离子钨钼共渗的扩散机制

对双层辉光离子钨钼共渗在离子条件下形成的渗层和无离子形成的渗层进行了对比,计算了溶质原子钨和钙与空位的结合能。据溶质－空位复合体扩散的能量条件,提出溶质－空位复合体扩散机制在双层辉光离子钨钼共渗中起重要作用。由此解释了双了离子钨钼共渗的Ｗ和ＭＯ原子快速现象和渗后冷却中大量金属合物在晶界的析出。     

Crystallization mechanism of Fe78Si13B9 amorphous alloy induced by ion bombardment

The crystallization behavior of Fe₇₈Si₁₃B₉ amorphous alloys induced by Ar ion bombardment was investigated by X-ray diffraction (XRD) and transmission electron microscopy (TEM) analysis. The crystallization process of amorphous alloys can be controlled by adjustment of ion incident angles (θ), beam density and substrate temperature. The compressive stress caused by ion bombardment will result in the decrease of critical nucleation energy and induce the crystallization of amorphous alloy even at very low temperature, and the thermal effect converted from energetic ions will improve the crystallization of amorphous alloys. The crystallization process of amorphous alloy induced by ion bombardment was a stress induced phase transformation process assisted by thermal effect.     

轰击能量对离子束辅助磁控溅射沉积Cr-N薄膜断裂韧性的影响

应用低能离子束辅助磁控溅射技术(IBAMS)沉积Cr-N薄膜,用场发射扫描电镜(FESEM)、原子力显微镜(AFM)和X射线衍射表征薄膜的组织结构,讨论了轰击能量对Cr-N薄膜组织、晶粒度以及硬度和断裂韧性的影响.结果表明:随离子束辅助轰击能量的升高,Cr-N薄膜由粗大的柱状晶变为细小的晶粒,当轰击能量达到1 200 V时,薄膜呈现等轴晶结构,薄膜致密度增加.FESEM得到的表面颗粒尺寸和AFM得到的粗糙度随轰击能量升高呈现相同的变化趋势,这些表观大颗粒是由许多小的亚晶块聚集而成.进一步用X射线衍射谱形分析表明:随轰击能量从0 V升高到800 V时,亚晶块的尺寸逐渐减小;到800 V时,晶块尺寸约为9 nm,但当能量升到1 200 V时,晶块尺寸反而增大,这是由离子束辅助轰击导致的两种不同机制而引起的,一种是离子轰击导致的喷丸碎化作用,而另一种为热效应引起的晶粒长大;当轰击能量从0 V增加800 V时,薄膜的硬度和断裂韧性都显著提高,与晶粒度的减小有关;而到1 200 V时,晶粒度较未辅助略大,但却具有很高的硬度以及较高的断裂韧性,说明硬度和断裂韧性的提高还与离子束轰击导致薄膜的致密化增加有关.     

Tribological properties of 2024 aluminum alloy plasma-based ion implanted with nitrogen then titanium

1　INTRODUCTIONOwingtolowdensityandhighspecificstrength ,aluminumanditsalloysareextensivelyusedinmanyfields ,especiallyinaviationandspaceindustry .Butlowhardnessandlowwearresistanceoftenlimittheirengineeringapplications .Surfacemodificationforalu minumanditsalloysbyionimplantationoffersthepossibilityofwideningtheirapplicationswherehighwearresistanceandlowdensityarerequired[15] .Sincenitrogenionisconvenienttoobtainandeasytocontrol,andAlNhasexcellentmechanicalproperties ,nitrogenionimplant…     

