纳米二氧化铈的研究现状

通过文献分析 ,阐述了纳米二氧化铈的制备方法 ,添加物对二氧化铈涂层性能的影响及不同基体上二氧化铈涂层的研究现状 ,指出了其中的不足 ,并对二氧化铈的研究进行了展望。     

水热法合成纳米二氧化铈

稀土氧化物纳米材料具有未被填满的4f电子层结构，因而表现出了独特的光学、电学、磁学特性，使得稀土基荧光材料、磁性材料、储氧材料以及高表面积催化剂载体材料在近些年得到了广泛应用。在实际应用过程中，为了获得均质材料，并表现出纳米材料独特的量子效应等，往往要求所制备纳米颗粒具有良好的分散性。     

纳米镍对高速电镀锌镀层形貌和取向的影响

目的分析连续电镀锌生产线进行纳米镍技术改造的效果,以期进一步提高锌层的表面质量。方法应用模拟重力法高速电镀锌设备在IF钢(无间隙原子钢)表面进行纳米镍试验,探讨纳米镍对钢基板擦划伤部位的修复效果及机理,分析纳米镍时间对电镀锌层形貌和取向的影响。结果纳米镍优先沉积在基板的缺陷位置,对基板擦伤位置具有良好的填充作用,且镍层与基板结合良好。随着纳米镍时间的延长,锌层的结晶尺寸减小,结晶状态趋于致密,(002)基面织构系数明显增加。结论纳米镍技术嵌入连续电镀锌生产线,对修复基板缺陷、优化锌层结晶起到了良好的作用。     

纳米结构黑镍薄膜的电沉积制备及其电化学行为

采用电沉积方法制备具有整体纳米结构的黑镍镀层,并通过肉眼观察结合扫描电镜、X射线衍射等测试技术研究电沉积过程中的主要参数(电解液pH、搅拌速度、制备温度及电流密度)对镀层颜色及整体微观结构的影响。进一步采用动电位极化及电化学阻抗等电化学测量技术研究黑镍镀层在中性3.5%NaCl溶液中的腐蚀行为及腐蚀机理。结果表明：黑镍镀层的颜色变化趋势决定于电沉积制备参数的选择;通过优化本工艺制备的黑镍镀层平均粒径约为50 nm。对比了近似条件下制备的光亮镍镀层,发现黑镍镀层在耐蚀性方面具有较大优势。     

二氧化铈抛光液化学机械抛光微晶玻璃的机理及优化

以纳米CeO₂为磨料自制抛光液,研究磨料质量分数、pH值、抛光液流量、抛光盘转速、表面活性剂种类和氟化铵质量分数等因素对微晶玻璃化学机械抛光的影响,分析总结CeO₂在微晶玻璃化学机械抛光中的作用机理,利用原子力显微镜（AFM）检测微晶玻璃抛光后的表面粗糙度。结果表明:当CeO₂质量分数为3%、抛光液流量为25mL/min、抛光盘转速为100r/min、pH=8.0、十二烷基硫酸钠质量分数为0.01%,氟化铵质量分数为0.7%时,抛光后微晶玻璃表面粗糙度（R_a）最低为0.72nm,材料去除速率达到180.91nm/min。      

纳米结构黑镍薄膜的电沉积机理

采用直流电沉积技术在改性的Watt镀镍溶液中获得了纳米晶黑镍薄膜, 采用SEM和XRD对薄膜的表面形貌和相组成进行了表征, 采用循环伏安法和电化学阻抗谱对黑镍薄膜的初始电沉积行为进行了研究. 结果表明, 黑镍薄膜表面平整光亮, 具有纳米晶结构; 黑镍薄膜的电沉积过程遵循3D成核/生长机制; 随着阴极沉积电势(负偏压)的增大, 黄铜电极表面Ni的电沉积反应\linebreak 由UPD沉积、异质成核/生长转化为最终的同质成核/生长, 相应的电荷转移电阻R_t的值先增大然后减小; 在较高的阴极沉积电势作用下, 由于吸附H原子(H₂分子)的结晶阻止作用和(镍)羟基化合物的吸附作用, 电沉积EIS图出现低频和超低频感抗弧.     

Pechini法制备的CeO2纳米晶的晶化动力学

通过Pechini法制备CeO2粉末.XRD分析表明,该粉末在300℃下煅烧1 h后成为纳米晶体.用DT-40热分析仪研究其晶化过程,在热分析过程中,CeO2的晶化过程符合Kissinger方程,计算得到其相变激活能为86.42 kJ/mol,且其晶化过程所需能量比固相法的晶化过程所需能量显著降低.根据Qzawa方程得到,在250℃下Avrami指数n为1.5,频率因子为1.75×108.并由此推断该反应机理的形核过程为长程扩散控制型生长(初期阶段),从小尺寸开始的各种形状的生长形核率随时间下降.     

