The novel usage of spectroscopic ellipsometry for the development of amorphous Si solar cells

We present the novel use of spectroscopic ellipsometry (SE) for the development of a-Si:H solar cell. SE is a very fast and useful tool to measure various optical properties of thin film. In the case of a-Si:H thin film analysis, generally, SE is used to estimate the film thickness, roughness, void fraction, optical constants such as (n,k), and so forth. In this study, optical parameters from SE measurements were analyzed with relation to structural and electrical properties of a-Si:H thin film for solar cell. By analyzing IR absorption spectra and conductivity measurements, it was affirmed that <ε₂> and parameter A by Tauc-Lorentz model fitting of SE data are representative parameters qualifying a-Si:H thin film, and that they have close relationships with FF and light induced degradation property of solar cells. Based on the analysis, solar cells that have i-layers with various E_g were optimized. By this research, easier and faster methodology to develop a-Si:H thin film for thin film Si solar cells using SE measurements was established.     

Design and Optimization of Amorphous Based on Highly Efficient HIT Solar Cell

The objective of this paper is to improve the power conversion efficiency of HIT solar cell using amorphous materials. A high efficiency amorphous material based on two dimensional heterojunction solar cell with thin intrinsic layer is designed and simulated at the research level using Synopsys/RSOFT-Solar Cell utility. The HIT structure composed of TCO/a-Si:H(p)/a-Si:H(i)/c-Si(n)/a-Si:H(i)/a-Si:H(n⁺)/Ag is created by using of RSOFT CAD. Optical characterization of the cell is performed by Diffract MOD model based on RCWA (rigorous coupled wave analysis) algorithm. Electrical characterization of the cell is done by Solar cell utility using based on Ideal diode method. In addition, optimization of the different layer thickness in the HIT structure is executed to improve the absorption and thereby the photocurrent density. The proposed HIT solar cell structure resulted in an open circuit voltage of 0.751 V, a short circuit current density of 36.37 mA/cm² and fill factor of 85.37% contributing to the total power conversion efficiency of 25.91% under AM1.5G. Simulation results showed that the power conversion efficiency is improved by 1.21% as compared to the reference HIT solar cell. This improvement in high efficiency is due to reduction of resistive losses, recombination losses at the hetero junction interface between intrinsic a-Si and c-Si, and optimization of the thicknesses in a-Si and c-Si layers.     

Computer simulation of a-Si/c-Si heterojunction solar cell with high conversion efficiency

The p-type a-Si:H/n-type c-Si (P⁺ a-Si:H/N⁺ c-Si) heterojunction was simulated for developing solar cells with high conversion efficiency and low cost. The characteristic of such cells with different work function of transparent conductive oxide (TCO) were calculated. The energy band structure, quantum efficiency and electric field are analyzed in detail to understand the mechanism of the heterojunction cell. Our results show that the a-Si/c-Si heterojunction is hypersensitive to the TCO work function, and the TCO work function should be large enough in order to achieve high conversion efficiency of P⁺ a-Si:H/N⁺ c-Si solar cells. With the optimized parameters set, the P⁺ a-Si:H/N⁺ c-Si solar cell reaches a high efficiency (η) up to 21.849% (FF: 0.866, V_OC: 0.861 V, J_SC: 29.32 mA/cm²).     

Development of n-μc-SiOx:H as cost effective back reflector and its application to thin film amorphous silicon solar cells

Development of doped silicon oxide based microcrystalline material as a potential candidate for cost-effective and reliable back reflector layer (BRL) for single junction solar cells is discussed in this article. Phosphorus doped μc-SiO_x:H layers with a refractive index ∼2 and with suitable electrical properties were fabricated by radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) technique, using the conventional capacitively coupled reactors. Optoelectronic properties of these layers were controlled by varying the oxygen content within the film. The performance of these layers as BRL have been investigated by incorporating them in a single junction amorphous silicon solar cell and compared with the conventional ZnO:Al based reflector layer. Single junction thin film a-Si solar cells with efficiency ∼9.12% have been successfully demonstrated by using doped SiO:H based material as a back reflector. It is found that the oxide based back reflector shows analogous performance to that of conventional ZnO:Al BRL layer. The main advantage with this technology is that, it can avoid the ex-situ deposition of ZnO:Al, by using doped μc-SiO:H based material grown in the same reactor and with the same process gases as used for thin-film silicon solar cells.     