离子轰击对致密T区结构Cr薄膜残余应力的影响

对于能量沉积技术,离子轰击是独立于晶粒尺寸之外影响残余应力的重要因素,沉积束流能量和通量是决定残余应力演化的关键参数。本文分别采用高功率调制脉冲磁控溅射 (Modulated Pulsed Power magnetron sputtering, MPPMS) 和高功率深振荡磁控溅射 (Deep Oscillation magnetron sputtering, DOMS) 控制沉积Cr薄膜的束流能量和通量,在相近的平均功率下调节微脉冲参数对峰值电流和峰值电压进行控制,进而实现离子轰击对本征残余应力控制。MPPMS和DOMS沉积的Cr薄膜厚度分别控制在 0.1、0.2、0.5、1.0、1.5 和 3.0 μm,并对残余应力进行对比研究。所有沉积的Cr薄膜均呈现 Cr(110) 择优取向,且形成了晶粒尺寸相当的致密T区结构。较之MPPMS,DOMS沉积Cr薄膜更呈现残余压应力特征。当Cr薄膜小于0.5 μm时,DOMS沉积Cr薄膜的残余应力表现出较高的压应力;进一步增加膜厚,残余应力逐渐受残余拉应力控制。在薄膜生长过程中,离子轰击在薄膜生长初期对残余应力贡献不大,当薄膜生长较厚时,离子能量对薄膜残余应力影响明显。离子能量是影响残余压应力形成的重要因素,高能量离子轰击有利于残余压应力的形成和控制。     

Enhanced adhesion of Cu-W thin films by ion beam assisting bombardment implanting

Cu-W thin film with high W content was deposited by dual-target DC-magnetron co-sputtering technology. Effects of the substrates surface treating technique on the adhesive strength of Cu-W thin films were studied. It is found that the technique of ion beam assisting bombardment implanting of W particles can remarkably improve the adhesive property of Cu-W thin films. Indentation and scratching test show that, the critical load is doubled over than the sample only sputter-cleaned by ion beam. The enhancing mechanism of ion beam assisting bombardment implanting of Cu-W thin films was analyzed. With the help of mid-energy Ar^＋ ion beam, W atoms can diffuse into the Fe-substrate surface layer; Fe atoms in the substrate surface layer and W atoms interlace with one another; and microcosmic mechanical meshing and diffusing combination on atom-scale among the Fe and W atoms through the film/substrate interface can be formed. The wettability and thermal expansion properties of the W atoms diffusion zone containing plentiful W atoms are close to those of pure W or W-based Cu-W film.     

氩离子轰击对中频-直流磁控溅射铝薄膜耐蚀性能的影响

目的研究氩离子轰击这种后处理工艺对TC4钛合金表面铝膜层结构和耐蚀性能的影响,为飞机钛合金紧固件的表面腐蚀防护工作提供理论依据。方法首先采用中频-直流相结合的磁控溅射离子镀方法在Ti-6Al-4V钛合金(TC4)基体表面制备铝膜,通过电化学方法研究膜层厚度和腐蚀时间对耐蚀性能的影响规律。其次,采用氩离子轰击工艺对膜层进行后处理,探讨氩离子轰击对膜层耐蚀性能的影响,同时利用SEM、EDS、AFM表征界面形貌,并分析耐蚀机理。最后,通过显微硬度仪和微纳米划痕仪测试膜层表面硬度和界面结合性能。结果随着膜层厚度从11.1μm增加至15.9μm,自腐蚀电流密度下降了76.6%,而当厚度由15.9μm增加至20.3μm时,自腐蚀电流密度又下降了24.3%。腐蚀浸泡时间达到24 h时,腐蚀产物在疏松氧化膜内的累积和覆盖阻碍了膜层的腐蚀;在48～72 h时,随着铝膜层相对疏松的腐蚀产物逐渐脱落,腐蚀逐渐加剧;浸泡至96h时,涂层表面出现宏观腐蚀坑。氩离子轰击后,膜层表面粗糙度增加,铝膜层自腐蚀电流密度由未轰击时的1.65×10~(-8)A/cm~2大幅度降低至7.29×10~(-10)A/cm~2。结论随着铝膜层厚度的增加,膜层耐蚀性逐渐增强。膜层在浸泡初期和中期,均具有较强的耐腐蚀性能;浸泡后期,膜层逐渐发生点蚀,耐蚀性能下降。表面氩离子轰击后,膜层的耐蚀性能、显微硬度和界面结合性能显著提高。     

