of thin film Si solar cells on glass by substrate thinning. We use thin Si films grown on thick Si substrates by either liquid phase epitaxy or chemical vapour deposition. A novel solar cell device fabrication process is then applied to the structure, in which the Si is thinned down to 20–30 μm leaving the grown Si film as the majority of the active material of the structure. We obtain a conversion efficiency of 14.4% for such a thin film Si solar cell on glass.     

Thin film solar cells on honeycomb-structured substrates for photovoltaic building blocks

Honeycomb-structured solar cell is proposed for photovoltaic building block applications. Honeycomb-like substrates were prepared either by a conventional semiconductor processing or by a low cost wet-chemical method, and amorphous Si thin film solar cells were fabricated on these substrates. We have demonstrated one of the essential requirements for building block application, which is the low sensitivity of the light incidence angles on the power conversion efficiency; and we have identified the critical processing issues through the experimental study using various thin film deposition methods. This honeycomb-structured solar cell is a promising candidate for the future photovoltaic building block applications enabling the inherent high strength-to-weight ratio and higher efficiency at an oblique light incidence.     

High-quality industrial n-type silicon wafers with an efficiency of over 23% for Si heterojunction solar cells

n-type CZ-Si wafers featuring longer minority carrier lifetime and higher tolerance of certain metal contamination can offer one of the best Si-based solar cells. In this study, Si heterojuction (SHJ) solar cells which was fabricated with different wafers in the top, middle and tail positions of the ingot, exhibited a stable high efficiency of > 22% in spite of the various profiles of the resistivity and lifetime, which demonstrated the high material utilization of n-type ingot. In addition, for effectively converting the sunlight into electrical power, the pyramid size, pyramid density and roughness of surface of the Cz-Si wafer were investigated by scanning electron microscope (SEM) and transmission electron microscope (TEM). Furthermore, the dependence of SHJ solar cell open-circuit voltage on the surface topography was discussed, which indicated that the uniformity of surface pyramid helps to improve the open-circuit voltage and conversion efficiency. Moreover, the simulation revealed that the highest efficiency of the SHJ solar cell could be achieved by the wafer with a thickness of 100 μm. Fortunately, over 23% of the conversion efficiency of the SHJ solar cell with a wafer thickness of 100 μm was obtained based on the systematic optimization of cell fabrication process in the pilot production line. Evidently, the large availability of both n-type ingot and thinner wafer strongly supported the lower cost fabrication of high efficiency SHJ solar cell.     

模拟非硅衬底上转换效率10%的多晶硅薄膜太阳电池

在重掺杂非活性单晶硅片上生长一定厚度的SiO2，开窗口后作为衬底，利用快速热化学气相沉积（RTCVD）及区熔再结晶（ZMR）方法制备多晶硅薄膜太阳电池。由于采用了区熔再结晶（ZMR）的方法，获得了取向一致的多晶硅薄膜,为薄膜电池的制备打下了良好的基础,转换效率达到10．21％。     

Large-size multi-crystalline silicon solar cells with honeycomb textured surface and point-contacted rear toward industrial production

In this paper, we present a multi-crystalline solar cell with hexagonally aligned hemispherical concaves, which is known as honeycomb textured structure, for an anti-reflecting structure. The emitter and the rear surface were passivated by silicon nitride, which is known as passivated emitter and rear (PERC) structure. The texture was fabricated by laser-patterning of silicon nitride film on a wafer and wet chemical etching of the wafer beneath the silicon nitride film through the patterned holes. This process succeeded in substituting the lithographic process usually used for fabricating honeycomb textured structure in small area. After the texturing process, solar cells were fabricated by utilizing conventional fabrication techniques, i.e. phosphorus diffusion in tube furnace, deposition of anti-reflection film and rear passivation film by chemical vapor deposition, front and rear electrodes formation by screen printing, and contact formation by furnace. By adding relatively small complicating process to conventional production process, conversion efficiency of 19.1% was achieved with mc-Si solar cells of over 200 cm² in size. The efficiency was independently confirmed by National Institute of Advanced Industrial Science and Technology (AIST).     

Physical basis for the design of CdS/CdTe thin film solar cells

Solar cells based on polycrystalline semiconductor thin films have great potential for decreasing the cost of photovoltaic energy. However, this kind of solar cells has characteristics very different from those fabricated on crystalline silicon for which the carrier-transport and behavior is clearly known. Instead, for hetero-junction solar cells made on less known polycrystalline materials the design is almost empirical. In this work, several physical aspects related to the behavior of polycrystalline thin film solar cells will be discussed, and some considerations for an adequate design of this kind of solar cells will be made. For example, the recombination at the grain boundaries and its influence on the short circuit current as a function of the crystallite sizes on the active material is considered. Based on this, the appropriate thickness of each layer and their resistivity will be discussed. As an example, these considerations will be applied to CdS/CdTe heterojunction solar cells, taking into account typical properties of CdTe thin films used for solar cells.     