Inverted and transparent polymer solar cells prepared with vacuum-free processing

Inverted transparent polymer solar cells were fabricated by sequentially depositing several organic layers from fluids, on ITO/glass substrates. ITO was used as a cathode to collect electrons. The photovoltage of these diodes can be increased by up to 400 mV by inserting a buffer layer of polyethylene oxide between ITO and the active layers, which results in 4-fold enhancement of power conversion efficiency under the illumination of 100 mW/cm² simulated AM1.5 solar light. The enhancement of V_oc is consistent with the work function change between ITO and ITO/PEO measured by photoelectron spectroscopy. Solar cell production without vacuum processing may lower production costs.     

Theoretical investigation on the absorption enhancement of the crystalline silicon solar cells by pyramid texture coated with SiNx:H layer

The absorption enhancement of the crystalline silicon (c-Si) solar cells by pyramid texture coated with SiN_x:H layer was investigated by theoretical simulation via rigorous coupled-wave analysis (RCWA). It was found that in order to maximize the spectrally weighted absorptance of the solar cells for the Air Mass 1.5 (AM1.5) solar spectrum (A_AM1.5), the required pyramid size (d) was dependent on the thickness of the c-Si substrate. The thinner the c-Si substrate is, the larger the pyramids should be. Pyramids with d > 0.5 μm can make A_AM1.5 maximal if the c-Si substrate thickness is larger than 50 μm. But d > 1.0 μm is needed when the c-Si substrate thickness is less than 25 μm. If the c-Si substrate is thinner than 5 μm, even d > 4.0 μm is required. The underlying mechanism was analyzed according to the diffraction theory. The pyramid texture acts as not only an antireflective (AR) component, but also a light trapping element. Then, the optimized refractive index and the thickness of SiN_x:H layer to further enhance the absorption were given out. The potential solar cell efficiency was also estimated.     

Improved the efficiency of small molecule organic solar cell by double anode buffer layers

Small molecule organic solar cell with an optimized hybrid planar-mixed molecular heterojunction (PM-HJ) structure of indium tin oxide (ITO)/ poly(3,4-ethylenedioxythiophene): poly(styrenesulfonate) (PEDOT: PSS) doped with 4 wt% sorbitol/ pentacene (2 nm)/ copper phthalocyanine (CuPc) (10 nm)/ CuPc: C₆₀ mixed (20 nm)/ fullerene (C₆₀) (20 nm)/ bathocuproine (BCP) (10 nm)/Al was fabricated. PEDOT: PSS layer doped with 4 wt% sorbitol and pentacene layer were used as interlayers between the ITO anode and CuPc layer to help the hole transport. And then the short-circuit current (J_sc) of solar cell was enhanced by inserting both the PEDOT: PSS (4 wt% sorbitol) and the pentacene, resulting in a 400% enhancement in power conversion efficiency (PCE). The maximum PCE of 3.9% was obtained under 1sun standard AM1.5G solar illumination of 100 mW/cm².     

Comparison of multicrystalline silicon surfaces after wet chemical etching and hydrogen plasma treatment: application to heterojunction solar cells

The modifications of the surface and subsurface properties of p-type multicrystalline silicon (mc-Si) after wet chemical etching and hydrogen plasma treatment were investigated. A simple heterojunction (HJ) solar cell structure consisting of front grids/ITO/(n)a-Si:H/(p)mc-Si/Al was used for investigating the conversion efficiency. It is found that the optimized wet chemical etching and cleaning processes as a last technological step before the deposition of the a-Si:H emitter are more favorable to HJ solar cells fabrication than the hydrogenation. Solar cells on p-type mc-Si were prepared without high-efficiency features (point contacts, back surface field). They exhibited efficiencies up to 13% for a cell area of 1 cm² and 12% for a cell area of 39 cm².     