三元合金靶择优溅射稳定态的表面化学成分

基于多元素靶溅射的Andersen-Sigmund关系式，在分析了大量的二、三元素合金溅射稳定态靶表面化学成分的变化之后，发现各元素之间表面结合能之比几乎与靶体化学成分无关。只要给各元素之间设定适当的表面结合能比，就可以很容易地计算出三元合金靶稳定态表面化学成分，至少对于用2keV氩离子轰击的Ag-Pd-Au三元合金靶系来说，其计算结果都与实验值一致。所分析的实验数据是在常温下取得的，所以可不考虑离子轰击诱发的Gibbs偏析，其结论很可能是多元合金靶溅射的一般规律。此外，由Gaidikas等最近所提出的所谓择优溅射中的“基体效应”理论是无实验依据的。     

Acoustic activation of structural rearrangement in carbon coating by ion bombardment

In order to explain atomic rearrangements in the target material, which is far deeper than the penetration depth of implanted ions, the acoustic action of low-energy (≤ 1 keV) ions on point defects in a diamond-like carbon (DLC) target was investigated. The total amplitude of the stress pulse generated due to the transfer of energy, momentum and volume from an incident ion to the target material is found, using a spherical approximation of the thermoelastic peak — the nanometric region where the phonon energy loss of the ion is thermalized. The spatial dependence of the amplitude of the generated pulse adjusted for sound absorption follows a power law rather than an exponential law. Due to such long-range action, the acoustic pulses from the ions of C⁺, Ar⁺ and Xe⁺ bombarding the DLC target can activate migration of defects at depths up to 50 nm and considerably reduce the activation energy of kinetic process at depths up to 300 nm. The dependence of the maximum depth of defect activation on the type of defect and on the energy of the ion was investigated for two typical values of the activation energy. The model was used to explain experimental data concerning the modification of optical properties of amorphous sp²-bond carbon films by 1.2 keV Ar⁺ ions.     

QTi2.5/Cu同基合金离子镀

采用同基合金电弧离子镀方法,在紫铜基体上制备了Cu-Ti合金薄膜,研究了弧电流和靶.基距离对膜层质量、沉积速率的影响.结果表明,镀层沉积速率随着弧电流的增加而增大,随靶-基距离的增大而下降;镀层近表面为层片状组织,镀层表面有颗粒存在,显示电弧源后期喷射的是Cu-Ti合金液滴;近界面处,组织细密,晶粒较小.镀层由沉积层和过渡层构成,Ti含量由表至里逐渐降低,过渡层的存在有利于提高膜-基结合力.镀层显微硬度呈梯度分布,表面显微硬度约为铜基材的3倍.     

阴极溅射对35CrMo钢离子硫氮碳共渗层的影响

用氩离子对３５ＣｒＭｏ钢离子硫氮在碳共渗层进行了阴极溅射，通过金相观察，显微硬度测定，Ｘ射线衍射相结构分析，电子探针氮碳硫分布，分析了阴极溅射对离子硫碳共渗层的影响，结果表明，阴极溅使共渗层中ε相和γ′相减少，白亮层呈典型粒状晶形貌，沿渗层深度氮碳的分布变化，峰值下降，次表层氮碳含量增加，离子硫氮碳共渗与阴极溅射良好的匹配，可使共渗硬化效果显著，渗层厚度增加。     

氩离子轰击感生Ni2Al3和NiAl3成分变化的TEM/EDS研究

在能量为3，5和7keV的氩离了轰击下，对激冷Ni-50%Al(质量分数）合金薄膜进行减薄，用配备有超薄窗口能谱仪的高分辨电镜观察分析了减薄后样品中两种合金相Ni2Al3和NiAl3的结构和成分变化。结果表明，在离子轰击下，合金相Ni2Al3和NiAl3的成分均有变化，Ni含量明显高于合金相化学配比。随着离子能量的降低，轰击后合金相中Ni含量增加。在3keV氩离子轰击下两个相的含Ni量均高达87％（原子分数）左右，在离子轰击过程中初始的NiAl3相点阵结构未发生明显变化，而Ni2Al3的初如结构在3和5keV氩离子轰击减薄后部分转变为体心立方结构。     