微晶硅材料和电池特性的相关研究

主要采用甚高频等离子体增强化学气相沉积技术制备了系列微晶硅材料和电池。通过对材料电学特性、结构特性和电池间性能关系的研究,获得了高效率微晶硅薄膜太阳电池所对应材料的基本特性:暗电导在10~(-8)s/cm量级上,光敏性大于1000,晶化率约50%。进行了制备电池的开路电压和表观带隙之间关系的研究。     

Novel separation process for free-standing silicon thin-films

Reduction of the solar cell thickness decreases the material use and offers a mechanically flexible cell. The present contribution introduces a novel method to produce free-standing thin monocrystalline Si layers and solar cells. The method has three advantages over other methods: (i) The device layer is mechanically stable on the host wafer during device fabrication. (ii) Nevertheless, the separation of the layer is guaranteed after the device fabrication. (iii) No foreign substrate is necessary for the layer separation. The method is based on the locally defined formation of buried cavities only beneath the regions to be separated from the host wafer.     

Crystalline silicon thin-film solar cells—recent results at Fraunhofer ISE

Crystalline silicon thin-film solar cells combine the advantages of the stability and high-efficiency potential of crystalline silicon solar cell technology with the low material utilization of the thin-film solar cell technology. At Fraunhofer ISE the wafer equivalent concept is currently pursued. Within this concept, the active silicon layers are deposited on high-temperature stable substrates. The resulting substrate/layer sandwich can be processed into a solar cell using the same techniques that are used in conventional crystalline silicon wafer solar cell processing, hence the name wafer equivalent. In the present paper we report on how we realized wafer equivalents and explain in detail our development work on processors for both large-area silicon deposition and for zone melting recrystallization. An overview is given on the solar cell results achieved in this area.     

Present status and future of crystalline silicon solar cells in Japan

Crystalline silicon solar cells show promise for further improvement of cell efficiency and cost reduction by developing process technologies for large-area, thin and high-efficiency cells and manufacturing technologies for cells and modules with high yield and high productivity.In this paper, Japanese activities on crystalline Si wafers and solar cells are presented. Based on our research results from crystalline Si materials and solar cells, key issues for further development of crystalline Si materials and solar cells will be discussed together with recent progress in the field. According to the Japanese PV2030 road map, by the year 2030 we will have to realize efficiencies of 22% for module and 25% for cell technologies into industrial mass production, to reduce the wafer thickness to 50–100 μm, and to reduce electricity cost from 50 Japanese Yen/kWh to 7 Yen/kWh in order to increase the market size by another 100–1000 times.     

Fabrication of nanoporous antireflection surfaces on silicon

After the surface of a silicon wafer has been texturized, the reflectance of the wafer surface can be reduced to increase the power generation efficiency of a silicon-based solar cell. This study presents the integration of self-assembled nanosphere lithography (SANSL) and photo-assisted electrochemical etching (PAECE) to fabricate a nanostructure array with a high aspect ratio on the surface of silicon wafer, to reduce its reflectance. The experimental results show that the etching depth of the fabricated nanopore array structure is about and its diameter is about 90 nm, such that the aspect ratio of the pore can reach about 68:1. The weighted mean reflectance of a blank silicon wafer is 40.2% in the wavelength range of 280-890 nm. Five-minute PAECE without SANSL reduces the weighted mean reflectance to 5.16%. Five-minute PAECE with SANSL reduces the weighted mean reflectance to 1.73%. Further coating of a 200 Å thick silicon nitride layer on the surface of a nanostructure array reduces the weighted mean reflectance even to 0.878%. The novel fabrication technology proposed in this study has the advantage of being low cost, and the fabricated nanostructure array can be employed as an antireflection structure in single crystalline silicon solar cells.     

MoOx/Ag/MoOx multilayers as hole transport transparent conductive electrodes for n-type crystalline silicon solar cells

Substitution of highly doped layers with conventional transparent conductive electrodes as carrier collecting and selective contacts in conventional crystalline silicon (c-Si) solar cell configurations is crucial in increasing affordability of solar cells by lowering material costs. In this study, oxide/metal/oxide (OMO) multilayers featuring molybdenum oxide (MoO_x) and silver (Ag) thin films are developed by thermal evaporation technique, as dopant-free hole transport transparent conductive electrodes (HTTCEs) for n-type c-Si solar cells. Semidopant-free asymmetric heterocontact (semi-DASH) solar cells on n-type c-Si utilizing OMO multilayers are fabricated. The effect of outer MoO_x layer thickness and Ag deposition rate on the photovoltaic characteristics of the fabricated semi-DASH solar cells are investigated. A comparison of front side pyramid textured and flat surface solar cells is performed to optimize the optical and electrical properties. Highest efficiency of 9.3% ± 0.2% is achieved in a pyramid textured semi-DASH c-Si solar cell with 15/10/30 nm of HTTCE structure.     