Fabrication of microcrystalline silicon solar cells on a SnO2 coated substrate using seed layer insertion

We fabricated hydrogenated microcrystalline silicon (μc-Si:H) solar cells on SnO₂ coated glass using a seed layer insertion technique. Since rich hydrogen atoms from the μc-Si:H deposition process degrade the SnO₂ layer, we applied p-type hydrogenated amorphous silicon (p-a-Si:H) as a window layer. To grow the μc-Si:H layer on the p-a-Si:H window layer, we developed a seed layer insertion method. We inserted the seed layer between the p-a-Si:H layer and intrinsic bulk μc-Si:H. This seed layer consists of a thin hydrogen diluted silicon buffer layer and a naturally hydrogen profiled layer. We compared the characteristics of solar cells with and without the seed layer. When the seed layer was not applied, the fabricated cell showed the characteristics of a-Si:H solar cell whose spectral response was in a range of 400-800 nm. Using the seed layer, we achieved a μc-Si:H solar cell with performance of V_oc=0.535 V, J_sc=16.0 mA/cm², FF=0.667, and conversion efficiency=5.7% without any back reflector. The spectral response was in the range of 400-1100 nm. Also, the fabricated device has little substrate dependence, because a-Si:H has weaker substrate selectivity than μc-Si:H.     

Plasma enhanced chemical vapor deposition of excellent a-Si:H passivation layers for a-Si:H/c-Si heterojunction solar cells at high pressure and high power

The intrinsic a-Si:H passivation layer inserted between the doped a-Si:H layer and the c-Si substrate is very crucial for improving the performance of the a-Si:H/c-Si heterojunction (SHJ) solar cell. The passivation performance of the a-Si:H layer is strongly dependent on its microstructure. Usually, the compact a-Si:H deposited near the transition from the amorphous phase to the nanocrystalline phase by plasma enhanced chemical vapor deposition (PECVD) can provide excellent passivation. However, at the low deposition pressure and low deposition power, such an a-Si:H layer can be only prepared in a narrow region. The deposition condition must be controlled very carefully. In this paper, intrinsic a-Si:H layers were prepared on n-type Cz c-Si substrates by 27.12 MHz PECVD at a high deposition pressure and high deposition power. The corresponding passivation performance on c-Si was investigated by minority carrier lifetime measurement. It was found that an excellent a-Si:H passivation layer could be obtained in a very wide deposition pressure and power region. Such wide process window would be very beneficial for improving the uniformity and the yield for the solar cell fabrication. The a-Si:H layer microstructure was further investigated by Raman and Fourier transform infrared (FTIR) spectroscopy characterization. The correlation between the microstructure and the passivation performance was revealed. According to the above findings, the a-Si:H passivation performance was optimized more elaborately. Finally, a large-area SHJ solar cell with an efficiency of 22.25% was fabricated on the commercial 156 mm pseudo-square n-type Cz c-Si substrate with the opencircuit voltage (V_oc) of up to 0.732 V.     

Silicon thin films prepared in the transition region and their use in solar cells

Diphasic silicon films (nc-Si/a-Si:H) have been prepared by a new regime of plasma enhanced chemical vapour deposition in the region adjacent of phase transition from amorphous to microcrystalline state. Comparing to the conventional amorphous silicon (a-Si:H), the nc-Si/a-Si:H has higher photoconductivity (σ_ph), better stability, and a broader light spectral response range in the longer wavelength range. It can be found from Raman spectra that there is a notable improvement in the medium range order. The blue shift for the stretching mode and red shift for the wagging mode in the IR spectra also show the variation of the microstructure. By using this kind of film as intrinsic layer, a p–i–n junction solar cell was prepared with the initial efficiency of 8.51% and a stabilized efficiency of 8.01% (AM1.5, 100 mw/cm²) at room temperature.     

Modeling and experimental performance of amorphous silicon solar cells with graded boron-doped active layers

The hydrogenated amorphous silicon (a-Si:H) p—i—n solar cell with grade boron-doped i-layer has been presented as a cell structure for improving the energy conversion efficiency. The theoretical analysis was carried out and it shows that by grading the Fermi level of the i-layer, a higher cell efficiency can be obtained. Furthermore, it shows that this structure will more available in the case of a-Si:H solar cell with its i-layer having a highlylocalized states density or a small value of the mobility—lifetime product (μτ). Based upon this anlysis, the a-Si:H p—i—n solar cells with graded boron-doped i-layers were actually fabricated by glow discharge of silane (SiH₄) and disilane (Si₂H₆) and the best efficiencies of 9.46 and 8.05% were obtained, respectively.     