热力耦合作用下镍基合金生长取向的微观相场研究

基于耦合外应力及交变温度场的微观相场动力学模型,以镍基合金为对象,研究了在沉淀过程中结构相的生长取向及合金元素分配。结果表明:交变温度场不能改变合金的生长取向及结构相的析出顺序。交变温度场条件下,合金Al含量较高时,L1_2相先析出;V含量较高时,DO_(22)相先析出;拉应力作用时,L1_2及DO_(22)结构相垂直于应力方向生长。[001]方向拉应力下、L1_2相先析出时,DO_(22)相在[100]取向上的生长受到促进;当在[100]方向拉应力下、DO_(22)相先析出时,L1_2相在[001]取向上的生长受到促进。随着交变高温温度的降低,L1_2相体积分数随温度的波动幅度显著降低而DO_(22)相的变化则相对较小。     

取向PT薄膜的溶胶-凝胶法制备及其对PST薄膜的取向诱导

采用溶胶-凝胶工艺,以TbCl3作为掺杂剂,在无规取向的ITO透明导电玻璃基板上成功地制备了高度择优取向的PbTiO3(PT)铁电薄膜.通过对不同前驱溶液浓度、热处理工艺、热处理时间和温度制备的PT薄膜样品的XRD图谱进行分析,得出了较为优化的制备工艺,并在此基础上溅射沉积出具有明显择优取向特征的PST薄膜.很明显,以取向PT作为诱导层,可以得到择优取向的PST薄膜材料.     

W含量对Ni-W合金基带取向及织构形成的影响

采用压延辅助双轴织构基板制备路线,结合X射线衍射和电子背散射衍射技术,系统研究了W量(原子分数)分别为5%、7%和9.3%的Ni-W合金基带在冷轧形变和再结晶热处理过程中的取向及织构形成的变化规律。研究发现,在冷轧形变过程中,随着W含量的增加,Ni-W合金基带中S和Copper取向含量的增量逐渐降低,而Brass取向含量的增量则呈现上升趋势,最终低W合金获得Copper型轧制织构,而高W合金获得Brass型轧制织构。在再结晶热处理过程中,低W合金立方晶粒形核较早并迅速长大,吞并其它取向,容易获得立方织构;高W合金的立方取向晶粒则和其它取向晶粒一同形核和长大,且长大速度不及其它取向晶粒,最后形成杂乱取向。     

The growth and structure of thin oxide films on ceria-sol-coated nickel

The influence of 14-nm thick ceria ceramic coatings deposited by the sol-gel technique on the early-stage oxidation of polycrystalline nickel at 973 K was studied by analytical electron microscopy, Auger electron spectroscopy, Rutherford backscattering spectrometry and X-ray diffraction. The size of the ceria particles in the coating was modified prior to oxidation by vacuum annealing. It was found that ceria particle size is a crucial factor affecting the oxidation kinetics, oxide microstructure, and distribution of cerium within the oxide film. Coarse ceria particles applied to the nickel surface were ineffective in the inhibition of oxidation and were spread throughout the whole oxide. Coatings with small ceria particles markedly improved the oxidation resistance. After oxidation such particles were present in the surface region of nickel oxide, acting as the sources of cerium ions segregated at the nickeloxide grain boundaries. The stereological analysis of oxide microstructure as well as microchemical examination supported the predominant role of grain-boundary segregation of cerium ions decreasing the oxidation rate. The results are discussed in terms of reactive-element effect on the development of microstructure of nickel oxide film during initial stages of oxidation.     

The reactive element effect on the growth rate of nickel oxide scales at high temperature

The restriction of oxide-scale growth by an incorporated reactive element has been investigated for the oxidation at 900°C of CeO₂-coated and Ce-alloyed Ni. Analytical electron microscopy of scales in transverse section revealed that significant inhibition of diffusion along a network of grain-boundary pathways in NiO was associated with segregation of Ce at a high concentration. The development of this form of Ce distribution depended critically on the provision of sufficiently small and closely spaced CeO₂ source particles within the scales.     

Effects of acetic acid on microstructure and electrochemical properties of nano cerium oxide films coated on AA7020-T6 aluminum alloy

Nano cerium oxide films were applied on AA7020-T6 aluminum alloy and the effects of acetic acid concentration on the microstructure and electrochemical properties of the coated samples were investigated by using scanning electron microscopy (SEM), X-ray diffraction (XRD), crack-flee films with well-developed grains were obtained and grain sizes of the films decreased. Elimination of cracks and decreasing grain size of the nano cerium oxide films caused corrosion resistance to increase.     