磁控溅射和多弧离子镀制备Cr涂层Zr-4合金的微观结构和抗高温氧化性能

为了对比研究磁控溅射和多弧离子镀两种工艺制备的Cr涂层Zr-4合金微观结构和抗高温氧化性能,分别采用直流磁控溅射和多弧离子镀制备了Cr涂层Zr-4合金样品,在空气气氛中开展高温氧化试验研究。结果表明,磁控溅射制备的Cr涂层Zr-4合金样品表面光滑,Cr涂层沿着(211)晶面择优生长,而多弧离子镀制备的Cr涂层Zr-4合金样品表面存在大量的滴液,Cr涂层沿着(110)晶面择优生长。高温氧化试验结果显示,磁控溅射制备的Cr涂层Zr-4合金样品的氧化质量增加约为多弧离子镀的一半,氧化后的微观结构显示磁控溅射制备的样品还有约4 μm厚的残留Cr涂层,且O原子仅仅大量扩散到距表面约8 μm处,而多弧离子镀制备的样品表面Cr涂层全部被氧化,且O原子大量扩散到距样品表面约1 mm深处的Zr-4合金基体中。因此,磁控溅射制备的Cr涂层Zr-4合金具有更好的抗高温氧化性能。     

磁控溅射制备Mo薄膜的优化工艺和组织及性能研究

基于正交试验设计,采用射频磁控溅射技术在不同工艺条件下制备了一系列纯金属Mo薄膜。以薄膜的纳米硬度和结合强度为评价指标,考察分析了溅射靶功率、基片温度、氩气流量和真空度4个工艺参数对溅射Mo薄膜综合力学性能和组织结构的影响规律及机理。结果表明,所制备的多种Mo薄膜均为立方多晶结构,并在(110)和(220)晶面择优生长。薄膜由细小的"树枝"状颗粒随机堆叠而成,表面呈压应力状态。综合考虑薄膜的沉积质量和沉积效率,提出磁控溅射制备Mo薄膜的较佳工艺参数为Mo靶功率100 W,沉积温度120℃,氩气流量90 cm3/min,真空度0.2 Pa。采用优化工艺制备的Mo薄膜具有良好的结晶状态和均匀致密的组织结构,纳米硬度为7.269 GPa,结合强度高达33.8 N。     

钛合金表面磁控溅射与多弧离子镀TiN膜的摩擦学性能比较

分别采用磁控溅射（MS）和多弧离子镀（MAIP）技术在TC4钛合金表面制备了TiN膜层，采用划痕仪、显微硬度计和多冲试验机评价了两种方法制备膜层的膜基结合强度及承受静态和动态载荷的能力。采用球一盘磨损试验机评价了膜层的摩擦学性能，利用扫描电镜（SEM）分析了磨痕形态特征，利用轮廓仪测量了磨损体积。结果表明：磁控溅射和多弧离子镀TiN膜层均能显著提高钛合金表面的硬度和承载能力；磁控溅射TiN膜层致密、光滑，有良好的减摩作用，但由于膜层承载能力低和膜基结合强度较差，摩擦因数随磨损行程呈增大变化趋势；多弧离子镀TiN膜层结合强度高，膜层厚，承载能力强，韧性好，同时硬质TiN膜层表面分布的Ti颗粒起到了润滑作用，因而耐磨性能优于磁控溅射TiN膜层。     

Corrosion resistance properties of AZ31 magnesium alloy after Ti ion implantation

Magnesium alloys have a wide range of applications in industry; however, their corrosion resistance, wear resistance, and hardness are rather poor, which limit their applications. Ti ion was implanted into the AZ31 magnesium alloy surface by metal vapor vacuum arc (MEVVA) implanter. This metal arc ion source has a broad beam and high current capabilities. The implantation energy was fixed at 45 keV and the dose was at 9 × 1017 cm?2. Through ion implantation, Ti ion implantation layer with approximately 900 nm in thickness was directly formed on the surface of AZ31 magnesium alloy, by which its surface property greatly improved. The chemical states of some typical elements of the ion implantation layer were analyzed by means of X-ray photoelectron spectroscopy (XPS), while the cross sectional morphology of the ion im-plantation layer and the phase structure were observed by means of scanning electron microscopy (SEM) and X-ray diffraction (XRD). The property of corrosion resistance of the Ti ion implanted layer was studied by the CS300P electrochemistry corrosion workstation in 3.5% NaCl solution. The results showed that the property of corrosion resistance was enhanced remarkably, while the corrosion velocity was obviously slowed down.     