Radiation resistant AlGaAs/GaAs concentrator solar cells with internal Bragg reflector

The problem of increasing efficiency, reliability and radiation resistance of solar cells based on AlGaAs/GaAs heterostructures can be solved by using an internal Bragg reflector. The Bragg reflector as a back surface reflector and as a back surface potential barrier which allows to conserve the high photosensitivity in the long- and middle-wavelength parts of the spectrum after electron and proton irradiation. The effect of base doping and base thickness on the radiation resistance of AlGaAs/GaAs solar cells with the internal Bragg reflector has been investigated. Concentrator solar cells efficiency and related parameters before and after 3 MeV electron irradiation at the fluence up to 3×10¹⁵ cm⁻² are represented. A base doping level of 1×10¹⁵ cm⁻³ and base thickness in the range 1.1–1.6 μm give an EOL AM0 efficiency of 15.8% (BOL–22%) at 30 Suns concentration after exposure to 1×10¹⁵ cm⁻² electron fluence. This EOL efficiency is among the highest reported for GaAs single-junction concentrator cells under AM0 conditions. Making the base doping level lower and the base thinner allows retaining a j_EOL/j_BOL ratio of 0.96 upon exposure up to 3×10¹⁵e/cm² 3 MeV electron fluence. These results are additionally supported by the modeling calculations of the relative damage coefficient.     

Advances in Bragg stack quantum well solar cells

Strain-balanced quantum well solar cells (SB-QWSC) extend the photon absorption edge beyond that of bulk GaAs by incorporation of quantum wells in the i-region of a p–i–n device. The addition of a distributed Bragg reflector (DBR) can substantially increase the photocurrent with little or no detriment to the dark-current. Experimental results are presented that show improvements of DBR cell efficiencies over SB-QWSC's without DBR's. In addition, at high dark-current levels appropriate to high concentration, we observe that the dark-currents of the SB-QWSC's exhibit ideal diode behaviour. We present evidence that the ideality n=1 dark-current is reduced in the DBR cells and discuss the possible efficiency improvements if the dark-current is radiatively dominant.     

Low temperature deposition of high open-circuit voltage (>1.0 V) p-i-n type amorphous silicon solar cells

P-i-n type hydrogenated amorphous silicon (a-Si:H) solar cells were deposited by the radio-frequency plasma-enhanced chemical vapor deposition (RF-PECVD) process at a low substrate temperature of 125 °C, which is compatible with low-cost poly (ethylene terephthalate) (PET) plastic substrates. Wide band gap (E_opt>1.88 eV) intrinsic a-Si:H films were achieved before the onset of the microcrystalline regime by changing the hydrogen dilution ratios. On the other hand, the structural, optical and electrical properties of p-type hydrogenated amorphous silicon carbide (p-a-SiC:H) window layers have been optimized at 125 °C. High quality p-a-SiC:H film with high optical band gap (E₀₄=2.02 eV) and high conductivity (σ_d=1.0×10⁻⁷ S/cm) was deposited at ‘low-power regime’ under low silane flow rates and high H₂ dilution conditions. With the combination of wide band gap p-a-SiC:H window layers and intrinsic a-Si:H layers, a high V_oc of 1.01 V (efficiency=5.51%, FF=0.72, J_sc=7.58 mA/cm²) was obtained for single junction a-Si:H p-i-n solar cell at a low temperature of 125 °C. Finally, flexible a-Si:H solar cell on PET substrate with efficiency of 4.60% (V_oc=0.98 V, FF=0.69, J_sc=6.82 mA/cm²) was obtained.     

Stability of a-Si:H solar cells deposited by Ar-treatment or by ECR techniques

Stability against light soaking was studied for amorphous silicon (a-Si:H) solar cells using three different i-layers; (a) device-quality a-Si:H (standard a-Si:H) with bandgap of 1.75 eV, (b) narrow bandgap (1.55 eV) a-Si:H fabricated by Ar* chemical annealing and (c) a-Si:H(Cl) fabricated from SiH₂Cl₂. Both the narrow bandgap a-Si:H and the a-Si:H(Cl) solar cells showed much improved stability than that of the standard a-Si:H solar cells: e.g., fill factor of the narrow bandgap a-Si:H cell only slightly decreased from 56% to 53%, while that of the standard a-Si:H cell degraded from 62% to 51%. In addition, mobility–lifetime products of the a-Si:H(Cl) cell also exhibited improved stability than that of the standard a-Si:H solar cell.     