A novel low cost texturization method for large area commercial mono-crystalline silicon solar cells

Texturization of mono-crystalline silicon for solar cell fabrication is still a key issue due to consumption of large amount of costly isopropyl alcohol (IPA) in conventional NaOH/KOH solution. The need of IPA arises due to the improvement in the uniformity of pyramidal structures and elimination of spots caused by bubbles sticking on the wafer surface during the texturization process. We investigated a new texturization technique for mono-crystalline silicon solar cells with tribasic sodium phosphate (Na₃PO₄, 12H₂O) solution with much less amount of IPA. The proposed texturization method of this paper is cost effective due to reduction in the consumption of expensive IPA. The cost comparison of our novel texturization approach with conventional NaOH texturization has also been reported in this paper. We are reporting for the first time such a novel approach of using tribasic sodium phosphate for texturization of mono-crystalline silicon surface with which solar cells of efficiency 14–14.8% are fabricated with more than 90% yield.     

多晶硅薄膜太阳电池

对已经取得较普遍应用的Si体太阳电池来说，开发新技术以降低电池的制造成本是目前该领域最重要的努力方向之一。尽管通过优化制造工艺可以在一定程度上进一进降低单晶Si和多晶Si体太阳电池的成本，但要进一大幅度地降低Si太阳电池的成本似乎是只能依赖于新一代的多晶Si薄膜电池。多晶Si薄膜电池因其转换效率高、寿命长和工艺简化等优点而极具潜力。本文从材料制备、材料性能和有关工艺等方面对多晶Si薄膜太阳电池的发展现状作了介绍。     

Ebeam fabrication of silicon nanodome photovoltaic devices without metal catalyst contamination

In this paper, the fabrication of silicon nanodome solar cells on crystalline wafers is reported. Crystalline silicon was patterned by ebeam lithography to define the silicon nano pillars with diameter of 100 nm, 1 μm and 5 μm. Unlike conventional bottom up growth of silicon nanowire from gold (Au), our method is free from contaminant. Consequently, it is a valuable method to fully evaluate the effect of nanostructures on solar cell performances. The fabricated devices were characterized through scanning electron microscopy, absorption measurements, illuminated solar cell I–V characteristics and monochromatic incident photon-to-electron conversion efficiency.     

Antireflective coating fabricated by chemical deposition of ZnO for spherical Si solar cells

ZnO thin films as an antireflective (AR) coating have been successfully fabricated on spherical Si solar cells by chemical deposition, which enables uniform film formation. ZnO films were prepared chemically by immersing the cell in an aqueous solution of zinc nitrate and dimethylamineborane maintained at 80 °C. The current–voltage measurements of the solar cells confirmed the increase in short circuit current induced by the AR effect. The open circuit voltage and fill factor were improved by surface passivation. As a result, the conversion efficiency of cells without an AR coating (9.45%) increased to 11.8%, which represents a 25% (relative) increase. The results indicate that the chemical deposition of ZnO is effective for the AR coating of spherical Si solar cells.     

Super high-efficiency multi-junction and concentrator solar cells

III–V compound multi-junction (MJ) (tandem) solar cells have the potential for achieving high conversion efficiencies of over 50% and are promising for space and terrestrial applications.We have proposed AlInP–InGaP double hetero (DH) structure top cell, wide-band gap InGaP DH structure tunnel junction for sub cell interconnection, and lattice-matched InGaAs middle cell. In 2004, we have successfully fabricated world-record efficiency concentrator InGaP/InGaAs/Ge 3-junction solar cells with an efficiency of 37.4% at 200-suns AM1.5 as a result of widening top cell band gap, current matching of sub cells, precise lattice matching of sub cell materials, proposal of InGaP–Ge heteroface bottom cell, and introduction of DH-structure tunnel junction. In addition, we have realized high-efficiency concentrator InGaP/InGaAs/Ge 3-junction solar cell modules (with area of 7000 cm²) with an out-door efficiency of 27% as a result of developing high-efficiency InGaP/InGaAs/Ge 3-junction cells, low optical loss Fresnel lens and homogenizers, and designing low thermal conductivity modules.Future prospects are also presented. We have proposed concentrator III–V compound MJ solar cells as the 3rd-generation solar cells in addition to 1st-generation crystalline Si solar cells and 2nd-generation thin-film solar cells. We are now challenging to develop low-cost and high output power concentrator MJ solar cell modules with an output power of 400 W/m² for terrestrial applications and high-efficiency, light-weight and low-cost MJ solar cells for space applications.