粉末冶金W/Re合金靶材的显微结构及磁控溅射沉积性能

为了研制高品质W/Re合金靶材,采用机械混料、压制成形和真空烧结致密化工艺路线制备了纯钨及铼含量分别为1％、5％、10％(质量分数)的钨/铼(W/Re)合金,测试了W/Re合金的致密度、晶粒度及晶粒取向、磁控溅射沉积等性能.研究表明,W/Re合金致密度及纯度均随Re含量增加而逐渐提高,而晶粒逐渐细化.W/10％Re合金...     

循环氩离子轰击对磁控溅射铝膜结构和性能的影响

为了提高烧结钕铁硼永磁材料的耐腐蚀性能,采用磁控溅射技术在钕铁硼表面制备了厚度约为14.0μm的铝膜,使用循环氩离子轰击铝膜的方法制备了3个周期的多层铝膜。利用扫描电子显微镜(SEM)观察铝膜的表面和截面形貌,X射线衍射仪(XRD)表征膜层的晶体结构,采用中性盐雾试验测试膜层的耐盐雾腐蚀性能,研究循环氩离子轰击对铝膜层形貌、结构及耐中性盐雾腐蚀性能的影响。结果表明:与相同厚度的单层铝膜相比,3个周期的多层铝膜晶粒均匀细小,膜层的柱状晶结构被打断,内部形成了两个明显的界面;膜层沿(111)晶面择优生长;与厚度相同的单层Al膜相比,3个周期的多层Al膜的耐蚀性显著提高,其耐中性盐雾腐蚀时间可达到312h。循环氩离子轰击铝膜的方法可以改善铝镀层的质量和耐盐雾腐蚀性能。     

Improvement of tribological behavior of a Ti-Al-V alloy by nitrogen ion implantation

The tribological properties especially wear and hardness of a Ti-Al-V alloy with nitrogen implantation (energy 60 keV) were investigated. The implantation was carried out at fluences range from 1×1016 to 4×1017 ions/cm2. Glancing angle X-ray diffraction (GAXRD) and X-ray photoelectron spectroscopy (XPS) analyses were performed to obtain surface characterization of the implanted sample. The unimplanted and implanted samples were also annealed at 600 ℃ in order to understand the influence of annealing on the tribological properties of Ti-Al-V. The hardness shows significant improvement at the higher fluence. After annealing at 600 ℃, the friction coefficient exhibits a relative decrease for the nitrogen-implanted samples. In addition, the wear rates of the implanted samples exhibits a great decrease after annealing at 600 ℃. Nature of the surface and reason for the variation and improvement in wear resistance were discussed in detail.     

Lubrication properties of silver-palladium alloy prepared by ion plating method for high temperature stud bolt

As a solid lubricant, silver-palladium (Ag-Pd) alloy coating was investigated for the application to high temperature stud bolt. A glue layer nickel (Ni) film was deposited on the surface of the hex bolt sample and then Ag-Pd alloy coating was performed on it using ion plating method. The friction coefficient of Ag-Pd alloy film coated bolt was lower than that of N-5000 oil coated bolt by the result of axial force measurement. The cyclic test of heat treatment was conducted to evaluate the durability of Ag-Pd alloy film coated bolt. In a cycle, sample was assembled into the block using torque wrench, followed by heating and disassembling. It was not successful to disassemble the N-5000 oil coated bolt from the block after only one cycle. However, the Ag-Pd alloy film coated bolt was able to be disassembled softly till 12 cycles.