Design of textured Al electrode for a hydrogenated amorphous silicon solar cell

Textured surface of metal electrodes formed on a polymer film have been studied to take advantage of an optical confinement effect for hydrogenated amorphous silicon (a-Si:H) solar cell. Theoretical considerations and simulated experiments show that an inclination angle of the textured shape larger than 30° causes an optical confinement effect. The suitable textured Al surface was formed by controlling the crystallization of Al in a sputter-deposition process and adopted for back-side electrodes of stainless steel/Al/polymer. Consequently, the short-circuit current (J_sc) was improved by about 10% by using a textured Al layer with homogeneous roughness of 200–400 nm in size. For further enhancement of J_sc, this textured layer was adopted for multilayer electrodes such as Ti/Ag/Ti/Al, and ITO/p-i-n type solar cells formed on this multilayer electrode showed a high conversion efficiency of 11.28%.     

Low bandgap carbazole copolymers containing an electron-withdrawing side chain for solar cell applications

A new series of low bandgap carbazole copolymers containing an electron-withdrawing moiety as a side chain, via Suzuki, Yamamoto, and Stille polymerization reactions has been synthesized. Their bandgaps and molecular energy levels can be tuned by copolymerizing with different conjugated electron-donating units. The resulting copolymers have low optical and electrochemical bandgaps. The optical bandgaps of the copolymers range from 1.79 to 1.24 eV. In order to investigate their photovoltaic properties, polymer solar cell devices based on low bandgap copolymers were fabricated with a structure of ITO/PEDOT:PSS/copolymers:PCBM/Al, under the illumination of AM 1.5 G, 100 mW/cm². The power conversion efficiencies (PCE) of the polymer solar cells based on these low bandgap copolymers were measured. The best performance was obtained by using PC-CARB as the electron donor and 6,6-phenyl C₇₁-butyric acid methyl ester (PC₇₁BM) as the electron acceptor. The PCE of the solar cell based on PC-CARB/P₇₁CBM (1:4) was 1.27% with an open-circuit voltage (V_oc) of 0.65 V, and a short-circuit current (J_sc) of 6.69 mA/cm².     

Development of high efficiency p-i-n amorphous silicon solar cells with the p-μc-Si:H/p-a-SiC:H double window layer

A structure is developed to help improve the TCO/p contact and efficiency of the solar cell. A p-i-n amorphous silicon (a-Si:H) solar cell with high-conversion efficiency is presented via use of a double p-type window layer composed of microcrystalline silicon and amorphous silicon carbide. The best efficiency is obtained for a glass/textured TCO/p-μc-Si:H/p-a-SiC:H/buffer/i-a-Si:H/n-μc-Si:H/GZO/Ag structure. Using a SnO₂/GZO bi-layer and a p-type hydrogenated microcrystalline silicon (p-μc-Si:H) layer between the TCO/p-a-SiC:H interface improves the photovoltaic performance due to reduction of the surface potential barrier. Layer thickness, B₂H₆/SiH₄ ratio and hydrogen dilution ratio of the p-μc-Si:H layer are studied experimentally. It is clearly shown that the double window layer can improve solar cell efficiency. An initial conversion efficiency of 10.63% is achieved for the a-Si:H solar cell.     

Efficiency enhancement of polymer solar cells by incorporating a self-assembled layer of silver nanodisks

We report the efficiency enhancement of polymer solar cells by incorporating a silver nanodisks' self-assembled layer, which was grown on the indium tin oxide (ITO) surface by the electrostatic interaction between the silver particles and modified ITO. Polymer solar cells with a structure of ITO (with silver nanodisks)/poly(3,4-ethylenedioxythiophene):poly(styrene sulfonate) (PEDOT:PSS) (Clevious P VP AI 4083)/poly(3-hexylthiophene):[6,6]-phenyl-C61 butyric acid methyl ester (P3HT:PC₆₁BM)/LiF/Al exhibited an open circuit voltage (V_OC) of 0.61±0.01 V, short-circuit current density (J_SC) of 9.24±0.09 mA/cm², a fill factor (FF) of 0.60±0.01, and power conversion efficiency (PCE) of 3.46±0.07% under one sun of simulated air mass 1.5 global (AM1.5G) irradiation (100 mW/cm²). The PCE was increased from 2.72±0.08% of the devices without silver nanodisks to 3.46±0.07%, mainly from the improved photocurrent density as a result of the excited localized surface plasmon resonance (LSPR) induced by the silver nanodisks.