Evolution of grain structure in nickel oxide scales

In systems such as the oxidation of nickel, in which grain-boundary diffusion in the oxide can control the rate of oxidation, understanding of the factors governing the grain structure is of importance. High-purity mechanically polished polycrystalline nickel was oxidized at 700°C, 800°C, and 1000°C for times up to 20 hr in 1 atm O₂. The scale microstructures were examined by parallel and transverse cross section transmission electron microscopy (TEM) and scanning electron microscopy (SEM). Texture coefficients were found by X-ray diffraction (XRD). Each grain in the transverse section grain boundary networks was systematically analyzed for width parallel to the Ni-NiO interface and perpendicular length, for boundary radius of curvature and for number of sides. The variation of these parameters with depth in the scale was examined. In particular, grains were increasingly columnar (i.e., with ratio of grain length to width >1) at higher temperatures and longer times. Columnar grain boundaries tended to be fairly static; the columnar grain width was less than the rate controlling grain size predicted from the oxidation rate. The mean boundary curvature per grain provided a guide to the tendency for grain growth, except in the region of the Ni-NiO interface, where the boundaries were thought to be pinned.     

氧化钒薄膜脉冲激光损伤研究

采用离子束溅射和退火工艺,在K9玻璃基体上制备了氧化钒薄膜,并对其微观形貌及组成进行了研究,还应用脉宽10ns、532nm波长的Nd:YAG激光器对薄膜样品进行了激光损伤阈值的测试.扫描电镜(SEM)分析结果表明,所制备的氧化钒薄膜均匀致密,晶粒平均尺寸约50nm.X射线光电子谱(XPS)分析可知,薄膜中钒的价态为 4价和 5价,薄膜由VO2和V2O5组成.在1Hz多次单点照射的条件下,以刚可见损伤作为判断激光损伤阈值的条件,得到此氧化钒薄膜的激光损伤阈值为21.9mJ/cm2.对刚可见损伤光斑和明显损伤光斑进行了微观分析,探讨了激光损伤原因.     

Critical misfit of epitaxial growth metallic thin films

The critical misfit of epitaxial growth metallic thin films fc was thermodynamically considered. It is found that there exists a competition between the energy of the misfit dislocation of film and non-coherent interface energy of film-substrate. Equilibrium between these energies was present at a critical atomic misfit ft. When the atomic misfit is larger than the critical value, epitaxial growth does not occur. The critical misfit of the epitaxial growth thin films can be predicted. The results show that fe is proportional to the non-coherent interface energy of the film-substrate, and inversely proportional to the elastic modulus and the thickness of the film.     

Influence of process parameters on electrochemical and physical properties of sputtered iron-doped nickel oxide thin films

1Introduction A principal focus of modern research in electrocatalysis is to discover electrode materials that exhibit excellent electrochemical stability and show interesting activity towards typical electrochemical reaction[1?10].It is desirable that th…     

Synthesis and properties of high corrosion resistant Ni–cerium oxide nano‐composite coating

The effect of cerium ion on the formation, morphology, composition, and corrosion behavior of Ni–cerium oxide coatings was investigated by SEM, FESEM, XRD, EDS, XPS, EIS, and potentiodynamic polarization. The extremely highest corrosion resistant coating was obtained when the cerium ion concentration in the plating bath was 16 mM. It has been observed that the presence of cerium ion in the plating bath led to changes in the morphology of the coating from pyramid nodular structure to coaxial structure. By adding cerium ion to the plating bath, a considerable grain refinement in the nanometer region was observed.     

外延膜的高分辨X射线衍射分析

广泛应用于半导体、铁电和光电材料中的外延结构特征以及应变和缺陷会影响外延膜的物理/化学性能。高分辨X射线衍射是对外延结构进行无损准确表征的关键技术。本文从高分辨X射线衍射与外延结构倒易空间的关系出发,重点阐述高分辨X射线衍射与普通X射线衍射的联系与区别,以强调高分辨X射线衍射特征。以铁电外延膜与衬底结构高分辨X射线衍射为例,系统分析它们的高分辨X射线衍射斑特征,包括共格生长、非共格生长、倾斜生长下衍射斑特征,以及外延膜的尺寸、外延膜的倾斜扭转和外延膜的应变对衍射斑的影响等。结合Si_1-xGe_x(x=0.1)等外延膜结构的具体分析阐述如何通过高分辨X射线衍射谱来获取外延膜结构参数,包括外延膜晶格常数、晶格错配度以及厚度和超晶格等信息。本文还系统介绍了高分辨X射线衍射中的倒易平面图的作法,以及相关的理论和实验方法,并据此获得了PbTiO₃外延膜的应力状态、畴结构、相变等结构信息。     

Synthesis and characterization of chemically deposited nickel substituted CdSe thin film

The technologically important Cd_0.5Ni_0.5Se thin film has been developed by solution growth technique on non-conducting glass substrate in tartarate bath containing Cd⁺², Ni⁺² ions and sodium selenosulphate in an aqueous alkaline medium at room temperature. Various preparative conditions of the thin films are outlined. The films were characterized by X-ray diffraction, scanning electron microscope, optical absorption and electrical measurements. The X-ray diffraction study indicates that the film is polycrystalline in nature with hexagonal phase. Scanning electron micrograph shows that the film is homogeneous with well-defined grains. The films have high optical absorption coefficient. Thermoelectric power measurement shows p-type conduction mechanism.